CN215103483U - Mask assembly and evaporation device using same - Google Patents

Mask assembly and evaporation device using same Download PDF

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Publication number
CN215103483U
CN215103483U CN202120886673.7U CN202120886673U CN215103483U CN 215103483 U CN215103483 U CN 215103483U CN 202120886673 U CN202120886673 U CN 202120886673U CN 215103483 U CN215103483 U CN 215103483U
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China
Prior art keywords
mask
plate
evaporation
substrate
assembly according
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CN202120886673.7U
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Chinese (zh)
Inventor
徐蒙蒙
王江南
史晓波
冯敏强
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Jiangsu Jicui Institute of Organic Optoelectronics Co Ltd
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Jiangsu Jicui Institute of Organic Optoelectronics Co Ltd
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Abstract

The utility model relates to a mask component and an evaporation device, wherein the mask component comprises a mask baffle plate and a mask plate, and the mask baffle plate is positioned at one side of the mask plate, which is far away from a substrate; the mask shielding plate and the mask plate are arranged at intervals in a separated mode; the mask plate is provided with a first evaporation pattern in a hollow mode, the mask shielding plate is provided with a second evaporation pattern in a hollow mode, and the vertical projection of the second evaporation pattern on the substrate covers the vertical projection of the first evaporation pattern on the substrate. It can weaken the coating by vaporization in-process the thermal radiation that the mask plate received avoids the mask plate thermal expansion to produce deformation.

Description

Mask assembly and evaporation device using same
Technical Field
The utility model belongs to the technical field of the evaporation coating technique and specifically relates to indicate a mask assembly and use its coating by vaporization device.
Background
When the evaporation process is adopted to manufacture the film layer in the display panel, a mask plate with patterns corresponding to the mold layer is generally attached to one side to be evaporated on a base plate of the display panel and is arranged above an evaporation source, and evaporation materials in the evaporation source are heated to form vapor which is dispersed to the base plate and deposited on the base plate so as to form the film layer on the base plate.
In the existing mask plate in the evaporation process, the mask plate is influenced by high-temperature gas, can absorb heat and deform, influences pixel offset and causes the defect of color mixing of a target display panel.
Chinese patent CN201080015151.4, publication No. CN102482759B, discloses an apparatus for holding a substrate in a material deposition device, comprising a substrate, a shadow mask and a support mask. The mask is "sandwiched" between the substrate and the supporting mask. The deposition opening of the shadow mask corresponds to an area on the deposition side 10a of the substrate where the material is to be deposited. Thus, the shadow mask can be provided with sufficient support. However, the shadow mask and the support mask are attached, and the support mask absorbs heat during the evaporation process and directly transmits the heat to the shadow mask, so that the shadow mask expands due to heat and deforms. And the shielding mask is jointed with the supporting mask, and in the evaporation process, if the supporting mask absorbs heat to expand, the shielding mask plate can deform along with the supporting mask, and the product quality is finally influenced.
Therefore, a new mask assembly and an evaporation device using the same need to be designed.
SUMMERY OF THE UTILITY MODEL
The to-be-solved technical problem of the utility model is to provide a mask component and use its coating by vaporization device, it can weaken the coating by vaporization in-process relatively the thermal radiation that the mask plate received avoids the mask plate to be heated the inflation and produces deformation, can effectively guarantee ultimate product quality.
In order to solve the technical problem, the utility model provides a mask baffle plate, which comprises a mask baffle plate and a mask plate, wherein the mask baffle plate is positioned at one side of the mask plate, which is far away from the substrate; the mask shielding plate and the mask plate are arranged at intervals in a separated mode; the mask plate is provided with a first evaporation pattern in a hollow mode, the mask shielding plate is provided with a second evaporation pattern in a hollow mode, and the vertical projection of the second evaporation pattern on the substrate covers the vertical projection of the first evaporation pattern on the substrate.
Preferably, the mask shielding plate is pre-bent as a whole, and a bending direction of the mask shielding plate is directed to the mask plate.
Preferably, the mask shielding plate is arc-shaped, and the bending direction of the mask shielding plate points to the mask plate.
Preferably, the mask blocking plate is provided in plurality.
Preferably, the mask shielding plates are stacked.
Preferably, the first evaporation pattern includes a plurality of first evaporation holes, and the second evaporation pattern includes a plurality of second evaporation holes; the first evaporation holes and the second evaporation holes are arranged in a one-to-one correspondence mode.
Preferably, one side of the mask plate, which faces the mask shielding plate, is provided with an infrared reflection coating.
Preferably, the mask device further comprises a bracket for fixing the mask plate and the mask shielding plate.
Preferably, the bracket is arranged on one side of the mask shielding plate far away from the mask plate; the edge of the mask shielding plate and the edge of the mask plate are fixed on the bracket through fasteners.
An evaporation device comprises the mask assembly.
Compared with the prior art, the technical scheme of the utility model have following advantage:
1. the utility model discloses a mask plate and mask shielding plate that set gradually are formed with the clearance between mask shielding plate and the mask plate. In the evaporation process, because a gap is formed, the heat absorbed by the mask shielding plate can not be directly conducted to the mask plate, the mask plate is not easy to deform, and the final product quality can be effectively ensured.
2. The utility model has a gap between the mask baffle plate and the mask plate; in the coating by vaporization in-process, if further thermal expansion, can play the supporting role to the mask, prevent that the coating by vaporization mask from further flagging.
Drawings
In order to make the content of the present invention more clearly understood, the present invention will be described in further detail with reference to the following embodiments of the present invention, in conjunction with the accompanying drawings, wherein:
FIG. 1 is a schematic diagram of a front view structure of a mask assembly;
FIG. 2 is a schematic diagram of a side view structure of a mask assembly.
The specification reference numbers indicate: 10-bracket, 20-mask baffle plate, 30-mask plate, 40-substrate and 11-fastener.
Detailed Description
The present invention is further described with reference to the following drawings and specific embodiments so that those skilled in the art can better understand the present invention and can implement the present invention, but the embodiments are not to be construed as limiting the present invention.
Referring to fig. 1-2, the utility model discloses a mask assembly and use its coating by vaporization device.
Above-mentioned mask assembly sets up in one side of substrate 40, and above-mentioned mask assembly includes: a mask plate 30, a mask shielding plate 20 and a support 10.
Specifically, the mask shielding plate 20, the mask plate 30 and the holder 10 are sequentially disposed. The mask plate 30 is attached to the substrate 40, the mask shielding plate 20 is located between the mask plate 30 and the support 10, and a gap is formed between the mask shielding plate 20 and the mask plate 30. Preferably, the gap between the mask shielding plate 20 and the mask plate 30 is small, a first evaporation pattern is hollowed on the mask plate 30, and a second evaporation pattern is hollowed on the mask shielding plate 20. The vertical projection of the second vapor deposition pattern on the substrate 40 covers the vertical projection of the first vapor deposition pattern on the substrate 40, so as to ensure that the vapor deposition region of the mask shielding plate 20 includes the vapor deposition region of the mask plate 30. In the coating by vaporization in-process, coating by vaporization material is sheltered from by above-mentioned mask shielding plate 20, and coating by vaporization material's heat can not directly be accepted to mask plate 30 to because separation interval sets up between mask shielding plate 20 and the mask plate 30, the heat that mask shielding plate 20 absorbed can not directly conduct to mask plate 30, greatly reduced the temperature of mask plate 30 during operation, make mask plate 30 difficult emergence deformation, can effectively guarantee ultimate product quality. Meanwhile, the heat radiation of the substrate can be weakened, and the performance stability of the device is ensured.
The infrared reflection coating is arranged on one side, facing the mask shielding plate 20, of the mask plate 30, so that the heat radiation effect of the mask shielding plate 20 on the mask plate 30 is reduced, and the temperature rise of the mask plate 30 is prevented.
The holder 10 is located on a side of the mask shielding plate 20 away from the mask plate. Wherein, the edge of the mask plate 30 and the edge of the mask shielding plate 20 are sequentially fixed on the bracket 10 by fasteners to ensure the stability of the structure.
The mask shielding plate 20 is prestressed so that the mask shielding plate 20, which is flat as a whole, is integrally pre-bent, and the bending direction of the mask shielding plate 20 is directed to the mask plate 30. The existence of the above-mentioned prestress makes the mask blank 20 less likely to deform.
Preferably, the mask shielding plate 20 itself may be formed in an arc shape, and a bending direction of the mask shielding plate 20 is directed to the mask plate 30. The mask shielding plate 20 is preferably made of high-toughness SUS 304H stainless steel, so that the mask shielding plate has high precision, smooth surface, and durability, is not easy to bend and deform, and can be tightly attached to a device to reduce the shadow effect.
Further, if the mask shielding plate 20 absorbs heat further during the evaporation process, the mask shielding plate 20 absorbs heat and expands, and the bent portion on the mask shielding plate expands, so that the bent portion on the mask shielding plate supports the mask plate 30, supports the mask plate 30 to be attached to the substrate 40, and prevents the mask plate 30 from further sagging.
Preferably, the mask shielding plates 20 may be provided in plurality, and a plurality of mask shielding plates 20 are stacked, so that the heat radiation received by the mask plate 30 is smaller and the structural stability of the mask assembly is better.
Further, the first evaporation pattern on the mask plate 30 includes a plurality of first evaporation holes arranged in an array, and the second evaporation pattern on the mask shielding plate 20 includes a plurality of second evaporation holes arranged in an array. The first evaporation holes and the second evaporation holes are correspondingly arranged, preferably, the size of the second evaporation holes is slightly larger than that of the corresponding first evaporation holes on all sides, so that the second evaporation holes in the mask baffle plate 20 effectively surround the first evaporation holes in the mask plate 30, and finally formed product quality is guaranteed.
An evaporation device comprises the mask assembly.
The working principle is as follows: the mask shielding plate 20, the mask plate 30 and the holder 10 are sequentially disposed. The mask plate 30 is attached to the substrate 40, and the mask baffle plate 20 is located between the mask plate 30 and the support 10. A gap is formed between the mask baffle plate and the mask plate 30, and in the evaporation process, because the gap is formed, the heat absorbed by the mask baffle plate can not be directly conducted to the mask plate 30, and the mask plate 30 is not easy to deform. Set up the crooked direction that shelters from the mask in advance, shelter from the mask if take place further crooked when the coating by vaporization, can support the mask, prevent that the coating by vaporization mask is flagging, effectively guarantee final product quality.
It should be understood that the above examples are only for clarity of illustration and are not intended to limit the embodiments. Other variations and modifications will be apparent to persons skilled in the art in light of the above description. And are neither required nor exhaustive of all embodiments. And obvious changes and modifications can be made without departing from the scope of the invention.

Claims (10)

1. A mask assembly is arranged on one side of a substrate to be subjected to evaporation, and is characterized by comprising a mask baffle plate and a mask plate, wherein the mask baffle plate is positioned on one side, far away from the substrate, of the mask plate; the mask shielding plate and the mask plate are arranged at intervals in a separated mode;
the mask plate is provided with a first evaporation pattern in a hollow mode, the mask shielding plate is provided with a second evaporation pattern in a hollow mode, and the vertical projection of the second evaporation pattern on the substrate covers the vertical projection of the first evaporation pattern on the substrate.
2. A mask assembly according to claim 1, wherein the mask shield plate is integrally pre-bent, and a bending direction of the mask shield plate is directed toward the mask plate.
3. A mask assembly according to claim 1, wherein the mask shield plate has an arc shape with a bending direction directed toward the mask plate.
4. A mask assembly according to claim 1, wherein the mask shield plate is provided in plurality.
5. A mask assembly according to claim 4, wherein a plurality of mask shield plates are arranged in a stack.
6. A mask assembly according to claim 1, wherein the first evaporation pattern includes a plurality of first evaporation holes, and the second evaporation pattern includes a plurality of second evaporation holes; the first evaporation holes and the second evaporation holes are arranged in a one-to-one correspondence mode.
7. A mask assembly according to claim 1, wherein the side of the mask plate facing the mask shielding plate is provided with an infrared reflective coating.
8. A mask assembly according to claim 1, further comprising a holder for holding the mask and the mask shield plate.
9. A mask assembly according to claim 8, wherein the holder is arranged on a side of the mask shield plate away from the mask plate; the edge of the mask shielding plate and the edge of the mask plate are fixed on the bracket through fasteners.
10. An evaporation device, characterized by comprising the mask assembly of any one of claims 1 to 9.
CN202120886673.7U 2021-04-27 2021-04-27 Mask assembly and evaporation device using same Active CN215103483U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202120886673.7U CN215103483U (en) 2021-04-27 2021-04-27 Mask assembly and evaporation device using same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202120886673.7U CN215103483U (en) 2021-04-27 2021-04-27 Mask assembly and evaporation device using same

Publications (1)

Publication Number Publication Date
CN215103483U true CN215103483U (en) 2021-12-10

Family

ID=79289514

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202120886673.7U Active CN215103483U (en) 2021-04-27 2021-04-27 Mask assembly and evaporation device using same

Country Status (1)

Country Link
CN (1) CN215103483U (en)

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