CN215288347U - Integrated trace boron removal device - Google Patents
Integrated trace boron removal device Download PDFInfo
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- CN215288347U CN215288347U CN202120660230.6U CN202120660230U CN215288347U CN 215288347 U CN215288347 U CN 215288347U CN 202120660230 U CN202120660230 U CN 202120660230U CN 215288347 U CN215288347 U CN 215288347U
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Abstract
The utility model relates to an integral type trace removes boron device, its structure is including setting up the RO basin that connects gradually in the container body and through conduit, the booster pump, the organic carbon descaler, degasser, remove boron electric desalination device, remove boron resin tower, polishing mixed resin tower and nitrogen sealing basin, the external two-stage RO of RO basin entry produces the water pipe, degasser's nitrogen gas sweeps the import and passes through the external nitrogen gas generating device of gas transmission pipeline, degasser's nitrogen gas sweeps the export and passes through gas transmission pipeline connection vacuum apparatus, the external terminal polishing section of pipeline is passed through to nitrogen sealing basin delivery port, nitrogen sealing basin is also through the external nitrogen gas generating device of gas transmission pipeline. The utility model has the advantages that: structural design is reasonable, and area is little, has practiced thrift the nitrogen gas use amount, need not acid-base regeneration, and trace boron gets rid of efficiently, and the integrated installation of integral type can full automatic operation, and supply of material cycle is short, and the treatment effect is stable. Is particularly suitable for small and medium semiconductor factories and scientific research laboratories.
Description
Technical Field
The utility model relates to an integral trace boron removal device, which belongs to the technical field of ultrapure water treatment.
Background
The boron content of surface water in nature is relatively stable, generally less than 0.5mg/L, and can reach 0.1mg/L in a few areas. The boron content of the underground water is generally higher, generally 0.5-1.5 mg/L, and the boron content of individual highly mineralized areas and boron mineral areas can reach 2-29 mg/L. The seawater also has a high boron content of 4-7 mg/L, and the average value is 4.5 mg/L.
Too high boron content of drinking water will affect the liver and kidney of human body. Too high boron will produce toxicity to irrigated plants, causing withered and yellow leaves and falling off, and affecting the growth of plants. In industrial production, particularly in the electronic industry and wafer or chip production, the content of boron directly affects the yield of products, the line width of the current mainstream 8-12 inches of wafers is 10-28 nm, and the content of boron in ultrapure water is generally limited to be less than 20 ng/L. Due to the substantial breakthrough of the 5nm production process, the requirement for the quality of ultrapure water must be increased after the mass production of large-size wafers and narrow-line processes in the future, and the control of the boron content becomes an important research subject.
In a semiconductor production process, boron is a p-type impurity, and the excess can make n-type silicon invert, which has an influence on the electron and hole concentrations. Boron removal is therefore a significant consideration in the pure water industry. Boron belongs to weak ionization elements, is not easy to ionize in water, generally exists in boric acid and borate, and cannot be effectively removed by a water purification technology, so that boron is a type of ion which enters pure water firstly when ion exchange resin is nearly exhausted in the process of producing ultrapure water. Boric acid is very weak and readily ionizes at high pH:
pH＜7:H2BO3
pH＞11.5：B(OH)4 -；
the ionization of boric acid is also affected by temperature and ionic strength, and at high concentrations, polymers are formed:
the presence of boron creates a weak acid environment and is therefore difficult to remove by conventional means. At present, the mature boron removal methods with certain development prospects comprise a precipitation method, an adsorption method, an extraction method, a reverse osmosis separation method, an ion exchange resin method and the like.
In the prior art, the traditional semiconductor water treatment project is usually treated by adopting the processes of an anion bed, a decarbonizing tower, reverse osmosis, an organic carbon decarbonizer, a mixed ion exchange tower and a polishing mixed ion exchange tower, and the ion content of boron in effluent can generally reach 50ppt and can reach 20ppt under a good condition. The traditional water treatment process in the prior art needs a large amount of acid and alkali to regenerate a negative and positive bed and a mixed bed, and the operation is complex.
SUMMERY OF THE UTILITY MODEL
The utility model provides an integral type trace removes boron device, its purpose aims at overcoming the above-mentioned not enough that prior art exists, need not acid-base regeneration, improves trace boron and gets rid of efficiency, and the integrated installation of integral type can full automatic operation, improves treatment effect stability.
The technical solution of the utility model is as follows: the utility model provides an integral type trace removes boron device, its structure is including setting up the RO basin that just connects gradually through conduit in the container body, the booster pump, the organic carbon descaler, degasser, remove boron electricity demineralizer, remove boron resin tower, polishing mixed resin tower and nitrogen sealing basin, the external two-stage RO of RO basin entry produces the water pipe, degasser's nitrogen gas sweeps the import and passes through the external nitrogen gas generating device of conduit, degasser's nitrogen gas sweeps the export and passes through conduit connection vacuum apparatus, the external terminal polishing section of conduit is passed through to nitrogen sealing basin delivery port, nitrogen sealing basin is also through the external nitrogen gas generating device of conduit.
Preferably, the RO water tank and the nitrogen-sealed water tank are respectively provided with a liquid level meter, a sewage discharge valve and an overflow pipeline.
Preferably, the degassing device is internally provided with a hydrophobic membrane for removing oxygen and carbon dioxide.
Preferably, the vacuum device is respectively connected with the circulating cooling device and the steam-water separation device through pipelines.
Preferably, the exhaust port of the steam-water separation device is connected to the outside of the container body through a pipeline.
Preferably, the boron-removing electric desalting device is internally provided with boron-removing resin, a water production outlet of the boron-removing electric desalting device is provided with a pressure gauge, a concentrated water outlet of the boron-removing electric desalting device is provided with a flow switch audible and visual alarm, and the concentrated water outlet of the boron-removing electric desalting device is connected to the outside of the container through a pipeline.
Preferably, the inlet of the boron removal electric desalting device, the inlet of the boron removal resin tower and the outlet of the polishing mixed resin tower are respectively connected with a resistance meter, the outlet of the boron removal resin tower is provided with a boron meter and a three-level water quality index automatic monitoring device, and the outlets of the boron removal resin tower and the polishing mixed resin tower are provided with two off-line detection devices.
Preferably, the boron-removing resin tower is filled with boron-selective resin,
preferably, an automatic three-way proportional flow control valve is arranged on a pipeline in front of the inlet of the nitrogen-sealed water tank.
Preferably, a ventilation system is further arranged in the container body.
The utility model has the advantages that: structural design is reasonable, and area is little, has practiced thrift the nitrogen gas use amount, need not acid-base regeneration, and trace boron gets rid of efficiently, and the integrated installation of integral type can full automatic operation, and supply of material cycle is short, and the treatment effect is stable. Is particularly suitable for small and medium semiconductor factories and scientific research laboratories.
Drawings
FIG. 1 is a schematic structural diagram of the integrated trace boron removal device of the present invention.
FIG. 2 is a schematic view of the boron removing process of the integrated trace boron removing device of the present invention.
In the figure, 1 is an RO water tank, 101 is a two-stage RO water producing pipe, 2 is a booster pump, 3 is an organic carbon remover, 4 is a deaerator, 401 is a nitrogen gas generator, 5 is a vacuum device, 6 is a boron removal electric desalter, 7 is a boron removal resin column, 8 is a polishing mixed resin column, 9 is a nitrogen sealed water tank, and 901 is an end polishing section.
Detailed Description
The present invention will be described in further detail with reference to examples and embodiments.
As shown in figure 1, an integral type trace removes boron device, its structure is including setting up RO basin 1 in the container body and connecting gradually through water pipeline, booster pump 2, organic carbon removes except that ware 3, degasser 4, remove boron electricity demineralizer 6, remove boron resin tower 7, polishing mixed resin tower 8 and nitrogen seals water tank 9, the external two-stage RO of RO basin 1 entry produces water pipe 101, degasser 4's nitrogen gas sweeps the import and passes through the external nitrogen gas generating device 401 of gas pipeline, degasser 4's nitrogen gas sweeps the export and passes through gas pipeline connection vacuum apparatus 5, nitrogen seals water tank 9 delivery port and passes through the external terminal polishing section of pipeline 901, nitrogen seals water tank 9 also through the external nitrogen gas generating device 401 of gas pipeline.
And a ventilation system is also arranged in the container body.
According to the above structure, as shown in fig. 1 and 2, in operation, two-stage RO produced water enters into the RO water tank 1, the outlet of the RO water tank 1 is connected with the inlet of the booster pump 2, the outlet of the booster pump 2 is connected with the inlet of the organic carbon remover 3, the outlet of the organic carbon remover 3 is connected with the inlet of the degasser 4, the outlet of the degasser 4 is connected with the total water inlet of the boron removal electric desalter 6, the outlet of the boron removal electric desalter 6 is connected with the inlet of the boron removal resin tower 7, the outlet of the boron removal resin tower 7 is connected with the inlet of the polishing mixed resin tower 8, and the outlet of the polishing mixed resin tower 8 is connected with the inlet of the nitrogen sealed water tank 9. An air inlet of the vacuum device 5 is connected with a nitrogen purging outlet of the degassing device 4, and the vacuum device 5 is provided with a circulating cooling device and a steam-water separation device.
The inside of the degasser 4 is provided with a hydrophobic membrane capable of removing oxygen and carbon dioxide, so that the influence of untreated carbon dioxide at the front end on the system is reduced, the load on the ion exchange resin is reduced, and meanwhile, oxygen is effectively removed.
RO basin 1, nitrogen seal basin 9 all set up level gauge, blowdown valve and overflow pipe, the external nitrogen gas generating device 401 of nitrogen seal basin 9 inhibits the contact of space above nitrogen seal basin 9 and outside air, effectively guarantees quality of water. An automatic three-way proportional flow control valve is arranged in front of the inlet of the nitrogen-sealed water tank 9, the water inlet flow is adjusted in time according to the use condition to maintain the liquid level of the nitrogen-sealed water tank 9 constant, and the nitrogen consumption is saved.
This device adopts the integrated design, can concentrate all devices and place in the container body of customization. Because trace H is generated in the operation process of the boron-removing electric desalting device 62Therefore, the concentrated water is arranged to be discharged out of the integrated device or recycled into the front stage water tank. The air outlet of the steam-water separation device in the vacuum device 5 is connected to the outside of the device.
The boron-removing electric desalting device 6 of the device is internally provided with boron-removing resin (known technology), the boron-removing efficiency reaches 99 percent, and H generated by electrolyzed water is relied on+And OH-The resin is effectively regenerated. The concentrated water is provided with a flow switch for alarming and is provided with an acousto-optic alarm, so that a user can be informed of the fact that the concentrated water flow of the boron removal electric desalting device is lower than a set value in time. The water production is provided with a pressure gauge for observing the change of the pressure difference in the device.
This device sets gradually the resistivity table in removing 6 imports of boron electricity demineralizer, removing 7 imports of boron resin tower, 8 exports of polishing mixed resin tower, removes 7 exports of boron resin tower and sets up boron table, tertiary quality of water index automatic monitoring device, can in time flow back to last flow section with handling unqualified water, avoids the pollution to follow-up equipment. Meanwhile, two off-line detection devices are arranged at the outlets of the boron removal resin tower 7 and the polishing mixed resin tower 8 and are used for off-line analysis of water quality, particularly analysis of trace boron.
The resin filled in the boron removal resin tower 8 of the device is boron selective resin (the prior art), is resin combined with boron ions by a complexing mechanism, and compared with the traditional ion exchange, the combination has the advantages of stronger coulomb force, higher boron removal efficiency and very small influence of other ions.
All the above components are prior art, and those skilled in the art can use any model and existing design that can implement their corresponding functions.
The foregoing is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, many modifications and improvements can be made without departing from the inventive concept, and all of them belong to the protection scope of the present invention.
Claims (10)
1. The utility model provides an integral type trace removes boron device, its characteristic is including setting up RO basin (1) in the container body and connecting gradually through water pipeline, booster pump (2), organic carbon descaler (3), degasser (4), remove boron electricity demineralizer (6), remove boron resin tower (7), polish mixed resin tower (8) and nitrogen sealing basin (9), water pipe (101) are produced to the external two-stage RO of RO basin (1) entry, the nitrogen gas of degasser (4) sweeps the import and passes through the external nitrogen gas generating device of gas pipeline (401), the nitrogen gas of degasser (4) sweeps the export and passes through gas pipeline connection vacuum apparatus (5), nitrogen sealing basin (9) delivery port passes through the external terminal polishing section of pipeline (901), nitrogen sealing basin (9) also pass through the external nitrogen gas generating device of gas pipeline (401).
2. The integrated trace boron removal device as claimed in claim 1, wherein the RO water tank (1) and the nitrogen-sealed water tank (9) are respectively provided with a liquid level meter, a sewage valve and an overflow pipeline.
3. The integrated trace boron removal device as claimed in claim 1, wherein a hydrophobic membrane for removing oxygen and carbon dioxide is arranged in said degassing device (4).
4. The integrated trace boron removal device as claimed in claim 1, wherein said vacuum device (5) is connected to the circulating cooling device and the steam-water separation device through pipes, respectively.
5. The integrated trace boron removal device as claimed in claim 4, wherein an exhaust port of said steam-water separation device is connected to the outside of the container body through a pipe.
6. The integrated trace boron removal device as claimed in claim 1, wherein the boron removal electric desalting device (6) is internally provided with boron removal resin, a water outlet of the boron removal electric desalting device (6) is provided with a pressure gauge, a concentrated water outlet of the boron removal electric desalting device (6) is provided with a flow switch audible and visual alarm, and the concentrated water outlet of the boron removal electric desalting device (6) is connected to a container body through a pipeline and is discharged outside the container body.
7. The integrated trace boron removal device as claimed in claim 1, wherein the inlet of the boron removal electric desalting device (6), the inlet of the boron removal resin tower (7) and the outlet of the polishing mixed resin tower (8) are respectively connected with a resistance meter, the outlet of the boron removal resin tower (7) is provided with a boron meter and a three-level water quality index automatic monitoring device, and the outlets of the boron removal resin tower (7) and the polishing mixed resin tower (8) are provided with two off-line detection devices.
8. An integrated trace boron removal apparatus as claimed in claim 1, wherein said boron removal resin tower (8) is filled with a boron selective resin,
9. the integrated trace boron removal device as claimed in claim 4, wherein an automatic three-way proportional flow control valve is arranged on a pipeline in front of an inlet of the nitrogen-sealed water tank (9).
10. An integrated trace boron removal device as claimed in any one of claims 1 to 9, wherein a ventilation system is further provided in said container.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202120660230.6U CN215288347U (en) | 2021-04-01 | 2021-04-01 | Integrated trace boron removal device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202120660230.6U CN215288347U (en) | 2021-04-01 | 2021-04-01 | Integrated trace boron removal device |
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| Publication Number | Publication Date |
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| CN215288347U true CN215288347U (en) | 2021-12-24 |
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|---|---|---|---|
| CN202120660230.6U Active CN215288347U (en) | 2021-04-01 | 2021-04-01 | Integrated trace boron removal device |
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| CN (1) | CN215288347U (en) |
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2021
- 2021-04-01 CN CN202120660230.6U patent/CN215288347U/en active Active
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