CN215355052U

CN215355052U - Sealing propeller structure for wafer cleaning

Info

Publication number: CN215355052U
Application number: CN202023042439.0U
Authority: CN
Inventors: 何淑英
Original assignee: Guangzhou Honghao Optoelectronic Semiconductor Co ltd
Current assignee: Guangzhou Honghao Optoelectronic Semiconductor Co ltd
Priority date: 2020-12-15
Filing date: 2020-12-15
Publication date: 2021-12-31
Anticipated expiration: 2030-12-15

Abstract

The utility model relates to the technical field of sealed propellers, in particular to a sealed propeller structure for wafer cleaning, wherein a propulsion box comprises an observation window, a wafer placing inlet, a propeller, a screen outlet, an ultrasonic vibration cleaner and an ultrasonic atomization sterilizer, the observation window and the wafer placing inlet are arranged in the middle and the upper half part of the outer side of the propulsion box, the propeller is arranged in the propulsion box, a sealing piston is arranged at the bottom of the propeller, the cleaning liquid automatically stops inputting after flowing into the propulsion box to a certain degree, the ultrasonic vibration cleaner and the ultrasonic atomization sterilizer in the propulsion box start and clean together to improve the cleaning efficiency, the propeller in the propulsion box presses downwards after cleaning is finished, and a switch valve has two functions of rotating, opening, separating and opening a screen leakage.

Description

Sealing propeller structure for wafer cleaning

Technical Field

The utility model relates to the technical field of sealing propellers, in particular to a sealing propeller structure for wafer cleaning.

Background

With the continuous development of the preparation process of the infrared detection device, people have higher and higher requirements on the surface quality of the wafer, but various impurities are inevitably introduced into the wafer in the production process. A method for cleaning a wafer by megasonic combined with liquid medicine deionized water is researched, and the surface granularity, surface organic matters, surface roughness and the like of the cleaned wafer are measured. Experimental results show that the method can effectively remove particles, organic matters and metal ion impurities on the surface of the wafer.

Ultrasonic cleaning technology was early in the early 20 th century 30 years, when fully automated wafer ultrasonic cleaning machines were used, in a laboratory of the american radio corporation, new jersey, to attempt to clean certain objects with home-made crude ultrasonic cleaning systems, but the tests were unsuccessful.

On the basis, the ultrasonic cleaning technology has been greatly developed in the 50 s of the 20 th century, and the working frequency of the ultrasonic used at that time is between 20 and 40 khz. Ultrasonic waves in this range are used in thousands of different work situations, many of which are where other cleaning means do not work well.

Ultrasonic waves can apply very large amounts of energy to a workpiece and are particularly useful for removing dirt that is firmly attached to a substrate. However, in some cases, the powerful energy of the ultrasonic wave of the fully automatic wafer ultrasonic cleaning machine can damage the substrate material which is sticky with dirt and has weak property. In the last decade, technological innovations have emerged in the field of ultrasound, increasing the safety factor for removing contaminants from sensitive substrates. In recent years, it has been found that ultrafine dirt particles on the surface can be removed by cleaning with megasonic waves (40 khz or less is called normal or low-frequency ultrasonic waves, and 1000khz or more is called high-frequency ultrasonic waves, also called megasonic waves, simply called megasonic waves, depending on the frequency of ultrasonic waves) without damaging the surface of the base material.

SUMMERY OF THE UTILITY MODEL

Technical problem to be solved

Aiming at the defects of the prior art, the utility model provides the sealing thruster structure which has good sealing performance, is used for cleaning the wafer and is provided with ultrasonic cleaning.

(II) technical scheme

In order to achieve the purpose, the utility model provides the following technical scheme: a sealed propeller structure for wafer cleaning comprises a propelling box, a screening box and a containing box, wherein the propelling box comprises an observation window, a wafer placing inlet, a propeller, a screen outlet, an ultrasonic vibration cleaner and an ultrasonic atomization sterilizer, the observation window and the wafer placing inlet are arranged at the middle part and the upper part of the outer side of the propelling box, the propeller is arranged inside the propelling box, a sealing piston is arranged at the bottom of the propeller, the sealing piston is fixedly connected with the propeller, the sealing piston is tightly attached to the inner wall of the propelling box, the upper part of the propelling box is provided with a cleaning liquid inlet, one end of the cleaning liquid inlet is communicated with the propelling box, the other end of the cleaning liquid inlet is provided with a valve, the ultrasonic vibration cleaner is arranged on the inner wall of the propelling box, the ultrasonic vibration cleaner is embedded into the inner wall of the propelling box, the screen outlet is arranged at the bottom end of the propelling box, the screen cloth and the ultrasonic atomization cleaning device are arranged in the screen cloth outlet, two ends of the screen cloth are fixedly connected with the screen cloth outlet, the ultrasonic atomization cleaning device is fixedly connected to the inner wall of the screen cloth outlet, a switch valve is arranged on the outer side of the screen cloth outlet, the screening box is located below the pushing box and fixedly connected with the pushing box, an outer flip cover is arranged on the outer side of the screening box and movably connected with the screening box, a cleaning liquid outlet is formed in one side of the screening box, a containing box is arranged on the other side of the screening box, one end of the cleaning liquid outlet is communicated with the screening box, a water valve is arranged at the other end of the cleaning liquid outlet, a plurality of drying trays are arranged inside the containing box, sliding strips are arranged at two ends of each drying tray, a plurality of sliding grooves are formed in the inner wall of the containing box, and the drying trays and the containing box are movably connected with the sliding strips through the sliding strips.

In order to prevent the wafer from sliding off, the utility model improves that the screen is a double-layer screen.

In order to take out the wafer conveniently, the utility model has the improvement that the switch valve can be opened or separated in a rotating mode, a switch baffle is arranged in the outlet of the screen mesh and is welded with the switch valve, and the switch baffle is arranged between the screen mesh and the ultrasonic atomization sterilizer.

In order to be more convenient to use, the wafer placing inlet is improved in that a sealing plate is arranged on the outer side of the wafer placing inlet, a sealing rubber strip is arranged on the inner side of the sealing plate, and the sealing plate is connected with the wafer placing inlet through a rotating shaft.

In order to increase the functionality, the utility model improves that the top end of the propeller is provided with an anti-skid rubber mat.

In order to dry and disinfect quickly, the improvement of the utility model is that negative ion water absorption disinfection cotton is arranged inside the drying tray.

(III) advantageous effects

Compared with the prior art, the utility model provides a sealing propeller structure for wafer cleaning, which has the following beneficial effects:

the sealing propeller structure for wafer cleaning has the advantages that after cleaning liquid flows into a propelling box to a certain degree, the cleaning liquid automatically stops inputting, at the moment, an ultrasonic vibration cleaner in the propelling box and an ultrasonic atomization sterilizer are started together for cleaning, the cleaning efficiency is improved, after cleaning is finished, the propeller in the propelling box is pushed down, a switch valve has two functions of rotating opening separation and opening sieve leakage, the using efficiency of equipment is improved, the switch valve on an outlet of a sieve screen is opened to filter out the cleaning liquid through the sieve screen, the filtered cleaning liquid flows into the sieve leakage box, a valve on an outlet of the cleaning liquid is opened, waste cleaning liquid flows out, the equipment is convenient to operate, an outer flip cover on the sieve leakage box is opened, the switch valve on an outlet of the sieve screen is rotated to open, the sieve screen in the outlet of the sieve screen is separated from the ultrasonic atomization sterilizer through the switch valve, then, a wafer which is cleaned is taken out, an airing disc placed on a containing box is disinfected and aired through negative ion water absorption disinfection cotton, can be quickly dried and sterilized.

Drawings

FIG. 1 is a schematic cross-sectional view of the structure of the present invention;

FIG. 2 is a front view of the present invention;

FIG. 3 is a schematic structural view of the present invention;

in the figure: 1. a propulsion box; 2. a screen box; 3. a containing box; 4. an observation window; 5. a wafer placement inlet; 6. a propeller; 7. a screen outlet; 8. an ultrasonic vibration cleaner; 9. an ultrasonic atomization sterilizer; 10. a sealing piston; 11. a cleaning liquid inlet; 12. an outer flip cover; 13. a cleaning liquid outlet; 14. an airing tray; 15. negative ion water absorption sterilized cotton; 16. a slide bar; 17. an on-off valve; 18. screening a screen; 19. a switch baffle;

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

Referring to fig. 1-3, a sealing propeller structure for wafer cleaning, includes a propulsion box 1, a screen box 2 and a containing box 3, the propulsion box 1 includes an observation window 4, a wafer placing inlet 5, a propeller 6, a screen outlet 7, an ultrasonic vibration cleaner 8 and an ultrasonic atomization sterilizer 9, the observation window 4 and the wafer placing inlet 5 are disposed at the middle and upper half of the outer side of the propulsion box 1, the propeller 6 is disposed inside the propulsion box 1, a sealing piston 10 is disposed at the bottom of the propeller 6, the sealing piston 10 is fixedly connected with the propeller 6, the sealing piston 10 is tightly attached to the inner wall of the propulsion box 1, the upper half of the propulsion box 1 is provided with a cleaning liquid inlet 11, and one end of the cleaning liquid inlet 11 is communicated with the propulsion box 1, the other end is provided with a valve, the ultrasonic vibration cleaner 8 is arranged on the inner wall of the propelling box 1, the ultrasonic vibration cleaner 8 is embedded into the inner wall of the propelling box 1, the screen outlet 7 is arranged at the bottom end of the propelling box 1, a screen 18 and an ultrasonic atomization cleaner are arranged in the screen outlet 7, two ends of the screen 18 are fixedly connected with the screen outlet 7, the ultrasonic atomization cleaner is fixedly connected on the inner wall of the screen outlet 7, the outside of the screen outlet 7 is provided with a switch valve 17, the screening box 2 is positioned below the propelling box 1, the screening box 2 is fixedly connected with the propelling box 1, the outside of the screening box 2 is provided with an outer flip cover 12, the outer flip cover 12 is movably connected with the screening box 2, one side of the screening box 2 is provided with a cleaning liquid outlet 13, the other side is provided with a containing box 3, one end of the cleaning liquid outlet 13 is communicated with the screening box 2, the other end of the containing box is provided with a water valve, a plurality of drying trays 14 are arranged inside the containing box 3, sliding strips 16 are arranged at two ends of each drying tray 14, a plurality of sliding grooves are formed in the inner wall of the containing box 3, and the drying trays 14 and the containing box 3 are movably connected through the sliding strips 16 and the sliding grooves.

In order to prevent the wafer from slipping, the screen 18 is a double-layer screen 18.

In order to take out the wafer conveniently, the utility model has the improvement that the switch valve 17 can be rotated to open or separate, the switch baffle 19 is arranged in the sieve outlet 7, the switch baffle 19 is welded with the switch valve 17, the switch baffle 19 is arranged between the sieve 18 and the ultrasonic atomization sterilizer 9, the switch valve 17 is opened to filter waste water through the sieve outlet 7, and after the waste water is dried, the switch valve 17 rotates to separate the sieve 18, so that the wafer is taken out and placed on the drying tray 14 in the holding box.

In order to facilitate the use, the utility model has the improvement that a sealing plate is arranged on the outer side of the wafer placing inlet 5, a sealing rubber strip is arranged on the inner side of the sealing plate, the sealing plate is movably connected with the wafer placing inlet 5, the sealing rubber strip on the inner side of the sealing plate is closed to be placed corresponding to the wafer placing inlet 5, and liquid in the placing box leaks.

In order to increase the functionality, the utility model improves that the top end of the propeller 6 is provided with an anti-skid rubber pad, and when in use, the anti-skid rubber pad is manually pushed to press the propeller 6 downwards.

In order to dry and disinfect quickly, the improvement of the utility model is that negative ion water absorption disinfection cotton 15 is arranged inside the drying tray 14, the cleaned wafer is placed on the drying tray 14, and the negative ion water absorption disinfection cotton 15 in the drying tray 14 helps the wafer to carry out secondary disinfection.

In summary, in the structure of the sealing pusher 6 for wafer cleaning, when the apparatus is in a standby state, the pusher 6 is stopped at the upper half part inside the pusher case 1, the cleaning liquid is inputted at the cleaning liquid inlet 11, the sealing plate of the wafer placing inlet 5 is opened to place the wafer, the sealing plate is closed, the cleaning liquid is automatically stopped to be inputted after the cleaning liquid flows into the pusher case 1 to a certain extent, at this time, the ultrasonic vibration cleaner 8 in the pusher case 1 starts cleaning together with the ultrasonic atomization sterilizer 9 to improve the cleaning efficiency, the pusher 6 in the pusher case 1 is pressed down after the cleaning is finished, the on-off valve 17 has two functions of rotating to open the separation and open the screen, the on-off valve 17 on the screen outlet 7 is opened to filter the cleaning liquid through the screen 18, the filtered cleaning liquid flows into the screen case 2, the valve on the cleaning liquid outlet 13 is opened, the waste cleaning liquid flows out, the outer flip cover 12 on the screen case 2 is opened, the switch valve 17 on the sieve outlet 7 is opened by rotation, so that the sieve 18 in the sieve outlet 7 is separated from the ultrasonic atomization sterilizer 9 through the switch valve 17, then the cleaned wafer is taken out, and the drying tray 14 placed on the containing box 3 is sterilized and dried through the negative ion water absorption sterilizing cotton 15.

Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the utility model, the scope of which is defined in the appended claims and their equivalents.

Claims

1. The utility model provides a sealed propeller structure for wafer cleaning, includes propulsion case (1), sieve hourglass case (2) and holds case (3), its characterized in that: the ultrasonic vibration cleaning device is characterized in that the propelling box (1) comprises an observation window (4), a wafer placing inlet (5), a propeller (6), a screen outlet (7), an ultrasonic vibration cleaning device (8) and an ultrasonic atomization sterilizer (9), the observation window (4) and the wafer placing inlet (5) are arranged in the middle and the upper half of the outside of the propelling box (1), the propeller (6) is arranged inside the propelling box (1), a sealing piston (10) is arranged at the bottom of the propeller (6), the sealing piston (10) is fixedly connected with the propeller (6), the sealing piston (10) is tightly attached to the inner wall of the propelling box (1), a cleaning liquid inlet (11) is arranged in the upper half of the propelling box (1), one end of the cleaning liquid inlet (11) is communicated with the propelling box (1), a valve is arranged at the other end of the cleaning liquid inlet, the ultrasonic vibration cleaning device (8) is arranged on the inner wall of the propelling box (1), the ultrasonic vibration cleaning device (8) is embedded into the inner wall of the propelling box (1), the screen outlet (7) is arranged at the bottom end of the propelling box (1), a screen (18) and an ultrasonic atomization cleaning device are arranged in the screen outlet (7), two ends of the screen (18) are fixedly connected with the screen outlet (7), the ultrasonic atomization cleaning device is fixedly connected onto the inner wall of the screen outlet (7), a switch valve (17) is arranged on the outer side of the screen outlet (7), the screening box (2) is positioned below the propelling box (1), the screening box (2) is fixedly connected with the propelling box (1), an outer flip cover (12) is arranged on the outer side of the screening box (2), the outer flip cover (12) is movably connected with the screening box (2), a cleaning liquid outlet (13) is arranged on one side of the screening box (2), a containing box (3) is arranged on the other side of the screening box, one end of the cleaning liquid outlet (13) is communicated with the screening box (2), the water valve is arranged at the other end of the water storage tank, a plurality of drying trays (14) are arranged inside the containing tank (3), sliding strips (16) are arranged at two ends of each drying tray (14), a plurality of sliding grooves are formed in the inner wall of the containing tank (3), and the drying trays (14) and the containing tank (3) are movably connected through the sliding strips (16) and the sliding grooves.

2. A seal pusher configuration for wafer cleaning as recited in claim 1, wherein: the screen (18) is a double-layer screen (18).

3. A seal pusher configuration for wafer cleaning as recited in claim 1, wherein: the switch valve (17) can be rotated to be opened or separated, a switch baffle (19) is arranged in the screen outlet (7), the switch baffle (19) is welded with the switch valve (17), and the switch baffle (19) is arranged between the screen (18) and the ultrasonic atomization sterilizer (9).

4. A seal pusher configuration for wafer cleaning as recited in claim 1, wherein: the wafer placing inlet (5) is provided with a sealing plate on the outer side, a sealing rubber strip is arranged on the inner side of the sealing plate, and the sealing plate is connected with the wafer placing inlet (5) through a rotating shaft.

5. A seal pusher configuration for wafer cleaning as recited in claim 1, wherein: the top end of the propeller (6) is provided with an antiskid rubber mat.

6. A seal pusher configuration for wafer cleaning as recited in claim 1, wherein: and negative ion water-absorbing sterilized cotton (15) is arranged in the airing disc (14).