CN216435854U

CN216435854U - Panel etching equipment

Info

Publication number: CN216435854U
Application number: CN202123137021.2U
Authority: CN
Inventors: 黎志恒
Original assignee: LG Display Optoelectronics Technology China Co Ltd
Current assignee: LG Display Optoelectronics Technology China Co Ltd
Priority date: 2021-12-13
Filing date: 2021-12-13
Publication date: 2022-05-03
Anticipated expiration: 2031-12-13

Abstract

The utility model discloses a panel etching equipment, including the clean mechanism of laser and vacuum reaction chamber, the interval is provided with upper portion plate electrode and lower part plate electrode in the reaction chamber, the upper portion plate electrode sets up the top at the reaction chamber, the lower part plate electrode sets up the bottom at the reaction chamber, the clean mechanism of laser includes the casing, be provided with first opening on the casing, the lateral wall of reaction chamber is provided with the second opening, first opening and the sealed butt joint of second opening, make casing and reaction chamber intercommunication, be provided with the laser cleaning head in the casing, the ray direction of laser cleaning head is towards the reaction chamber, the below activity of upper portion plate electrode is provided with the collecting plate, the collecting plate is used for collecting the impurity that the upper portion plate electrode dropped. Through setting up the clean mechanism of laser, can clear away the impurity in the reaction chamber under vacuum state, under the effect of laser ray, the impurity of upper portion plate electrode can drop on the collecting plate, is collected by the collecting plate is unified.

Description

Panel etching equipment

Technical Field

The utility model relates to a panel processing equipment field especially relates to a panel etching equipment.

Background

The display device includes a display panel (hereinafter referred to as a panel), and during processing, a photoresist layer is coated on one side of the panel, and a panel etching device is used to etch the photoresist layer to form a groove, and then a conductive material is filled into the groove, so as to form a circuit structure on the panel.

The panel etching equipment is equipment for etching a photoresist layer based on chemical reaction, as shown in fig. 1, the panel etching equipment comprises a vacuum reaction chamber 100 ', an upper electrode plate 200 ' and a lower electrode plate 300 ' are arranged in the reaction chamber 100 ', a panel to be etched is placed on the lower electrode plate 300 ' before etching operation, and then circuits of the upper electrode plate 200 ' and the lower electrode plate 300 ' are respectively connected to etch the panel.

The prior art has the following problems: the photoresist layer on the panel is etched to generate smoke, the smoke adheres to the upper electrode plate 200 'to form impurities, and the impurities are accumulated to a certain amount to affect the panel etching operation, for example, the impurities fall on the surface of the panel to pollute the panel, so the upper electrode plate 200' needs to be cleaned periodically. At present, the impurities of the upper electrode plate 200 'are cleaned by adopting a manual shoveling mode, the manual workload of cleaning operation is large, after the manual cleaning operation is completed, the reaction chamber 100' needs to be vacuumized again, the steps are complex, and the whole efficiency of panel processing of panel etching equipment is not favorably improved.

SUMMERY OF THE UTILITY MODEL

The utility model aims to provide a: provided is a panel etching apparatus which can clean impurities and has high overall efficiency of panel processing.

In order to achieve the purpose, the utility model adopts the following technical proposal:

the utility model provides a panel etching equipment, includes the reaction chamber of vacuum, the interval is provided with upper portion electrode board and lower part electrode board in the reaction chamber, the upper portion electrode board sets up the top of reaction chamber, the lower part electrode board sets up the bottom of reaction chamber still includes the clean mechanism of laser, the clean mechanism of laser includes the casing, be provided with first opening on the casing, the lateral wall of reaction chamber is provided with the second opening, first opening with the sealed butt joint of second opening makes the casing with the reaction chamber intercommunication, be provided with the laser cleaning head in the casing, the ray direction orientation of laser cleaning head the reaction chamber, the below activity of upper portion electrode board is provided with the collecting plate, the collecting plate is used for collecting the impurity that upper portion electrode board dropped.

The preferable scheme of the panel etching equipment comprises a first driving assembly, wherein the first driving assembly is connected with the shell, the first driving assembly drives the shell to move along the vertical direction and/or the horizontal direction, the shell is provided with a first door body, the first door body can seal the first opening, the side wall of the reaction chamber is provided with a second door body, and the second door body can seal the second opening.

As a preferable scheme of the panel etching apparatus, the first driving assembly includes a first slide rail and a first driving member, the first slide rail is fixed to the outer side surface of the reaction chamber, a first slide block is slidably disposed on the first slide rail, the first slide block is connected to the housing, and the first driving member drives the first slide block to move along the length direction of the first slide rail.

As an optimal scheme of panel etching equipment, first drive assembly still includes second slide rail and second driving piece, the length direction of second slide rail with the length direction of first slide rail is the contained angle, the second slide rail with first slider fixed connection, it is provided with the second slider to slide on the second slide rail, the second slider with casing fixed connection, the drive of second driving piece the second slider is followed the length direction of second slide rail removes.

As a preferable scheme of the panel etching equipment, the panel etching equipment comprises a positioning assembly, wherein the positioning assembly comprises a matched sensor and a matched sensing piece, one of the sensor and the sensing piece is arranged on the outer side face of the shell, and the other of the sensor and the sensing piece is arranged on the outer side face of the reaction chamber.

As a preferable scheme of the panel etching device, a second driving assembly is arranged in the housing, the laser cleaning head is connected with the second driving assembly, and the second driving assembly drives the laser cleaning head to rotate.

As a preferred scheme of panel etching equipment, the second drive assembly includes cylinder and laser seat, the laser seat with the casing is connected, the laser cleaning head with the laser seat is articulated, one of the cylinder body of cylinder and the piston rod of cylinder with the laser seat is connected, the other one of the cylinder body of cylinder and the piston rod of cylinder with the laser cleaning head is articulated.

As a preferred scheme of panel etching equipment, the second drive assembly includes laser seat, first motor, first gear and second gear, the laser seat with the casing is connected, the laser cleaning head with the laser seat is articulated, first motor sets up on the laser seat, the output shaft of first motor with first gear is fixed, the second gear with the laser cleaning head is connected, first gear with the second gear meshing.

As a preferable scheme of the panel etching apparatus, a third driving assembly is further disposed in the housing, the second driving assembly is connected to the housing through the third driving assembly, and the third driving assembly drives the second driving assembly to move along the width direction of the reaction chamber.

As a preferred scheme of panel etching equipment, the third drive assembly includes second motor, lead screw, nut and guide rail, the second motor is fixed in the casing, the one end of lead screw with the output shaft of second motor is fixed, the other end of lead screw pass through the bearing with the casing is connected, the length of lead screw is followed the width direction of reacting chamber extends, the nut is twisted soon to be in on the lead screw, the guide rail is fixed in the casing, the length of guide rail is followed the width direction of reacting chamber extends, the laser seat of second drive assembly slides and sets up on the guide rail, the laser seat with the nut is fixed.

The utility model has the advantages that: through setting up the clean mechanism of laser, can clear away the impurity in the reacting chamber under vacuum state, under laser ray's effect, the impurity of upper portion plate electrode can drop on the collecting plate, collect by the collecting plate is unified, collect the back, can shift out the reacting chamber with the collecting plate through the manipulator, thereby transport impurity from the reacting chamber, artificial work load has not only been reduced, can also make cleaning operation go on under vacuum environment, need not bleed the vacuum to the reacting chamber again after the cleaning action is accomplished, the efficiency of cleaning operation is improved, thereby the whole efficiency of panel etching equipment to panel processing has been improved.

Drawings

The present invention will be described in further detail with reference to the accompanying drawings and examples.

FIG. 1 is a schematic view of a panel etching apparatus according to the prior art.

Fig. 2 is a schematic view of a panel etching apparatus according to an embodiment of the present invention.

Fig. 3 is a partial schematic view of a panel etching apparatus according to an embodiment of the present invention.

Fig. 4 is a schematic view of a third driving assembly according to an embodiment of the present invention.

Fig. 5 is a schematic view of the second driving assembly according to the first embodiment of the present invention.

Fig. 6 is a schematic view of the second driving assembly according to the second embodiment of the present invention.

In fig. 1:

100', a reaction chamber; 200', an upper electrode plate; 300', a lower electrode plate.

In fig. 2 to 6:

100. a reaction chamber; 1001. a second opening; 200. an upper electrode plate; 300. a lower electrode plate; 400. a laser cleaning mechanism;

1. a housing; 101. a first opening; 2. a laser cleaning head; 3. a first drive assembly; 301. a first slide rail; 302. a first slider; 303. a second slide rail; 304. a second slider; 401. a sensor; 402. a sensing member; 5. a second drive assembly; 501. a laser seat; 502. a cylinder; 5021. a cylinder body; 5022. a piston rod; 503. a first motor; 504. a first gear; 505. a second gear; 6. mounting a plate; 7. a third drive assembly; 701. a second motor; 702. a screw rod; 703. a nut; 704. a guide rail; 705. a bearing; 8. a first door body; 9. a second door body; 10. and (4) collecting the plate.

Detailed Description

The advantages and features of the present invention and the methods of accomplishing the same will become apparent with reference to the following detailed description of the embodiments taken in conjunction with the accompanying drawings. However, the present invention is not limited to the embodiments disclosed below, but may be implemented in various different forms, and the embodiments are provided only to accomplish the disclosure of the present invention and to enable those skilled in the art to sufficiently understand the scope of the present invention, and the present invention is limited only by the scope of the claims. Like reference numerals denote like constituent elements throughout the specification.

Hereinafter, the present invention will be described in detail with reference to the accompanying drawings.

As shown in fig. 2, the utility model provides a panel etching device, which comprises a laser cleaning mechanism 400 and a vacuum reaction chamber 100, wherein an upper electrode plate 200 and a lower electrode plate 300 are arranged at an interval in the reaction chamber 100, the upper electrode plate 200 is arranged at the top of the reaction chamber 100, the lower electrode plate 300 is arranged at the bottom of the reaction chamber 100, the laser cleaning mechanism 400 comprises a housing 1, a first opening 101 is arranged on the housing 1, a second opening 1001 is arranged on the side wall of the reaction chamber 100, the first opening 101 and the second opening 1001 are in sealed butt joint, so as to communicate the housing 1 with the reaction chamber 100, the laser cleaning head 2 is arranged in the housing 1, the dotted line in fig. 2 represents the laser ray emitted by the laser cleaning head 2, the ray direction of the laser cleaning head 2 faces the reaction chamber 100, the collecting plate 10 is movably arranged below the upper electrode plate 200, and the collecting plate 10 is used for collecting impurities falling from the upper electrode plate 200. Through setting up clean mechanism 400 of laser, can clear away the impurity in the reaction chamber 100 under vacuum state, under laser ray's effect, the impurity of upper portion plate electrode 200 can drop on collecting plate 10, collect by collecting plate 10 is unified, collect the back, can shift out reaction chamber 100 with collecting plate 10 through the manipulator, thereby transport impurity from reaction chamber 100, artificial work load has not only been reduced, can also make cleaning operation go on under vacuum environment, need not bleed vacuum to reaction chamber 100 again after the cleaning operation is accomplished, improve cleaning operation's efficiency, thereby the whole efficiency of panel etching equipment to panel processing has been improved.

Referring to fig. 3, in particular, the panel etching apparatus includes a first driving assembly 3, the first driving assembly 3 is connected to the housing 1, the first driving assembly 3 drives the housing 1 to move in a vertical direction and a horizontal direction, so that the housing 1 is spaced from a second opening 1001 of the reaction chamber 100, the housing 1 is provided with a first door body 8, the first door body 8 selectively blocks the first opening 101, a second door body 9 is provided on a side wall of the reaction chamber 100, and the second door body 9 selectively blocks the second opening 1001. Referring to fig. 2, in the embodiment, the reaction chamber 100 is provided with two second openings 1001, the two second openings 1001 are respectively disposed at two sides of the reaction chamber 100, the left second opening 1001 is an inlet, the right second opening 1001 is an outlet, the panel enters the reaction chamber 100 from the left second opening 1001 for etching operation, after the etching operation is completed, the panel leaves the reaction chamber 100 from the right second opening 1001, and by providing the first driving assembly 3, when the laser cleaning mechanism 400 is not needed, the first driving assembly 3 can drive the laser cleaning mechanism 400 to leave the second opening 1001 of the reaction chamber 100, at this time, the second opening 1001 can be used for the panel to enter and exit, and the setting of the laser cleaning mechanism 400 is prevented from affecting the etching operation of the panel.

Referring to fig. 3, specifically, the first driving assembly 3 includes a first slide rail 301 and a first driving member (not shown in the figure), the first slide rail 301 is fixed to an outer side surface of the reaction chamber 100, a first slide block 302 is slidably disposed on the first slide rail 301, the first slide block 302 is fixedly connected to the housing 1, and the first driving member drives the first slide block 302 to move along a length direction of the first slide rail 301. By arranging the first slide rail 301 and the first slide block 302, the movement of the housing 1 can be guided, so that the movement direction of the housing 1 can be conveniently controlled.

Specifically, the first driving assembly 3 further includes a second slide rail 303 and a second driving element (not shown in the figure), a length direction of the second slide rail 303 and a length direction of the second slide rail 303 form an included angle, in this embodiment, a length of the first slide rail 301 extends along a horizontal direction, a length of the second slide rail 303 extends along a vertical direction, a second slider 304 is slidably disposed on the second slide rail 303, the second slide rail 303 is fixedly connected with the first slider 302, a second slider 304 is slidably disposed on the second slide rail 303, the second slider 304 is fixedly connected with the housing 1, and the second driving element drives the second slider 304 to move along the length direction of the second slide rail 303. Through setting up second slide rail 303, can increase the moving direction of casing 1, further make things convenient for the removal of casing 1, make things convenient for the adjustment of casing 1 position. The first and second driving members may be motors, cylinder assemblies, or the like.

Specifically, the panel etching apparatus includes a positioning assembly, the positioning assembly includes a sensor 401 and a sensing element 402, the sensor 401 is disposed on an outer side of the housing 1, and the sensing element 402 is disposed on an outer side of the reaction chamber 100 in this embodiment, and in other embodiments, the sensor 401 may be disposed on an outer side of the reaction chamber 100, and the sensing element 402 may be disposed on an outer side of the housing 1. By providing the sensor 401 and the sensing member 402, the housing 1 and the reaction chamber 100 can be positionally positioned, the positioning accuracy of the housing 1 and the reaction chamber 100 can be improved, and the sealing property of the connection between the housing 1 and the reaction chamber 100 during the cleaning operation can be ensured.

Referring to fig. 4 to 6, specifically, a second driving assembly 5 is arranged in the housing 1, the laser cleaning head 2 is connected with the second driving assembly 5, and the second driving assembly 5 drives the laser cleaning head 2 to rotate. By providing the second driving assembly 5, the second driving assembly 5 can increase the cleaning range of the laser cleaning head 2, so that the number of the laser cleaning heads 2 can be reduced, and the cost of the laser cleaning mechanism 400 can be reduced.

Referring to fig. 4, in this embodiment, the laser cleaning heads 2 are provided in a plurality of numbers, the laser cleaning heads 2 are arranged at intervals along the width direction of the reaction chamber 100, the laser cleaning heads 2 are fixed on a mounting plate 6, and the laser cleaning heads 2 are connected with the second driving assembly 5 through the mounting plate 6, so that the speed of the cleaning operation can be increased, and the cleaning efficiency can be improved.

Referring to fig. 5, in an embodiment, the second driving assembly 5 includes a cylinder 502 and a laser holder 501, the laser holder 501 is connected with the housing 1, the laser cleaner head 2 is hinged with the laser holder 501 through a mounting plate 6, one of a cylinder 5021 of the cylinder 502 and a piston rod 5022 of the cylinder 502 is connected with the laser holder 501, and the other of the cylinder 5021 of the cylinder 502 and the piston rod 5022 of the cylinder 502 is hinged with the mounting plate 6. By arranging the air cylinder 502, the piston rod 5022 of the air cylinder 502 extends and retracts to control the rotation of the mounting plate 6, so that the direction of the laser ray emitted by the laser cleaning head 2 is controlled, and the cleaning area of the laser cleaning head 2 is adjusted.

Referring to fig. 6, in another embodiment, the second driving assembly 5 includes a laser base 501, a first motor 503, a first gear 504 and a second gear 505, the laser base 501 is connected with the housing 1, the laser cleaning head 2 is hinged to the laser base 501 through the mounting plate 6, the first motor 503 is disposed on the laser base 501, an output shaft of the first motor 503 is fixed to the first gear 504, the second gear 505 is fixed to the laser cleaning head 2 through the mounting plate 6, and the first gear 504 is engaged with the second gear 505. By arranging the first motor 503, the first gear 504 and the second gear 505, when the output shaft of the first motor 503 rotates, the output shaft of the first motor 503 can drive the mounting plate 6 to rotate through the cooperation of the first gear 504 and the second gear 505, so that the direction of the laser ray emitted by the laser cleaning head 2 is controlled, and the cleaning area of the laser cleaning head 2 is adjusted.

Referring to fig. 4, specifically, a third driving assembly 7 is further disposed in the housing 1, the second driving assembly 5 is connected to the housing 1 through the third driving assembly 7, and the third driving assembly 7 drives the second driving assembly 5 to move along the width direction of the reaction chamber 100. By providing the third driving assembly 7, the third driving assembly 7 can further increase the cleaning range of the laser cleaning head 2, so that the number of the laser cleaning heads 2 can be reduced, and the cost of the laser cleaning mechanism 400 can be reduced. For example, the distance between two adjacent laser cleaning heads 2 may be increased, and in an embodiment, only one laser cleaning head 2 may be provided.

Referring to fig. 4 to 6, specifically, the third driving assembly 7 includes a second motor 701, a lead screw 702, a nut 703 and a guide rail 704, the second motor 701 is fixed in the housing 1, one end of the lead screw 702 is fixed to an output shaft of the second motor 701, the other end of the lead screw 702 is connected to the housing 1 through a bearing 705, the length of the lead screw 702 extends along the width direction of the reaction chamber 100, the nut 703 is screwed on the lead screw 702, the guide rail 704 is fixed in the housing 1, the length of the guide rail 704 extends along the width direction of the reaction chamber 100, the laser holder 501 of the second driving assembly 5 is slidably disposed on the guide rail 704, and the laser holder 501 and the nut 703 are fixed. When the output shaft of the second motor 701 drives the screw rod 702 to rotate, the rotation motion of the screw rod 702 is converted into the linear motion of the laser seat 501 under the matching of the guide rail 704, the nut 703 and the laser seat 501, so that the laser seat 501 drives the laser cleaning head 2 to move. It can be understood that, a gap exists between two adjacent laser cleaning heads 2, and the second motor 701, the lead screw 702 and the nut 703 are provided, so that the laser cleaning heads 2 can move along the width direction of the reaction chamber 100, and thus the laser cleaning heads 2 can clean the whole area of the upper electrode plate 200, and the cleaning effect is improved. The screw 702 transmission has the following advantages: 1. high precision: the motor is driven by a screw rod, the screw rod is formed by one-step rolling, the transmission precision can be 0.0005mm/mm, and the highest resolution can reach 0.0015 mm; 2. the structure is simple, and the integral design is convenient; 3. high life: in fact, under normal load conditions, the motor can reach a lifetime of at least 500 ten thousand cycles; 4. high efficiency: compared with the common transmission mechanisms such as gear and rack transmission or synchronous belt transmission, the motor has higher transmission efficiency.

Although the embodiments of the present invention have been described above with reference to the accompanying drawings, the present invention is not limited to the above embodiments, but may be manufactured in various forms, and those skilled in the art will understand that the present invention may be embodied in other specific forms without changing the technical spirit or essential features of the invention. It is therefore to be understood that the above described embodiments are illustrative and not restrictive in all respects.

Claims

1. The utility model provides a panel etching equipment, includes the reaction chamber of vacuum, the interval is provided with upper portion electrode board and lower part electrode board in the reaction chamber, the upper portion electrode board sets up the top of reaction chamber, the lower part electrode board sets up the bottom of reaction chamber, its characterized in that still includes the clean mechanism of laser, the clean mechanism of laser includes the casing, be provided with first opening on the casing, the lateral wall of reaction chamber is provided with the second opening, first opening with the sealed butt joint of second opening makes the casing with the reaction chamber intercommunication, be provided with the laser cleaning head in the casing, the ray direction orientation of laser cleaning head the reaction chamber, the below activity of upper portion electrode board is provided with the collecting plate, the collecting plate is used for collecting the impurity that the upper portion electrode board dropped.

2. The panel etching equipment according to claim 1, comprising a first driving assembly, wherein the first driving assembly is connected with the casing, the first driving assembly drives the casing to move in a vertical direction and/or a horizontal direction, the casing is provided with a first door body, the first door body can seal the first opening, the side wall of the reaction chamber is provided with a second door body, and the second door body can seal the second opening.

3. The panel etching apparatus according to claim 2, wherein the first driving assembly includes a first slide rail and a first driving member, the first slide rail is fixed to an outer side surface of the reaction chamber, a first slide block is slidably disposed on the first slide rail, the first slide block is connected to the housing, and the first driving member drives the first slide block to move along a length direction of the first slide rail.

4. The panel etching apparatus according to claim 3, wherein the first driving assembly further comprises a second slide rail and a second driving member, a length direction of the second slide rail forms an included angle with a length direction of the first slide rail, the second slide rail is fixedly connected with the first slider, a second slider is slidably disposed on the second slide rail, the second slider is fixedly connected with the housing, and the second driving member drives the second slider to move along the length direction of the second slide rail.

5. The panel etching apparatus according to any one of claims 2 to 4, comprising a positioning assembly including a cooperating sensor and sensor, one of the sensor and sensor being disposed on an outer side of the housing, the other of the sensor and sensor being disposed on an outer side of the reaction chamber.

6. The panel etching apparatus of claim 1, wherein a second drive assembly is disposed within the housing, the laser cleaning head being coupled to the second drive assembly, the second drive assembly driving the laser cleaning head to rotate.

7. The panel etching apparatus of claim 6, wherein the second driving assembly comprises an air cylinder and a laser seat, the laser seat is connected with the housing, the laser cleaning head is hinged with the laser seat, one of a cylinder body of the air cylinder and a piston rod of the air cylinder is connected with the laser seat, and the other is hinged with the laser cleaning head.

8. The panel etching apparatus of claim 6, wherein the second driving assembly comprises a laser base, a first motor, a first gear and a second gear, the laser base is connected with the housing, the laser cleaning head is hinged with the laser base, the first motor is arranged on the laser base, an output shaft of the first motor is fixed with the first gear, the second gear is connected with the laser cleaning head, and the first gear is meshed with the second gear.

9. The panel etching apparatus according to claim 6, wherein a third driving assembly is further disposed in the housing, the second driving assembly is connected to the housing through the third driving assembly, and the third driving assembly drives the second driving assembly to move in a width direction of the reaction chamber.

10. The panel etching apparatus according to claim 9, wherein the third driving assembly includes a second motor, a screw rod, a nut, and a guide rail, the second motor is fixed in the housing, one end of the screw rod is fixed to an output shaft of the second motor, the other end of the screw rod is connected to the housing through a bearing, a length of the screw rod extends along a width direction of the reaction chamber, the nut is screwed on the screw rod, the guide rail is fixed in the housing, a length of the guide rail extends along the width direction of the reaction chamber, a laser holder of the second driving assembly is slidably disposed on the guide rail, and the laser holder and the nut are fixed.