CN215386064U - Full-coverage type facial mask - Google Patents

Abstract

The utility model relates to a facial mask technical field especially relates to a full coverage formula facial mask, including the substrate, set up the hole of dodging that corresponds eyes, nose and mouth on the substrate respectively, the substrate is located the week side of dodging the hole and is provided with cover membrane cloth, cover membrane cloth sets up the first membrane cloth of dodging hole top side in eyes department including the activity, one side of substrate is fixed and is provided with the intermediate level, one side that the intermediate level deviates from the substrate is provided with the laminating layer. This application has ensured the coverage effect of facial mask in the use through the setting of covering membrane cloth, is difficult for producing the dead angle that can't moisturize the skin.

Description

Full-coverage type facial mask

Technical Field

The application relates to the technical field of facial masks, in particular to a full-coverage facial mask.

Background

As is known to all, the face is the position of a human body which can express beauty most directly, so that how to maintain the health of the face skin becomes a matter which is valued by men and women who love beauty, and the common face maintenance method for modern people is to apply facial masks, and the facial masks are used as main carriers and are matched with various essence liquids to act on the skin, so that various effects of moisturizing, whitening, anti-aging, grease balancing and the like can be realized.

The mask in the related art comprises a soft base material formed by cutting a non-woven fabric, wherein a plurality of avoiding holes corresponding to eyes, a nose and a mouth are respectively cut on the mask, and essence is pre-adsorbed on the soft base material, so that the mask is endowed with the performance of moisturizing and skin care.

Although the facial mask in the technology can moisturize and moisturize the face after being applied to the face, due to the arrangement of the avoiding holes, the positions of the dead corners such as the eyelid, the two sides of the nasal alar and the like of the face cannot be covered, and moisturizing are performed.

SUMMERY OF THE UTILITY MODEL

For the coverage effect of the laying process of guarantee facial mask, this application provides a full coverage formula facial mask.

The application provides a full coverage formula facial mask adopts following technical scheme:

the utility model provides a full coverage formula facial mask, a serial communication port, including the substrate, set up the hole of dodging that corresponds eyes, nose and mouth on the substrate respectively, the activity of week side that the substrate is located the hole of dodging is provided with the cover film cloth, the cover film cloth sets up the first membrane cloth of the hole top side of dodging in eyes department including the activity, the fixed intermediate level that is provided with in one side of substrate, one side that the intermediate level deviates from the substrate is provided with the laminating layer.

Through adopting above-mentioned technical scheme, when needing to use the facial mask, only need to be provided with the laminating layer one side and lay towards the people's face, can cooperate the use that covers membrane cloth to realize the comprehensive cover to face, and cover membrane cloth sets up for the activity, consequently can open and shut according to the in-service use condition, when having ensured facial mask moisturizing effect, be difficult for because of the too poor experience that influences the user of gas permeability is felt.

Preferably, the two sides of the base material are provided with ear-hanging parts.

Through adopting above-mentioned technical scheme, when needing to carry out the use to the facial mask, only need to be provided with the one side of laminating and lay towards people's face, hang ear-hang portion again and can use on the ear, and make the facial mask be difficult for taking place to drop because of the user removes through setting up of ear-hang portion.

Preferably, the covering film cloth further comprises a second film cloth arranged at the nose avoiding hole, and a through hole is formed in the position, close to the nose, of the second film cloth.

Through adopting above-mentioned technical scheme, the second membrane cloth that covers the setting is compared and is directly seted up in nose department and dodge the hole, and it can also play the moist skin effect of moisturizing to the alar both sides of nose, and through the setting of ear-hang portion, can tightly laminate second membrane cloth and nose, has ensured the holistic coverage effect of facial mask then.

Preferably, the second membrane cloth is provided with a nose bridge strip at the positions on two sides of the nose wing.

Through adopting above-mentioned technical scheme, the setting of ear-hang portion cooperation bridge of the nose strip for the adjustment of laminating can be carried out according to user's face type and nose size to the second membrane cloth, and the dead angle of alar department of the nose also can fully contact moisturize, has ensured the holistic effect that covers of facial mask then.

Preferably, the mouth avoidance hole is a strip-shaped hole formed along the horizontal direction.

Through adopting above-mentioned technical scheme, the hole is dodged to general mouth department in the bar hole ratio, and its coverage is better, and still has better ventilation effect.

Preferably, the side edge of the base material, which is positioned at the top side of the strip-shaped hole, is movably arranged to be a third film cloth.

Through adopting above-mentioned technical scheme, the setting of third membrane cloth for when laying the facial mask, normal speech and breathing are difficult for influencing in the time of the moisturizing skin of mouth department can fully be kept moist.

Preferably, the covering film cloth is formed by weaving and cutting tea fiber spinning and bamboo fiber spinning respectively serving as warp and weft.

By adopting the technical scheme, the tea fiber is a fiber with antibacterial and deodorant functions, which is prepared by extracting a natural antibacterial agent from tea leaves, and the bamboo fiber has good air permeability, instant water absorbability, natural antibacterial, bacteriostatic, mite-removing, deodorant, ultraviolet-resistant and other functions, so that the covering membrane cloth is endowed with excellent antibacterial performance and moisturizing and air permeability.

Preferably, the diameter of the tea fiber spinning thread is 0.3-0.4mm, and the density of the tea fiber spinning thread along the length direction of the warp thread is 25-30 pieces/cm;

the yarn diameter of the bamboo fiber spinning is 0.5-0.7mm, and the density of the bamboo fiber spinning along the length direction of the weft is 15-20 pieces/cm.

Through adopting above-mentioned technical scheme, regard as the tea fiber spinning and the bamboo fiber spinning of warp and weft respectively with above-mentioned line footpath and density, its weaving cuts the cover membrane cloth that forms, and mechanical properties is better, is difficult for being pulled and tears the destruction, and the gas permeability is good, has ensured the comprehensive coverage effect of facial mask then.

In summary, the present application includes at least one of the following beneficial technical effects:

1. the covering effect of the mask is guaranteed through the arrangement of the covering membrane cloth, then in the using process, the mask can moisturize and moisten the parts such as eyelids and nasal wings, the whole using process is convenient, the mask can be used only by laying the surface provided with the attaching layer towards the face, and the covering membrane cloth can be opened and closed according to the using condition of a user;

2. according to the mask, the second mask cloth and the nose bridge strip are arranged, so that the second mask cloth can be attached and adjusted according to the face shape and the size of the nose of a user, and the overall covering effect of the mask is further guaranteed;

3. this application has given the better antibacterial performance and the moisturizing performance of cover membrane cloth through the weaving of above-mentioned line footpath and density tea fiber spinning and bamboo fiber spinning and the characteristic that material itself has, and when being difficult for being pulled and torn the destruction, the gas permeability is good.

Drawings

Fig. 1 is a schematic view of the overall structure of a full-coverage mask in example 1 of the present application;

fig. 2 is a schematic view of the overall structure of a full-coverage mask in another state according to embodiment 1 of the present application.

Reference numerals: 1. a substrate; 2. avoiding holes; 31. a first membrane cloth; 32. a second membrane cloth; 33. a third film cloth; 4. an intermediate layer; 5. laminating layers; 6. an ear-hanging part; 7. a through hole; 8. a nose bridge strip.

Detailed Description

The present application is described in further detail below with reference to figures 1-2.

The embodiment of the application discloses a full-coverage facial mask, referring to fig. 1 and 2, which comprises a base material 1 formed by weaving and cutting cotton fibers and avoidance holes 2 formed in the base material 1 and respectively corresponding to eyes, a nose and a mouth. The two sides of the base material 1 are provided with the ear hanging parts 6, the facial mask can be fixed by hanging the ear hanging parts 6 and ears, and then the facial mask is not easy to fall off due to the movement of a user in the use process. An intermediate layer 4 is fixedly arranged on one side of the substrate 1, and the intermediate layer 4 is a carboxymethyl cellulose layer. One side that middle level 4 deviates from substrate 1 is provided with laminating layer 5, and laminating layer 5 is the silk fibrous layer.

When the facial mask needs to be laid, the face with the laminating layer 5 only needs to be laid on the face, and the ear hanging part 6 is hung on the ears, so that the facial mask can be maintained and moisturized through the facial mask cloth and the essence adsorbed on the facial mask cloth.

In order to ensure the coverage and skin moistening effect of the mask, and to make the mask capable of covering and moistening the eyelid, two sides of the nasal alar, and the like, referring to fig. 1 and 2, the substrate 1 is provided with a covering film cloth at the periphery of the avoiding hole 2, and the covering film cloth comprises a first film cloth 31, a second film cloth 32 and a third film cloth 33.

The covering membrane cloth is formed by cutting tea fiber spinning and bamboo fiber spinning, wherein the tea fiber spinning is warp, the thread diameter of the tea fiber spinning is 0.3mm, the density of the tea fiber spinning along the length direction of the warp is 30 threads/cm, the bamboo fiber spinning is weft, the thread diameter of the bamboo fiber spinning is 0.5 mm, and the density of the bamboo fiber spinning along the length direction of the weft is 20 threads/cm.

The tea fiber spinning and the bamboo fiber spinning with the line diameter and the density can endow the mask with better mechanical property and antibacterial moisturizing property through the characteristics of the mask, and the mask is not easy to be pulled and damaged and has good air permeability, so that the comprehensive covering effect of the mask is ensured.

First membrane cloth 31 activity sets up the top side of dodging hole 2 in eyes department, and can open and shut according to the in-service use condition, when having ensured facial mask moisturizing effect, is difficult for because of the too poor experience that influences the user of gas permeability feels, compares solitary use cucumber piece etc. and lays the eye, and the operation is more convenient.

Second membrane cloth 32 integrated into one piece sets up and dodges hole 2 department at the nose, and through-hole 7 has been seted up to the position that second membrane cloth 32 is close to nose department, and second membrane cloth 32 lies in the week side fixed nose bridge strip 8 that is provided with of through-hole 7. When needing to use the facial mask, lay the facial mask on the face earlier, hang ear-hang portion 6 on the ear again, can knead nose bridge strip 8 according to user's face type and nose size, make second membrane cloth 32 hug closely with nose and nose wing both sides then, ensured the holistic skin effect that covers of facial mask then.

The mouth avoidance hole 2 is a strip-shaped hole formed along the horizontal direction, and the third film cloth 33 is a movable part located on the top side of the strip-shaped hole. The strip-shaped holes are matched with the third membrane cloth 33, so that after the facial mask is laid by a user, the mouth part can be fully moisturized and moisturized, and meanwhile, good air permeability is still achieved.

The implementation principle and the working process of the full-coverage type facial mask in the embodiment of the application are as follows: when needing to use facial mask, only need lay the one side that is provided with close skin layer on people's face to hang 6 back of establishing on the ear with ear-hang portion, can cooperate the setting of covering membrane cloth to carry out the full aspect to the face and cover, and the concrete covering condition can be adjusted according to user's face type or the in-service use condition, when having ensured the covering effect promptly, the facial mask still has good gas permeability and moisturizing.

The above embodiments are preferred embodiments of the present application, and the protection scope of the present application is not limited by the above embodiments, so: all equivalent changes made according to the structure, shape and principle of the present application shall be covered by the protection scope of the present application.

Claims (6)

1. The full-coverage type facial mask is characterized by comprising a substrate (1), wherein avoidance holes (2) corresponding to eyes, noses and mouths are formed in the substrate (1), covering membrane cloth is arranged on the periphery of the substrate (1) in the avoidance holes (2), the covering membrane cloth comprises a first membrane cloth (31) movably arranged on the top side of the avoidance holes (2) at the eyes, an intermediate layer (4) is fixedly arranged on one side of the substrate (1), and a binding layer (5) is arranged on one side of the intermediate layer (4) away from the substrate (1);

cover membrane cloth still including setting up second membrane cloth (32) of dodging hole (2) department at the nose, through-hole (7) have been seted up to the position that second membrane cloth (32) are close to nose hole department, state that substrate (1) is located the side activity of bar hole top side and sets up to third membrane cloth (33).

2. The full coverage mask as claimed in claim 1, wherein the substrate (1) is provided with ear hanging parts (6) at both sides.

3. The full-coverage mask as claimed in claim 1, wherein the second mask cloth (32) is provided with a nose bridge strip (8) at both sides of the wing of the nose.

4. The full-coverage facial mask as claimed in claim 1, wherein the avoiding hole (2) at the mouth is a strip-shaped hole formed along the horizontal direction.

5. The full-coverage mask as claimed in claim 1, wherein the cover film cloth is cut by weaving tea fiber spinning and bamboo fiber spinning as warp and weft, respectively.

6. The full-coverage mask as claimed in claim 5, wherein the diameter of the tea fiber yarn is 0.3-0.4mm, and the density of the tea fiber yarn along the length direction of the warp yarn is 25-30 pieces/cm;

the yarn diameter of the bamboo fiber spinning is 0.5-0.7mm, and the density of the bamboo fiber spinning along the length direction of the weft is 15-20 pieces/cm.

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