CN216528735U - Carbon ion source device with reflector power supply - Google Patents

Abstract

The utility model relates to a carbon ion source device with a repeller power supply, which comprises an arc chamber, a cover plate, a filament, a cathode, a repeller and a vent hole, wherein the arc chamber is provided with a first arc chamber and a second arc chamber; the arc starting chamber is a chamber for generating plasma by collision of electrons and gas molecules; the cover plate is provided with a leading-out slit for leading out plasma, and the plasma is led out of the arc starting chamber; the filament generates a first group of electrons after being heated, and the first group of electrons are used for heating the cathode; after the cathode is heated, a second group of electrons are generated and used for starting arc; the reflecting electrode is arranged on one side, opposite to the cathode, in the arcing chamber and used for constructing an electric field in the arcing chamber; the vent hole is arranged on the inner wall of the arc starting chamber and used for inputting gas into the arc starting chamber. The ion source device can obtain the carbon ion beam with larger beam current and more purity, is convenient for adjusting the electric field intensity, improves the injection quality and improves the product yield.

Description

Carbon ion source device with reflector power supply

Technical Field

The utility model belongs to the field of semiconductor manufacturing and processing, and relates to a carbon ion source device with a reflector power supply, which is suitable for ion implantation equipment.

Background

Ion implantation is an important doping method in the field of semiconductor chip fabrication, in which carbon is used as an effective method for combined ion implantation to fabricate ultra-shallow junctions and abrupt junctions, and to suppress diffusion of boron and other doping atoms.

In the ion implantation process, not only the parameters of implantation energy, dose, angle, etc. need to be accurately controlled, but also the contamination condition during implantation needs to be strictly controlled. Once the pollution is increased, the equipment must be cleaned and maintained, the effective operation time of the equipment is greatly reduced, and the operation cost of a machine table is increased. However, carbon tends to accumulate due to its own characteristics, leading to increased contamination during ion implantation.

The ion source is an apparatus for generating plasma by ionizing neutral atoms or molecules, and is an indispensable component of an ion implanter. At present, the ion source commonly used by ion implantation equipment is mainly made of metals such as molybdenum, tungsten and the like on the side wall of an arc-starting chamber and a cover plate provided with a lead-out seam. During carbon ion implantation, carbon is easily accumulated on the surface of materials such as molybdenum, tungsten and the like. Carbon accumulated on the surface of the side wall of the arc chamber can reduce the dissociation efficiency of the plasma and reduce the ion beam current; and the carbon accumulated at the leading-out seam can form burrs, and the blocking part separates a channel for the advancing of the ion beam, so that the integral uniformity of the ion beam is reduced, and the beam forming difficulty is increased. In addition, when carbon is accumulated to a certain degree, peeling is generated, and the peeled carbon has a certain probability of reaching the process cavity along with the ion beam and being adsorbed on the surface of the wafer, so that the product yield is damaged. Furthermore, electrons moving in the arc chamber may collide with the arc chamber and the cover plate to generate metal ions, which may cause contamination of the generated ion beam and the analyzing magnet. And, the cathode and the repeller in the arc starting chamber have the same potential at present, and the electric field intensity in the arc starting chamber cannot be intuitively and conveniently adjusted, so that the movement distance or speed of electrons is poor, and the effect of generating plasma is influenced; or more time is needed to debug a plurality of power supplies, the efficiency is low, and the production requirement of a large-scale production line cannot be met. Therefore, there is a need for an ion source apparatus that is more suitable for carbon ion implantation to reduce the accumulation and contamination during the carbon ion implantation process and to quickly adjust the movement of electrons in the arc chamber.

SUMMERY OF THE UTILITY MODEL

Based on the problems in the prior art, the utility model provides a carbon ion source device with a repeller power supply, which is mainly used in ion implantation equipment and is particularly suitable for a carbon ion implantation process.

According to the technical scheme of the utility model, the utility model provides a carbon ion source device with a repeller power supply, which is a device for ionizing neutral atoms or molecules and generating carbon plasma; the plasma generating device comprises an arc starting chamber, a cover plate, a filament, a cathode, a reflecting electrode and a vent hole, wherein the arc starting chamber is a chamber for generating plasma by collision of electrons and gas molecules; the cover plate is provided with an extraction slit for extracting the plasma and extracting the plasma out of the arcing chamber; a filament that generates a first set of electrons after being heated, the first set of electrons being used to heat the cathode; a cathode that, when heated, generates a second set of electrons that is used for arc starting; a reflector disposed on the side of the arc striking chamber opposite to the cathode for constructing an electric field in the arc striking chamber; and the vent hole is arranged on the inner wall of the arc starting chamber and is used for inputting gas into the arc starting chamber.

The arc starting chamber is in a box shape with one side provided with a bottom and the other side provided with an opening, and the cover plate is detachably fixed and covered at the opening of the arc starting chamber; the cover plate is provided with a strip-shaped lead-out seam; one or more through vent holes are formed in the inner wall of the arc starting chamber; a cathode is arranged on one side surface of the arc starting chamber adjacent to the cover plate; the cathode is in a cylindrical shape, one end of the cathode is provided with a bottom, and the other end of the cathode is provided with an opening; a repeller is disposed in the arc striking chamber on a side opposite the cathode, and a repeller power supply is connected between the repeller and the arc striking chamber to generate an electric field that confines a second set of electrons to oscillate between the repeller and the cathode.

Preferably, the arc starting chamber is made of graphite, and the cover plate is made of graphite.

Further preferably, the reflector is a block made of graphite.

Furthermore, the cathode sleeve is provided with a sleeve-shaped cathode cap, and a gap is formed between the cathode and the cathode cap at least at the position close to the bottom of the cathode; a filament is accommodated in the cathode, and two tail ends of the filament penetrate out of the opening of the cathode; a reflecting electrode is arranged on one side wall of the arc starting chamber opposite to the filament; the filament and the cathode are arranged in the arc starting chamber, and the cathode cap and the arc starting chamber are arranged in the arc starting chamber.

Furthermore, the device also comprises a circuit component which is connected with the arc starting chamber, the filament, the cathode and the reflecting electrode.

Preferably, a chamfer is arranged on one surface of the cover plate close to the inner part of the arc starting chamber and at the edge of the lead-out seam.

Furthermore, at least one pair of magnetic bodies is arranged outside the arc striking chamber and close to the positions of two surfaces where the cathode and the reflecting electrode are arranged, and an ion source magnetic field is arranged between the magnetic bodies; the ion source magnetic field causes a second set of electrons to spiral.

Further, an arc starting chamber mounting part, a cathode mounting plate, an insulating fixing plate, a filament clamp and a reflector mounting plate are arranged outside the arc starting chamber; the arc striking chamber is fixedly arranged on the arc striking chamber mounting part; the cathode mounting plate is provided with a through second fixing hole, and the opening end of the cathode is fixedly arranged in the second fixing hole; the outer side surface of the cathode close to the opening end is provided with a thickened part, the outer diameter of the thickened part is larger than the outer diameter of other parts of the cathode, and a cathode cap is fixedly sleeved on the outer side surface of the thickened part; a through first fixing hole is formed in one side surface of the arc starting chamber adjacent to the cover plate, and the cathode cap penetrates through the first fixing hole; the number of the filament clamps is two, and the two filament clamps are respectively fixedly connected with the two tail ends of the filament; the filament clamp and the cathode mounting plate are fixedly connected with the insulating fixing plate, and a gap is formed between the filament clamp and the cathode mounting plate; the insulating fixing plate is fixedly connected with the arc striking chamber mounting part; a third fixing hole is formed in one side wall of the arc starting chamber, which is opposite to the cathode, a reflecting electrode is nested in the third fixing hole, and a gap is formed between the reflecting electrode and the inner side surface of the third fixing hole; and an insulated reflecting electrode mounting plate is fixedly arranged at the third fixing hole and outside the arc striking chamber, a through hole is formed in the reflecting electrode mounting plate, and a reflecting electrode terminal penetrates through the through hole of the reflecting electrode mounting plate for fixing.

Furthermore, two ends of the filament are connected with a filament power supply; a cathode power supply is connected between the cathode and the filament, so that the potential of the cathode is higher than that of the filament; an arc starting chamber power supply is connected between the arc starting chamber and the cathode, so that the potentials of the arc starting chamber and a cathode cap contacted with the arc starting chamber are higher than that of the cathode; the power supply of the reflecting electrode is an adjustable power supply.

Compared with the prior art, the carbon ion source device with the reflector power supply has the beneficial effects that: in the working process, other metal ions are not generated in the arc striking chamber basically, so that the pollution is reduced, and a purer carbon ion beam can be obtained; the electric field in the arc striking chamber can be quickly adjusted through the reflector power supply, so that the movement intensity of electrons is adjusted, and the plasma generation efficiency is improved; and the accumulation of carbon on the inner wall of the arc striking chamber and the inner side surface of the cover plate of the arc striking chamber is reduced; in addition, the problem that carbon is accumulated at the edge corner of the extraction slit to block the ion beam is avoided. Therefore, the ion source device for the carbon ion implantation process can obtain the carbon ion beam with larger beam current and higher purity, thereby improving the implantation quality and the product yield.

Drawings

Fig. 1 is a schematic structural diagram of an ion source apparatus according to an embodiment of the present invention.

Fig. 2 is a schematic perspective view of a part of an ion source apparatus according to an embodiment of the present invention.

Fig. 3 is a schematic perspective view of a cathode side of an ion source apparatus according to an embodiment of the utility model.

Fig. 4 is a schematic perspective view of a reflector side of the ion source apparatus shown in fig. 3.

Description of the figure numbers: 1: an arc striking chamber; 2: a cover plate; 3: leading out a seam; 4: a filament; 5: a cathode; 6: a reflective electrode; 7: a repeller terminal; 8: an ion source magnetic field; 9: a vent hole; 10: chamfering; 11: a cathode cap; 12: a cathode mounting plate; 13: an insulating fixing plate; 14: a filament clamp; 15: fixing the rod; 16: an arcing chamber mounting portion; 17: a repeller mounting plate; 18: a first fixing hole; 19: a second fixing hole; 20: a third fixing hole; 21: a repeller power supply.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, not all embodiments. All other embodiments obtained by a person skilled in the art based on the embodiments in the patent of the utility model without any inventive work belong to the protection scope of the patent of the utility model.

The utility model provides an ion source device for a carbon ion implantation process, wherein the ion source for the carbon ion implantation process is a device which ionizes neutral atoms or molecules and generates carbon plasma; the ion source device can reduce the accumulation of carbon and the pollution of impurity ions, and is convenient for adjusting the electric field intensity in the arcing chamber.

The utility model relates to an ion source device for a carbon ion implantation process, which comprises an arc starting chamber, a cover plate, a filament, a cathode and a vent hole, wherein the arc starting chamber is provided with a plurality of arc starting holes; the plasma generating device comprises an arc starting chamber, a plasma generating chamber and a plasma generating chamber, wherein the arc starting chamber is used for generating plasma by collision of electrons and gas molecules; the cover plate is provided with an extraction slit for extracting plasma and extracting the plasma out of the arc starting chamber; a filament that generates a first set of electrons (filament thermions) after being heated, the first set of electrons being used to heat the cathode; a cathode that, when heated, generates a second set of electrons (cathode electrons) that is used for arc starting; and the vent hole is arranged on the inner wall of the arc starting chamber and is used for inputting gas into the arc starting chamber. The ion source device for the carbon ion implantation process can obtain the carbon ion beam with larger beam current and higher purity, is convenient for adjusting the electric field intensity, improves the implantation quality and improves the product yield.

Specifically, referring to fig. 1 to 4, an ion source apparatus for forming plasma by sputtering a substance according to the present invention includes an arc-starting chamber 1 and a cover plate 2, wherein the arc-starting chamber 1 has a box shape with a bottom at one side and an opening at the other side, and the cover plate 2 is detachably fixed to cover the opening of the arc-starting chamber 1. Specifically, for example, the whole arc starting chamber 1 is a cuboid, and one surface of the cuboid is a cover plate 2. The cover plate 2 is provided with a strip-shaped lead-out seam 3.

The cover plate 2 is detachably and fixedly connected with the arc striking chamber 1 by means of screws, for example, and in a specific embodiment, is fixed by using a fixing rod 15. As shown in fig. 3, the arc starting chamber 1 is fixedly mounted on the arc starting chamber mounting portion 16. The arc chamber mount 16 is connected to the rest of the ion source apparatus. A through hole is formed at the edge of the cover plate 2, and a fixing rod 15 passes through the through hole to fixedly connect the cover plate 2 and the arc-starting chamber mounting part 16, so that the relative position of the cover plate 2 and the arc-starting chamber 1 is fixed, and the connection mode can be selected as threaded connection. Preferably, there are four fixing rods 15 uniformly distributed at both sides of the length direction of the lead-out slit 3.

A cathode 5 is arranged on one side surface of the arc starting chamber 1 adjacent to the cover plate 2, and one end of the cathode 5 is in a barrel shape with a bottom and the other end being open. The cathode 5 accommodates the filament 4 therein, and both ends of the filament 4 penetrate out from the opening of the cathode 5 and are connected with a filament power supply, so that the filament 4 is energized to emit electrons when in operation. In some embodiments, the central portion of the filament 4 is, for example, a planar spiral bend (mosquito coil or spiral disk), two ends of the filament 4 are fixedly connected to two filament clamps 14, respectively, the filament clamps 14 are conductors, and the filament power supply is connected to the filament clamps 14.

A cylindrical cathode cap 11 is fitted around the cathode 5, and at least at a position near the bottom of the cathode 5, a gap is provided between the cathode 5 and the cathode cap 11. In a specific embodiment, referring to fig. 1 and 2, a thickened portion is disposed on an outer side surface of the cathode 5 near the open end, an outer diameter of the thickened portion is larger than outer diameters of other portions of the cathode, and a cathode cap 11 is fixedly sleeved on the outer side surface of the thickened portion (for example, by a threaded connection or an interference fit connection). When the cathode 5 is hit by the electrons generated by the filament 4 during operation, the cathode 5 emits electrons in all directions, and the cathode cap 11 serves to block the electrons moving around the side of the cathode 5 and only leaves the electrons moving toward the side of the arc-starting chamber 1 opposite to the cathode 5, for this reason, preferably, as shown in fig. 1, the cathode cap 11 and the cathode 5 are flush with each other at the end near the inside of the arc-starting chamber 1.

A reflector 6, for example, a plate-like or cylindrical shape, is provided on one side wall of the arc starting chamber 1 facing the cathode 5. A repeller power supply 21, preferably an adjustable power supply, is connected between repeller 6 and the arc-starting chamber 1, generating an electric field that confines a second set of electrons to oscillate between repeller 6 and cathode 5.

The device also comprises a fixed structure for fixing the positions of the reflecting electrode 6, the filament 4 and the cathode 5, so that a gap and non-conductivity exist between the reflecting electrode 6 and the arc starting chamber 1, a gap and non-conductivity exist between the filament 4 and the cathode 5, and a gap and non-conductivity exist between the cathode cap 11 and the arc starting chamber 1, so that the potential of each part can be controlled through an additional circuit component to form an electric field, and further the motion trail of electrons or ions can be controlled.

Aiming at the carbon ion implantation process, the arc starting chamber 1 and the cover plate 2 which are made of graphite materials are adopted in the ion source device, so that the adverse effect caused by carbon accumulation is avoided, the generation of other impurity ions is avoided, and the product yield of the ion implantation process is improved. Further, in order to prevent a small amount of electrons or ions from hitting the repeller 6, it is more preferable to use graphite as the material of the repeller 6.

Moreover, the electric field in the arc striking chamber can be quickly adjusted through the repeller power supply 21, so that the movement intensity of electrons is adjusted, and the plasma generation efficiency is improved.

In addition, because the cover plate 2 has a thickness, after the strip-shaped lead-out seam 3 is formed on the cover plate 2, vertical edges and corners exist at the edge of the lead-out seam 3, and then carbon accumulation is easily caused at the positions, so that the running of ion beam current is influenced. In a preferred embodiment, as shown in fig. 1, a smooth and curved chamfer 10 is provided on one surface of the cover plate 2 near the inside of the arc generating chamber 1 and at the edge of the extraction slit 3, so that the ion beam is not easily accumulated when being extracted outward and passing through the extraction slit 3. It will be understood that fig. 1 is a schematic cross-sectional view in only one direction, and that all edges and corners of the actual outlet seam 3 on the side close to the arcing chamber 1 (for example, a rectangular outlet seam 3 would produce four edges and four corners) are eliminated by the chamfer 10, and instead are smoothly transitioned into a curved surface.

In one embodiment, the fixing structure for fixing the positions of the repeller 6, the filament 4, and the cathode 5 includes an arc chamber mounting portion 16, a cathode mounting plate 12, an insulating fixing plate 13, a filament clamp 14, and a repeller mounting plate 17. The cathode mounting plate 12 is a conductor, for example, made of graphite, and has a second fixing hole 19 formed therethrough, and the open end of the cathode 5 is fixedly disposed in the second fixing hole 19. The second fixing hole 19 has the same inner diameter as the outer diameter of the cathode 5 and is connected near the open end of the cathode 5, for example, by screwing. The filament clamp 14 and the cathode mounting plate 12 are both fixedly connected with the insulating fixing plate 13 (for example, fixedly connected by screws/bolts), and a gap exists between the filament clamp 14 and the cathode mounting plate 12, so that a three-layer nested structure of the filament 4, the cathode 5 and the cathode cap 11 which are arranged in sequence from inside to outside is formed, and the positions of the filament clamp, the cathode cap and the cathode mounting plate are fixed. A first through fixing hole 18 is arranged on one side surface of the arc starting chamber 1 where the cathode 5 is positioned. The insulating fixing plate 13 is fixedly connected with the arc-starting chamber mounting part 16, the cathode cap 11 is positioned in the first fixing hole 18, and the cathode cap 11 and the arc-starting chamber 1 have a gap and are not conductive.

Referring to fig. 1, 2 and 4, a third fixing hole 20 is formed on a side wall of the arc starting chamber 1 opposite to the cathode 5, the reflector 6 is embedded in the third fixing hole 20, and a gap is formed between the reflector 6 and an inner side surface of the third fixing hole 20, which is not conductive. One side of the reflecting electrode 6 is positioned in the arc starting chamber 1, and a reflecting electrode terminal 7 which is rod-shaped for example is arranged on the other side of the reflecting electrode 6 in a protruding way; an insulating repeller mounting plate 17 is fixedly arranged at the position of the third fixing hole 20 and outside the arc starting chamber 1 (for example, fixedly connected by a screw/bolt manner), a through hole is formed in the repeller mounting plate 17, and the repeller terminal 7 penetrates through the through hole of the repeller mounting plate 17 to be fixed, so that a gap exists between the repeller 6 and the arc starting chamber 1, and the repeller is not conductive.

As shown in fig. 1, at least one side surface of the arc starting chamber 1 is provided with one or more vent holes 9 penetrating through the wall of the arc starting chamber 1, and the vent holes 9 are connected with a gas supply device through a pipeline or the like, so that a required gas (such as carbon monoxide or carbon dioxide) is introduced into the arc starting chamber 1. In a specific embodiment, the arc starting chamber 1 is substantially rectangular, the arc starting chamber 1 is perpendicular to four edges of the cover plate 2, one side of the arc starting chamber 1 is provided with a 45-degree chamfer angle, for example, to form four elongated planes with length directions perpendicular to the cover plate 2, a vent hole 9 is arranged in the middle of at least one elongated plane, and preferably, vent holes 9 are arranged at four edges; of course, the device can be arranged at other positions.

In addition, the arc starting chamber 1, the filament 4, the cathode 5 and the reflecting electrode 6 are connected with a circuit component which comprises the following components: two ends of the filament 4 are connected with a filament power supply; a cathode power supply is connected between the cathode 5 and the filament 4, so that the potential of the cathode 5 is higher than that of the filament 4; an arc starting chamber power supply is connected between the arc starting chamber 1 and the cathode 5, so that the potentials of the arc starting chamber 1 and a cathode cap 11 which is in contact with the arc starting chamber 1 are higher than that of the cathode 5; a reflecting electrode power supply 21 is connected between the reflecting electrode 6 and the arc starting chamber 1, and the reflecting electrode power supply 21 is an adjustable power supply, so that the relative potential between the reflecting electrode 6 and the arc starting chamber 1 can be conveniently and quickly adjusted, and the electric field is changed, and the intensity of electron or ion movement is controlled. It is understood that the specific power supplies and the fixing and layout of the lead structure are not limited, and any specific implementation of the circuit connection can be realized.

And at least one pair of magnetic bodies are arranged outside the arc starting chamber 1 and close to the two surfaces of the cathode 5 and the reflecting electrode 6, and an ion source magnetic field 8 is arranged between the magnetic bodies and used for enabling electrons to do spiral motion under the action of the magnetic field and increasing the motion distance of the electrons.

The working process of the carbon ion source device with the reflector power supply comprises the following steps:

detecting whether the vacuum degree of each component and an arc striking chamber of the ion source device is normal or not;

the ion source device is powered on to enable each part to reach the set potential and current;

a gas (e.g. carbon monoxide or carbon dioxide) is passed into the arc striking chamber 1 through a vent 9;

the filament power supply energizes the filament 4, and the filament 4 releases thermal electrons (a first set of electrons, filament thermal electrons);

the filament 4 and the cathode 5 are connected with a cathode power supply, the position and the polarity of the cathode power supply are shown in figure 1, and the potential of the cathode 5 is higher than that of the filament 4;

the thermal electrons are accelerated towards the cathode 5 under the action of the electric field and bombard the cathode 5, so that electron avalanche is generated at the cathode 5, and a large number of electrons (a second group of electrons, cathode electrons) are released in all directions;

electrons emitted laterally by the cathode 5 are blocked by the cathode cap 11, leaving only electrons moving toward the repeller 6;

the electrons collide with the gas molecules introduced from the vent holes 9, so that the gas molecules are ionized to generate plasma;

an ion source magnetic field 8 exists between the magnetic bodies, electrons move in the ion source magnetic field 8 and make spiral motion under the action of magnetic field force, so that the movement distance of the electrons is increased, and the collision probability of the electrons and gas molecules is increased;

the polarity and the size of the repeller power supply 21 are adjusted according to the needs, when the potential of the repeller 6 is lower than the potential of the arc starting chamber 1, electrons move to the opposite direction (towards the cathode 5) due to the action of an electric field when moving to the vicinity of the repeller 6 (namely, the electrons are reflected), so that the moving distance of the electrons is increased, and the collision probability of the electrons and gas molecules is increased; the lower the potential of the reflecting electrode 6 is, the stronger the effect of reflecting electrons is, so that the rapid adjustment of the electron motion intensity can be realized;

or, the intensity of the electric field in the arc starting chamber 1 is changed by adjusting the repeller power supply 21, the plasma is controlled to impact the inner wall of the arc starting chamber 1, and more ions or molecules are sputtered, so that the plasma concentration is increased;

an extraction voltage is applied to one side of the cover plate 2 far away from the arc starting chamber 1, and the generated plasma is extracted from the arc starting chamber 1 through the extraction slit 3 to form a plasma beam.

In summary, the above description is only a preferred embodiment of the present invention, and is not intended to limit the scope of the present invention. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims (10)

1. A kind of carbon ion source apparatus with power of repeller, characterized by that, the carbon ion source apparatus is the apparatus making neutral atom or molecule ionize and produce the carbon plasma;

the carbon ion source device comprises an arc starting chamber, a cover plate, a filament, a cathode, a reflecting electrode and a vent hole,

an arc starting chamber, which is used for a chamber for generating plasma by the collision of electrons and gas molecules;

the cover plate is provided with an extraction slit for extracting plasma and extracting the plasma out of the arc starting chamber;

a filament that generates a first set of electrons after being heated, the first set of electrons being used to heat the cathode;

a cathode that, when heated, generates a second set of electrons that is used for arc starting;

a repeller provided on the side of the arc chamber opposite to the cathode, for forming an electric field in the arc chamber;

and the vent hole is arranged on the inner wall of the arc starting chamber and is used for inputting gas into the arc starting chamber.

2. The carbon ion source device with the repeller power supply according to claim 1, comprising an arc starting chamber (1) and a cover plate (2), wherein the arc starting chamber (1) has a box shape with a bottom on one side and an opening on the other side, and the cover plate (2) is detachably fixed to cover the opening of the arc starting chamber (1); the cover plate (2) is provided with a strip-shaped lead-out seam (3); one or more through vent holes (9) are formed in the inner wall of the arc starting chamber (1); a cathode (5) is arranged on one side surface of the arc starting chamber (1) adjacent to the cover plate (2); the cathode (5) is in a cylindrical shape, one end of the cathode is provided with a bottom, and the other end of the cathode is provided with an opening; a repeller (6) is disposed on a side of the arc chamber (1) opposite the cathode (5), a repeller power supply (21) is connected between the repeller (6) and the arc chamber (1), and an electric field is generated that confines a second set of electrons to oscillate between the repeller (6) and the cathode (5).

3. The apparatus for a carbon ion source with a repeller power supply according to claim 2, wherein the arc-starting chamber (1) is an arc-starting chamber made of graphite, and the cover plate (2) is a cover plate made of graphite.

4. The carbon ion source device with repeller power supply according to claim 3, wherein the repeller (6) is a block made of graphite.

5. The apparatus of claim 3, wherein the cathode (5) is sheathed with a sleeve-shaped cathode cap (11) with a gap between the cathode (5) and the cathode cap (11) at least at a position near the bottom of the cathode (5); a filament (4) is accommodated in the cathode (5), and two tail ends of the filament (4) penetrate out of an opening of the cathode (5); a reflector (6) is arranged on one side wall of the arc starting chamber (1) opposite to the filament (4); the filament lamp further comprises a fixing structure used for fixing the positions of the reflection electrode (6), the filament (4) and the cathode (5), a gap exists between the reflection electrode (6) and the arc starting chamber (1), a gap exists between the filament (4) and the cathode (5), and a gap exists between the cathode cap (11) and the arc starting chamber (1).

6. The apparatus of claim 3, further comprising a circuit assembly connected to the arc striking chamber (1), the filament (4), the cathode (5), and the repeller (6).

7. The apparatus of claim 3, wherein a chamfer (10) is provided at the edge of the exit slit (3) on the side of the cover plate (2) near the inside of the arc starting chamber (1).

8. The apparatus for producing a carbon ion source with a repeller power supply according to claim 4, wherein at least one pair of magnetic bodies having an ion source magnetic field (8) therebetween are provided outside the arc-starting chamber (1) at positions close to both sides where the cathode (5) and the repeller (6) are located; the ion source magnetic field (8) causes a second set of electrons to spiral.

9. The carbon ion source device with the repeller power supply of claim 5, wherein the arc-starting chamber (1) is externally provided with an arc-starting chamber mounting portion (16), a cathode mounting plate (12), an insulating fixing plate (13), a filament clamp (14), and a repeller mounting plate (17); the arc starting chamber (1) is fixedly arranged on the arc starting chamber mounting part (16);

a second through fixing hole (19) is formed in the cathode mounting plate (12), and the open end of the cathode (5) is fixedly arranged in the second fixing hole (19); the outer side surface of the cathode (5) close to the opening end is provided with a thickened part, the outer diameter of the thickened part is larger than that of other parts of the cathode, and the outer side surface of the thickened part is fixedly sleeved with the cathode cap (11); a through first fixing hole (18) is formed in one side surface of the arc starting chamber (1) adjacent to the cover plate (2), and the cathode cap (11) is arranged in the first fixing hole (18) in a penetrating mode; the number of the filament clamps (14) is two, and the two filament clamps (14) are respectively fixedly connected with the two tail ends of the filament (4); the filament clamp (14) and the cathode mounting plate (12) are fixedly connected with an insulating fixing plate (13), and a gap is formed between the filament clamp (14) and the cathode mounting plate (12); the insulating fixing plate (13) is fixedly connected with the arc striking chamber mounting part (16);

a third fixing hole (20) is formed in one side wall of the arc starting chamber (1) opposite to the cathode (5), the reflecting electrode (6) is nested in the third fixing hole (20), and a gap exists between the reflecting electrode (6) and the inner side face of the third fixing hole (20); the position of the third fixing hole (20) and the outer side of the arc starting chamber (1) are fixedly provided with insulation reflecting electrode mounting plates (17), through holes are formed in the reflecting electrode mounting plates (17), and reflecting electrode terminals (7) penetrate through the through holes of the reflecting electrode mounting plates (17) and are fixed.

10. The apparatus of claim 5, wherein a filament power supply is connected to both ends of the filament (4);

a cathode power supply is connected between the cathode (5) and the filament (4), so that the potential of the cathode (5) is higher than that of the filament (4);

an arc starting chamber power supply is connected between the arc starting chamber (1) and the cathode (5), so that the potentials of the arc starting chamber (1) and the cathode cap (11) contacted with the arc starting chamber (1) are higher than that of the cathode (5); the repeller power supply (21) is an adjustable power supply.

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