CN216079335U

CN216079335U - High-purity gas oval spherical cavity buffer

Info

Publication number: CN216079335U
Application number: CN202121742589.4U
Authority: CN
Inventors: 姜锦龙; 王衡遥; 吴浩月; 叶根; 廖烽
Original assignee: Chengdu Zhongke Purui Purification Equipment Co ltd
Current assignee: Chengdu Zhongke Purui Purification Equipment Co ltd
Priority date: 2021-07-28
Filing date: 2021-07-28
Publication date: 2022-03-18
Anticipated expiration: 2031-07-28

Abstract

The utility model discloses a high-purity gas elliptical spherical cavity buffer which comprises an elliptical spherical cavity, a high-purity gas inlet and a high-purity gas outlet; the oval spherical cavity is arranged in the buffer and is used for buffering introduced high-purity gas; the high-purity gas inlet is arranged on the buffer, and high-purity gas is introduced into the bottom of the elliptical spherical cavity through an inlet pipeline; the high-purity gas outlet is arranged at the top of the buffer and used for discharging gas. By improving the internal structure and the gas inlet and outlet mode, the speed of removing other impurity gases in the oval spherical cavity in the process of flowing high-purity gas from bottom to top is increased when the high-purity gas purifier is used for the first time, the initial replacement time of the high-purity gas is shortened, and the waste of the high-purity gas is reduced.

Description

High-purity gas oval spherical cavity buffer

Technical Field

The utility model relates to the field of chemical machinery, in particular to a high-purity gas elliptical spherical cavity buffer.

Background

At present, the existing high-purity gas buffer adopts a structure with a cylindrical or cubic inner cavity, and the two methods for treating the high-purity gas have the defects of long initial replacement time, waste of a large amount of high-purity gas, high cost and the like. Therefore, how to well shorten the initial replacement time of the high-purity gas and reduce the waste of the high-purity gas becomes a technical problem to be solved urgently.

SUMMERY OF THE UTILITY MODEL

The utility model provides a high-purity gas oval spherical cavity buffer, which aims to solve the technical problems that: the initial replacement time of the high-purity gas is shortened, and the gas consumption is reduced.

In view of the above problems of the prior art, according to one aspect of the present disclosure, the following technical solutions are adopted in the present invention:

a high purity gas elliptical spherical cavity damper comprising:

the oval spherical cavity is arranged in the buffer and is used for buffering introduced high-purity gas;

the high-purity gas inlet is arranged on the buffer, and high-purity gas is introduced into the bottom of the elliptical spherical cavity through an inlet pipeline;

and the high-purity gas outlet is arranged at the top of the buffer and used for discharging gas.

In order to better realize the utility model, the further technical scheme is as follows:

further, the inlet pipeline guides high-purity gas into the pipe orifice at the bottom of the oval spherical cavity and the distance between the pipe orifice and the lowest point of the oval spherical cavity is the outer diameter of the inlet pipeline.

Furthermore, the oval spherical cavity is arranged in a mode that the long axis is vertical and the short axis is horizontal.

Further, the high-purity gas outlet is arranged at the highest point of the oval spherical cavity.

Further, the pipe orifice of the outlet pipeline connected with the high-purity gas outlet is higher than or even at the highest position of the oval spherical cavity.

Further, the high-purity gas inlet is arranged in the middle of the buffer.

Furthermore, the inner wall of the oval spherical cavity is smooth.

Further, the buffer is formed by welding two semi-elliptical spheres.

Compared with the prior art, the utility model has the following beneficial effects:

according to the high-purity gas oval cavity buffer, the internal structure and the gas inlet and outlet modes are improved, so that the speed of removing other impurity gases in the oval cavity in the process that high-purity gas flows from bottom to top can be increased when the buffer is used for the first time, the initial replacement time of the high-purity gas is shortened, the waste of the high-purity gas is reduced, and the like.

Drawings

For a clearer explanation of the embodiments or technical solutions in the prior art of the present application, the drawings used in the description of the embodiments or prior art will be briefly described below, it is obvious that the drawings in the following description are only references to some embodiments in the present application, and other drawings can be obtained by those skilled in the art without creative efforts.

FIG. 1 is a schematic diagram of a high purity gas oval spherical chamber buffer in accordance with one embodiment of the present invention.

Wherein, the names corresponding to the reference numbers in the drawings are:

1-an oval spherical cavity, 2-a high-purity gas inlet, 3-an inlet pipeline, 4-a high-purity gas outlet and 5-a welding line.

Detailed Description

The present invention will be described in further detail with reference to examples, but the embodiments of the present invention are not limited thereto.

As shown in fig. 1, a high-purity gas elliptical spherical cavity buffer comprises an elliptical spherical cavity 1, a high-purity gas inlet 2 and a high-purity gas outlet 4; the oval spherical cavity 1 is arranged in the buffer and used for buffering introduced high-purity gas; the high-purity gas inlet 2 is arranged on the buffer, and high-purity gas is introduced into the bottom of the oval spherical cavity 1 through an inlet pipeline 3; the high-purity gas outlet 4 is arranged at the top of the buffer and used for discharging gas. In the buffer of the embodiment, a cylindrical or cubic cavity structure in the prior art is set as the oval spherical cavity 1, and in use, gas enters the bottom of the oval spherical cavity 1 through the inlet pipeline 3, then flows to the outlet at the upper part gradually, and other gas in the oval spherical cavity 1 is removed in the flowing process. The ellipsoidal cavity 1 has the advantages of shortening the initial replacement time of high-purity gas, greatly reducing the waste gas and the like.

The high purity gases mentioned in the above examples are within the range generally recognized by those skilled in the art, and no particular critical value is intended to be limited to the high purity gas. Of course, the high-purity gas oval spherical cavity buffer can also be used for buffering gas and is within the protection scope of the application.

Generally, the inlet pipe 3 introduces high-purity gas into the bottom of the oval spherical cavity 1 at a specific position, i.e. the height of the pipe orifice of the inlet pipe 3 extending into the oval spherical cavity 1 should ensure that the designed maximum gas flow passes through. Preferably, the distance between the pipe orifice of the inlet pipe 3 for introducing the high-purity gas into the bottom of the elliptical spherical cavity 1 and the lowest point of the elliptical spherical cavity 1 is the outer diameter of the inlet pipe 3.

The elliptical spherical cavity 1 can be preferably arranged in the manner shown in fig. 1, that is, the elliptical spherical cavity 1 is arranged with the major axis vertical and the minor axis horizontal, and the dimension in the vertical direction is larger than the horizontal width dimension. The elliptical spherical cavity 1 in the arrangement mode is more beneficial to discharging other gases.

For the high-purity gas outlet 4 arranged at the top of the buffer, the high-purity gas outlet 4 can be further arranged at the highest point of the oval spherical cavity 1, and the pipe orifice of the outlet pipeline connected with the high-purity gas outlet 4 is higher than or even at the highest point of the oval spherical cavity 1, namely the outlet pipeline cannot extend into the oval spherical cavity 1.

The outlet pipe and the buffer body can be connected by welding, and other connecting methods can be adopted.

The high purity gas inlet 2 may be generally located anywhere in the buffer, preferably in the middle of the buffer/ellipsoidal cavity 1 as shown in fig. 1, and the inlet pipe 3 is connected to the middle of the ellipsoidal cavity 1 and extends to the lowest point of the ellipsoidal cavity 1, but ensures the designed maximum gas flow rate.

In another embodiment, the inner wall of the oval spherical cavity 1 should be smooth, i.e. have a high degree of finish.

The elliptical spherical cavity buffer for preparing high-purity gas can be formed by welding two semi-elliptical spheres with very high smoothness. It is preferably divided into two semi-elliptical spheres in the vertical direction and then welded to form a vertical face weld 5, as shown in figure 1. If divided into two semi-elliptical spherical shapes in the horizontal direction, and then welded to form the bumper, this is not shown in this manner.

In summary, the high-purity gas oval cavity buffer can improve the speed of removing other impurity gases in the oval cavity 1 in the process that high-purity gas flows from bottom to top when in first use by improving the internal structure and the gas inlet and outlet modes.

The embodiments are described in a progressive manner in the specification, each embodiment focuses on differences from other embodiments, and the same and similar parts among the embodiments are referred to each other.

Reference throughout this specification to "one embodiment," "another embodiment," "an embodiment," etc., means that a particular feature, structure, or characteristic described in connection with the embodiment is included in at least one embodiment described generally in this application. The appearances of the same phrase in various places in the specification are not necessarily all referring to the same embodiment. Further, when a particular feature, structure, or characteristic is described in connection with any embodiment, it is submitted that it is within the scope of the utility model to effect such feature, structure, or characteristic in connection with other embodiments.

Although the utility model has been described herein with reference to a number of illustrative embodiments thereof, it should be understood that numerous other modifications and embodiments can be devised by those skilled in the art that will fall within the spirit and scope of the principles of this disclosure. More specifically, various variations and modifications are possible in the component parts and/or arrangements of the subject combination arrangement within the scope of the disclosure and claims of this application. In addition to variations and modifications in the component parts and/or arrangements, other uses will also be apparent to those skilled in the art.

Claims

1. A high-purity gas oval spherical cavity buffer is characterized by comprising:

the oval spherical cavity (1) is arranged in the buffer and is used for buffering introduced high-purity gas;

the high-purity gas inlet (2) is arranged on the buffer, and high-purity gas is introduced into the bottom of the oval spherical cavity (1) through an inlet pipeline (3);

a high-purity gas outlet (4), wherein the high-purity gas outlet (4) is arranged at the top of the buffer and used for discharging gas.

2. The high purity gas oval spherical cavity buffer according to claim 1, characterized in that the distance between the orifice of the inlet pipe (3) for introducing high purity gas into the bottom of the oval spherical cavity (1) and the lowest point of the oval spherical cavity (1) is the outer diameter of the inlet pipe (3).

3. A high purity gas ellipsoidal chamber buffer as claimed in claim 1 wherein the ellipsoidal chamber (1) is arranged with its major axis vertical and minor axis horizontal.

4. A high purity gas ellipsoidal chamber buffer according to claim 1 wherein the high purity gas outlet (4) is located at the highest point of the ellipsoidal chamber (1).

5. The high purity gas elliptical spherical cavity buffer of claim 1, characterized in that the orifice of the outlet conduit connected to the high purity gas outlet (4) is higher or even than the highest point of the elliptical spherical cavity (1).

6. The high purity gas elliptical spherical cavity buffer of claim 1, characterized in that the high purity gas inlet (2) is located in the middle of the buffer.

7. The high purity gas elliptical cavity buffer of claim 1, characterized in that the elliptical cavity (1) has smooth inner walls.

8. The high purity gas elliptical spherical chamber baffle as claimed in claim 1 wherein said baffle is formed by welding two semi-elliptical spheres.