CN216537709U - Tail gas absorption vacuum buffer tank for organic silicon slag slurry discharge - Google Patents
Tail gas absorption vacuum buffer tank for organic silicon slag slurry discharge Download PDFInfo
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- CN216537709U CN216537709U CN202122401030.1U CN202122401030U CN216537709U CN 216537709 U CN216537709 U CN 216537709U CN 202122401030 U CN202122401030 U CN 202122401030U CN 216537709 U CN216537709 U CN 216537709U
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Abstract
A tail gas absorption vacuum buffer tank for discharging organic silicon slag slurry comprises a tank body, wherein a tail gas inlet pipe is arranged on the end face of one end of the tank body, and a tail gas outlet pipe and a nitrogen pipe are arranged at the top of the tank body; a partition board is arranged in the tank body, the partition board is horizontally arranged, an arc plate extending upwards is arranged at one end, close to the tail gas inlet pipe, of the partition board, the arc plate and the tail gas inlet pipe are arranged at the same horizontal height, and a gap is reserved between the upper end of the arc plate and the inner top surface of the tank body; the tail gas outlet pipe is connected with an exhaust pipe on one end in the tank body, the exhaust pipe comprises an exhaust pipe head, a mist catcher is arranged in the exhaust pipe head, the lower end of the exhaust pipe head is connected with a first air inlet pipe head, and the side wall of the exhaust pipe head is connected with a second air inlet pipe head; the first air inlet pipe head penetrates through the partition plate downwards and extends to the position below the partition plate; the bottom of the tank body is provided with a liquid discharge pipe. This is novel adopts above-mentioned structure, solves in the sediment thick liquid tail gas smugglies liquid entering water ring vacuum system secretly, leads to forming the colloid among the water ring vacuum system and influences the problem of system normal operating.
Description
Technical Field
The utility model relates to the technical field of organic silicon slag slurry discharge, in particular to a tail gas absorption vacuum buffer tank for organic silicon slag slurry discharge.
Background
In the production process of the organosilicon high-boiling cracking batch method, a single set of high-boiling cracking kettle can carry out slag slurry discharge operation in each production period (12 hours/period), the slag slurry in the high-boiling cracking kettle is discharged into a slag slurry tank, because the slag slurry tank is an atmospheric pressure tank, tail gas in the tank needs to be discharged to an absorption device in the discharge process, the slag slurry tank is ensured to maintain the atmospheric pressure (atmospheric pressure), the tail gas absorption device is a water ring vacuum system, if the tail gas enters the water ring vacuum system along with liquid organosilicon monomer materials in the tail gas absorption process, the organosilicon monomer materials and water in the water ring vacuum pump carry out hydrolysis reaction, a large amount of colloid substances can be rapidly generated, and further the normal operation of the water ring vacuum system is influenced, because the volume of a gas phase pipeline connected with the water ring vacuum system is limited, the buffer capacity of the pipeline is limited, and the vacuum degree in the pipeline fluctuates after the discharge amount of the tail gas changes, the tail gas absorption process cannot be stably and continuously performed.
Disclosure of Invention
The utility model aims to solve the technical problem of providing a tail gas absorption vacuum buffer tank for discharging organosilicon slurry, and solves the problem that the normal operation of a water ring vacuum system is influenced by colloid formed in the water ring vacuum system because liquid carried by the tail gas of the slurry enters the water ring vacuum system.
In order to solve the technical problems, the technical scheme adopted by the utility model is as follows: a tail gas absorption vacuum buffer tank for discharging organic silicon slag slurry comprises a tank body, wherein a tail gas inlet pipe is arranged on the end face of one end of the tank body, and a tail gas outlet pipe and a nitrogen pipe are arranged at the top of the tank body;
a partition board is arranged in the tank body and horizontally arranged, an arc plate extending upwards is arranged at one end, close to the tail gas inlet pipe, of the partition board, the arc plate and the tail gas inlet pipe are arranged at the same horizontal height, and a gap is reserved between the upper end of the arc plate and the inner top surface of the tank body;
the tail gas outlet pipe is positioned at one end in the tank body and is connected with an exhaust pipe, the exhaust pipe comprises an exhaust pipe head, a mist catcher is arranged in the exhaust pipe head, the lower end of the exhaust pipe head is connected with a first air inlet pipe head which is vertically downward, and the side wall of the exhaust pipe head is connected with a second horizontal air inlet pipe head;
the first air inlet pipe head penetrates through the partition plate downwards and extends to the position below the partition plate;
and a liquid discharge pipe is arranged at the bottom of the tank body.
In a preferable scheme, a pressure gauge and a thermometer are arranged at the top of the tank body.
In the preferred scheme, the top of the tank body is provided with an upper standby pipe, and the bottom of the tank body is provided with a lower standby pipe.
In the preferred scheme, the other end of the tank body, which is far away from the tail gas inlet pipe, is provided with a side pipeline, and the side pipeline is provided with a liquid level meter.
In a preferable scheme, a manhole is arranged at one end of the tank body, which is provided with the tail gas inlet pipe.
In a preferable scheme, an inclined baffle is arranged at the connecting position of the second air inlet pipe head and the air outlet pipe head, and the inclined baffle is arranged by extending from the upper edge of the output end of the second air inlet pipe head in a downward inclination manner.
In a preferred scheme, the pipe diameters of the first air inlet pipe head and the second air inlet pipe head are smaller than those of the air outlet pipe head.
The tail gas absorption vacuum buffer tank for discharging the organic silicon slag slurry, provided by the utility model, has the following beneficial effects by adopting the structure:
(1) the interference degree of the tail gas absorption system is improved, and the vacuum degree of the tail gas absorption system is effectively stabilized;
(2) after tail gas discharged from the slurry tank enters the vacuum buffer tank, liquid carried in the tail gas can be separated in the vacuum buffer tank and cannot be carried to a water ring vacuum system;
(3) organosilicon monomer material accessible bottom discharge pipe mouth of pipe of storing in the vacuum buffer tank utilizes the diaphragm pump to extract and retrieve to this unit rectification system in, can not only reduce organosilicon monomer's loss, can also protect water ring vacuum system.
Drawings
The utility model is further illustrated by the following examples in conjunction with the accompanying drawings:
fig. 1 is a schematic view of the overall structure of the present invention.
In the figure: the device comprises a tank body 1, a tail gas inlet pipe 2, a tail gas outlet pipe 3, a pressure gauge 4, a thermometer 5, a nitrogen pipe 6, an upper standby pipe 7, a partition plate 8, an arc plate 9, an exhaust pipe 10, an exhaust pipe head 1001, a first air inlet pipe head 1002, a second air inlet pipe head 1003, a side pipeline 11, a liquid level meter 12, a liquid discharge pipe 13, a lower standby pipe 14, an inclined baffle 15, a mist catcher 16 and a manhole 17.
Detailed Description
As shown in fig. 1, a tail gas absorption vacuum buffer tank for discharging organosilicon slurry comprises a tank body 1, wherein a tail gas inlet pipe 2 is arranged on the end face of one end of the tank body 1, and a tail gas outlet pipe 3 and a nitrogen pipe 6 are arranged at the top of the tank body 1;
a partition plate 8 is arranged in the tank body 1, the partition plate 8 is horizontally arranged, an arc plate 9 extending upwards is arranged at one end of the partition plate close to the tail gas inlet pipe 2, the arc plate 9 and the tail gas inlet pipe 2 are arranged at the same horizontal height, and a gap is reserved between the upper end of the arc plate 9 and the inner top surface of the tank body 1;
the end of the tail gas outlet pipe 3, which is positioned in the tank body 1, is connected with an exhaust pipe 10, the exhaust pipe 10 comprises an outlet pipe head 1001, a mist catcher 16 is arranged in the outlet pipe head 1001, the lower end of the outlet pipe head 1001 is connected with a first air inlet pipe head 1002 which faces downwards vertically, and the side wall of the outlet pipe head 1001 is connected with a second horizontal air inlet pipe head 1003;
the first air inlet pipe head 1002 penetrates through the partition plate 8 downwards and extends to the position below the partition plate 8;
a liquid discharge pipe 13 is arranged at the bottom of the tank body 1.
In the preferred scheme, the top of the tank body 1 is provided with a pressure gauge 4 and a thermometer 5.
In the preferred scheme, the top of the tank body 1 is provided with an upper standby pipe 7, and the bottom of the tank body 1 is provided with a lower standby pipe 14.
In the preferred scheme, a side pipeline 11 is arranged at the other end of the tank body 1 far away from the tail gas inlet pipe 2, and a liquid level meter 12 is arranged on the side pipeline 11.
In a preferred scheme, a manhole 17 is arranged at one end of the tank body 1 provided with the tail gas inlet pipe 2.
In a preferable scheme, an inclined baffle 15 is arranged at a connection position of the second air inlet pipe head 1003 and the air outlet pipe head 1001, and the inclined baffle 15 is arranged by extending from the upper edge of the output end of the second air inlet pipe head 1003 in a downward inclination manner.
In an optimal scheme, the pipe diameters of the first air inlet pipe head 1002 and the second air inlet pipe head 1003 are smaller than that of the air outlet pipe head 1001.
When the device is adopted to discharge the organic silicon slag slurry:
the tank body 1 is vacuumized by a water ring vacuum system connected with the tail gas outlet pipe 3, the pressure value is observed by a pressure gauge 4, after the pressure value is stabilized, inputting the tail gas of the organosilicon slurry into the tank body through a tail gas inlet pipe 2, impacting the tail gas on an arc plate 9 when the tail gas enters, ascending a gas phase part, descending a liquid phase part, entering the gas phase part into an area above a partition plate 8 from a gap between the arc plate 9 and the inner top surface of the tank body 1, and finally enters from the second air inlet pipe head 1003, passes through the mist catcher 16 for final liquid phase capture and then is discharged, the liquid phase flows to the bottom of the tank body 1 along the partition plate 8, and is stored in the tank body 1 below the partition plate 8 together with the liquid phase falling down along the exhaust pipe 10, after the exhaust gas discharge is completed, nitrogen gas is supplied into the tank body 1 through the nitrogen gas pipe 6 and the pressure in the tank body 1 is stabilized, and then a valve on the liquid discharge pipe 13 is opened to perform liquid phase discharge.
Claims (7)
1. The utility model provides a tail gas absorbs vacuum buffer tank for organosilicon sediment thick liquid discharges, includes jar body (1), its characterized in that: a tail gas inlet pipe (2) is arranged on the end face of one end of the tank body (1), and a tail gas outlet pipe (3) and a nitrogen pipe (6) are arranged at the top of the tank body (1);
a partition plate (8) is arranged in the tank body (1), the partition plate (8) is horizontally arranged, an arc plate (9) extending upwards is arranged at one end, close to the tail gas inlet pipe (2), of the partition plate, the arc plate (9) and the tail gas inlet pipe (2) are arranged at the same horizontal height, and a gap is reserved between the upper end of the arc plate (9) and the inner top surface of the tank body (1);
one end of the tail gas outlet pipe (3) positioned in the tank body (1) is connected with an exhaust pipe (10), the exhaust pipe (10) comprises an air outlet pipe head (1001), a mist catcher (16) is arranged in the air outlet pipe head (1001), the lower end of the air outlet pipe head (1001) is connected with a first air inlet pipe head (1002) which is vertically downward, and the side wall of the air outlet pipe head (1001) is connected with a second horizontal air inlet pipe head (1003);
the first air inlet pipe head (1002) penetrates through the partition plate (8) downwards and extends to the position below the partition plate (8);
a liquid discharge pipe (13) is arranged at the bottom of the tank body (1).
2. The tail gas absorption vacuum buffer tank for discharging the organosilicon slurry as claimed in claim 1, wherein: the top of the tank body (1) is provided with a pressure gauge (4) and a thermometer (5).
3. The tail gas absorption vacuum buffer tank for discharging the organosilicon slurry as claimed in claim 1, wherein: the top of the tank body (1) is provided with an upper standby pipe (7), and the bottom of the tank body (1) is provided with a lower standby pipe (14).
4. The tail gas absorption vacuum buffer tank for discharging the organosilicon slurry as claimed in claim 1, wherein: the other end of the tank body (1) far away from the tail gas inlet pipe (2) is provided with a side pipeline (11), and the side pipeline (11) is provided with a liquid level meter (12).
5. The tail gas absorption vacuum buffer tank for discharging the organosilicon slurry as claimed in claim 1, wherein: the tank body (1) is provided with a manhole (17) at one end provided with a tail gas inlet pipe (2).
6. The tail gas absorption vacuum buffer tank for discharging the organosilicon slurry as claimed in claim 1, wherein: an inclined baffle (15) is arranged at the connecting position of the second air inlet pipe head (1003) and the air outlet pipe head (1001), and the inclined baffle (15) is arranged at the output end of the second air inlet pipe head (1003) in a downward inclined extending mode.
7. The tail gas absorption vacuum buffer tank for discharging the organosilicon slurry as claimed in claim 1 or 6, wherein: the pipe diameters of the first air inlet pipe head (1002) and the second air inlet pipe head (1003) are smaller than that of the air outlet pipe head (1001).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202122401030.1U CN216537709U (en) | 2021-10-03 | 2021-10-03 | Tail gas absorption vacuum buffer tank for organic silicon slag slurry discharge |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202122401030.1U CN216537709U (en) | 2021-10-03 | 2021-10-03 | Tail gas absorption vacuum buffer tank for organic silicon slag slurry discharge |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN216537709U true CN216537709U (en) | 2022-05-17 |
Family
ID=81565846
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202122401030.1U Active CN216537709U (en) | 2021-10-03 | 2021-10-03 | Tail gas absorption vacuum buffer tank for organic silicon slag slurry discharge |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN216537709U (en) |
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2021
- 2021-10-03 CN CN202122401030.1U patent/CN216537709U/en active Active
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