CN216361912U - Laser heating device - Google Patents
Laser heating device Download PDFInfo
- Publication number
- CN216361912U CN216361912U CN202121428615.6U CN202121428615U CN216361912U CN 216361912 U CN216361912 U CN 216361912U CN 202121428615 U CN202121428615 U CN 202121428615U CN 216361912 U CN216361912 U CN 216361912U
- Authority
- CN
- China
- Prior art keywords
- laser heating
- light
- beam expanding
- heating apparatus
- lens
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The utility model provides a laser heating device, includes light source subassembly, beam expanding device, fan-shaped light forming device, the light source subassembly sends the light beam, warp beam expanding lens with fan-shaped light forming device forms the bar facula, covers the projection area of exposure camera lens. The projection area is accurately heated.
Description
Technical Field
The utility model relates to a laser heating device, in particular to a laser heating device applied to the field of direct-write exposure.
Background
Direct writing exposure is widely applied to the field of semiconductor and printed circuit board production, is one of the process steps for manufacturing products such as semiconductor devices, chips, printed circuit boards and the like, and is used for printing characteristic patterns on the surface of a substrate to finally obtain a pattern structure required according to circuit design. The traditional photoetching technology needs to make a master mask or a film negative film of a mask for exposure operation, the making period is long, and each plate corresponds to a single pattern and cannot be widely applied. In order to solve the above problems of the conventional exposure technology, the direct-write exposure technology has come to work, and it uses the digital light processing technology to edit different required pattern structures through a programmable digital mirror device, so as to rapidly switch patterns, reduce the cost, shorten the manufacturing period, and is widely applied to the field of exposure technology. The principle of direct writing exposure is to transfer a design pattern to the surface of a substrate coated with a photosensitive material by a method of modulating a light beam, and then to finally obtain a required pattern structure by processes of developing, etching and the like.
In the process of exposing the printed circuit board, the temperature of the printed circuit board has direct influence on the exposure dose, particularly for ink exposure, the exposure dose can be reduced by 1-2 energy grids every time the printed circuit board is raised by 1 ℃, and the exposure time can be shortened by 5-10%, which means that the yield of the printed circuit board is improved by 5-10%. But the temperature of the printed circuit board cannot be raised by directly changing the ambient temperature, which may cause uncontrolled changes in lens magnification, laser stability and lifetime, etc., thereby reducing the exposure accuracy.
Disclosure of Invention
The utility model aims to provide a laser heating device for accurately heating an exposure area.
In order to solve the above problems, the present invention provides a laser heating device, which includes a light source assembly, a beam expander, and a fan-shaped light forming device, wherein the light source assembly emits a light beam, and a strip-shaped light spot is formed by the beam expander and the fan-shaped light forming device to cover a projection area of an exposure lens.
Furthermore, the beam expander is a zoom beam expander lens, and the length of the strip-shaped light spot in a first direction is changed, wherein the first direction corresponds to the variable length direction of the projection area.
Further, the device also comprises a light spot length adjusting device, and the length of the strip-shaped light spot in the second direction is changed through the light spot length adjusting device.
Further, the light spot length adjusting device is a deformable prism pair or a cylindrical lens beam expanding system.
Further, the light source assembly emits collimated light beams, the beam expanding device is a beam expanding lens, or the light source assembly emits divergent light, and the beam expanding device is a collimator.
Further, the fan-shaped light forming device is a cylindrical lens or a Powell prism.
Further, the light source assembly includes an infrared laser.
Furthermore, the wavelength range of the infrared laser is 805 nm-2000 nm.
Furthermore, the power range of the infrared laser is 10W-100W.
Further, the laser heating device is arranged on the side of the exposure lens.
Compared with the prior art, the laser heating device adjusts the light beams emitted by the light source component into the same shape and size as the field of view of the exposure lens through the beam expanding device and the fan-shaped light forming device, accurately heats the exposure area, does not affect the relevant parameters of the exposure lens, does not affect the exposure precision, and simultaneously improves the yield.
Drawings
Fig. 1 is a schematic view of a heating device and an exposure lens.
Fig. 2 is a schematic view of a first embodiment of the heating device.
Fig. 3 is a schematic view of a second embodiment of the heating device.
Fig. 4 is a schematic diagram of an anamorphic prism pair optical path.
Detailed Description
In order that the objects, aspects and advantages of the utility model will become more apparent, the utility model will be described by way of example only, and in connection with the accompanying drawings.
As shown in fig. 1 to 4, a laser heating device 1 is disposed at one side of an exposure lens 2, light emitted from the laser heating device 1 is obliquely incident on a projection area 4 of the projection lens 2, and a heating area of the laser heating device 1 is slightly larger than the projection area 4 of the projection lens 2.
As shown in fig. 2, the laser heating apparatus 1 includes a light source assembly 10, a beam expanding device 11, a fan-shaped light forming device 12, and a spot length adjusting device 13 as a first embodiment of the laser apparatus. The light source assembly 10 emits light beams, a strip-shaped light spot is formed by the beam expanding lens 11 and the fan-shaped light forming device 12, and the length of the strip-shaped light spot in one direction is changed by the light spot length adjusting device 12.
The light source assembly 10 includes an infrared laser, which emits collimated light. Preferably, the wavelength range of the infrared laser is 805 nm to 2000 nm. Preferably, the power range of the infrared laser is 10W-100W. The effect of improving the temperature is realized by utilizing the infrared laser with high power and low cost.
The beam expander 11 is an expander lens, and preferably, the beam expander 11 is a zoom expander lens. The beam expander 11 expands the spot area of the light beam emitted by the light source assembly 10, and the width of the spot can be adjusted in the first direction by the zoom beam expander lens.
The fan-shaped light forming device 12 may adopt a cylindrical lens or a powell prism, and preferably, the fan-shaped light forming device 12 adopts a powell prism, which is beneficial to obtaining a fan-shaped light with better uniformity. The light beam forms a long-strip-shaped light spot after passing through the fan-shaped light forming device.
The light spot length adjusting device 13 is used for further adjusting the area of the elongated light spot, and the light spot length adjusting device is used for adjusting the length of the light spot in a second direction, wherein the second direction is perpendicular to the first direction. The light spot length adjusting device can adopt a deformable prism pair or a cylindrical lens beam expanding system, and preferably adopts a deformable prism pair, so that the uniformity of the emergent light spots of the deformable prism pair can be ensured to be unchanged.
The length of the spot in the first direction can be further adjusted by adjusting the distance between the fan-shaped light forming means 12 and the spot length adjusting means 13.
As shown in fig. 3, in a second embodiment of the laser device, the laser heating device includes a light source assembly 20, a beam expanding device 21, a fan-shaped light forming device 22, and a spot length adjusting device 23. The light source assembly 20 emits light beams, a strip-shaped light spot is formed by the beam expanding lens 21 and the fan-shaped light forming device 22, and the length of the strip-shaped light spot in one direction is changed by the light spot length adjusting device 22.
The light source assembly 20 and the beam expanding device 21 are connected by an optical fiber 24, and the beam expanding device 21 adopts a collimator, and the collimator adjusts the light beam emitted by the infrared laser to a collimated light beam with a proper size. The beam expanding device 21 expands the spot area of the light beam emitted from the light source assembly 20, and controls the width of the spot in the first direction.
The fan-shaped light forming means 22 and the spot length adjusting means 23 have the same structure as in the first embodiment.
As shown in fig. 4, the width L of the incident light is further increased to L' by the adjustment of the spot-length adjusting means, and the projection area of the exposure lens is adapted.
As another embodiment of the laser heating device (not shown in the drawings), the laser heating device includes a light source assembly, a beam expanding device, a fan-shaped light forming device, and a light spot length adjusting device, the light source assembly includes an infrared laser and a collimator, the infrared laser may also be connected by an optical fiber, the beam expanding device and the fan-shaped light forming device adopt the same structure as in the first embodiment, and preferably, the beam expanding device adopts a variable-power beam expanding lens, so that the length of the light spot is easily adjusted.
The laser heating device adjusts light beams emitted by the light source component into the same shape and size as the view field of the exposure lens through the beam expanding device and the fan-shaped light forming device, if light spots adjusted through the beam expanding lens and the fan-shaped light forming device cannot completely cover the view field of the exposure lens, the light spots further pass through the light spot length adjusting device, so that the size of the light spots completely covers the view field of the exposure lens, and the exposure area is accurately heated.
In the field of laser direct writing, particularly in the field of exposure in which a DMD is used as a spatial light modulation element for laser direct writing, a certain area of the DMD is selected as a working area, the selected area is rectangular, the long edge of the selected area is kept unchanged, the short edge of the selected area is selected according to the actual situation, the length of the long edge of a projection area projected onto a substrate through the DMD is also kept unchanged, and the short edge of the projection area is variable. The laser heating device can conveniently adjust the length of the short side of the laser heating area through the zoom beam expanding lens, and control the length of the long side of the laser heating area through the light spot length adjusting device to match with the projection area, so that the projection area can be accurately heated.
Claims (10)
1. A laser heating device is characterized in that: the light source assembly emits light beams, the beam expanding device and the fan-shaped light forming device form strip-shaped light spots, and the strip-shaped light spots cover a projection area of an exposure lens.
2. The laser heating apparatus according to claim 1, characterized in that: the beam expanding device is a zooming beam expanding lens and changes the length of the strip-shaped light spot in a first direction, and the first direction corresponds to the variable length direction of the projection area.
3. The laser heating apparatus according to claim 1 or 2, characterized in that: the device also comprises a light spot length adjusting device, and the length of the strip-shaped light spot in the second direction is changed through the light spot length adjusting device.
4. The laser heating apparatus according to claim 3, characterized in that: the light spot length adjusting device is a deformed prism pair or a cylindrical lens beam expanding system.
5. The laser heating apparatus according to claim 1, characterized in that: the light source assembly emits collimated light beams, the beam expanding device is a beam expanding lens, or the light source assembly emits divergent light, and the beam expanding device is a collimator.
6. The laser heating apparatus according to claim 1, characterized in that: the fan-shaped light forming device is a cylindrical lens or a Powell prism.
7. The laser heating apparatus according to claim 1, characterized in that: the light source assembly includes an infrared laser.
8. The laser heating apparatus according to claim 7, wherein: the wavelength range of the infrared laser is 805 nm-2000 nm.
9. The laser heating apparatus according to claim 7, wherein: the power range of the infrared laser is 10W-100W.
10. The laser heating apparatus according to claim 1, characterized in that: the laser heating device is arranged on the side edge of the exposure lens.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202121428615.6U CN216361912U (en) | 2021-06-25 | 2021-06-25 | Laser heating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202121428615.6U CN216361912U (en) | 2021-06-25 | 2021-06-25 | Laser heating device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN216361912U true CN216361912U (en) | 2022-04-22 |
Family
ID=81188524
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202121428615.6U Active CN216361912U (en) | 2021-06-25 | 2021-06-25 | Laser heating device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN216361912U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115534277A (en) * | 2022-09-27 | 2022-12-30 | 江苏新美星包装机械股份有限公司 | Heating device and heating method for plastic preforms |
| CN115534276A (en) * | 2022-09-27 | 2022-12-30 | 江苏新美星包装机械股份有限公司 | Conveying and heating device for plastic preforms |
-
2021
- 2021-06-25 CN CN202121428615.6U patent/CN216361912U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115534277A (en) * | 2022-09-27 | 2022-12-30 | 江苏新美星包装机械股份有限公司 | Heating device and heating method for plastic preforms |
| CN115534276A (en) * | 2022-09-27 | 2022-12-30 | 江苏新美星包装机械股份有限公司 | Conveying and heating device for plastic preforms |
| CN115534276B (en) * | 2022-09-27 | 2024-01-19 | 江苏新美星包装机械股份有限公司 | Conveying heating device for plastic preform |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US10261421B2 (en) | Controller for optical device, exposure method and apparatus, and method for manufacturing device | |
| CN216361912U (en) | Laser heating device | |
| EP3330798B1 (en) | Maskless photolithographic system in cooperative working mode for cross-scale structure | |
| US5742376A (en) | Projection exposure apparatus and projection exposure method | |
| US7663734B2 (en) | Pattern writing system and pattern writing method | |
| TWI651762B (en) | Alignment device, alignment method, photo etching device, and article manufacturing method | |
| US20080291418A9 (en) | Method and apparatus for maskless photolithography | |
| KR20220106166A (en) | Direct recording photoetching system and direct recording photoetching method | |
| US11464116B2 (en) | Lithographic exposure system and method for exposure and curing a solder resist | |
| CN112384323A (en) | Laser processing apparatus, laser processing method, and method for manufacturing film formation mask | |
| US10101652B2 (en) | Exposure method, method of fabricating periodic microstructure, method of fabricating grid polarizing element and exposure apparatus | |
| US7012270B2 (en) | Photolithography system having multiple adjustable light sources | |
| JPH10270330A (en) | Method and device for forming pattern | |
| GB2155650A (en) | Controlled exposure | |
| KR101784461B1 (en) | Laser direct imaging apparatus and laser direct imaging method | |
| KR100273717B1 (en) | Method for making encoder by using laser beam | |
| CN216351771U (en) | Optical system of direct-writing type photoetching machine | |
| CN112327578B (en) | Photoetching system of direct-writing photoetching machine | |
| KR102040341B1 (en) | Illumination device | |
| US20040017555A1 (en) | Method for improving image quality and for increasing writing speed during exposure of light-sensitive layers | |
| KR101390512B1 (en) | Improved light exposure source for forming patterns, and exposure apparatus, system, and method for forming patterns having the same | |
| US20060183057A1 (en) | Patterning method | |
| JPH0560254B2 (en) | ||
| JPS62187815A (en) | Light quantity controller | |
| KR20230062357A (en) | Illumination optical system and laser processing apparatus |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |