CN215457715U - Clean base station - Google Patents

Clean base station Download PDF

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Publication number
CN215457715U
CN215457715U CN202120591679.1U CN202120591679U CN215457715U CN 215457715 U CN215457715 U CN 215457715U CN 202120591679 U CN202120591679 U CN 202120591679U CN 215457715 U CN215457715 U CN 215457715U
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China
Prior art keywords
cleaning
base
clean
groove
base station
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CN202120591679.1U
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Chinese (zh)
Inventor
郑连荣
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Shenzhen Silver Star Intelligent Group Co Ltd
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Shenzhen Silver Star Intelligent Technology Co Ltd
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Priority to CN202120591679.1U priority Critical patent/CN215457715U/en
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Abstract

The application provides a clean basic station, including the base with be used for supplying to drag the clean groove of piece of wiping, the base is arranged in to clean groove, the base has the entry that is used for supplying cleaning machines people to get into clean groove, clean groove installs in the base, is equipped with location structure in the base, is equipped with on the clean groove to be used for with the adaptation structure of this clean groove of location structure cooperation location, location structure and adaptation structure can dismantle continuously. This application cleaning base station, through set up location structure in the base, and set up adaptation structure on clean groove to can dismantle location structure and adaptation structure and link to each other, with the dismouting of convenient clean groove, and when clean groove installation, be connected the location through adaptation structure and location structure's cooperation, with the mounted position of confirming clean groove, thereby need not the clean trench position of sensor response, simplify the structure, reduce cost.

Description

Clean base station
Technical Field
The application belongs to the technical field of cleaning equipment, and more specifically relates to a clean basic station.
Background
At present, for cleaning the mopping piece on the cleaning robot, the cleaning robot is generally placed in a pool for manual cleaning. Especially when mopping, some users often clean the mopping piece for many times, the cleaning is inconvenient, and water is easy to splash during cleaning. In view of this, a cleaning base station, that is, a base station with a cleaning function, is proposed in the related art, in which a cleaning tank is provided in a base station of a cleaning robot, and a mop of the cleaning robot is cleaned in the cleaning tank. In the related art, it is general to provide a sensor in a base station to detect whether a cleaning tank is installed in place. However, with the sensor, a waterproof structure is required to avoid damage by the cleaning liquid, resulting in a complicated structure and high cost.
SUMMERY OF THE UTILITY MODEL
An object of the embodiment of this application is to provide a clean basic station to the clean basic station who exists among the solution prior art needs uses the clean groove mounted position of sensor response, leads to the structure complicacy, problem with high costs.
In order to achieve the above purpose, the embodiment of the present application adopts the following technical solutions: the cleaning base station comprises a base and a cleaning groove for cleaning a mopping piece, wherein the cleaning groove is arranged in the base, the base is provided with an inlet for a cleaning robot to enter the cleaning groove, the cleaning groove is arranged in the base, a positioning structure is arranged in the base, an adaptive structure used for being matched with the positioning structure to position the cleaning groove is arranged on the cleaning groove, and the positioning structure is detachably connected with the adaptive structure.
In an alternative embodiment, the positioning structure comprises a guide rail arranged in the base obliquely to the horizontal direction, and the adapting structure comprises a sliding plate adapted to be supported on the guide rail, the sliding plate being arranged on the cleaning tank.
In an alternative embodiment, opposite side walls of the cleaning slot are bent outwardly to form the sled.
In an optional embodiment, a first magnetic part is arranged on the guide rail, and a first magnetic part matched with the first magnetic part for magnetic attraction positioning is arranged on the sliding plate.
In an optional embodiment, the positioning structure comprises a pressing element, the adapting structure comprises a matching element for matching with the pressing element to press the cleaning groove, the matching element is arranged on the cleaning groove, and the pressing element is detachably connected with the matching element.
In an optional embodiment, the pressing component is a second magnetic component, and the mating component is a second magnetic component which is matched with the second magnetic component for magnetic attraction positioning;
and/or the pressing part is a buckling part, and the matching part is a buckle matched and clamped with the buckling part for positioning;
and/or the pressing piece is a pop-up self-locker, and the fitting piece is a joint matched and locked with the pop-up self-locker.
In an optional embodiment, the cleaning base station further comprises a buffer member for buffering the impact force generated when the cleaning groove is installed in the base; the buffer member is mounted on the cleaning groove, or/and the buffer member is mounted in the base.
In an alternative embodiment, an opening suitable for being taken out of the cleaning groove is formed on one side of the base, which faces away from the inlet, or/and one side of the base, which is adjacent to the inlet.
In an optional embodiment, the base further comprises a sewage tank, the sewage tank is arranged on the outer side of the base and is connected with the cleaning groove, and the cleaning base station further comprises a buffer piece used for buffering the impact force generated when the cleaning groove is installed in the base; the buffer member is mounted on the sewage tank.
In an alternative embodiment, the adapting structure comprises a stop plate protruding upwards from one side of the cleaning groove adjacent to the opening, and the positioning structure comprises a stepped groove opened on the base to be matched with and accommodate the stop plate.
The beneficial effect of the clean basic station that this application embodiment provided lies in: compared with the prior art, this application cleaning base station is through setting up location structure in the base, and sets up adaptation structure on clean groove to can dismantle location structure and adaptation structure and link to each other, with the dismouting of convenient clean groove, and when clean groove installation, be connected the location through adaptation structure and location structure's cooperation, with the mounted position of confirming clean groove, thereby need not the clean trench position of sensor response, simplify the structure, reduce cost.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings needed to be used in the embodiments or exemplary technical descriptions will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present application, and it is obvious for those skilled in the art to obtain other drawings without creative efforts.
Fig. 1 is a schematic side view of a cleaning robot in a cleaning base station according to an embodiment of the present disclosure;
fig. 2 is a perspective view of a base of a cleaning base station according to an embodiment of the present disclosure;
FIG. 3 is a schematic side view of a base of a cleaning base station according to an embodiment of the present disclosure;
fig. 4 is a schematic top view of a cleaning tank of a cleaning base station according to an embodiment of the present disclosure;
FIG. 5 is a schematic side view of a cleaning base station according to another embodiment of the present disclosure;
FIG. 6 is a schematic side view of a cleaning base station according to another embodiment of the present disclosure;
FIG. 7 is a schematic side view of a cleaning base station according to another embodiment of the present disclosure;
fig. 8 is a schematic rear view of a cleaning tank of a cleaning base station according to another embodiment of the present disclosure;
fig. 9 is a schematic side view of a cleaning base station according to another embodiment of the present disclosure;
FIG. 10 is a schematic side view of a cleaning base station according to another embodiment of the present disclosure;
fig. 11 is a schematic side view of a cleaning base station according to another embodiment of the present disclosure;
fig. 12 is a schematic side view of a cleaning base station according to another embodiment of the present disclosure;
fig. 13 is a schematic side view of a cleaning base station according to another embodiment of the present application.
Wherein, in the drawings, the reference numerals are mainly as follows:
100-a clean base station;
10-a base; 11-an inlet; 12-an opening; 13-a positioning structure; 131-a guide rail; 132-a first magnetic element; 133-a step groove; 134-a press fit; 1341-fasteners; 1342-a second magnetic attachment; 1343-pop-up auto-lock; 14-a cleaning member; 15-a purified water tank;
20-cleaning the tank; 21-a support plate; 22-an adaptation structure; 221-a slide plate; 222-a first magnetic member; 223-a stopper plate; 224-a mating member; 2241-buckling; 2242-a second magnetic member; 2243-a joint; 23-temporary storage box; 24-a sewage tank; 25-a buffer;
900-cleaning robot; 91-a mop.
Detailed Description
In order to make the technical problems, technical solutions and advantageous effects to be solved by the present application clearer, the present application is further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present application and are not intended to limit the present application.
It will be understood that when an element is referred to as being "secured to" or "disposed on" another element, it can be directly on the other element or be indirectly on the other element. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or be indirectly connected to the other element.
Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the present application, "a plurality" means two or more unless specifically limited otherwise. The meaning of "a number" is one or more unless specifically limited otherwise.
In the description of the present application, it is to be understood that the terms "upper", "lower", "vertical", "horizontal", "top", "bottom", "inner", "outer", and the like, indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, are only for convenience in describing the present application and simplifying the description, and do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be taken as limiting the present application.
In the description of the present application, it is to be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; either directly or indirectly through intervening media, either internally or in any other relationship. The specific meaning of the above terms in the present application can be understood by those of ordinary skill in the art as appropriate.
Reference throughout this specification to "one embodiment," "some embodiments," or "an embodiment" means that a particular feature, structure, or characteristic described in connection with the embodiment is included in one or more embodiments of the present application. Thus, appearances of the phrases "in one embodiment," "in some embodiments," "in other embodiments," or the like, in various places throughout this specification are not necessarily all referring to the same embodiment, but rather "one or more but not all embodiments" unless specifically stated otherwise. Furthermore, the particular features, structures, or characteristics may be combined in any suitable manner in one or more embodiments.
Referring to fig. 1 to 4, fig. 1 is a schematic side view of a cleaning base station 100 provided in this embodiment, and illustrates an internal structure of a base 10, and further illustrates a state when a cleaning robot 900 is in a cleaning slot 20 in the base 10 for cleaning. Fig. 2 is a perspective view of the base 10 of the cleaning base station 100 according to the present embodiment. Fig. 3 is a schematic side view of the base station provided in this embodiment, and shows the internal structure of the base 10. Fig. 4 is a schematic top view of the cleaning tank 20 of the cleaning base station 100 according to this embodiment.
Referring to fig. 1 to 3, a clean base station 100 provided in the present application will now be described. The cleaning base station 100 comprises a base 10 and a cleaning tank 20, wherein the cleaning tank 20 is used for cleaning the mopping piece 91, namely, the mopping piece 91 is placed in the cleaning tank 20 to clean the mopping piece 91. The cleaning groove 20 is disposed in the base 10, an inlet 11 is opened at one side of the lower end of the base 10, and the cleaning robot 900 can enter the base 10 from the inlet 11 and enter the cleaning groove 20, so that the wiping member 91 of the cleaning robot 900 can be cleaned in the cleaning groove 20, the cleaning is convenient, and the splashing of water is prevented. Clean groove 20 cartridge is in installing in base 10, be equipped with location structure 13 in the base 10, be equipped with adaptation structure 22 on the clean groove 20, location structure 13 can dismantle with adaptation structure 22 and link to each other, adaptation structure 22 is used for fixing a position this clean groove 20 with location structure 13 cooperation, so that when the clean groove 20 of installation, can fix a position the mounted position of clean groove 20, in order to guarantee that clean groove 20 installs the assigned position, thereby need not the clean groove 20 position of sensor response, the simplified structure, and cost is reduced.
The utility model provides a clean basic station 100, compared with the prior art, the clean basic station 100 of this application, through set up location structure 13 in base 10, and set up adaptation structure 22 on clean groove 20, and can dismantle location structure 13 and adaptation structure 22 and link to each other, in order to make things convenient for the dismouting of clean groove 20, and when clean groove 20 installs, be connected the location through adaptation structure 22 and location structure 13's cooperation, in order to confirm the mounted position of clean groove 20, thereby need not the clean groove 20 position of sensor response, the simplified structure, and cost is reduced.
In one embodiment, a support plate 21 is provided in the cleaning tank 20 to support the cleaning robot 900 so that the mop 91 of the cleaning robot 900 is washed on the support plate 21 and also to facilitate the cleaning robot 900 to enter the cleaning tank 20.
In one embodiment, a cleaning member 14 may be provided in the base 10 to clean the scrubbing member 91 from the cleaning tank 20. Of course, in other embodiments, the wiper 91 may be placed in the cleaning tank 20 and rinsed directly with water.
In one embodiment, the positioning structure 13 includes a guide rail 131, the adapting structure 22 includes a sliding plate 221, the guide rail 131 is disposed in the base 10, the guide rail 131 is disposed obliquely to the horizontal direction, the sliding plate 221 is mounted on the cleaning tank 20, when the cleaning tank 20 is mounted in the base 10, the sliding plate 221 can be placed on the guide rail 131, and the sliding plate 221 can slide up and down on the guide rail 131 by gravity, so that the cleaning tank 20 can be automatically mounted in place, and the positioning and mounting of the cleaning tank 20 are facilitated. The structure of the guide rail 131 and the sliding plate 221 is used, so that the cleaning tank 20 can be conveniently supported, and the structure is simple.
In one embodiment, referring to fig. 1 and 4, two opposite sidewalls of the cleaning groove 20 are bent outward to form the sliding plate 221, that is, the sliding plate 221 is formed by bending the corresponding sidewalls of the cleaning groove 20 outward to facilitate manufacturing, and when disassembling, the cleaning groove 20 can be lifted up to separate the sliding plate 221 from the guide rail 131 first, so as to facilitate taking out the cleaning groove 20. In addition, the cleaning tank 20 has a large movement space in the base 10, and the cleaning tank 20 can be easily placed and taken out. Of course, in other embodiments, a slide rail may be disposed on the cleaning slot 20, and a slide groove is correspondingly disposed in the base 10, and the positioning and installation of the cleaning slot 20 may also be achieved through the cooperation of the slide rail and the slide groove.
In one embodiment, the base 10 has an opening 12 formed in a side thereof, and the opening 12 is adapted to allow the cleaning tank 20 to be removed, i.e., the cleaning tank 20 can be removed from the base 10 through the opening 12 to clean the cleaning tank 20.
In one embodiment, referring to fig. 1 and 3, the base 10 is provided with the opening 12 on the side facing away from the inlet 11, so that the cleaning tank 20 can be removed from the side of the base 10 facing away from the inlet 11. In another embodiment, an opening 12 may be opened at a side of the base 10 adjacent to the inlet 11 to take out the cleaning tank 20 from a side of the base 10 adjacent to the inlet 11. Of course, in some embodiments, the opening 12 may be disposed on both the side of the base 10 away from the inlet 11 and the side of the base 10 adjacent to the inlet 11, respectively, to facilitate the assembly and disassembly of the cleaning tank 20.
In one embodiment, the cleaning base station 100 further includes a clean water tank 15, and the clean water tank 15 is provided to supply clean water to the cleaning tank 20 when cleaning is to be performed, thereby facilitating cleaning. Of course, in other embodiments, the clean water may be supplied directly to the clean tank 20 through the faucet without providing the clean water tank 15.
Referring to fig. 5, fig. 5 is a schematic side view of the cleaning base station 100 according to the embodiment, and illustrates an internal structure of the base 10. The structure of the present embodiment is a modification on the basis of fig. 1. In this embodiment, the guide rail 131 is provided with a first magnetic member 132, and the sliding plate 221 is provided with a first magnetic member 222, so that when the cleaning tank 20 is installed in the base 10, the first magnetic member 132 and the first magnetic member 222 cooperate with magnetic attraction to position the cleaning tank 20, and the positioning is more convenient.
The first magnetic element 132 can be a magnet, and the first magnetic element 222 can be a member such as an iron element or a magnet that magnetically attracts the magnet. Of course, the first magnetic member 222 can be a magnet, and the first magnetic member 132 can be a member such as an iron member, a magnet, etc. magnetically attracted to the magnet.
In one embodiment, when the cleaning tank 20 is disassembled, the cleaning tank 20 can be lifted up and then the cleaning tank 20 can be drawn out, so as to avoid direct drawing and reduce the force for drawing the cleaning tank 20.
In one embodiment, the bottom of the cleaning tank 20 is further provided with a temporary storage tank 23. The temporary storage tank 23 is adapted to temporarily store the sewage, that is, the sewage after the cleaning of the mop 91 in the cleaning tank 20 is drained to the temporary storage tank 23 for storage.
In one embodiment, the temporary storage box 23 is connected to the cleaning tank 20, so that when the cleaning tank 20 is taken out, the temporary storage box 23 can be taken out together, the cleaning tank 20 and the temporary storage box 23 can be cleaned conveniently, the temporary storage box 23 and the cleaning tank 20 do not need to be taken out in a separate manner, and the use is convenient. In one embodiment, the temporary storage tank 23 is detachably connected to the cleaning bath 20 so that the temporary storage tank 23 and the cleaning bath 20 can be washed after the temporary storage tank 23 and the cleaning bath 20 are taken out of the base 10, respectively. Of course, in some embodiments, the temporary storage tank 23 and the cleaning tank 20 may be fixedly connected or provided as an integral structure so as to be cleaned together.
Referring to fig. 6, fig. 6 is a schematic side view of the cleaning base station 100 according to the present embodiment, and illustrates an internal structure of the base 10. The structure of the present embodiment is a modification on the basis of fig. 5. In this embodiment, the cleaning base station 100 further includes a buffer member 25, when the cleaning slot 20 is installed in the base 10, when the cleaning slot 20 is moved to a predetermined position, that is, when the cleaning slot 20 is moved to the end of the stroke, a certain impact force is generated, and the buffer member 25 can buffer the impact force to smoothly install the cleaning slot 20, thereby ensuring that the cleaning slot 20 is installed in place.
In one embodiment, the bumper 25 is mounted to the base 10 so that the cleaning slot 20 can be cushioned by the cleaning slot 20 when the cleaning slot 20 is mounted in the base 10. In other embodiments, the buffer member 25 may be mounted on the cleaning bath 20. In still other embodiments, a bumper 25 may be mounted on the base 10 and the cleaning tank 20, respectively.
In one embodiment, the adapter 22 includes a stop plate 223, the stop plate 223 protrudes upward from a side of the cleaning tank 20 adjacent to the opening 12, that is, the stop plate 223 protrudes from the cleaning tank 20, and the stop plate 223 is used as the adapter 22. The positioning structure 13 comprises a step groove 233 which is matched with the containing stop plate 223, the step groove 233 is arranged on the base 10, namely the step groove 233 is arranged on the base 10, so that the positioning structure 13 is formed, when the cleaning groove 20 is arranged on the base 10, the stop plate 223 is arranged in the step groove 233, the designated position of the cleaning groove 20 arranged in the base 10 is determined, the structure is convenient to machine and manufacture, the stop plate 223 is arranged, the cleaning groove 20 can be conveniently pulled out, and the cleaning groove 20 is convenient to disassemble and clean.
In one embodiment, a buffer member 25 may be provided on the stopper plate 223 to buffer an impact force when the cleaning slot 20 moves to the end of the stroke in the base 10. Of course, in other embodiments, the buffer 25 may be in the step groove 233.
In one embodiment, the guide rails 131 may be provided in the base 10, and the sliding plate 221 may be provided on the cleaning tank 20 to better fit and position the cleaning tank 20 with the stopper plate 223 and the stepped groove 233.
In one embodiment, the first magnetic member 132 may be disposed on the guide rail 131, and the first magnetic member 222 may be disposed on the sliding plate 221 to better position the cleaning tank 20.
Referring to fig. 7, fig. 7 is a schematic side view of the cleaning base station 100 according to the present embodiment, and illustrates an internal structure of the base 10. The structure of the present embodiment is a modification on the basis of fig. 6. In this embodiment, the base 10 further includes a sewage tank 24, the sewage tank 24 is disposed outside the base 10, the sewage tank 24 is connected to the cleaning tank 20, and the sewage tank 24 is disposed to store more sewage, so as to reduce the number of times of cleaning the base station 100, and facilitate use. Further, the dirty water tank 24 is connected to the clean tank 20, and when the dirty water tank 24 is taken out, the clean tank 20 and the temporary storage tank 23 can be taken out together for cleaning.
In one embodiment, the waste water tank 24 may be detachably connected to the cleaning tank 20, and after the waste water tank 24 and the cleaning tank 20 are separated from the base 10, the waste water tank 24 may be detached from the cleaning tank 20 for separate cleaning. Of course, in some embodiments, waste tank 24 may be fixedly connected to cleaning tank 20 for disassembly and cleaning therewith.
In one embodiment, the waste water tank 24 may be fixedly connected to the temporary storage tank 23 so as to be cleaned together. Of course, in other embodiments, the sewage tank 24 may be detachably connected to the temporary storage tank 23 so that the sewage tank 24 is separately cleaned from the temporary storage tank 23.
In one embodiment, when the sewage tank 24 is provided, the sewage in the temporary storage tank 23 may be discharged to the sewage tank 24 by the pump member so that the temporary storage tank 23 dumps the sewage. Of course, in some embodiments, when the height of the wastewater tank 24 is lower than the height of the cleaning tank 20, wastewater generated from the cleaning tank 20 may be discharged to the wastewater tank 24, so that a pump member may not be used, thereby reducing costs.
In one embodiment, when the sewage tank 24 and the buffer member 25 are provided at the same time, and the sewage tank 24 is connected to the cleaning tank 20, the buffer member 25 may be mounted on the sewage tank 24 so as to mount the buffer member 25.
Referring to fig. 8, fig. 8 is a schematic rear view of a cleaning tank in the base station 100 according to the embodiment. The structure of the present embodiment is a modification on the basis of fig. 5. In this embodiment, the buffer member 25 is installed on the cleaning groove 20 to buffer the impact generated when the cleaning groove 20 is installed in the base 10.
In one embodiment, the bumper 25 is provided at the periphery of the side of the cleaning slot 20 facing away from the inlet 11 to provide a more uniform force on the periphery of the cleaning slot 20.
Referring to fig. 9, fig. 9 is a schematic rear view of a cleaning tank in the cleaning base station 100 according to the embodiment. The structure of the present embodiment is a modification on the basis of fig. 5. In this embodiment, the positioning structure 13 includes a pressing element 134, the adapting structure 22 includes a fitting element 224, the fitting element 224 is disposed on the cleaning tank 20, and the fitting element 224 is detachably connected to the pressing element 134, the fitting element 224 is used to cooperate with the pressing element 134 to press the cleaning tank 20, so as to position and install the cleaning tank 20 in the base 10 and better position the cleaning tank 20.
In one embodiment, the compression member 134 includes fasteners 1341, and the fasteners 1341 are disposed on the base 10. The fitting 224 includes a latch 2241, the latch 2241 is installed on the cleaning slot 20, and the latch 2241 is used for being clamped with the latch 1341 to fix the cleaning slot 20, and further to position the cleaning slot 20. The buckling piece 1341 and the buckle 2241 are used for positioning, so that the structure is simple and the cost is low.
In one embodiment, the snap 1341 is located on the base 10 near the opening 12, and the snap 2241 is located on the end of the cleaning slot 20 away from the inlet 11, so that the position of the snap 1341 can be directly seen to facilitate the snap-fit of the snap 2241 with the snap 1341.
Referring to fig. 10, fig. 10 is a schematic rear view of a cleaning tank in the cleaning base station 100 according to the embodiment. The structure of the present embodiment is a modification on the basis of fig. 9. In this embodiment, the latch 2241 is located at an end of the cleaning slot 20 close to the inlet 11, and the fastener 1341 is located in the base 10, when the cleaning slot 20 is located in the base 10 and installed at a designated position, the latch 2241 is connected to the fastener 1341 in a latching manner, so as to position the cleaning slot 20. In other embodiments, the latch 2241 may be disposed on the side of the cleaning slot 20 and in the corresponding position in the base 10.
Referring to fig. 11, fig. 11 is a schematic rear view of a cleaning tank in the base station 100 according to the embodiment. The structure of the present embodiment is a modification on the basis of fig. 9. In this embodiment, the pressing member 134 includes a second magnetic member 1342, the second magnetic member 1342 is disposed on the base 10, the fitting member 224 includes a second magnetic member 2242, the second magnetic member 2242 is installed on the cleaning slot 20, the second magnetic member 2242 is used for being magnetically attracted to the second magnetic member 1342, so as to be installed in the base 10 in the cleaning slot 20, the second magnetic member 1342 and the second magnetic member 2242 can be magnetically attracted to position the cleaning slot 20 and the base 10. The second magnetic piece 1342 and the second magnetic piece 2242 are used, so that the magnetic device is simple in structure, convenient to install and low in cost.
The second magnetic part 1342 may be a magnet, and the second magnetic part 2242 is a member magnetically attracted to the magnet, such as an iron member or a magnet. Of course, the second magnetic member 2242 can be a magnet, and the second magnetic member 1342 is a member such as an iron member or a magnet that is magnetically attracted to the magnet.
Referring to fig. 12, fig. 12 is a schematic rear view of a cleaning tank in the base station 100 according to the embodiment. The structure of the present embodiment is a modification on the basis of fig. 11. In this embodiment, the positioning structure 13 further includes a guide rail 131, the adapting structure 22 further includes a sliding plate 221, the guide rail 131 is disposed in the base 10, the guide rail 131 is disposed in a horizontal direction, and the sliding plate 221 is mounted on the cleaning tank 20. That is, the cleaning slot 20 is more stably positioned in the base 10 by the guide rail 131 cooperating with the sliding plate 221 and the second magnetic member 2242 cooperating with the second magnetic member 1342.
Referring to fig. 13, fig. 13 is a schematic rear view of a cleaning tank in the base station 100 according to the embodiment. The structure of the present embodiment is a modification on the basis of fig. 11. In this embodiment, the pressing member 134 includes a pop-up self-locking device 1343, and the pop-up self-locking device 1343 is disposed in the base 10; the fitting 224 includes a joint 2243, the joint 2243 is mounted on the cleaning tank 20, and the joint 2243 is used for matching and locking with the pop-up self-locker 1343, so that when the cleaning tank 20 is mounted in the base 10, the joint 2243 can be locked by the pop-up self-locker 1343 to position the cleaning tank 20 with the base 10. When the cleaning tank 20 is taken out, the cleaning tank 20 is pushed by the pop-up locker 1343 so that the cleaning tank 20 is taken out.
In one embodiment, the guide rail 131 and the sliding plate 221 form a pair of matching and positioning connection structures, the first magnetic member 132 and the first magnetic member 222 form a pair of matching and positioning connection structures, the second magnetic member 1342 and the second magnetic member 2242 form a pair of matching and positioning connection structures, the pop-up self-locking device 1343 and the connector 2243 form a pair of matching and positioning connection structures, the snap member 1341 and the snap 2241 form a pair of matching and positioning connection structures, and the stop plate 223 and the step groove 233 form a pair of matching and positioning connection structures. Any one or more pairs of positioning connection structures are selected and respectively arranged on the cleaning groove 20 and the base 10, so that the cleaning groove 20 and the base 10 can be positioned and matched.
The cleaning base station 100 of the embodiment of the application can ensure that the cleaning tank 20 is installed at a set position in the base 10 without using a sensor, and the structure is simplified and the cost is low.
The above description is only exemplary of the present application and should not be taken as limiting the present application, as any modification, equivalent replacement, or improvement made within the spirit and principle of the present application should be included in the protection scope of the present application.

Claims (10)

1. A clean base station, characterized by: including the base with be used for supplying to drag the clear clean groove of piece of wiping, clean groove is arranged in the base, the base has and is used for supplying cleaning robot to get into the entry in clean groove, clean groove install in the base, be equipped with location structure in the base, be equipped with on the clean groove be used for with this clean groove's of location structure cooperation location adaptation structure, location structure with adaptation structure can dismantle and link to each other.
2. The clean base station of claim 1, wherein: the positioning structure comprises a guide rail which is inclined to the horizontal direction and arranged in the base, the adaptive structure comprises a sliding plate which is adaptively supported on the guide rail, and the sliding plate is arranged on the cleaning groove.
3. The clean base station of claim 2, wherein: two opposite side walls of the cleaning groove are bent outwards to form the sliding plate.
4. The clean base station of claim 2, wherein: the guide rail is provided with a first magnetic part, and the sliding plate is provided with a first magnetic part matched with the first magnetic part for magnetic attraction positioning.
5. The clean base station of claim 1, wherein: the positioning structure comprises a pressing part, the adapting structure comprises an adapting piece which is used for being matched with the pressing part to compress the cleaning groove, the adapting piece is arranged on the cleaning groove, and the pressing part is detachably connected with the adapting piece.
6. The clean base station of claim 5, wherein: the pressing component is a second magnetic component, and the matching component is a second magnetic component which is matched with the second magnetic component for magnetic attraction positioning;
and/or the pressing part is a buckling part, and the matching part is a buckle matched and clamped with the buckling part for positioning;
and/or the pressing piece is a pop-up self-locker, and the fitting piece is a joint matched and locked with the pop-up self-locker.
7. The clean base station of any one of claims 1-6, wherein: the cleaning base station also comprises a buffer piece for buffering impact force generated when the cleaning groove is arranged in the base; the buffer member is mounted on the cleaning groove, or/and the buffer member is mounted in the base.
8. The clean base station of any one of claims 1-6, wherein: an opening suitable for the cleaning groove to be taken out is formed in one side of the base, which is far away from the inlet, or/and one side of the base, which is close to the inlet.
9. The clean base station of claim 8, wherein: the base further comprises a sewage tank, the sewage tank is arranged on the outer side of the base and connected with the cleaning groove, and the cleaning base station further comprises a buffer piece used for buffering the impact force generated when the cleaning groove is installed in the base; the buffer member is mounted on the sewage tank.
10. The clean base station of claim 8, wherein: the adapting structure comprises a stop plate which is arranged on the cleaning groove in a protruding mode and is close to one side of the opening, and the positioning structure comprises a step groove which is arranged on the base and is used for accommodating the stop plate in a matching mode.
CN202120591679.1U 2021-03-23 2021-03-23 Clean base station Active CN215457715U (en)

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CN202120591679.1U CN215457715U (en) 2021-03-23 2021-03-23 Clean base station

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