CN215844663U - Cavity plasma cleaning machine - Google Patents
Cavity plasma cleaning machine Download PDFInfo
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- CN215844663U CN215844663U CN202122092639.5U CN202122092639U CN215844663U CN 215844663 U CN215844663 U CN 215844663U CN 202122092639 U CN202122092639 U CN 202122092639U CN 215844663 U CN215844663 U CN 215844663U
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Abstract
The utility model discloses a cavity plasma cleaning machine, wherein the cavity plasma cleaning machine comprises a cleaning box, an air inlet device, a vacuumizing device and a radio frequency power supply; the cleaning box comprises a box body and a box cover hermetically connected with the box body, the box body is provided with a feed inlet, the box cover is arranged at the feed inlet and matched with the box body to form a cleaning cavity, a frame is arranged in the cleaning cavity and used for bearing materials, an air inlet pipe is connected in the box body, and the air inlet pipe is provided with an air outlet communicated with the cleaning cavity; the gas inlet device is arranged outside the cleaning box, is communicated with the gas inlet pipe and is used for conveying process gas into the cleaning cavity; the vacuumizing device is arranged outside the cleaning box and is communicated with the cleaning cavity; the radio frequency power supply is arranged outside the cleaning box and is electrically connected with the frame in the cleaning cavity through an electrode. The technical scheme of the utility model simplifies the structure of the air inlet pipeline, ensures the reliability of sealing and improves the cleaning effect.
Description
Technical Field
The utility model relates to the technical field of plasma cleaning machines, in particular to a cavity plasma cleaning machine.
Background
In the conventional cavity plasma cleaning machine, an air inlet pipe is arranged on a box cover, a plurality of air inlet holes facing the interior of a box body are formed in the air inlet pipe, and the air inlet pipe rotates along with the box cover, so that a hose communicated with the air inlet pipe is required to be arranged on the box cover, and one end of the hose is connected with an air inlet device; or the connecting pipe is arranged on the box body and connected with the air inlet device, the joint connected with the air inlet pipe is arranged on the box cover, when the box cover is closed, the joint is communicated with the connecting pipe, and due to the design, the sealing structure of the joint and the connecting pipe is complex, and the sealing effect of the joint and the connecting pipe is difficult to ensure because the box cover needs frequent opening and closing.
SUMMERY OF THE UTILITY MODEL
The utility model mainly aims to provide a cavity plasma cleaning machine, which aims to simplify the structure of an air inlet pipeline, ensure the reliability of sealing and improve the cleaning effect.
In order to achieve the above object, the present invention provides a chamber plasma cleaning machine, comprising:
the cleaning box comprises a box body and a box cover hermetically connected with the box body, the box body is provided with a feed inlet, the box cover is arranged at the feed inlet and matched with the box body to form a cleaning cavity, a frame is arranged in the cleaning cavity and used for bearing materials, an air inlet pipe is connected in the box body, and the air inlet pipe is provided with an air outlet communicated with the cleaning cavity;
the air inlet device is arranged outside the cleaning box, is communicated with the air inlet pipe and is used for conveying process gas into the cleaning cavity;
the vacuumizing device is arranged outside the cleaning box and is communicated with the cleaning cavity; and
and the radio frequency power supply is arranged outside the cleaning box and is electrically connected with the frame in the cleaning cavity through an electrode.
Optionally, the inner side wall of the box body is provided with at least one air inlet, and the air inlet pipe is communicated with the air inlet through a joint.
Optionally, the air inlet pipe is arranged around the inner side wall of the box body.
Optionally, the box still is equipped with the step groove, the step groove encircles the feed inlet setting and with wash the chamber intercommunication, the intake pipe is fixed in through the fastener installation in the step groove.
Optionally, the air inlet hole is arranged on a groove wall of the step groove.
Optionally, the frame has a plurality of accommodating cavities for the material to bear, and the accommodating cavities are arranged in a matrix.
Optionally, the frame includes a plurality of bearing plates that set up relatively, and connect in a plurality of baffles between the bearing plate, a plurality of baffles with a plurality of bearing plates enclose and close and form a plurality of holding chambeies, the bearing plate with the baffle is equipped with the confession the via hole that the process gas passes through.
Optionally, the vacuum pumping device comprises a primary pump and a secondary pump communicated with the primary pump, and the secondary pump is communicated with the cleaning cavity.
Optionally, one side of the box body, which is away from the feed inlet, is provided with an air exhaust hole, the air exhaust hole is communicated with the secondary pump through a pipeline, a guide plate is further connected in the box body, and the guide plate and the air exhaust hole are arranged oppositely.
Optionally, a connecting hole is formed in one side, away from the feeding hole, of the box body, and an electrode of the radio frequency power supply penetrates through the connecting hole and is electrically connected with the frame.
According to the cavity plasma cleaning machine in the technical scheme, the air inlet pipe is connected into the box body, and the process gas is conveyed into the cleaning cavity through the air outlet hole in the air inlet pipe, so that compared with the existing cavity plasma cleaning machine in which the air inlet pipe is arranged on the box cover, the air inlet pipe is fixed in the box body, a hose is omitted from being connected with the air inlet device, the opening and closing of the box cover can be facilitated, and meanwhile, the air leakage caused by the damage of the hose is avoided; and compared with the existing plasma cleaning machine, the connector connected with the air inlet pipe is arranged on the box cover, the sealing structure between the inlet connector and the box body is not required to be considered, the sealing structure design is simplified, the sealing reliability is ensured, and the cleaning effect of the cavity plasma cleaning machine is further ensured.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the structures shown in the drawings without creative efforts.
FIG. 1 is a schematic structural view of a chamber plasma cleaning machine according to an embodiment of the present invention;
FIG. 2 is a front view of the plasma cleaner of FIG. 1;
FIG. 3 is a schematic view of a cleaning tank of the plasma cleaning apparatus of FIG. 1;
FIG. 4 is a schematic view of the cleaning tank of FIG. 3 at another angle;
FIG. 5 is a schematic structural view of a tank body of the cleaning tank of FIG. 3;
FIG. 6 is a front view of the wash tank of FIG. 5;
FIG. 7 is a cross-sectional view of the cleaning tank of FIG. 6 taken along section A-A.
The reference numbers illustrate:
the implementation, functional features and advantages of the objects of the present invention will be further explained with reference to the accompanying drawings.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
In the present invention, unless otherwise expressly stated or limited, the terms "connected," "secured," and the like are to be construed broadly, and for example, "secured" may be a fixed connection, a removable connection, or an integral part; can be mechanically or electrically connected; they may be directly connected or indirectly connected through intervening media, or they may be connected internally or in any other suitable relationship, unless expressly stated otherwise. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.
In addition, the descriptions related to "first", "second", etc. in the present invention are only for descriptive purposes and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one such feature. In addition, technical solutions between various embodiments may be combined with each other, but must be realized by a person skilled in the art, and when the technical solutions are contradictory or cannot be realized, such a combination should not be considered to exist, and is not within the protection scope of the present invention.
The utility model provides a cavity plasma cleaning machine.
Specifically, the plasma cleaning machine utilizes plasma to achieve the effect that cannot be achieved by the conventional cleaning method, and referring to fig. 1 to 7, in the embodiment of the present invention, the chamber plasma cleaning machine 10 includes a cleaning box 100, an air inlet device, a vacuum pumping device 200, and a radio frequency power supply; the cleaning box 100 comprises a box body 110 and a box cover 120 hermetically connected with the box body 110, wherein the box body 110 is provided with a feed inlet 111, the box cover 120 is covered on the feed inlet 111 and is matched with the box body 110 to form a cleaning cavity 112, a frame 130 is arranged in the cleaning cavity 112 and is used for bearing materials, an air inlet pipe 140 is connected in the box body 110, and the air inlet pipe 140 is provided with an air outlet hole 141 communicated with the cleaning cavity 112; the gas inlet device is arranged outside the cleaning box 100 and communicated with the gas inlet pipe 140, and is used for conveying process gas into the cleaning cavity 112; the vacuum pumping device 200 is arranged outside the cleaning box 100 and is communicated with the cleaning cavity 112; the rf power source is disposed outside the cleaning chamber 100 and electrically connected to the frame 130 in the cleaning chamber 112 via electrodes.
Specifically, the cleaning process of the chamber plasma cleaning machine 10 is as follows: the vacuum pumping device 200 pumps air into the cleaning cavity 112 to form a vacuum suitable for generating plasma in the cleaning cavity 112, the air inlet device delivers process gas into the cleaning cavity 112 through the air inlet pipe 140, the radio frequency power supply supplies power to the frame 130 in the cleaning cavity 112 through the electrodes, so that the process gas in the cleaning cavity 112 generates plasma, and the plasma bombards the material in the cleaning cavity 112 to make the pollutants on the material separate from the surface of the material.
Compared with the prior art that the air inlet pipe 140 is arranged in the box body 110 and the air inlet pipe 140 is arranged on the box cover 120 and the hose connected with the air inlet device is connected to the box cover 120, the air inlet pipe 140 can be conveniently opened and closed by the scheme of the application, the hose is prevented from being damaged due to frequent opening and closing of the box cover 120, air leakage is prevented, and the cleaning effect of the cavity plasma cleaning machine 10 is ensured; compared with the prior art in which the air inlet pipe 140 is arranged on the case cover 120 and the joint 150 is arranged on the case cover 120, the scheme of the application can avoid the complex sealing structure design of the joint 150 and the connecting pipe, ensure the sealing reliability and further ensure the cleaning effect.
It will be appreciated that the cover 120 is movably connected to the housing 110, since the cover 120 needs to be opened to access the material. The cover 120 may be rotatably connected to the case 110, and the cover 120 may be rotatably switched between an open state and a closed state, for example, the cover 120 is hinged to the case 110 through a hinge; the cover 120 may also be movable back and forth relative to the case 110, and the cover 120 may be movable between an open state and a closed state, for example, a sliding slot for the cover 120 to slide is provided in the case 110; of course, the cover 120 and the housing 110 may be connected by screws. Referring to fig. 3, in the present embodiment, in order to facilitate the removal of the material from the washing chamber 112 by opening the cover 120, the cover 120 is hinged to the case 110, and the cover 120 is rotatable about a hinge axis with respect to the case 110.
In order to realize sealing, a sealing ring is arranged between the box cover 120 and the box body 110, the sealing ring is arranged around the periphery of the feeding hole 111, a locking member is arranged on the box cover 120, and when the box cover 120 is in a closed state, the sealing ring is tightly attached to the box cover 120 and the box body 110 under the compression of the locking member, so that the sealing performance of the cleaning cavity 112 is ensured. The sealing ring may be disposed on the box body 110 or on the box cover 120, and the box cover 120 or the box body 110 is provided with a mounting groove for mounting the sealing ring. Wherein, the shape of the feed inlet 111 can be round, square, etc.
The air inlet device includes an air storage tank and an inflator pump communicated with the air storage tank, and the inflator pump is communicated with the air inlet pipe 140 through a pipeline and is used for conveying the process gas in the air storage tank to the cleaning cavity 112. In the present embodiment, the process gas is argon.
According to the cavity plasma cleaning machine 10, the air inlet pipe 140 is connected into the box body 110, and the process gas is conveyed into the cleaning cavity 112 through the air outlet hole 141 in the air inlet pipe 140, compared with the existing cavity plasma cleaning machine 10 that the air inlet pipe 140 is arranged in the box cover 120, the air inlet pipe 140 is fixed in the box body 110, so that a hose is omitted to be connected with an air inlet device, the opening and closing of the box cover 120 can be facilitated, and meanwhile, air leakage caused by damage of the hose is avoided; in addition, compared with the existing plasma cleaning machine, the connector 150 connected with the air inlet pipe 140 is arranged on the box cover 120, the sealing structure between the inlet connector 150 and the box body 110 is not required to be considered, the design of the sealing structure is simplified, the sealing reliability is ensured, and the cleaning effect of the cavity plasma cleaning machine 10 is further ensured.
Further, in an embodiment, the sidewall of the box body 110 is provided with at least one air inlet hole 113, and the air inlet pipe 140 is communicated with the air inlet hole 113 through a joint 150. Wherein, the air inlet 113 runs through the side wall of the box body 110, one side of the air inlet 113 communicated with the inner wall of the box body 110 is communicated with the air inlet pipe 140 through the joint 150, and one side of the air inlet 113 communicated with the outer wall of the box body 110 is communicated with the air inlet device through a pipeline.
Further, referring to fig. 5 and 6, in an embodiment, the intake duct 140 is disposed around an inner sidewall of the case 110. By disposing the inlet pipe 140 around the inner sidewall of the chamber body 110, the process gas overflowing from the outlet hole 141 of the inlet pipe 140 can be uniformly diffused to various positions of the cleaning chamber 112. Further, in an embodiment, the number of the air inlet pipes 140 may be multiple sets, and the multiple sets of air inlet pipes 140 are arranged at intervals along the depth direction of the cleaning cavity 112.
Further, referring to fig. 5, in an embodiment, the box body 110 is further provided with a stepped groove 114, the stepped groove 114 is disposed around the feeding hole 111 and is communicated with the cleaning chamber 112, and the air inlet pipe 140 is fixedly installed in the stepped groove 114 through a fastening member.
As shown in fig. 5, the stepped groove 114 for installing and fixing the air inlet pipe 140 is arranged at the feed port 111, so that the air inlet pipe 140 is prevented from occupying the space of the cleaning chamber 112, the volume of the frame 130 can be increased under the condition that the volume of the cleaning chamber 112 is not changed, and more materials can be loaded. Thus, in the same volume of the cleaning chamber 112, the present embodiment can clean more materials, thereby improving the cleaning efficiency and the cleaning amount.
It will be appreciated that, since the air inlet pipe 140 is installed in the stepped groove 114, in order to further reduce the space occupation of the washing chamber 112, in an embodiment, the air inlet hole 113 is provided in a groove wall of the stepped groove 114. Thus, the air inlet pipe 140 can be directly connected with the air inlet hole 113 in the installation groove without additionally arranging a connecting pipe extending into the cleaning cavity 112, thereby avoiding occupying the space of the cleaning cavity 112.
Specifically, in the present embodiment, referring to fig. 3 and 5, a mounting plate 115 is provided at one end of the case body 110 having the feed port 111, the cover 120 is rotatably mounted on the mounting plate 115 by a hinge, and a stepped groove 114 is formed at a connection of the mounting plate 115 and the case body 110.
Referring to fig. 5 and 6, in an embodiment, the frame 130 has a plurality of accommodating cavities 133 for carrying the material, and the accommodating cavities 133 are arranged in a matrix. As can be appreciated, the frame 130 is divided into a plurality of accommodating cavities 133, which facilitates stacking and placing of materials and facilitates taking and placing of operators.
The frame 130 includes a plurality of opposite supporting plates 131 and a plurality of partition plates 132 connected between the supporting plates 131, the plurality of partition plates 132 and the plurality of supporting plates 131 enclose to form the plurality of receiving cavities 133, and the supporting plates 131 and the partition plates 132 are provided with air holes for the process gas to pass through.
Further, in one embodiment, the vacuum apparatus 200 includes a primary pump 210 and a secondary pump 220 in communication with the primary pump 210, the secondary pump 220 being in communication with the wash chamber 112. Specifically, in the present embodiment, the primary pump 210 is a roots pump and the secondary pump 220 is a double-vane pump. Through the combination of the primary pump 210 and the secondary pump 220, the pressure in the cleaning cavity 112 can be constant, the condition of generating plasma in the cleaning cavity 112 is ensured, and the cleaning effect is ensured.
Further, referring to fig. 7, in an embodiment, a suction hole 116 is formed in a surface of the box body 110 away from the feed port 111, the suction hole 116 is communicated with the secondary pump 220 through a pipe, a guide plate 160 is further connected in the box body 110, and the guide plate 160 is arranged opposite to the suction hole 116.
As shown in fig. 7, by connecting the guide plate 160 disposed opposite to the suction hole 116 in the tank 110, it is possible to prevent the contaminants separated from the surface of the material from being sucked into the primary pump 210 and the secondary pump 220 and to prevent damage to the primary pump 210 and the secondary pump 220. Wherein the area of the baffle 160 is greater than or equal to the area of the pumping holes 116. The shape of the baffle 160 may be various, such as square, polygon, circle, etc., and the shape of the baffle 160 is not limited herein.
It can be understood that a connecting hole is formed on a side of the box body 110 away from the feeding hole 111, and an electrode of the rf power supply passes through the connecting hole to be electrically connected to the frame 130.
The above description is only an alternative embodiment of the present invention, and not intended to limit the scope of the present invention, and all modifications and equivalents of the present invention, which are made by the contents of the present specification and the accompanying drawings, or directly/indirectly applied to other related technical fields, are included in the scope of the present invention.
Claims (10)
1. A chamber plasma cleaning machine, comprising:
the cleaning box comprises a box body and a box cover hermetically connected with the box body, the box body is provided with a feed inlet, the box cover is arranged at the feed inlet and matched with the box body to form a cleaning cavity, a frame is arranged in the cleaning cavity and used for bearing materials, an air inlet pipe is connected in the box body, and the air inlet pipe is provided with an air outlet communicated with the cleaning cavity;
the air inlet device is arranged outside the cleaning box, is communicated with the air inlet pipe and is used for conveying process gas into the cleaning cavity;
the vacuumizing device is arranged outside the cleaning box and is communicated with the cleaning cavity; and
and the radio frequency power supply is arranged outside the cleaning box and is electrically connected with the frame in the cleaning cavity through an electrode.
2. The chamber plasma cleaning machine as claimed in claim 1, wherein the inner sidewall of the cabinet is provided with at least one air inlet hole, and the air inlet pipe is communicated with the air inlet hole through a joint.
3. The chamber plasma cleaner of claim 2, wherein the inlet duct is disposed around an inner sidewall of the chamber body.
4. The chamber plasma cleaning machine as recited in claim 3, wherein said cabinet further has a stepped groove disposed around said feed port and communicating with said cleaning chamber, said intake pipe being mounted and fixed in said stepped groove by a fastening member.
5. The chamber plasma cleaning machine as claimed in claim 4, wherein the air inlet hole is formed in a wall of the stepped groove.
6. The chamber plasma cleaning machine as claimed in claim 5, wherein said frame has a plurality of receiving chambers for said material to be carried, said plurality of receiving chambers being arranged in a matrix arrangement.
7. The plasma cleaning apparatus according to claim 6, wherein the frame comprises a plurality of opposite carrier plates and a plurality of partition plates connected between the carrier plates, the plurality of partition plates and the plurality of carrier plates enclosing to form the plurality of receiving cavities, the carrier plates and the partition plates having through holes for the process gas to pass through.
8. The chamber plasma cleaning machine as recited in claim 7, wherein said vacuum pumping means comprises a primary pump and a secondary pump in communication with said primary pump, said secondary pump being in communication with said cleaning chamber.
9. The plasma chamber cleaning machine according to claim 8, wherein a suction hole is formed in a surface of the chamber body facing away from the inlet, the suction hole is communicated with the secondary pump through a pipe, and a guide plate is further connected to the chamber body and is disposed opposite to the suction hole.
10. The chamber plasma cleaning machine of claim 9, wherein a connecting hole is formed in a side of the box body facing away from the feeding hole, and an electrode of the radio frequency power supply passes through the connecting hole to be electrically connected with the frame.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202122092639.5U CN215844663U (en) | 2021-08-31 | 2021-08-31 | Cavity plasma cleaning machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202122092639.5U CN215844663U (en) | 2021-08-31 | 2021-08-31 | Cavity plasma cleaning machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN215844663U true CN215844663U (en) | 2022-02-18 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202122092639.5U Active CN215844663U (en) | 2021-08-31 | 2021-08-31 | Cavity plasma cleaning machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN215844663U (en) |
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2021
- 2021-08-31 CN CN202122092639.5U patent/CN215844663U/en active Active
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