CN215955240U - Wafer ultraviolet processing device - Google Patents

Abstract

The utility model relates to the technical field of wafer processing auxiliary devices, in particular to a wafer ultraviolet processing device which has no light leakage, is provided with a reliable safety lock, can use a common ultraviolet lamp tube or a high-density grid lamp tube and is easy to replace; the drawer type refrigerator comprises a lower-layer box body, an upper-layer box body, an air duct and a drawer tray, wherein the lower-layer box body is hollow, and the upper-layer box body is connected with the lower-layer box body through a plurality of first support columns; the upper box body comprises an outer shell and an inner shell, the inner cavity of the outer shell is communicated with an inlet and an outlet used for the drawer tray to enter and exit, the inner shell is installed inside the outer shell through a plurality of pillars II, a plurality of first cooling fans are installed on the back surface of the outer shell, a non-airtight housing is installed on the outer side of each first cooling fan, a plurality of sliding rails are installed in the inner shell, the drawer tray is connected with the telescopic ends of the sliding rails, the inner shell comprises two side plates and a bottom plate, and a plurality of lamp tube modules are installed on the top surface of the inner shell.

Description

Wafer ultraviolet processing device

Technical Field

The utility model relates to the technical field of wafer processing auxiliary devices, in particular to a wafer ultraviolet processing device.

Background

Wafer refers to a silicon wafer used for making silicon semiconductor circuits, the starting material of which is silicon. And dissolving the high-purity polycrystalline silicon, doping the dissolved high-purity polycrystalline silicon into silicon crystal seed crystals, and slowly pulling out the silicon crystal seed crystals to form cylindrical monocrystalline silicon. After the silicon crystal bar is ground, polished and sliced, a silicon wafer, namely a wafer is formed

The existing wafer ultraviolet treatment device is expensive, the operation process of replacing the lamp tube is difficult, ultraviolet light leaks when the equipment works, the eyes are damaged, and the safety protection is insufficient.

SUMMERY OF THE UTILITY MODEL

In order to solve the technical problems, the utility model provides the wafer ultraviolet treatment device which has no light leakage, is provided with a reliable safety lock, can use a common ultraviolet lamp tube or a high-density grid lamp tube, and is easy to replace.

The wafer ultraviolet treatment device comprises a lower layer box body, an upper layer box body, an air duct and a drawer tray, wherein the lower layer box body is hollow, and the upper layer box body is connected with the lower layer box body through a plurality of first support columns;

the upper box body comprises an outer shell and an inner shell, the inner cavity of the outer shell is communicated with an inlet and an outlet used for the drawer tray to go in and out, the inner shell is installed inside the outer shell through a plurality of pillars II, a plurality of first cooling fans are installed on the back surface of the outer shell, a non-airtight housing is installed on the outer side of each first cooling fan, a plurality of sliding rails are installed in the inner shell, the drawer tray is connected with the telescopic ends of the sliding rails, the inner shell comprises two side plates and a bottom plate, a plurality of lamp tube modules are installed on the top surface of the inner shell, a vent is formed in the top surface of the outer shell, a plurality of second cooling fans are installed at the vent, and an air channel covering the vent is installed on the outer shell.

Further, the safety lock comprises a safety lock body, a sensor and a limiting block, wherein the mounting base body is fixed in position, the sensor and the limiting block are fixed on the mounting base body, the sensor is used for sensing the position of the drawer tray, the limiting block is used for limiting the drawer tray, and the sensor is electrically connected with the power supply of the lamp tube module.

Further, the lamp tube module comprises a lamp group substrate, a lamp holder fixed on the lamp group substrate, and a lamp tube installed on the lamp holder, wherein the lamp group substrate is made of high-finish aluminum alloy.

Furthermore, the drawer tray comprises a drawer base body, a third support column connected with the drawer base body, and a handle arranged at the other end of the third support column, wherein the handle is L-shaped;

the wafer bearing device is arranged on the drawer base body through a plurality of mounting holes.

Furthermore, the bottom of the lower-layer box body is provided with a caster support.

Compared with the prior art, the utility model has the beneficial effects that: the device carries out ultraviolet treatment on the wafer, no light leakage exists in the treatment process, and the opening and closing of the lamp tube can be automatically controlled in the moving process of the drawer tray, so that the use is more convenient; secondly, the lamp tube is assembled in a modularized mode, and replacement is more convenient.

Drawings

FIG. 1 is a schematic structural view of the present invention;

FIG. 2 is a block diagram of the drawer tray after it is opened;

FIG. 3 is a block diagram of the lower housing;

FIG. 4 is an exploded view of the upper cabinet, the second cooling fan, the air duct, and the like;

FIG. 5 is a side view of the drawer tray, the first fan, the second fan, and the lamp module;

FIG. 6 is a schematic rear view structural diagram of the present invention;

FIG. 7 is a bottom view perspective of the drawer tray;

fig. 8 is a structural view of a lamp tube module;

FIG. 9 is a top view of the drawer tray and safety lock;

in the drawings, the reference numbers: 1. a lower layer box body; 2. an upper layer box body; 3. an air duct; 4. a drawer tray; 5. a first support column; 101. an indicator light; 102. a device function switch; 103. a meter; 104. an equipment alarm light; 105. a control circuit board; 106. a third heat radiation fan; 201. an outer shell; 202. an inner shell; 203. a second support column; 204. a first heat radiation fan; 205. a housing; 206. a multi-section slide rail; 6. a lamp tube module; 601. a lamp group substrate; 602. a lamp socket; 603. a lamp tube; 7. a second heat radiation fan; 8. a safety lock; 801. installing a base body; 802. a sensor; 803. a limiting block; 401. a drawer base; 402. a third pillar; 403. a handle; 404. mounting holes; 405. a wafer carrying device; 9. and a caster support.

Detailed Description

The following detailed description of embodiments of the present invention is provided in connection with the accompanying drawings and examples. The following examples are intended to illustrate the utility model but are not intended to limit the scope of the utility model.

As shown in fig. 1 to 9, the wafer ultraviolet treatment apparatus of the present invention includes a lower chamber 1, an upper chamber 2, an air duct 3 and a drawer tray 4, wherein the lower chamber 1 is hollow, and the upper chamber 2 is connected to the lower chamber 1 through a plurality of pillars 5;

the lower-layer box body 1 is provided with an electric control instrument 103 device for controlling the whole set of device, the middle support column I5 is used for connecting the lower-layer box body 1 and the upper-layer box body 2, a gap flows between the lower-layer box body 1 and the upper-layer box body 2, and is convenient for heat dissipation, the lower-layer box body 1 is provided with an indicator light 101 for displaying the state of each lamp tube 603, a plurality of device function switches 102, a plurality of device state (temperature and operation time) instruments 103 and a device alarm light 104, a control circuit board 105 is arranged in the lower-layer box body 1, and a third cooling fan 106 is arranged on the back of the lower-layer box body 1 and is used for discharging heat in the lower-layer box body 1 and ensuring the normal operation of each electrical element;

the upper layer box body 2 comprises an outer layer shell 201 and an inner layer shell 202, the inner part of the outer layer shell is hollow, the front side of the outer layer shell is communicated with an inlet and an outlet for the inlet and the outlet of the drawer tray 4, the inner layer shell 202 is installed in the outer layer shell 201 through a plurality of second support columns 203, a certain distance is reserved between the outer layer shell 201 and the inner layer shell 202 and used for forming an air duct 3 and heat dissipation, a plurality of first cooling fans 204 are installed on the back surface of the outer layer shell, the first cooling fans 204 can be axial flow or cross flow, in the embodiment, axial flow fans are adopted, and an unsealed shell 205 is installed on the outer side of the first cooling fans 204 and used for preventing ultraviolet light leaked from an opening of the first cooling fans 204 from being directly radiated;

a plurality of sliding rails 206 are arranged in the inner shell 202, the drawer tray 4 is connected with the telescopic ends of the sliding rails 206, the inner shell 202 comprises two side plates and a bottom plate, the rear side of the inner shell 202 is used for mounting electronic devices and forming an air duct 3 for heat dissipation, a plurality of lamp tube modules 6 are arranged on the top surface of the inner shell 202, a vent is arranged on the top surface of the outer shell 201, a plurality of second cooling fans 7 are arranged at the vent, the air duct 3 covering the vent is arranged on the outer shell 201, the set second cooling fans 7 draw air outwards and upwards to enable hot air to flow out along the air duct 3, the air duct 3 can shield ultraviolet light from being seen by an operator and can form a certain chimney effect, normal temperature air outside the device is filled into the upper box 2 by the first cooling fan 204 and is heated by heat dissipated by the lamp tubes 603 in the upper box 2 to become hot air, and then is pumped out by the second cooling fans 7, the hot air is sent into the air channel 3, the density of the hot air is small, the hot air naturally rises along the vertical channel, the upper layer box body 2 has a tendency of forming negative pressure, and the extraction of the air with lower peripheral temperature by the first cooling fan 204 is enhanced.

As a preferable scheme of the above embodiment, the automatic drawer opening and closing device further comprises a safety lock 8, the safety lock 8 comprises a mounting base 801 with a fixed position, a sensor 802 and a limiting block 803 which are fixed on the mounting base 801, the sensor 802 is used for sensing the position of the drawer tray 4, the limiting block 803 is used for limiting the drawer tray 4, the sensor 802 is electrically connected with a power supply of the lamp tube module 6, the limiting block 803 limits the drawer tray 4, and when the drawer tray 4 is drawn out, the drawer tray 4 is separated from the limiting block 803 by a certain distance, and the sensor 802 controls the lamp tube module 6 to be closed.

As a preferable solution of the above embodiment, the lamp module 6 includes a lamp group substrate 601, a lamp holder 602 fixed on the lamp group substrate 601, and a lamp 603 installed on the lamp holder 602, the lamp group substrate 601 is made of high-finish aluminum alloy, and can reflect ultraviolet light with high efficiency and have good heat dissipation efficiency, and an aluminum foil can be fixed on the lamp group substrate 601 to reflect ultraviolet light, so as to enhance the illumination of the wafer.

As a preferable scheme of the above embodiment, the drawer tray 4 includes a drawer base 401, a pillar iii 402 connected to the drawer base 401, and a handle 403 installed at the other end of the pillar iii 402, wherein the handle 403 is L-shaped, and when the drawer tray 4 completely enters the inner shell 202, the handle 403 blocks the entrance and the exit, so that no light is leaked;

the wafer bearing device 405 is installed on the drawer base 401 through the installation holes 404, and the wafer is placed on the wafer bearing device 405, so that the wafer can enter and exit the upper-layer box body 2 to be subjected to ultraviolet treatment, wherein the wafer bearing device 405 is the prior art, is not illustrated, and can be selectively installed as required.

As a preferable scheme of the above embodiment, the bottom of the lower casing 1 is provided with a caster support 9 for facilitating the transportation of the device.

In the description of the present invention, it should be noted that, unless otherwise explicitly specified or limited, the terms "mounted" and "connected" are to be interpreted broadly, e.g., as being either fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art.

The above description is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, several modifications and variations can be made without departing from the technical principle of the present invention, and these modifications and variations should also be regarded as the protection scope of the present invention.

Claims (5)

1. The wafer ultraviolet treatment device is characterized by comprising a lower-layer box body (1), an upper-layer box body (2), an air duct (3) and a drawer tray (4), wherein the lower-layer box body (1) is hollow, and the upper-layer box body (2) is connected with the lower-layer box body (1) through a plurality of first supports (5);

the upper layer box body (2) comprises an outer layer shell (201) and an inner layer shell (202), the inner part of the outer layer shell is hollow, the front side of the outer layer shell is communicated with an entrance used for the drawer tray (4) to go in and out, the inner layer shell (202) is arranged in the outer layer shell (201) through a plurality of second support columns (203), a plurality of first cooling fans (204) are arranged on the back surface of the outer layer shell, a non-closed housing (205) is arranged on the outer side of the first cooling fans (204), a plurality of sliding rails (206) are arranged in the inner layer shell (202), the drawer tray (4) is connected with the telescopic end of the multi-section sliding rail (206), the inner shell (202) comprises two side plates and a bottom plate, a plurality of lamp tube modules (6) are installed on the top surface of the inner shell (202), a ventilation opening is formed in the top surface of the outer shell (201), a plurality of second cooling fans (7) are installed at the ventilation opening, and an air duct (3) covering the air vent is arranged on the outer shell (201).

2. The wafer ultraviolet processing device as claimed in claim 1, further comprising a safety lock (8), wherein the safety lock (8) comprises a fixed-position mounting base body (801), a sensor (802) and a limiting block (803) which are fixed on the mounting base body (801), the sensor (802) is used for sensing the position of the drawer tray (4), the limiting block (803) is used for limiting the drawer tray (4), and the sensor (802) is electrically connected with the power supply of the lamp tube module (6).

3. The wafer UV processing apparatus according to claim 2, wherein the lamp module (6) comprises a lamp set substrate (601), a lamp holder (602) fixed on the lamp set substrate (601), and a lamp (603) mounted on the lamp holder (602), and the lamp set substrate (601) is made of high-finish aluminum alloy.

4. The wafer ultraviolet processing device as claimed in claim 3, wherein the drawer tray (4) comprises a drawer base (401), a third pillar (402) connected with the drawer base (401), and a handle (403) installed at the other end of the third pillar (402), wherein the handle (403) is L-shaped;

the wafer bearing device (405) is arranged on the drawer base body (401) through a plurality of mounting holes (404).

5. The wafer UV processing device according to claim 4, characterized in that the bottom of the lower box (1) is provided with a caster support (9).

Images