CN216123043U - Etching two-fluid temperature adjusting system - Google Patents
Etching two-fluid temperature adjusting system Download PDFInfo
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- CN216123043U CN216123043U CN202122159094.5U CN202122159094U CN216123043U CN 216123043 U CN216123043 U CN 216123043U CN 202122159094 U CN202122159094 U CN 202122159094U CN 216123043 U CN216123043 U CN 216123043U
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Abstract
The utility model provides an etching two-fluid temperature adjusting system. The utility model provides an etching two fluid temperature governing system, includes air inlet mechanism, electric heat temperature controller, gas-liquid mixture spray thrower, the liquid pump, etching platform and controller, air inlet mechanism passes through the first entry linkage of electric heat temperature controller and gas-liquid mixture spray thrower, the second entry linkage of liquid pump and gas-liquid mixture spray thrower, be equipped with the nozzle on the gas-liquid mixture spray thrower, the inside first temperature sensor who is connected with the controller that still is equipped with of gas-liquid mixture spray thrower, the controller respectively with gas-liquid mixture spray thrower and electric heat temperature controller independent control connection. According to the utility model, the temperature of the two etching fluids during spraying is regulated by regulating the heating power of the electric heating temperature controller and feeding back the first temperature sensor arranged at the outlet of the gas-liquid mixing sprayer, so that the temperature of the two etching fluids reaches the temperature required by the process, the etching rate is increased, the quality stability of the etched circuit is ensured, and the hidden danger of the etching quality is reduced.
Description
Technical Field
The utility model relates to the field of line etching, in particular to an etching two-fluid temperature regulating system.
Background
The etching second fluid is atomized liquid which is obtained by respectively mixing original etching liquid and air according to a certain proportion and then uniformly mixing the original etching liquid and the air in a nozzle under certain pressure and temperature and is used for eliminating circuit burrs.
According to the current process requirement, the etching two fluids need to be etched under the condition of constant 50 ℃ to achieve the best effect, in the current etching equipment, air is not subjected to specific heating or temperature regulation, etching liquid is not subjected to temperature control by a specific temperature regulation control device, and the temperature difference of the air is obvious due to the influence of seasons, so that the temperature of the mixed atomized etching two fluids is greatly influenced, the mixed atomized etching two fluids are difficult to achieve the best etching condition of 50 ℃ by means of the temperature of the etching liquid, particularly in winter, the temperature difference is larger, the etching rate is reduced, the quality of an etched line is unstable, and the quality hidden danger exists.
SUMMERY OF THE UTILITY MODEL
The utility model provides an etching two-fluid temperature adjusting system for overcoming the problems that in the prior etching equipment described in the background art, air is not subjected to specific heating or temperature adjustment, etching liquid is not subjected to temperature control by a specific temperature adjusting and controlling device, the temperature of the mixed atomized etching two fluids is greatly influenced, the mixed atomized etching two fluids are difficult to reach the optimal etching condition of 50 ℃ by means of the self temperature of the etching liquid, the etching rate is reduced, the quality of an etched line is unstable, and potential quality hazards exist. The utility model can more accurately adjust and control the etching temperature of the etching two fluids and improve the etching quality.
In order to solve the technical problems, the utility model adopts the technical scheme that: the utility model provides an etching two-fluid temperature governing system, includes air intake mechanism, electric heat temperature controller, gas-liquid mixture spray thrower, liquid pump, etching platform and controller, air intake mechanism passes through the electric heat temperature controller with the first access connection of gas-liquid mixture spray thrower, the liquid pump with the second access connection of gas-liquid mixture spray thrower, be equipped with on the gas-liquid mixture spray thrower and be used for etching two fluid spun nozzles, the nozzle is just right the top surface of etching platform, the gas-liquid mixture spray thrower is inside to be close to the nozzle position still is equipped with first temperature sensor, first temperature sensor with the controller is connected, the controller respectively with gas-liquid mixture spray thrower and electric heat temperature controller independent control are connected.
Furthermore, an etching cylinder for recovering etching two fluids is arranged below the etching platform and is connected with the liquid pump through a backflow channel.
Preferably, the air intake mechanism is a blower.
Furthermore, a second temperature sensor and a heating mechanism for heating the liquid in the etching cylinder are further arranged in the etching cylinder, the second temperature sensor is connected with the controller, and the controller is in independent control connection with the heating mechanism.
Further, still be equipped with the display screen that is used for showing the temperature on the gas-liquid mixture spray thrower, the display screen with first temperature sensor is connected.
Preferably, the nozzle is an atomising nozzle.
Furthermore, a cooling mechanism used for cooling the liquid in the etching cylinder is further arranged in the etching cylinder, and the controller is connected with the cooling mechanism in an independent control mode.
Preferably, the heating mechanism is an electric heating tube.
Preferably, the first temperature sensor and the second temperature sensor are both contact temperature sensors.
More preferably, the blower is a centrifugal blower.
Compared with the prior art, the beneficial effects are:
1. according to the utility model, the temperature of the two etching fluids during spraying is regulated by regulating the heating power of the electric heating temperature controller and feeding back the first temperature sensor arranged at the outlet of the gas-liquid mixing sprayer, so that the temperature of the two etching fluids reaches the temperature required by the process, the etching rate is increased, the quality stability of the etched circuit is ensured, and the hidden danger of the etching quality is reduced.
2. The utility model also adds a heating mechanism for temperature regulation and control, a cooling mechanism and a second temperature sensor for feeding back the temperature of the etching liquid in the etching cylinder; the whole system can respectively adjust the temperature of the gas and the liquid before mixing, and the adjustment is more flexible.
Drawings
Fig. 1 is a schematic diagram of the framework of the present invention.
Detailed Description
The drawings are for illustrative purposes only and are not to be construed as limiting the patent; for the purpose of better illustrating the embodiments, certain features of the drawings may be omitted, enlarged or reduced, and do not represent the size of an actual product; it will be understood by those skilled in the art that certain well-known structures in the drawings and descriptions thereof may be omitted. The positional relationships depicted in the drawings are for illustrative purposes only and are not to be construed as limiting the present patent.
The same or similar reference numerals in the drawings of the embodiments of the present invention correspond to the same or similar components; in the description of the present invention, it should be understood that if there are terms such as "upper", "lower", "left", "right", "long", "short", etc., indicating orientations or positional relationships based on the orientations or positional relationships shown in the drawings, it is only for convenience of description and simplicity of description, but does not indicate or imply that the device or element referred to must have a specific orientation, be constructed in a specific orientation, and be operated, and therefore, the terms describing the positional relationships in the drawings are only used for illustrative purposes and are not to be construed as limitations of the present patent, and specific meanings of the terms may be understood by those skilled in the art according to specific situations.
The technical scheme of the utility model is further described in detail by the following specific embodiments in combination with the attached drawings:
as shown in fig. 1, an etching two-fluid temperature adjusting system comprises an air inlet mechanism, an electric heating temperature controller, a gas-liquid mixing sprayer, a liquid pump, an etching platform and a controller, wherein the air inlet mechanism is connected with a first inlet of the gas-liquid mixing sprayer through the electric heating temperature controller, the liquid pump is connected with a second inlet of the gas-liquid mixing sprayer, a nozzle used for spraying etching two fluids is arranged on the gas-liquid mixing sprayer, the nozzle is just opposite to the top surface of the etching platform, a first temperature sensor is further arranged in the gas-liquid mixing sprayer close to the position of the nozzle, the first temperature sensor is connected with the controller, and the controller is respectively connected with the gas-liquid mixing sprayer and the electric heating temperature controller in an independent control mode.
An etching cylinder for recovering the etching two fluids is also arranged below the etching platform and is connected with the liquid pump through a return channel. The etching cylinder can recover the liquid in the etching second fluid, and can also additionally add etching liquid through recovery and circulation; waste of etching liquid can be reduced.
In the embodiment, the air inlet mechanism is a centrifugal blower; the nozzle is an atomizing nozzle. The first temperature sensor and the second temperature sensor are both contact temperature sensors; still be equipped with the display screen that is used for showing the temperature on the gas-liquid mixture spray thrower, the display screen is connected with first temperature sensor.
In this embodiment, a second temperature sensor and a heating mechanism for heating liquid in the etching cylinder are further arranged in the etching cylinder, the second temperature sensor is connected with a controller, and the controller is independently controlled and connected with the heating mechanism; the heating mechanism may be an electrical heating tube or other device capable of raising the temperature of the etching liquid.
In this embodiment, the etching cylinder is further provided with a cooling mechanism for cooling the liquid in the etching cylinder, and the controller is connected with the cooling mechanism in an independent control manner. The cooling mechanism can be that a cold water plate is arranged at the bottom or on the side wall of the etching cylinder, and the liquid in the etching cylinder is subjected to heat exchange and temperature reduction through the cold water plate and an external circulating mechanism; in other embodiments, the cooling mechanism may be another device capable of cooling the liquid in the etching cylinder, for example, an external water cooling fan cools the etching cylinder.
This embodiment can adopt two kinds of mode of operation, and the first kind of mode of operation is fairly simple, promptly: heating the gas sucked by the air inlet mechanism to 50 ℃ through an electric heating temperature controller, and then heating the liquid in the etching cylinder to 50 ℃ through the heating mechanism, wherein the gas and the liquid are both 50 ℃; then after being mixed by a gas-liquid mixing sprayer, the mixture is atomized by an atomizing nozzle and sprayed to the etching second fluid on the etching platform, namely 50 ℃; the operation is relatively simple.
The second operation mode is automatically controlled by the controller, and because the gas is heated more quickly, the gas sucked by the air inlet mechanism can be heated to a temperature higher than 50 ℃ by the electric heating temperature controller, then the etching liquid can not be heated, the etching liquid reflowing to the liquid pump again by using the waste heat of the recovered etching liquid is at a temperature lower than 50 ℃, the liquid and the gas can reach a temperature as much as 50 ℃ after being mixed in the gas-liquid mixing sprayer, through the feedback of the first temperature sensor, if the temperature at the nozzle is lower than 50 ℃, the heating power of the electric heating temperature controller can be improved or the heating mechanism is started to heat, and finally the nozzle is opened after the temperature at the nozzle is adjusted to 50 ℃, and the etching two fluids are atomized and sprayed out; when the temperature of the nozzle is higher than 50 ℃, the heating power of the electric heating temperature controller can be automatically reduced through the controller or the cooling mechanism is started to cool the liquid, and finally the temperature of the nozzle can be adjusted to 50 ℃.
The temperature of the two etching fluids during spraying is adjusted by adjusting the heating power of the electric heating temperature controller and feeding back the first temperature sensor arranged at the outlet of the gas-liquid mixing sprayer, so that the temperature of the two etching fluids reaches the temperature required by the process, the etching rate is increased, the stable quality of the etched circuit is ensured, and the hidden danger of the etching quality is reduced. A heating mechanism for regulating and controlling the temperature, a cooling mechanism and a second temperature sensor for feeding back the temperature of the etching liquid are additionally arranged in the etching cylinder; the whole system can respectively adjust the temperature of the gas and the liquid before mixing, and the adjustment is more flexible.
It should be understood that the above-described embodiments of the present invention are merely examples for clearly illustrating the present invention, and are not intended to limit the embodiments of the present invention. Other variations and modifications will be apparent to persons skilled in the art in light of the above description. And are neither required nor exhaustive of all embodiments. Any modification, equivalent replacement, and improvement made within the spirit and principle of the present invention should be included in the protection scope of the claims of the present invention.
Claims (10)
1. The utility model provides an etching two-fluid temperature governing system, its characterized in that, is including mechanism, electric heat temperature controller, gas-liquid mixture spray thrower, liquid pump, etching platform and controller admits air, the mechanism of admitting air passes through the electric heat temperature controller with the first access connection of gas-liquid mixture spray thrower, the liquid pump with the second access connection of gas-liquid mixture spray thrower, be equipped with on the gas-liquid mixture spray thrower and be used for etching two fluid spun nozzles, the nozzle is just right the top surface of etching platform, the gas-liquid mixture spray thrower is inside to be close to the nozzle position still is equipped with first temperature sensor, first temperature sensor with the controller is connected, the controller respectively with gas-liquid mixture spray thrower and electric heat temperature controller independent control connection.
2. The etching two-fluid temperature regulating system according to claim 1, wherein an etching cylinder for recovering the etching two fluids is further provided below the etching platform, and the etching cylinder is connected with the liquid pump through a return channel.
3. The etching two fluid temperature regulation system of claim 1, wherein the gas inlet mechanism is a blower.
4. The system as claimed in claim 1, wherein a second temperature sensor and a heating mechanism for heating the liquid in the etching cylinder are further disposed in the etching cylinder, the second temperature sensor is connected to the controller, and the controller is independently connected to the heating mechanism.
5. The etching two-fluid temperature adjusting system according to claim 1, wherein a display screen for displaying temperature is further provided on the gas-liquid mixing sprayer, and the display screen is connected to the first temperature sensor.
6. The etching fluid temperature conditioning system of claim 1, wherein the nozzle is an atomizing nozzle.
7. The system as claimed in claim 4, wherein the etching cylinder is further provided with a cooling mechanism for cooling the liquid in the etching cylinder, and the controller is connected to the cooling mechanism in an independent control manner.
8. The etching two fluid temperature regulation system of claim 4, wherein the heating mechanism is an electrical heater.
9. The etching fluid temperature conditioning system of claim 1, wherein the first temperature sensor and the second temperature sensor are both contact temperature sensors.
10. The etching two fluid temperature adjustment system of claim 3, wherein the blower is a centrifugal blower.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202122159094.5U CN216123043U (en) | 2021-09-07 | 2021-09-07 | Etching two-fluid temperature adjusting system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202122159094.5U CN216123043U (en) | 2021-09-07 | 2021-09-07 | Etching two-fluid temperature adjusting system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN216123043U true CN216123043U (en) | 2022-03-22 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202122159094.5U Active CN216123043U (en) | 2021-09-07 | 2021-09-07 | Etching two-fluid temperature adjusting system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN216123043U (en) |
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2021
- 2021-09-07 CN CN202122159094.5U patent/CN216123043U/en active Active
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