CN215285982U - Rack is used in production of nanometer protection film - Google Patents

Abstract

The utility model discloses a rack is used in production of nanometer protection film, include: the main frame, the adjusting structure and the limiting structure are arranged on the main frame, wherein the limiting structure comprises a plurality of limiting rods, a plurality of springs are arranged on the outer surface of each limiting rod, an arc-shaped limiting plate is fixedly connected to one end, far away from the limiting rod, of the spring, through the arrangement of the limiting rod and the arc-shaped limiting plate, workers can install the winding roller with the nanometer protective film outside the arc-shaped limiting plate, meanwhile, the arc-shaped limiting plate is driven to limit the wind-up roll and the nanometer protective film through the resilience formed by the spring, so that the phenomenon that the nanometer protective film falls off is avoided, meanwhile, the worker starts the positive and negative rotation motor, drives the support rod and the limiting rod to rotate through the positive and negative rotation motor, thereby adjust the position of arc limiting plate, make things convenient for the staff to place the position of difference with the nanometer protection film.

Description

Rack is used in production of nanometer protection film

Technical Field

The utility model relates to a rack technical field specifically is a rack is used in production of nanometer protection film.

Background

The nano film is divided into a particle film and a compact film, the particle film is a film with nanoparticles adhered together and a very fine gap in the middle, and the compact film refers to a film with a compact film layer and a nano-scale grain size and can be used for: gas catalysis, like automobile exhaust treatment material, filter material, high density magnetic recording material, photosensitive material, flat panel display material, superconducting material etc, need to use the wind-up roll to collect the nanometer protection film after the production is accomplished in the middle of the production process of nanometer protection film, and place the rack with the wind-up roll, and current rack is when placing the wind-up roll to the nanometer protection film, can not carry out spacingly and fixed to the wind-up roll, the condition that the wind-up roll dropped takes place very easily, lead to the damage of nanometer protection film, and current rack is when the staff places, need the staff to move different positions and place the nanometer protection film, and do not make things convenient for staff's work, for this reason, propose a rack for nanometer protection film production.

SUMMERY OF THE UTILITY MODEL

An object of the utility model is to provide a rack is used in production of nanometer protection film to solve the problem that proposes in the above-mentioned background art.

In order to achieve the above object, the utility model provides a following technical scheme: a rack is used in nanometer protection film production, includes: the main frame, the adjusting structure and the limiting structure;

the adjusting structure and the limiting structure are both arranged on the main frame;

wherein, limit structure includes a plurality of gag lever posts, the outside surface mounting of gag lever post has a plurality of springs, the spring is kept away from the one end fixedly connected with arc limiting plate of gag lever post.

Through adopting above-mentioned technical scheme, through the setting of body frame, for adjusting structure and limit structure provide mounted position to for the wind-up roll of nanometer protection film provides through the gag lever post and places the space, the resilience that forms through the spring simultaneously drives the arc limiting plate and carries on spacingly to the wind-up roll of nanometer protection film, avoids the wind-up roll production of nanometer protection film to drop, and through the position of placing of adjusting structure adjustment nanometer protection film wind-up roll, the staff's of being convenient for use.

Preferably, the main frame comprises a shell, a circular through groove is formed in the surface of the upper portion of the shell, a plurality of fixing frames are mounted on the upper portion of the shell, and a top plate is fixedly connected to the tops of the fixing frames.

Through adopting above-mentioned technical scheme, set up to adjusting the structure through the casing and provide the mounted position to install limit structure through mount and roof.

Preferably, adjust the structure including positive reverse motor, positive reverse motor fixed mounting in the inside diapire of casing, the circular limiting plate of output shaft fixedly connected with of positive reverse motor, the outside surface of circular limiting plate with the internal surface homogeneous body shaping that circular leads to the groove has a plurality of semicircle spacing strips, the semicircle spacing strip sets up to the elastic rubber strip, the upper portion fixed surface of circular limiting plate is connected with the bracing piece.

Through adopting above-mentioned technical scheme, through starting just reversing the motor, drive circular limiting plate through just reversing the motor and rotate, the rotation of circular limiting plate can drive the bracing piece and rotate to adjust the position of nanometer protection film wind-up roll, and through the setting of semicircle spacing strip, avoid bracing piece and circular limiting plate to remove at will.

Preferably, a plurality of universal wheels are mounted on the lower surface of the housing through screws, and a push handle is fixedly mounted outside the housing.

Through adopting above-mentioned technical scheme, the user is convenient for carry out position adjustment to this device for the impetus cooperation universal wheel through pushing away the handle.

Preferably, the top of the supporting rod is rotatably connected to the lower surface of the top plate through a bearing, and the plurality of limiting rods are fixedly mounted on the outer surface of the supporting rod.

Through adopting above-mentioned technical scheme, carry on spacingly through the roof to the bracing piece, provide installation space for the gag lever post through the bracing piece simultaneously to carry on spacingly to the gag lever post.

Preferably, the diameter of the outer wall of the circular limiting plate is smaller than the diameter of the inner wall of the circular through groove, and the circular limiting plate is clamped inside the circular through groove.

Through adopting above-mentioned technical scheme, carry on spacingly to circular limiting plate through circular logical groove, carry on spacingly to bracing piece and gag lever post simultaneously, be convenient for to the position adjustment of gag lever post, avoid bracing piece and gag lever post to remove at will.

Compared with the prior art, the beneficial effects of the utility model are that:

this application is through the setting of gag lever post and arc limiting plate, the staff can install the outside of arc limiting plate with the wind-up roll that has the nanometer protection film, the resilience that forms through the spring simultaneously drives the arc limiting plate and carries on spacingly to wind-up roll and nanometer protection film, avoid the nanometer protection film to produce the phenomenon that drops, while staff is through starting positive and negative motor, drive bracing piece and gag lever post through positive and negative motor and rotate, thereby adjust the position of arc limiting plate, make things convenient for the staff to place the different positions with the nanometer protection film.

Drawings

Fig. 1 is a schematic structural view of the placing rack for producing the nano-protective film of the present invention;

fig. 2 is a schematic view of the internal structure of the housing of the present invention;

fig. 3 is the utility model discloses the structure schematic diagram of circular limiting plate and semicircle spacing strip.

In the figure: 10. a housing; 11. a circular through groove; 12. a fixed mount; 13. a support bar; 14. a limiting rod; 15. a spring; 16. an arc limiting plate; 17. a top plate; 20. a positive and negative rotation motor; 21. a circular limiting plate; 22. a semicircular limiting strip; 30. a universal wheel; 31. a pushing handle.

Detailed Description

The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.

Referring to fig. 1-3, the present invention provides a technical solution:

as shown in fig. 1-2, a rack for producing a nano protective film comprises: the body frame, adjust structure and limit structure.

Wherein, adjust structure and limit structure and all install on the body frame, through the setting of body frame, provide the mounted position for adjusting structure and limit structure.

Wherein, limit structure includes a plurality of gag lever posts 14, the outside surface mounting of gag lever post 14 has a plurality of springs 15, spring 15 keeps away from the one end fixedly connected with arc limiting plate 16 of gag lever post 14, the wind-up roll of protection film of nanometer provides through gag lever post 14 and places the space, the resilience that forms through spring 15 simultaneously drives arc limiting plate 16 and carries on spacingly to the wind-up roll of nanometer protection film, avoid the wind-up roll of nanometer protection film to produce and drop, and through the position of placing of adjusting structure adjustment nanometer protection film wind-up roll, the staff's of being convenient for use.

As shown in fig. 1-2, the main frame has the following components: the body frame includes casing 10, and circular logical groove 11 has been seted up on the upper portion surface of casing 10, and a plurality of mounts 12 are installed on the upper portion of casing 10, and mount 12 top fixedly connected with roof 17.

The operating principle of the main frame is as follows: the mounting position is provided by the arrangement of the housing 10 for the adjustment structure and the mounting of the stop structure is provided by the mounting bracket 12 and the top plate 17.

As shown in fig. 1-3, the composition of the regulating structure: the structure of adjusting includes positive reverse motor 20, positive reverse motor 20 fixed mounting is in the inside diapire of casing 10, the circular limiting plate 21 of output shaft fixedly connected with of positive reverse motor 20, the outside surface of circular limiting plate 21 and the shaping of the inside surface homogeneous body that circular logical groove 11 led to have the spacing strip 22 of a plurality of semicircles, the spacing strip 22 of semicircle sets up to the elastic rubber strip, the upper portion fixed surface of circular limiting plate 21 is connected with bracing piece 13, the top of bracing piece 13 is passed through the bearing and is rotated and connect in the lower part surface of roof 17, the equal fixed mounting of a plurality of gag lever posts 14 is in the outside surface of bracing piece 13.

As shown in fig. 1-2, the working principle of the adjusting structure is as follows: through starting motor 20 just reversing, it is rotatory to drive circular limiting plate 21 through motor 20 just reversing, and the rotation of circular limiting plate 21 can drive bracing piece 13 and rotate to adjust the position of nanometer protection film wind-up roll, and through the setting of semicircle spacing 22, avoid bracing piece 13 and circular limiting plate 21 to remove at will.

In order to facilitate the movement of the nanometer protective film by workers, a plurality of universal wheels 30 are installed on the surface of the lower part of the shell 10 through screws, a push handle 31 is fixedly installed outside the shell 10, and a user can conveniently adjust the position of the device by taking the push handle 31 as a force application point and matching with the universal wheels 30.

According to the technical scheme, the working steps of the scheme are summarized and carded:

in the application, a user moves the device to a specified position by pushing the handle 31 to match with the universal wheel 30, after the device is moved to the specified position, a worker places the winding roller of the nanometer protective film on the outer wall of the arc limiting plate 16 and drives the arc limiting plate 16 to limit the winding roller through resilience generated by the spring 15, so that the winding roller is prevented from falling off and the nanometer protective film is prevented from being damaged, and when the nanometer protective film is placed, the worker can start the forward and reverse motor 20, wherein the model of the forward and reverse motor 20 is D5BLD220-48A-30S, the rotation of the forward and reverse motor 20 can drive the circular limiting plate 21 and the supporting rod 13 to rotate, so that different limiting rods 14 are moved to different positions, the nanometer protective film can be conveniently placed by the worker, and the time for placing the nanometer protective film in the moving position of the worker is reduced, improve staff's work efficiency, simultaneously through the setting of semicircle spacing strip 22, avoid the random removal of circular limiting plate 21.

To sum up: this application is through the setting of gag lever post 14 and arc limiting plate 16, the staff can install the outside of arc limiting plate 16 with the wind-up roll that has the nanometer protection film, the resilience that forms through spring 15 simultaneously drives arc limiting plate 16 and carries on spacingly to wind-up roll and nanometer protection film, avoid the nanometer protection film to produce the phenomenon that drops, the staff is through starting positive and negative motor 20 that changes, it rotates to drive bracing piece 13 and gag lever post 14 through positive and negative motor 20 that changes, thereby adjust the position of arc limiting plate 16, make things convenient for the staff to place the different positions with the nanometer protection film.

The part not involved in the utility model is the same as the prior art or can be realized by adopting the prior art. Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.

Claims (6)

1. The utility model provides a rack is used in production of nanometer protection film which characterized in that includes: the main frame, the adjusting structure and the limiting structure;

the adjusting structure and the limiting structure are both arranged on the main frame;

wherein, limit structure includes a plurality of gag lever posts (14), the outside surface mounting of gag lever post (14) has a plurality of springs (15), spring (15) are kept away from the one end fixedly connected with arc limiting plate (16) of gag lever post (14).

2. The placing rack for producing the nano protective film according to claim 1, wherein: the main frame comprises a shell (10), a circular through groove (11) is formed in the surface of the upper portion of the shell (10), a plurality of fixing frames (12) are installed on the upper portion of the shell (10), and a top plate (17) is fixedly connected to the tops of the fixing frames (12).

3. The placing rack for producing the nano protective film according to claim 2, wherein: the adjusting structure comprises a forward rotating motor (20), the forward rotating motor (20) is fixedly installed on the inner bottom wall of the shell (10), the circular limiting plate (21) is fixedly connected with an output shaft of the forward rotating motor (20), the outer surface of the circular limiting plate (21) and the inner surface of the circular through groove (11) are integrally formed to form a plurality of semicircular limiting strips (22), the semicircular limiting strips (22) are arranged to be elastic rubber strips, and the upper surface of the circular limiting plate (21) is fixedly connected with a supporting rod (13).

4. The placing rack for producing the nano protective film according to claim 3, wherein: the universal wheels (30) are mounted on the surface of the lower portion of the shell (10) through screws, and the pushing handle (31) is fixedly mounted on the outer portion of the shell (10).

5. The placing rack for producing the nano protective film according to claim 3, wherein: the top of the supporting rod (13) is rotatably connected to the lower surface of the top plate (17) through a bearing, and the limiting rods (14) are fixedly mounted on the outer surface of the supporting rod (13).

6. The placing rack for producing the nano protective film according to claim 5, wherein: the diameter of the outer wall of the circular limiting plate (21) is smaller than that of the inner wall of the circular through groove (11), and the circular limiting plate (21) is clamped inside the circular through groove (11).

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