CN216026667U - Clamping rotary cleaning machine for microelectronic manufacturing - Google Patents

Clamping rotary cleaning machine for microelectronic manufacturing Download PDF

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Publication number
CN216026667U
CN216026667U CN202122069347.XU CN202122069347U CN216026667U CN 216026667 U CN216026667 U CN 216026667U CN 202122069347 U CN202122069347 U CN 202122069347U CN 216026667 U CN216026667 U CN 216026667U
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China
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wall
cleaning machine
microelectronic manufacturing
clamping
cavity
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Expired - Fee Related
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CN202122069347.XU
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Chinese (zh)
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姜鑫宇
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Individual
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Individual
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Abstract

The utility model relates to the technical field of microelectronics, in particular to a cleaning machine for clamping and rotating type microelectronic manufacturing. It is including wasing the bucket, it is equipped with rotatory disturbance device to wash bucket inside, rotatory disturbance device includes the bull stick, the bull stick passes through motor output shaft and rotates inside the washing bucket, the bull stick outer wall is equipped with a plurality of mounts, the mount is hollow structure, and the outer wall has seted up a plurality of through-holes, the inside board of placing that slides of mount, the cavity has all been seted up to the surface around placing the board, it inlays and is equipped with the carriage to place the inboard cavity, there is the disturbance flabellum inside rotating through motor output shaft of carriage. The utility model can disturb water flow to contact raw materials transversely and longitudinally, and improve cleaning effect.

Description

Clamping rotary cleaning machine for microelectronic manufacturing
Technical Field
The utility model relates to the technical field of microelectronics, in particular to a cleaning machine for clamping and rotating type microelectronic manufacturing.
Background
The present invention relates to a cleaning machine for manufacturing micro-electronic devices, and more particularly, to a cleaning machine for manufacturing micro-electronic devices, which is a novel technique developed along with integrated circuits, especially ultra-large scale integrated circuits, wherein a micro-electronic chip and the like need to be cleaned from impurities on the surface of a raw material during manufacturing to avoid affecting subsequent use, but the present cleaning machine cannot be used for cleaning the raw material during manufacturing micro-electronic devices, resulting in poor cleaning effect.
SUMMERY OF THE UTILITY MODEL
The present invention is directed to a clamping rotary microelectronic manufacturing cleaning machine that solves the above-mentioned problems of the prior art.
In order to achieve the purpose, the utility model provides a clamping rotary type cleaning machine for microelectronic manufacturing, which comprises a cleaning barrel, wherein a rotary disturbance device is arranged in the cleaning barrel and comprises a rotating rod, the rotating rod rotates in the cleaning barrel through a motor output shaft, a plurality of fixing frames are arranged on the outer wall of the rotating rod, the fixing frames are of hollow structures, a plurality of through holes are formed in the outer walls of the fixing frames, a placing plate slides in the fixing frames, cavities are formed in the front surface and the rear surface of the placing plate, a connecting frame is embedded in the inner cavity of the placing plate, and disturbance fan blades rotate in the connecting frame through a motor output shaft.
As a further improvement of the technical scheme, the inner wall of the cavity is provided with two symmetrical clamping plates, and the surfaces of the clamping plates and the inner wall of the cavity are fixedly connected with clamping springs.
As a further improvement of the technical scheme, an air bag cushion is arranged on the inner surface of the clamping plate and made of hollow elastic rubber.
As a further improvement of the technical scheme, a lifting groove is formed in the end portion of the inner wall of the fixing frame, a lifting plate is arranged on the outer wall of the placing plate, and the lifting plate slides in the lifting groove.
As a further improvement of the technical scheme, a screw rod is arranged in the lifting groove in a rotating mode, the end of the screw rod extends out of the lifting groove in a rotating mode and is connected with a rotary table, and the screw rod is connected with the surface of the lifting plate in a threaded matching mode.
As a further improvement of the technical scheme, the outer wall of the cleaning barrel is provided with three supporting devices, each supporting device comprises a connecting rod, and the end part of each connecting rod is movably connected with an inclined rod.
As a further improvement of the technical scheme, the connecting rod is movably connected with the end part of the inclined rod through a rotating shaft, and the end part of the inclined rod is hinged with a non-slip mat.
Compared with the prior art, the utility model has the beneficial effects that:
in this centre gripping rotation type cleaning machine for microelectronics manufacturing, put inside the cavity through the raw materials with microelectronics manufacturing, then will place inside board slip inserts the mount, add water to the washing bucket is inside, it rotates to drive the bull stick by motor output shaft, make the mount rotate inside the washing bucket, it carries out whole horizontal disturbance washing to drive the rotatory centrifugal force that produces of raw materials, then drive the rotation of disturbance flabellum by motor output shaft, can be to the inside disturbance that carries out of cavity near the raw materials, the vertical rotation of disturbance flabellum, can carry out vertical disturbance washing raw materials to water, thereby improve the effect of water impact raw materials, the cleaning performance is better.
Drawings
FIG. 1 is a schematic view of the overall structure of embodiment 1 of the present invention;
FIG. 2 is a schematic structural diagram of a rotational perturbation apparatus according to embodiment 1 of the present invention;
fig. 3 is an exploded view of a placement board structure in embodiment 1 of the present invention;
FIG. 4 is an exploded view of a holding plate structure according to embodiment 1 of the present invention;
FIG. 5 is a cut-away view of the fixing frame structure in accordance with embodiment 1 of the present invention;
fig. 6 is a schematic structural view of a supporting device in embodiment 1 of the present invention.
The various reference numbers in the figures mean:
100. a washing barrel; 110. a support device; 111. a connecting rod; 112. an inclined lever; 113. a non-slip mat;
200. a rotational perturbation device; 210. a rotating rod; 211. a motor; 212. a fixed mount; 213. a through hole; 214. a lifting groove; 2141. a screw; 2142. a turntable; 220. placing the plate; 221. a cavity; 222. a connecting frame; 223. disturbing the fan blades; 2230. a motor; 224. a clamping plate; 2240. a clamping spring; 225. an airbag cushion; 226. a lifting plate.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Example 1
Referring to fig. 1 to 6, the present embodiment provides a clamping rotary type cleaning machine for microelectronic manufacturing, including a cleaning barrel 100, a rotary disturbing device 200 is disposed inside the cleaning barrel 100, the rotary disturbing device 200 includes a rotating rod 210, the rotating rod 210 rotates inside the cleaning barrel 100 through an output shaft of a motor 211, and the motor 211 is fixed at the bottom of the cleaning barrel 100.
For more stable support washing barrel 100, washing barrel 100 outer wall is equipped with three strutting arrangement 110, and strutting arrangement 110 includes connecting rod 111, and connecting rod 111 tip swing joint has slope pole 112, can outwards rotate the slope with slope pole 112, forms the triangular support form, and convenient more stable support washing barrel 100 adjusts the contained angle of slope pole 112 and horizontal plane, can change the height that washing barrel 100 supported, and the practicality is stronger.
In order to avoid slipping, the connecting rod 111 is movably connected with the end part of the inclined rod 112 through a rotating shaft, the end part of the inclined rod 112 is hinged with a non-slip pad 113, the inclined rod 112 can be rotated freely and stably, meanwhile, the non-slip pad 113 is contacted with the ground, the friction force between the non-slip pad 113 and the ground is increased, and slipping is avoided.
The outer wall of the rotating rod 210 is provided with a plurality of fixing frames 212, the fixing frames 212 are of hollow structures, the outer wall is provided with a plurality of through holes 213, the fixing frames 212 slide inside to place the plates 220, the front and back surfaces of the plates 220 are provided with cavities 221, raw materials manufactured by micro-electronics can be placed inside the cavities 221, the plates 220 are placed to slide and inserted into the fixing frames 212, water is added into the cleaning barrel 100, the rotating rod 210 is driven by the output shaft of the motor 211 to rotate, the fixing frames 212 are driven to rotate inside the cleaning barrel 100, and the raw materials are driven to rotate to generate centrifugal force to perform overall transverse disturbance cleaning.
In order to avoid cleaning and falling off, the inner wall of the cavity 221 is provided with two symmetrical clamping plates 224, a clamping spring 2240 is fixedly connected between the surface of the clamping plate 224 and the inner wall of the cavity 221, the microelectronic manufacturing raw materials can be placed between the two clamping plates 224 of the cavity 221, the clamping spring 2240 is compressed, the clamping plates 224 can be driven to gather inwards to clamp the fixed raw materials under the elastic force action of the clamping spring 2240, and cleaning and falling off are avoided.
In order to cushion the damage of the rigid impact of clamping to the outer wall of the raw material, the inner surface of the clamping plate 224 is provided with the airbag cushion 225, the airbag cushion 225 is made of hollow elastic rubber, when the clamping plate 224 clamps the raw material, the airbag cushion 225 is compressed, the clamping effect can be improved under the elastic action of the airbag cushion 225, and the rigid impact of the clamping is buffered to damage the outer wall of the raw material.
Place board 220 inner chamber and inlay and be equipped with the linking frame 222, linking frame 222 is inside to have disturbance flabellum 223 through motor 2230 output shaft rotation, and motor 2230 fixes at linking frame 222 inner wall, drives disturbance flabellum 223 by motor 2230 output shaft and rotates, can be to the inside disturbance that carries on of cavity 221 near the raw materials, and the vertical rotation of disturbance flabellum 223 can carry out longitudinal disturbance to water and wash the raw materials to improve the effect of water impact raw materials, the cleaning performance is better.
In order to ensure the structural integrity, the end part of the inner wall of the fixing frame 212 is provided with a lifting groove 214, the outer wall of the placing plate 220 is provided with a lifting plate 226, the lifting plate 226 slides inside the lifting groove 214, when the raw material is placed inside the cavity 221, the placing plate 220 is pulled out from the inside of the fixing frame 212, and the lifting plate 226 slides inside the lifting groove 214 to avoid completely falling off, so that the structural integrity is ensured.
In order to make the placing plate 220 move up and down more conveniently, the inside of the lifting groove 214 is rotated to form a screw 2141, the end of the screw 2141 is rotated to stretch out the inside of the lifting groove 214 and is connected with a turntable 2142, the screw 2141 is in threaded fit with the surface of the lifting plate 226 and can be held by the turntable 2142 to rotate, the screw 2141 is rotated inside the lifting groove 214, and therefore the lifting plate 226 is driven to slide along the threads of the outer wall of the screw 2141, the placing plate 220 can move up and down more conveniently, and the practicability is higher.
When the clamping rotary type cleaning machine for microelectronic manufacturing is used specifically, the turntable 2142 is held to rotate, the screw 2141 is rotated in the lifting groove 214, the lifting plate 226 is driven to slide along the threads on the outer wall of the screw 2141, the placing plate 220 moves up and down, the microelectronic manufacturing raw material is placed between the two clamping plates 224 of the cavity 221, the clamping spring 2240 is compressed, the clamping plates 224 can be driven to gather inwards to clamp and fix the raw material under the action of the elastic force of the clamping spring 2240, then the placing plate 220 is inserted into the fixed frame 212 in a sliding manner, water is added into the cleaning barrel 100, the rotating rod 210 is driven by the output shaft of the motor 211 to rotate, the fixed frame 212 rotates in the cleaning barrel 100, the raw material is driven to rotate to generate centrifugal force to carry out overall transverse disturbance cleaning, then the disturbance fan 223 is driven by the output shaft of the motor 2230 to rotate, the disturbance can be carried out in the cavity 221 close to the raw material, and the fan 223 rotates vertically, the raw materials can be cleaned by longitudinally disturbing water, so that the effect of impacting the raw materials by the water is improved, and the cleaning effect is better.
The foregoing shows and describes the general principles, essential features, and advantages of the utility model. It will be understood by those skilled in the art that the present invention is not limited to the embodiments described above, and the preferred embodiments of the present invention are described in the above embodiments and the description, and are not intended to limit the present invention. The scope of the utility model is defined by the appended claims and equivalents thereof.

Claims (7)

1. A clamping rotary cleaning machine for microelectronic manufacturing, comprising a cleaning barrel (100), characterized in that: wash bucket (100) inside rotatory disturbance device (200) of being equipped with, rotatory disturbance device (200) are including bull stick (210), bull stick (210) are in through motor (211) output shaft rotation inside washing bucket (100), bull stick (210) outer wall is equipped with a plurality of mounts (212), mount (212) are hollow structure, and a plurality of through-holes (213) have been seted up to the outer wall, inside slip of mount (212) has places board (220), place board (220) front and back surface and all seted up cavity (221), it inlays and is equipped with linking frame (222) to place board (220) inner chamber, inside motor (2230) output shaft rotation through linking frame (222) has disturbance flabellum (223).
2. The clamp rotary microelectronic manufacturing cleaning machine of claim 1, wherein: two symmetrical clamping plates (224) are arranged on the inner wall of the cavity (221), and clamping springs (2240) are fixedly connected between the surfaces of the clamping plates (224) and the inner wall of the cavity (221).
3. The clamp rotary microelectronic manufacturing cleaning machine of claim 2, wherein: the interior surface of the clamping plate (224) is provided with an airbag cushion (225), and the airbag cushion (225) is made of hollow elastic rubber materials.
4. The clamp rotary microelectronic manufacturing cleaning machine of claim 1, wherein: the end part of the inner wall of the fixed frame (212) is provided with a lifting groove (214), the outer wall of the placing plate (220) is provided with a lifting plate (226), and the lifting plate (226) slides in the lifting groove (214).
5. The clamp rotary microelectronic manufacturing cleaning machine of claim 4, wherein: the inside screw rod (2141) that rotates of lifting groove (214), screw rod (2141) tip rotates and stretches out inside lifting groove (214), and be connected with carousel (2142), screw rod (2141) with lifter plate (226) surface screw-thread fit connects.
6. The clamp rotary microelectronic manufacturing cleaning machine of claim 1, wherein: the outer wall of the cleaning barrel (100) is provided with three supporting devices (110), each supporting device (110) comprises a connecting rod (111), and the end part of each connecting rod (111) is movably connected with an inclined rod (112).
7. The clamp rotary microelectronic manufacturing cleaning machine of claim 6, wherein: the connecting rod (111) is movably connected with the end part of the inclined rod (112) through a rotating shaft, and the end part of the inclined rod (112) is hinged with an anti-skid pad (113).
CN202122069347.XU 2021-08-31 2021-08-31 Clamping rotary cleaning machine for microelectronic manufacturing Expired - Fee Related CN216026667U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202122069347.XU CN216026667U (en) 2021-08-31 2021-08-31 Clamping rotary cleaning machine for microelectronic manufacturing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202122069347.XU CN216026667U (en) 2021-08-31 2021-08-31 Clamping rotary cleaning machine for microelectronic manufacturing

Publications (1)

Publication Number Publication Date
CN216026667U true CN216026667U (en) 2022-03-15

Family

ID=80622788

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202122069347.XU Expired - Fee Related CN216026667U (en) 2021-08-31 2021-08-31 Clamping rotary cleaning machine for microelectronic manufacturing

Country Status (1)

Country Link
CN (1) CN216026667U (en)

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GR01 Patent grant
GR01 Patent grant
CB03 Change of inventor or designer information

Inventor after: Qiang Xuehua

Inventor after: Gao Feng

Inventor after: Jiang Xinyu

Inventor before: Jiang Xinyu

CB03 Change of inventor or designer information
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20220315