CN216460545U - Silicon polished section belt cleaning device - Google Patents
Silicon polished section belt cleaning device Download PDFInfo
- Publication number
- CN216460545U CN216460545U CN202220000864.3U CN202220000864U CN216460545U CN 216460545 U CN216460545 U CN 216460545U CN 202220000864 U CN202220000864 U CN 202220000864U CN 216460545 U CN216460545 U CN 216460545U
- Authority
- CN
- China
- Prior art keywords
- box body
- placing box
- placing
- cleaning
- plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 53
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 23
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 23
- 239000010703 silicon Substances 0.000 title claims abstract description 23
- 238000005498 polishing Methods 0.000 claims abstract description 35
- 239000007788 liquid Substances 0.000 claims abstract description 25
- 238000005192 partition Methods 0.000 claims abstract description 14
- 239000012459 cleaning agent Substances 0.000 claims abstract description 11
- 230000005540 biological transmission Effects 0.000 claims description 16
- 238000001914 filtration Methods 0.000 claims description 4
- 230000033001 locomotion Effects 0.000 abstract description 11
- 230000000694 effects Effects 0.000 abstract description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 3
- 238000000034 method Methods 0.000 description 8
- 238000005406 washing Methods 0.000 description 6
- 230000003028 elevating effect Effects 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 238000005034 decoration Methods 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000005381 potential energy Methods 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000011012 sanitization Methods 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
Images
Abstract
The utility model relates to the technical field of polishing sheets, and discloses a silicon polishing sheet cleaning device, which comprises a placing box body, wherein a partition plate is arranged in the placing box body, a sound wave generator is arranged on the placing box body and is used for enabling a cleaning agent in the placing box body to generate transverse fluctuation, a cleaning mechanism is also arranged in the placing box body, the silicon polishing sheet cleaning device is also arranged in the placing box body, the cleaning mechanism can do reciprocating lifting motion in the placing box body under the driving of an external device, so that liquid in the placing box body can generate longitudinal flow, and further the polishing sheet body placed in the placing box body can be cleaned longitudinally, the cleaning effect is improved, when in need of cleaning, the polishing sheet body is placed on the placing plate, and a movable plate arranged in the placing box body in a sliding manner is driven by the external mechanism to do reciprocating lifting motion in the placing box body, thereby generating water flow flowing longitudinally and further cleaning the polishing sheet body.
Description
Technical Field
The utility model relates to a polished section technical field specifically is a silicon polished section belt cleaning device.
Background
The polishing sheet is prepared by mixing nano-scale silicon dioxide particles with a high-efficiency adhesive, uniformly coating the mixture on the surface of a polyester film, and drying and curing the mixture.
Because traditional polishing piece body adopts the abluent mode of sound wave to clean more, however sound wave generator can only be that the washing liquid produces horizontal ripple, has certain limitation to the washing of polishing piece body, leads to polishing piece can not by clean, still remains the spot on the polishing piece, in addition because traditional cleaning device, the cleaning solution that its inside bore overflows easily at abluent in-process, leads to the workstation to receive the pollution, need follow-up cleaning work, it is very inconvenient.
SUMMERY OF THE UTILITY MODEL
The utility model provides a silicon polished section belt cleaning device possesses multi-direction and carries out clear beneficial effect to polished section, has solved traditional polished section body that mentions among the above-mentioned background and has adopted the abluent mode of sound wave to clean more, and sound wave generator can only be that the washing liquid produces horizontal ripple, has certain limitation to the washing of polished section body, leads to polished section can not by sanitization, still remains the problem of spot on the polished section.
The utility model provides a following technical scheme: a silicon polished section cleaning device comprises a placing box body, wherein a partition plate is arranged in the placing box body, the partition plate divides a working area in the box body, a sound wave generator is arranged on the placing box body and used for enabling a cleaning agent in the placing box body to generate transverse fluctuation, and a cleaning mechanism is further arranged in the placing box body and used for enabling the cleaning agent in the placing box body to generate longitudinal fluctuation;
the cleaning mechanism comprises a vertical plate arranged in the placing box body, a placing plate is arranged on the vertical plate and used for placing the polishing sheet body, a movable plate is arranged in the placing box body in a sliding mode and used for enabling a cleaning agent in the placing box body to generate longitudinal fluctuation.
As an alternative to the silicon polished wafer cleaning device of the present invention, wherein: the placing box body is internally provided with a transmission mechanism, the movable plate is arranged on the transmission mechanism, and the movable plate is arranged in the placing box body in a sliding mode through the transmission mechanism;
the transmission mechanism comprises a rotating block which is rotatably arranged in the placing box body, a sliding rod is further arranged on the placing box body in a sliding mode, the rotating block intermittently abuts against the bottom of the sliding rod, and the movable plate is arranged at the top of the sliding rod.
As an alternative to the silicon polished wafer cleaning device of the present invention, wherein: the sliding rod is further provided with a spring, and the sliding rod is elastically connected with the placing box body through the spring.
As an alternative to the silicon polished wafer cleaning device of the present invention, wherein: the placing box body is further provided with a limiting rod, and the sliding rod is further arranged on the limiting rod in a sliding mode.
As an alternative to the silicon polished wafer cleaning device of the present invention, wherein: the placing box body is further provided with a telescopic rod, and the placing box body is further connected with the placing plates through the telescopic rod.
As an alternative to the silicon polished wafer cleaning device of the present invention, wherein: the placing plate is further provided with a through hole, and the through hole is used for ensuring liquid circulation.
As an alternative to the silicon polished wafer cleaning device of the present invention, wherein: a collecting mechanism is further arranged in the placing box body, the collecting mechanism comprises a flowing groove formed in the partition plate, a filter screen is further arranged in the placing box body, and the filter screen is used for filtering overflowing liquid;
the bottom of filter screen still installs the collection piece, be provided with communicating pipe on the collection piece, the collection piece passes through communicating pipe and work area intercommunication.
The utility model discloses possess following beneficial effect:
1. the silicon polished wafer cleaning device is also provided with a cleaning mechanism in the placing box body, the cleaning mechanism can do reciprocating lifting motion in the placing box body under the driving of an external device, thereby leading the liquid in the placing box body to generate longitudinal flow, further longitudinally cleaning the polishing sheet body placed in the placing box body, improving the cleaning effect, placing the polishing sheet body on the placing plate when in need of cleaning, the movable plate which is arranged in the placing box body in a sliding way is driven by an external mechanism to do reciprocating circular lifting motion in the placing box body, so as to generate water flow flowing longitudinally, and then wash the polishing piece body, make the polishing piece body of placing on placing the board take place the displacement for the produced rivers of prevention fly leaf when going up and down, be provided with the riser in placing the box body, the riser is used for spacing polishing piece body.
2. The silicon polished wafer cleaning device is characterized in that a movable plate is arranged in the placing box body, a collecting mechanism is arranged in the placing box body, a flowing groove which flows when liquid overflows is formed in the partition plate, so that the liquid attached to the partition plate can flow out of a working area divided by the partition plate through the flowing groove and flow to a filter screen arranged in the placing box body, the impurities attached to the liquid are filtered by the filter screen, the cleaning liquid filtered by the filter screen flows to the bottom of the filter screen and finally drops onto a collecting block arranged on the lower side of the filter screen, a communicating pipe is arranged on the collecting block, the collecting block is communicated with the working area through the communicating pipe, and the cleaning liquid flows back to the working area in the placing box body through the communicating pipe connected with the collecting block, thereby completing the purposes of collecting liquid and purifying and reusing.
Drawings
Fig. 1 is a schematic view of the overall structure of the present invention.
Fig. 2 is a schematic view of the internal structure of the present invention.
Fig. 3 is a partially enlarged view of a portion a in fig. 2.
In the figure: 1. placing the box body; 11. a polishing pad body; 2. a partition plate; 3. an acoustic wave generator; 4. a cleaning mechanism; 41. a vertical plate; 43. placing the plate; 44. a movable plate; 45. a through hole; 5. a transmission mechanism; 51. rotating the block; 52. a slide bar; 53. a spring; 54. a limiting rod; 55. a telescopic rod; 6. a collection mechanism; 61. a flow channel; 62. a filter screen; 63. collecting blocks; 64. a communication pipe is provided.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
Example 1
Referring to fig. 1-3, a silicon polishing sheet cleaning device comprises a placing box body 1, a partition plate 2 is arranged in the placing box body 1, the partition plate 2 divides a working area in the box body 1, a sound wave generator 3 is arranged on the placing box body 1, the sound wave generator 3 is used for enabling a cleaning agent in the placing box body 1 to generate transverse fluctuation, a cleaning mechanism 4 is further arranged in the placing box body 1, and the cleaning mechanism 4 is used for enabling the cleaning agent in the placing box body 1 to generate longitudinal fluctuation;
the cleaning mechanism 4 comprises a vertical plate 41 arranged in the placing box body 1, a placing plate 43 is arranged on the vertical plate 41, the placing plate 43 is used for placing the polishing sheet body 11, a movable plate 44 is also arranged in the placing box body 1 in a sliding manner, and the movable plate 44 is used for enabling the cleaning agent in the placing box body 1 to generate longitudinal fluctuation.
In this embodiment: because traditional polished wafer body 11 adopts the abluent mode of sound wave to clean more, however sound wave generator can only be that the washing liquid produces horizontal ripple, the washing to polished wafer body 11 has certain limitation, consequently still be provided with clean mechanism 4 in placing box body 1, clean mechanism 4 can be reciprocating elevating movement in placing box body 1 under the drive of external device, and then make the liquid of placing in the box body 1 produce fore-and-aft flow, and then can follow vertically to placing polished wafer body 11 in placing box body 1 and wash, improve abluent effect.
The baffle 2 is provided with two in placing box body 1, and two baffle 2 symmetries set up in placing box body 1. The two partition boards 2 divide a working area in the placing box body 1.
The cleaning mechanism 4 comprises a vertical plate 41 arranged in the placing box body 1, a placing plate 43 is arranged on the vertical plate 41, the placing plate 43 is used for placing the polishing sheet body 11, a movable plate 44 is also arranged in the placing box body 1 in a sliding manner, and the movable plate 44 is used for enabling the cleaning agent in the placing box body 1 to generate longitudinal fluctuation.
When needing to wash, place polishing piece body 11 on placing board 43, slide the fly leaf 44 that sets up in placing box body 1 through the external mechanism drive and do reciprocating motion in placing box body 1, thereby produce the rivers of longitudinal flow, and then wash polishing piece body 11, make the polishing piece body 11 of placing on placing board 43 take place the displacement for the rivers that prevent fly leaf 44 produced when going up and down, be provided with riser 41 in placing box body 1, riser 41 is used for spacing polishing piece body 11.
Example 2
Referring to fig. 1-3, a transmission mechanism 5 is further disposed in the storage box 1, a movable plate 44 is mounted on the transmission mechanism 5, and the movable plate 44 is slidably disposed in the storage box 1 through the transmission mechanism 5;
the transmission mechanism 5 comprises a rotating block 51 which is rotatably arranged in the placing box body 1, a sliding rod 52 is also slidably arranged on the placing box body 1, the rotating block 51 intermittently abuts against the bottom of the sliding rod 52, and the movable plate 44 is arranged at the top of the sliding rod 52;
the sliding rod 52 is also provided with a spring 53, and the sliding rod 52 is elastically connected with the placing box body 1 through the spring 53;
the placing box body 1 is also provided with a limiting rod 54, and the sliding rod 52 is also arranged on the limiting rod 54 in a sliding manner;
the placing box body 1 is further provided with a telescopic rod 55, and the placing box body 1 is further connected with the placing plate 43 through the telescopic rod 55.
In this embodiment: through the arrangement of the transmission mechanism 5 in the placing box body 1, the transmission mechanism 5 can drive the movable plate 44 connected with the transmission mechanism to perform reciprocating lifting motion in the placing box body 1, so as to generate water flow flowing longitudinally to clean the polishing sheet body 11.
The transmission mechanism 5 comprises a rotating block 51 which is rotatably arranged in the placing box body 1, a sliding rod 52 is also slidably arranged on the placing box body 1, the rotating block 51 intermittently abuts against the bottom of the sliding rod 52, and the movable plate 44 is arranged at the top of the sliding rod 52.
When the turning block 51 is rotated by the motor drive in placing the box body 1, the longer end of the turning block 51 can slide along with the intermittent abutting of the rotation at the bottom of the sliding rod 52 arranged in the box body 1, and when the longer end of the turning block 51 abuts against the sliding rod 52, the abutting sliding rod 52 slides towards the top of the box body 1, so that the movable plate 44 connected with the sliding rod 52 is driven to slide towards the top of the box body 1 in the box body 1, and the lifting is completed.
When the rotating block 51 gradually moves away from the bottom of the sliding rod 52 along with the rotation of the longer end thereof, the sliding rod 52 gradually slides towards the bottom of the box body 1 due to the loss of the interference of the rotating block 51, so as to drive the movable plate 44 connected with the sliding rod to slide towards the bottom of the box body 1, thereby completing the descent.
Because the turning block 51 is continuously rotated in placing box body 1 under the drive of motor, the turning block 51 obtains longer end and can circulate and be close to conflict slide bar 52-keep away from the reciprocating motion of slide bar 52 to make slide bar 52 be the reciprocating elevating movement of placing box body 1 inner loop, and then make the fly leaf 44 of installing on slide bar 52 be the reciprocating elevating movement of circulation in placing box body 1, thereby continuously produce fore-and-aft rivers and wash polishing piece body 11.
In order to rapidly return the sliding rod 52, a spring 53 is provided on the sliding rod 52, when the sliding rod 52 slides towards the top of the placing case 1, the sliding rod 52 will press the spring 53, so that it accumulates elastic potential energy, when the sliding rod 52 loses the interference, the spring 53 will release the accumulated elastic potential energy, so that it generates a pushing force which can push the sliding rod 52 to slide towards the bottom, thereby accelerating the return process of the sliding rod 52.
In order to make the sliding rod 52 slide more stably in the placing box body 1, a limiting rod 54 is further arranged on the placing box body 1, and the sliding rod 52 is arranged on the limiting rod 54 in a sliding manner, so that the sliding rod 52 is limited by the limiting rod 54 in the sliding process, and the purpose of making the sliding rod 52 slide more stably is achieved.
In order to make the movable plate 44 slide more stably in the placing box 1, a telescopic rod 55 is further disposed at the bottom of the movable plate 44, the movable plate 44 is further connected with the placing box 1 through the telescopic rod 55, and two telescopic rods 55 are disposed on the movable plate 44, so that the movable plate 44 is ensured to be stable in the sliding process.
Example 3
Referring to fig. 1-3, the placing plate 43 is further provided with a through hole 45, and the through hole 45 is used for ensuring the liquid to flow through.
In this embodiment: in order to allow the cleaning liquid to normally pass through in the longitudinal direction, a plurality of through holes 45 are opened in the placing plate 43, and the cleaning liquid can flow from the top of the placing plate 43 to the bottom thereof through the through holes 45.
Example 4
Referring to fig. 1-3, a collecting mechanism 6 is further disposed in the placing box 1, the collecting mechanism 6 includes a flow groove 61 formed on the partition board 2, a filter screen 62 is further disposed in the placing box 1, and the filter screen 62 is used for filtering overflowing liquid;
the bottom of the filter screen 62 is also provided with a collecting block 63, a communicating pipe 64 is arranged on the collecting block 63, and the collecting block 63 is communicated with the working area through the communicating pipe 64.
In this embodiment: since a part of the detergent in the storage case 1 may overflow from the storage case 1 during the reciprocating up-and-down movement of the movable plate 44, a collecting mechanism 6 is further provided in the storage case 1 to recover the overflowing liquid.
The collecting mechanism 6 comprises a flowing groove 61 formed in the partition board 2, a filter screen 62 is further installed in the placing box body 1, the filter screen 62 is used for filtering overflowing liquid, a collecting block 63 is further installed at the bottom of the filter screen 62, a communicating pipe 64 is arranged on the collecting block 63, and the collecting block 63 is communicated with a working area through the communicating pipe 64.
Set up on baffle 2 because the mobile groove 61 that liquid flows when overflowing, make the liquid accessible mobile groove 61 attached to on baffle 2 flow the work interval that baffle 2 cut apart, and flow to setting up the filter screen 62 of placing in the box body 1, and filter its adnexed impurity by filter screen 62, the cleaning solution after being filtered by filter screen 62 can flow to the bottom of filter screen 62 and finally drip to setting up on the collection piece 63 of filter screen 62 downside, be provided with communicating pipe 64 on the collection piece 63, collection piece 63 passes through communicating pipe 64 and work area intercommunication, the cleaning solution can flow the work area of placing back in the box body 1 on collection piece 63 and through communicating pipe 64 that is connected with it, thereby accomplish the purpose of collecting liquid and purification reuse.
It is noted that, herein, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus.
The foregoing is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, a plurality of improvements and decorations can be made without departing from the technical principle of the present invention, and these improvements and decorations should also be regarded as the protection scope of the present invention.
Claims (7)
1. The utility model provides a silicon polishing piece belt cleaning device, is including placing box body (1), it is provided with baffle (2) in box body (1) to place, baffle (2) are in work area, its characterized in that are divided in box body (1): the cleaning device is characterized in that a sound wave generator (3) is arranged on the placing box body (1), the sound wave generator (3) is used for enabling a cleaning agent in the placing box body (1) to generate transverse fluctuation, a cleaning mechanism (4) is further arranged in the placing box body (1), and the cleaning mechanism (4) is used for enabling the cleaning agent in the placing box body (1) to generate longitudinal fluctuation;
the cleaning mechanism (4) comprises a vertical plate (41) arranged in the placing box body (1), a placing plate (43) is arranged on the vertical plate (41), the placing plate (43) is used for placing the polishing sheet body (11), a movable plate (44) is arranged in the placing box body (1) in a sliding mode, and the movable plate (44) is used for enabling a cleaning agent in the placing box body (1) to generate longitudinal fluctuation.
2. The silicon polishing pad cleaning apparatus according to claim 1, wherein: the placing box body (1) is also internally provided with a transmission mechanism (5), the movable plate (44) is arranged on the transmission mechanism (5), and the movable plate (44) is arranged in the placing box body (1) in a sliding manner through the transmission mechanism (5);
drive mechanism (5) are including rotating turning block (51) that sets up in placing box body (1), it is provided with slide bar (52) still to slide on placing box body (1), just turning block (51) intermittent type is contradicted the bottom of slide bar (52), fly leaf (44) are installed the top of slide bar (52).
3. The silicon polishing pad cleaning apparatus according to claim 2, wherein: the sliding rod (52) is further provided with a spring (53), and the sliding rod (52) is elastically connected with the placing box body (1) through the spring (53).
4. The silicon polishing pad cleaning apparatus according to claim 3, wherein: the placing box body (1) is further provided with a limiting rod (54), and the sliding rod (52) is further arranged on the limiting rod (54) in a sliding mode.
5. The silicon polishing pad cleaning apparatus according to claim 4, wherein: the storage box body (1) is further provided with a telescopic rod (55), and the storage box body (1) is further connected with the storage plate (43) through the telescopic rod (55).
6. The silicon polishing pad cleaning apparatus according to claim 5, wherein: the placing plate (43) is further provided with a through hole (45), and the through hole (45) is used for ensuring liquid circulation.
7. The silicon polishing pad cleaning apparatus according to claim 6, wherein: a collecting mechanism (6) is further arranged in the placing box body (1), the collecting mechanism (6) comprises a flow groove (61) formed in the partition plate (2), a filter screen (62) is further arranged in the placing box body (1), and the filter screen (62) is used for filtering overflowing liquid;
the bottom of the filter screen (62) is also provided with a collecting block (63), the collecting block (63) is provided with a communicating pipe (64), and the collecting block (63) is communicated with a working area through the communicating pipe (64).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202220000864.3U CN216460545U (en) | 2022-01-04 | 2022-01-04 | Silicon polished section belt cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202220000864.3U CN216460545U (en) | 2022-01-04 | 2022-01-04 | Silicon polished section belt cleaning device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN216460545U true CN216460545U (en) | 2022-05-10 |
Family
ID=81433452
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202220000864.3U Expired - Fee Related CN216460545U (en) | 2022-01-04 | 2022-01-04 | Silicon polished section belt cleaning device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN216460545U (en) |
-
2022
- 2022-01-04 CN CN202220000864.3U patent/CN216460545U/en not_active Expired - Fee Related
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20220510 |
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| CF01 | Termination of patent right due to non-payment of annual fee |