CN215317969U

CN215317969U - Chemical mechanical polishing device convenient to adjust

Info

Publication number: CN215317969U
Application number: CN202023063640.7U
Authority: CN
Inventors: 蒋芳芳; 蒋晖晖
Original assignee: Nanjing Intelink Microelectronics Co ltd
Current assignee: Nanjing Intelink Microelectronics Co ltd
Priority date: 2020-12-18
Filing date: 2020-12-18
Publication date: 2021-12-28
Anticipated expiration: 2030-12-18

Abstract

The utility model discloses a chemical mechanical polishing device convenient to adjust, which comprises a chassis, wherein an annular groove is formed in the outer side wall of the bottom end of the chassis, and a fixing ring is connected to the inside of the annular groove in a sliding manner, so that the chemical mechanical polishing device has the beneficial effects that: according to the utility model, through arranging the reset mechanism, the clamping mechanism, the protection structure and the pressurization mechanism, when the pressure between the chassis and the polishing head needs to be adjusted for polishing different wafer surfaces, the expansion degree of the air bag can be adjusted, the pressure between the polishing head pressing on the chassis and the chassis can be adjusted, the pressure between the upper surface of the chassis and the wafer can be adjusted, the polishing effect on the surface of the wafer is prevented from being influenced when different wafers are polished, through arranging the clamping mechanism, the reset mechanism and the protection mechanism, when the chassis needs to be overhauled or replaced, the disassembly operation is simple, after the replacement is finished, the assembly operation is simple, the chassis is convenient to overhaul and replace, and the use is convenient.

Description

Chemical mechanical polishing device convenient to adjust

Technical Field

The utility model relates to a chemical mechanical polishing device convenient to adjust, and belongs to the field of chemical mechanical polishing devices.

Background

Chemical Mechanical Polishing (CMP) is a means of achieving global planarization in integrated circuit fabrication, and is specifically designed to achieve a flat, scratch-free and contaminant-free surface on a wafer, which is carried by a polishing head to be polished with an abrasive slurry on a rotating polishing disk for chemical mechanical polishing.

At present, in the prior art, in the process of rotating a polishing disk of a chemical mechanical polishing device, chemical mechanical polishing is performed on different wafers, and it is difficult to adjust the pressure between the upper surface of the polishing disk and the wafers, so that the polishing effect on the surfaces of the wafers is affected, and therefore, the utility model provides the chemical mechanical polishing device convenient to adjust.

SUMMERY OF THE UTILITY MODEL

The present invention provides a chemical mechanical polishing apparatus that is easy to adjust and solves the above problems.

In order to solve the technical problems, the utility model provides the following technical scheme:

the utility model relates to a chemical mechanical polishing device convenient to adjust, which comprises a chassis, wherein an annular groove is formed in the outer side wall of the bottom end of the chassis, a fixing ring is connected inside the annular groove in a sliding manner, the bottom of the fixing ring is fixedly connected with a fixing disc through two connecting rods, an air bag is arranged between the fixing ring and the chassis, the outer side wall of the air bag is fixedly communicated with a pressurizing mechanism, a protection mechanism is sleeved on the outer side wall of the air bag and fixedly connected between the chassis and the fixing disc, a reset mechanism is arranged inside the chassis, a clamping mechanism is arranged between the reset mechanism and the annular groove, and the reset mechanism is communicated with the annular groove through the clamping mechanism.

Preferably, screens mechanism includes fan type movable plate, fan type shifting chute, slot and inserted bar, fan type movable plate, slot and inserted bar all are provided with two, two fan type movable plate symmetry is seted up on the inside wall in annular groove, two the equal sliding connection of fan type movable plate is in the inside of fan type shifting chute, two the slot is all seted up on solid fixed ring's lateral wall, two sliding connection fan type movable plate is all run through to the one end of inserted bar, canceling release mechanical system is located between two fan type shifting chutes, two the one end that canceling release mechanical system was kept away from to the inserted bar all runs through solid fixed ring of sliding connection through the slot.

Preferably, the reset mechanism comprises a shrink groove, two ends of the shrink groove are communicated with the annular groove through fan-shaped moving grooves, two sliding plates are connected to two ends of the inside of the shrink groove in a sliding mode, two sliding blocks are fixedly connected to the outer side wall of each sliding plate, sliding grooves are formed in two sides of each sliding plate, the sliding grooves are formed in the inner side wall of the shrink groove, the sliding blocks are connected to the inside of the sliding grooves in a sliding mode, and two reset springs are fixedly connected between the sliding plates.

Preferably, protection machanism includes protection casing and a protection section of thick bamboo, a protection section of thick bamboo threaded connection is on the interior roof of annular groove, the protection casing is provided with two, two the distribution is established to the overcoat in the protection casing, all set up the spout that two symmetries set up on the lateral wall of protection casing, two sliding connection has two spacing axles between the protection casing, the equal sliding connection of spacing axle is in the inside of two spouts, two the protection casing passes through spout and spacing axle sliding connection, is located the outside protection casing top and chassis fixed connection are located inside protection casing bottom and fixed disk fixed connection are located inside the lateral wall fixed connection of protection casing and gasbag.

Preferably, booster mechanism includes intake pipe, outlet duct, booster pump and aspiration pump, intake pipe and outlet duct are all fixed the intercommunication on the lateral wall of gasbag, the one end that gasbag was kept away from to intake pipe and outlet duct is sent and is do not fixed the intercommunication with the output of booster pump and aspiration pump, booster pump and aspiration pump all are located the below of fixed disk.

Preferably, the equal fixedly connected with air pump support in bottom of booster pump and aspiration pump, booster pump and aspiration pump all pass through air pump support fixed connection in the bottom of fixed disk.

The utility model has the following beneficial effects: according to the utility model, by arranging the reset mechanism, the clamping mechanism, the protection structure and the pressurizing mechanism, when the pressure between the chassis and the polishing head needs to be adjusted for polishing the surfaces of different wafers, the pressurizing pump inflates the air bag through the air inlet pipe or extracts the air in the air bag through the air exhaust pump, so that the expansion degree of the air bag can be adjusted, the distance between the fixed disk and the chassis is adjusted, the pressure between the polishing head pressing on the chassis and the chassis is adjusted, the pressure between the upper surface of the chassis and the wafers can be adjusted, and the polishing effect on the surfaces of the wafers is prevented from being influenced when different wafers are polished;

through setting up screens mechanism, canceling release mechanical system and protection machanism, when needs overhaul the chassis or change, carry out the easy operation of dismantling, after the change, carry out the easy operation of installation, be convenient for overhaul and change convenient to use to the chassis.

Drawings

The accompanying drawings, which are included to provide a further understanding of the utility model and are incorporated in and constitute a part of this specification, illustrate embodiments of the utility model and together with the description serve to explain the principles of the utility model and not to limit the utility model. In the drawings:

FIG. 1 is an external structural view of the present invention;

FIG. 2 is a schematic view of the internal structure of the present invention;

fig. 3 is an enlarged schematic view of a portion a in fig. 2.

In the figure: 1. a chassis; 2. an annular groove; 3. a fixing ring; 31. a connecting rod; 32. fixing the disc; 4. a reset mechanism; 41. a sliding plate; 42. a slider; 43. a sliding groove; 44. a return spring; 45. a contraction groove; 5. a clamping mechanism; 51. a sector-shaped moving plate; 52. a fan-shaped moving groove; 53. a slot; 54. inserting a rod; 6. an air bag; 7. a protection mechanism; 71. a protective cover; 72. a chute; 73. a limiting shaft; 74. a protective cylinder; 8. a pressurization mechanism; 81. an air inlet pipe; 82. an air outlet pipe; 83. a booster pump; 84. an air pump.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

Example (b): as shown in fig. 1-3, a chemical mechanical polishing device convenient to adjust, including chassis 1, annular groove 2 has been seted up on the lateral wall of chassis 1 bottom, the inside sliding connection of annular groove 2 has solid fixed ring 3, gu fixed ring 3's bottom is through two connecting rod 31 fixedly connected with fixed disks 32, gu be provided with gasbag 6 between fixed ring 3 and the chassis 1, gasbag 6's lateral wall is fixed to be communicated and is had booster mechanism 8, the cover is equipped with protection machanism 7 on gasbag 6's the lateral wall, protection machanism 7 fixed connection is between chassis 1 and fixed disks 32, chassis 1's inside is provided with canceling release mechanical system 4, be provided with clamping mechanism 5 between canceling release mechanical system 4 and the annular groove 2, canceling release mechanical system 4 is linked together through clamping mechanism 5 and annular groove 2.

The clamping mechanism 5 comprises a fan-shaped moving plate 51, fan-shaped moving grooves 52, slots 53 and inserting rods 54, the fan-shaped moving grooves 52, the fan-shaped moving plate 51, the slots 53 and the inserting rods 54 are arranged in two numbers, the two fan-shaped moving grooves 52 are symmetrically arranged on the inner side wall of the annular groove 2, the two fan-shaped moving plates 51 are connected inside the fan-shaped moving grooves 52 in a sliding mode, the two slots 53 are arranged on the side wall of the fixing ring 3, one ends of the two inserting rods 54 are connected with the fan-shaped moving plates 51 in a penetrating and sliding mode, the resetting mechanism 4 is located between the two fan-shaped moving grooves 52, and one ends, far away from the resetting mechanism 4, of the two inserting rods 54 are connected with the fixing ring 3 in a penetrating and sliding mode through the slots 53.

Canceling release mechanical system 4 includes shrink groove 45, shrink groove 45's both ends all are linked together with annular groove 2 through fan-shaped moving chute 52, shrink groove 45's the equal sliding connection in inside both ends has sliding plate 41, two sliding blocks 42 of equal fixedly connected with on sliding plate 41's the lateral wall, sliding plate 41's both sides all are provided with sliding tray 43, sliding tray 43 all sets up on shrink groove 45, the inside wall on, the equal sliding connection of sliding block 42 is in sliding tray 43's inside, fixedly connected with reset spring 44 between two sliding plates 41.

Protection machanism 7 includes protection casing 71 and a protection section of thick bamboo 74, a protection section of thick bamboo 74 threaded connection is on the interior roof of annular groove 2, protection casing 71 is provided with two, the inside and outside cover of two protection casings 71 is established and is distributed, all set up the spout 72 that two symmetries set up on the lateral wall of protection casing 71, sliding connection has two spacing axles 73 between two protection casings 71, the equal sliding connection of spacing axle 73 is in the inside of two spouts 72, two protection casings 71 pass through spout 72 and spacing axle 73 sliding connection, be located outside protection casing 71 top and chassis 1 fixed connection, be located inside protection casing 71 bottom and fixed disk 32 fixed connection, be located inside protection casing 71 and the lateral wall fixed connection of gasbag 6.

The pressurizing mechanism 8 comprises an air inlet pipe 81, an air outlet pipe 82, a pressurizing pump 83 and a suction pump 84, the air inlet pipe 81 and the air outlet pipe 82 are fixedly communicated on the outer side wall of the air bag 6, one ends, far away from the air bag 6, of the air inlet pipe 81 and the air outlet pipe 82 are fixedly communicated with the output ends of the pressurizing pump 83 and the suction pump 84 respectively, and the pressurizing pump 83 and the suction pump 84 are located below the fixed disc 32.

The bottoms of the booster pump 83 and the air pump 84 are fixedly connected with air pump supports, and the booster pump 83 and the air pump 84 are fixedly connected with the bottom of the fixed disk 32 through the air pump supports.

Specifically, when the polishing device is used, an external power supply is connected, a polishing head carries a wafer to abut against the upper surface of the chassis 1, the fixed disk 32 is connected with a rotating shaft of a mechanical polishing device, through the arrangement of the reset mechanism 4, the clamping mechanism 5, the protection structure and the pressurization mechanism 8, when the pressure between the chassis 1 and the polishing head needs to be adjusted for polishing different wafer surfaces, the booster pump 83 inflates the air bag 6 through the air inlet pipe 81 or extracts the air in the air bag 6 through the air exhaust pump 84, the expansion degree of the air bag 6 can be adjusted, the fixed disk 32 drives the fixed ring 3 to move through the connecting rod 31, because the fixed ring 3 is clamped with the fan-shaped moving plate 51 through the inserted link 54, the fixed ring 3 is prevented from separating from the ring groove 2, the distance between the fixed disk 32 and the chassis 1 is adjusted, the chassis 1 can be driven to move upwards, the pressure between the polishing head pressing on the chassis 1 and the chassis 1 is adjusted, the pressure between the upper surface of the chassis 1 and the wafer can be adjusted, the polishing effect on the surface of the wafer is prevented from being influenced when different wafers are polished, by arranging the clamping mechanism 5, the reset mechanism 4 and the protection mechanism 7, when the chassis 1 needs to be overhauled or replaced, after bolts between the protection cylinder 74 and the annular groove 2 are screwed, the air in the air bag 6 is pumped by the air pump 84 through the air outlet pipe 82, the chassis 1 moves downwards, the fixing ring 3 drives the fan-shaped moving plate 51 to abut against the inner top wall of the fan-shaped moving groove 52 through the inserting rod 54, the inserting rod 54 in the inserting groove 53 is pushed towards the inside of the fan-shaped moving plate 51, the inserting rod 54 moves into the contraction groove 45 through pushing the sliding plate 41, the chassis 1 can be separated from the fixing ring 3 after the inserting rod 54 is pushed away from the inserting groove 53, because the reset spring 44 has elasticity, the inserting rod 54 can be pushed into the annular groove 2 through pushing the sliding plate 41, carry out the easy operation of dismantling, after the change, in propelling movement inserted bar 54 inserts shrink groove 45, hide in fan type movable plate 51 back until its one end that is close to annular groove 2, with solid fixed ring 3 propelling movement to annular groove 2's inside, reset spring 44 drives inserted bar 54 through promoting sliding plate 41 and inserts in slot 53, can accomplish the installation, and the easy operation of installing is carried out, is convenient for overhaul chassis 1 and change convenient to use.

Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the utility model, the scope of which is defined in the appended claims and their equivalents.

Claims

1. The utility model provides a be convenient for adjust chemical mechanical polishing device, its characterized in that, includes chassis (1), annular groove (2) have been seted up on the lateral wall of chassis (1) bottom, the inside sliding connection of annular groove (2) has solid fixed ring (3), the bottom of solid fixed ring (3) is through two connecting rod (31) fixedly connected with fixed disk (32), be provided with gasbag (6) between solid fixed ring (3) and chassis (1), the lateral wall of gasbag (6) is fixed to be communicated has booster mechanism (8), the cover is equipped with protection machanism (7) on the lateral wall of gasbag (6), protection machanism (7) fixed connection is between chassis (1) and fixed disk (32), the inside of chassis (1) is provided with canceling release mechanical system (4), be provided with screens mechanism (5) between canceling release mechanical system (4) and annular groove (2), the reset mechanism (4) is communicated with the annular groove (2) through a clamping mechanism (5).

2. The chemical mechanical polishing device convenient to adjust as recited in claim 1, wherein the clamping mechanism (5) comprises a fan-shaped moving plate (51), two fan-shaped moving grooves (52), two slots (53) and two insertion rods (54), the two fan-shaped moving grooves (52), the two fan-shaped moving plates (51), the two slots (53) and the two insertion rods (54) are symmetrically arranged on the inner side wall of the annular groove (2), the two fan-shaped moving plates (51) are slidably connected inside the fan-shaped moving grooves (52), the two slots (53) are arranged on the side wall of the fixing ring (3), one ends of the two insertion rods (54) penetrate through the slidably connected fan-shaped moving plate (51), the resetting mechanism (4) is located between the two fan-shaped moving grooves (52), and one ends of the two insertion rods (54) far away from the resetting mechanism (4) penetrate through the slidably connected fixing ring (3) through the slots (53).

3. The chemical mechanical polishing device convenient for adjustment of the chemical mechanical polishing device as recited in claim 2, wherein the reset mechanism (4) comprises a shrink slot (45), both ends of the shrink slot (45) are communicated with the annular slot (2) through fan-shaped moving slots (52), both ends of the interior of the shrink slot (45) are slidably connected with sliding plates (41), both sliding blocks (42) are fixedly connected on the outer side walls of the sliding plates (41), both sides of the sliding plates (41) are provided with sliding slots (43), both sliding slots (43) are arranged on the inner side walls of the shrink slot (45), both sliding blocks (42) are slidably connected inside the sliding slots (43), and a reset spring (44) is fixedly connected between the two sliding plates (41).

4. The chemical mechanical polishing device convenient to adjust as recited in claim 3, wherein the protection mechanism (7) comprises two protection covers (71) and two protection cylinders (74), the protection cylinders (74) are screwed on the inner top wall of the annular groove (2), the two protection covers (71) are provided with two protection covers (71) which are sleeved with each other and distributed, the side walls of the protection covers (71) are respectively provided with two symmetrically arranged sliding grooves (72), two limit shafts (73) are connected between the two protection covers (71) in a sliding manner, the limit shafts (73) are respectively connected in the two sliding grooves (72) in a sliding manner, the two protection covers (71) are connected with each other in a sliding manner through the sliding grooves (72) and the limit shafts (73), the top end of the protection cover (71) positioned outside is fixedly connected with the base plate (1), and the bottom end of the protection cover (71) positioned inside is fixedly connected with the fixed plate (32), the protective cover (71) positioned inside is fixedly connected with the outer side wall of the air bag (6).

5. A chemical mechanical polishing device convenient for adjustment according to claim 4, wherein the pressurization mechanism (8) comprises an air inlet pipe (81), an air outlet pipe (82), a pressurization pump (83) and a suction pump (84), the air inlet pipe (81) and the air outlet pipe (82) are fixedly communicated on the outer side wall of the air bag (6), one ends of the air inlet pipe (81) and the air outlet pipe (82) far away from the air bag (6) are fixedly communicated with the output ends of the pressurization pump (83) and the suction pump (84), respectively, and the pressurization pump (83) and the suction pump (84) are both located below the fixed disk (32).

6. A chemical mechanical polishing apparatus convenient for conditioning as defined in claim 5, wherein the bottom of each of the booster pump (83) and the suction pump (84) is fixedly connected with an air pump bracket, and each of the booster pump (83) and the suction pump (84) is fixedly connected with the bottom of the fixed platen (32) through the air pump bracket.