CN216170909U

CN216170909U - Gas purification equipment

Info

Publication number: CN216170909U
Application number: CN202122434306.6U
Authority: CN
Inventors: 王锐; 王虎成; 张丹; 汪敏; 陈俊; 沈蓉
Original assignee: Hefei Yasheng Semiconductor Equipment Technology Co ltd
Current assignee: Hefei Yasheng Semiconductor Equipment Technology Co ltd
Priority date: 2021-10-09
Filing date: 2021-10-09
Publication date: 2022-04-05
Anticipated expiration: 2031-10-09

Abstract

The utility model relates to the technical field of gas treatment equipment, in particular to gas purification equipment. Including the washing room, washing room middle part position is cut apart into the second washing room that is located the first washing room of left side position and is located the right side position through the division board, install the overflow pipe that is used for communicateing second washing room and first washing room on the division board, first baffle and second baffle are installed respectively to first washing room inner chamber and second washing room inner chamber position equally, first baffle and second baffle bottom fixed mounting are in the washing room inner chamber, all there is the clearance between top and the washing room inner wall, the intake pipe is installed to first washing room left side upper portion position, still install first mixer in the intake pipe, bottom position installs first circulating pipe between first baffle and the division board, waste gas treatment ability has been promoted, need not to fill PallRing, can guarantee throughput.

Description

Gas purification equipment

Technical Field

The utility model relates to the technical field of gas treatment equipment, in particular to gas purification equipment.

Background

Various production facilities and manufacturing processes are required for manufacturing semiconductor devices, and since the common process gases are corrosive and toxic (CHF) in the manufacturing process of semiconductor devices according to the characteristics of the WetEtch process₃,Cl₂,BCl₃) If harmful gases generated in the semiconductor production process are directly discharged into the atmosphere without any treatment, serious pollution is caused to the atmosphere and the human ecological environment. Therefore, all semiconductor production lines are specially designed with a project for treating waste gas, so that harmful gas generated in the production process is purified to reach an allowable concentration and then is discharged into the atmosphere.

The existing gas purification equipment has limited treatment capacity, cannot meet the treatment capacity of waste gas of a factory, and has the disadvantages of complex structure, complex processing technology, high processing difficulty, high product repair and rejection rate in the production process and high cost of the whole machine.

SUMMERY OF THE UTILITY MODEL

Technical problem to be solved

In order to solve the above problems in the prior art, the present invention provides a gas purification apparatus, which improves the exhaust gas treatment capability and ensures the treatment capability without filling PallRing.

(II) technical scheme

In order to achieve the purpose, the utility model adopts the main technical scheme that: including the washing room, washing room middle part position is cut apart into the first washing room that is located the left side position and is located the second washing room of right side position through the division board, install the overflow pipe that is used for intercommunication second washing room and first washing room on the division board, first baffle and second baffle are do not installed to first washing room inner chamber and second washing room inner chamber position equally divide, first baffle and second baffle bottom fixed mounting all have the clearance in the washing room inner chamber between top and the washing room inner wall, the intake pipe is installed to first washing room left side upper portion position, still install first mixer in the intake pipe, the first circulating pipe is installed to the bottom position between first baffle and the division board, the feed inlet intercommunication of the other one end of first circulating pipe and first mixer, still install first circulating pump and drain pipe on the first circulating pipe, the utility model discloses a washing machine, including division board, second circulating pipe, inlet tube, mixing machine and second circulating pump, the second circulating pipe is installed to the bottom position between division board and the second division board, the other one end of second circulating pipe and second washing room right side upper portion intercommunication, install the inlet tube on the second circulating pipe, still install the second on the second circulating pipe and mix machine and second circulating pump, first washing room top is located and mixes machine feed inlet intercommunication through pipe and second between first division board and the division board, the blast pipe is installed to the second washing room upper portion position between being located division board and the second division board.

Preferably, the right end of the overflow pipe is higher than the left end.

Preferably, the lower ends of the air inlet pipe and the overflow pipe are both positioned below the liquid level, and the upper end of the second circulating pipe, which is positioned at the right side of the inner cavity of the second washing chamber, is positioned below the liquid level.

(III) advantageous effects

The utility model provides a gas purification device. The method has the following beneficial effects:

(1) adopt mixing apparatus can be abundant mix the washing to waste gas and washing liquid, promoted purifying effect, the quantity of fog and powder significantly reduces in the waste gas.

(2) The washing can be carried out in sections, and washing water is saved.

Drawings

FIG. 1 is a block diagram of the present invention.

In the figure: 2. a separator plate; 3. a first washing chamber; 4. a second washing chamber; 5. an overflow pipe; 6. a first separator; 7. a second separator; 8. an air inlet pipe; 9. a first mixer; 10. a first circulation pipe; 11. a first circulation pump; 12. a drain pipe; 13. a second circulation pipe; 14. a water inlet pipe; 15. a second mixer; 16. a second circulation pump; 17. and (4) exhausting the gas.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

As shown in FIG. 1, the gas purifying apparatus of the present embodiment comprises a washing chamber, the middle position of the washing chamber is divided into a first washing chamber 3 at the left position and a second washing chamber 4 at the right position by a partition board 2, an overflow pipe 5 for communicating the second washing chamber 4 with the first washing chamber 3 is installed on the partition board 2, a first partition board 6 and a second partition board 7 are respectively installed at the inner cavity of the first washing chamber 3 and the inner cavity of the second washing chamber 4, the bottoms of the first partition board 6 and the second partition board 7 are fixedly installed at the inner cavity of the washing chamber, a gap is formed between the top and the inner wall of the washing chamber, an air inlet pipe 8 is installed at the upper position of the left side of the first washing chamber 3, a first mixer 9 is further installed on the air inlet pipe 8, a first circulation pipe 10 is installed at the bottom position between the first partition board 6 and the partition board 2, the other end of the first circulation pipe 10 is communicated with the feed inlet of the first mixer 9, the first circulating pipe 10 is further provided with a first circulating pump 11 and a water discharging pipe 12, a second circulating pipe 13 is arranged at the bottom between the partition board 2 and the second partition board 7, the other end of the second circulating pipe 13 is communicated with the upper part of the right side of the second washing chamber 4, a water inlet pipe 14 is arranged on the second circulating pipe 13, a second mixer 15 and a second circulating pump 16 are further arranged on the second circulating pipe 13, the top of the first washing chamber 3 is positioned between the first partition board 6 and the partition board 2 and is communicated with a feed inlet of the second mixer 15 through a guide pipe, and an exhaust pipe 17 is arranged at the upper part between the partition board 2 and the second partition board 7 of the second washing chamber 4. The waste gas entering through the air inlet pipe is firstly mixed and washed in the first mixer 9 by the washing liquid pumped by the first circulating pump 11 and the first circulating pipe 10, then injected into the first washing chamber 3, the purified air enters the second mixer 9 through the conduit, and is secondarily washed by the washing liquid in the second mixer 9, the second circulating pump 16 and the second circulating pipe 13, the secondarily washed air is discharged through the exhaust pipe 17, the washing liquid on the left side of the second partition board 7 is supplemented into the first washing chamber 4 through the overflow pipe 5, and the washing liquid twice washed in the first washing chamber 4 is discharged through the drain pipe 12.

Further, one end of the overflow pipe 5 on the right side is higher than one end of the overflow pipe on the left side.

Furthermore, the lower ends of the air inlet pipe 8 and the overflow pipe 5 are both positioned below the liquid level, and the upper end of the second circulating pipe 13 positioned at the right side of the inner cavity of the second washing chamber 4 is positioned below the liquid level.

The working principle is as follows: the waste gas entering through the air inlet pipe is firstly mixed and washed in the first mixer 9 by the washing liquid pumped by the first circulating pump 11 and the first circulating pipe 10, then injected into the first washing chamber 3, the purified air enters the second mixer 9 through the conduit, and is secondarily washed by the washing liquid in the second mixer 9, the second circulating pump 16 and the second circulating pipe 13, the secondarily washed air is discharged through the exhaust pipe 17, the washing liquid on the left side of the second partition board 7 is supplemented into the first washing chamber 4 through the overflow pipe 5, and the washing liquid twice washed in the first washing chamber 4 is discharged through the drain pipe 12.

Claims

1. A gas cleaning device comprising a scrubbing chamber, characterized in that: the washing chamber middle position is divided into a first washing chamber (3) positioned at the left side position and a second washing chamber (4) positioned at the right side position through an isolation plate (2), an overflow pipe (5) used for communicating the second washing chamber (4) with the first washing chamber (3) is installed on the isolation plate (2), a first partition plate (6) and a second partition plate (7) are respectively installed at the inner cavity of the first washing chamber (3) and the inner cavity of the second washing chamber (4), the bottoms of the first partition plate (6) and the second partition plate (7) are fixedly installed in the inner cavity of the washing chamber, gaps exist between the top and the inner wall of the washing chamber, an air inlet pipe (8) is installed at the upper part of the left side of the first washing chamber (3), a first mixing machine (9) is further installed on the air inlet pipe (8), and a first circulating pipe (10) is installed at the bottom position between the first partition plate (6) and the isolation plate (2), the other end of the first circulating pipe (10) is communicated with a feed inlet of the first mixer (9), the first circulating pipe (10) is also provided with a first circulating pump (11) and a drain pipe (12), a second circulating pipe (13) is arranged at the bottom between the isolation plate (2) and the second partition plate (7), the other end of the second circulation pipe (13) is communicated with the upper part of the right side of the second washing chamber (4), a water inlet pipe (14) is arranged on the second circulating pipe (13), a second mixer (15) and a second circulating pump (16) are also arranged on the second circulating pipe (13), the top of the first washing chamber (3) is positioned between the first clapboard (6) and the clapboard (2) and is communicated with a feed inlet of the second mixer (15) through a conduit, and an exhaust pipe (17) is arranged at the upper part of the second washing chamber (4) between the partition plate (2) and the second partition plate (7).

2. A gas cleaning device according to claim 1, characterized in that: one end of the right side of the overflow pipe (5) is higher than one end of the left side.

3. A gas cleaning device according to claim 1, characterized in that: the lower ends of the air inlet pipe (8) and the overflow pipe (5) are both positioned below the liquid level, and one end of the second circulating pipe (13) which is positioned at the upper part of the right side of the inner cavity of the second washing chamber (4) is positioned below the liquid level.