CN215067725U - Cleaning device for upper cover of gluing developing machine - Google Patents

Abstract

The utility model discloses a rubber coating developing machine upper cover belt cleaning device, comprises a workbench, the rigidity that the workstation both sides are located the middle part between front surface and the rear surface has the fixed station, the upper surface central point of workstation one side fixed station puts fixed mounting has cleaning solution injection apparatus. A rubber coating developing machine upper cover belt cleaning device, it drives the rubber coating development silicon chip to rotate the platform and can follow rubber coating development silicon chip lower surface and be close to border position through the development silicon chip, let rubber coating development silicon chip rotate, it is more stable to rotate the process, avoid rubber coating development silicon chip to rotate the in-process position and change and influence the next step after the washing, and the development silicon chip rotates platform and is little with rubber coating development silicon chip area of contact, the antiskid cover of rubber circle is removable, reduce the pollution to rubber coating development silicon chip after the washing, can clear away unnecessary water stain and dust on rubber coating development silicon chip surface through cleaning the clamp, make clean effect better.

Description

Cleaning device for upper cover of gluing developing machine

Technical Field

The utility model relates to a rubber coating developing machine upper cover belt cleaning device technical field, in particular to rubber coating developing machine upper cover belt cleaning device.

Background

Developing means a process of developing a latent image formed by exposing a film or a printing plate by using a reducing agent, wherein the cleaning device for the upper cover of the gluing developing machine is mainly used for spraying clear water to the front side and the back side of a gluing developing silicon wafer by two groups of spray pipes so as to remove a developing product and redundant developing solution attached to the gluing developing silicon wafer and extruding water on the gluing developing silicon wafer by using an extrusion roller; the existing cleaning device has certain defects when in use, the traditional cleaning device is used for cleaning a glue spreading developing silicon wafer, the contact area between a rotating structure and the glue spreading developing silicon wafer is large in the cleaning process, the glue spreading developing silicon wafer is not stable enough in the rotating process, the position change is easy to occur to influence the next step of cleaning, the cleaning process is only simple to wash, and the cleaning effect is poor.

SUMMERY OF THE UTILITY MODEL

The utility model discloses a main aim at provides a rubber coating developing machine upper cover belt cleaning device can effectively solve the problem in the background art.

In order to achieve the above purpose, the utility model adopts the following technical scheme:

the utility model provides a rubber coating developing machine upper cover belt cleaning device, includes the workstation, the rigidity that the workstation both sides are located the middle part between front surface and the rear surface has the fixed station, the upper surface central point of workstation one side fixed station puts fixed mounting and has cleaning solution injection apparatus, the upper surface central point that cleaning solution injection apparatus one side fixed station was kept away from to the workstation puts fixed mounting and has water jet equipment, the inboard fixed mounting of workstation has the developing silicon chip to rotate the platform, the inboard position fixed mounting who is close to the front surface of workstation cleans the clamp, the workstation upper surface is close to the inboard position fixedly connected with water proof sack, the fixed frame of water proof sack upper end fixedly connected with, the workstation lower surface is close to inboard position fixedly connected with funnel, the lower fixed surface of funnel is connected with the drain pipe.

Preferably, the position that the workstation upper surface is close to the four corners has seted up circular through-hole, circular through-hole inside is fixed with electric telescopic handle No. one, electric telescopic handle's upper end and the lower fixed surface of fixed frame are connected.

Preferably, an opening is formed in the position, close to the rear surface of the workbench, of the lower surface of the developing silicon wafer rotating table, a first electric driving device is fixed inside the opening, a second opening is formed in the inner side of the developing silicon wafer rotating table, the number of the second openings is four, and the second openings are uniformly formed in the inner side of the developing silicon wafer rotating table.

Preferably, the one side that is close to the development silicon chip and rotates the platform outside inside No. two openings all is fixed with the fixed axle, the one end that the development silicon chip rotated the platform was kept away from in the outside of fixed axle is fixed with solid fixed ring, the outside of fixed axle is located and keeps away from fixed mounting between the one end of development silicon chip and the solid fixed ring and has the bearing, an electric drive device axis of rotation outside fixed mounting has the retainer plate, the retainer plate outside all is equipped with the rubber circle with the bearing outside, the rubber circle outside is fixed with the antiskid cover, development silicon chip rotates platform lower fixed surface and installs the dead lever, dead lever installation quantity is four, dead lever evenly installs in development silicon chip and rotates platform lower surface, development silicon chip rotates the platform and passes through dead lever fixed mounting in the workstation inboard.

Preferably, clean and press from both sides including spud pile, No. two electric telescopic handle, lower plate clamp, fixed plate, No. two electric drive device, go up the plate clamp, magic subsides and curved surface sponge strip.

Preferably, the fixing pile is fixed at a position close to the front surface of the inner side of the workbench, the electric telescopic rod for two times is fixedly installed at one end, away from the workbench, of the fixing pile, the lower plate is fixed at a position, close to the upper end, of the outer side of the electric telescopic rod for two times, the fixing plate is fixed at the upper surface of the electric telescopic rod for two times, the electric driving device for two times is embedded and fixed at a position, away from one side of the electric telescopic rod for two times, of the upper plate clamp is fixed at the outer side of an upper rotating shaft of the electric driving device for two times, the magic tape is fixed at the upper surface of the lower plate clamp and the lower surface of the upper plate clamp, the curved sponge strip is fixed at one side, away from the lower plate clamp and the upper plate clamp, and the wiping clamp is fixedly installed at a position, close to the front surface, of the inner side of the workbench through the fixing pile.

Compared with the prior art, the utility model discloses following beneficial effect has:

the utility model discloses in, develop the silicon chip and rotate the platform through the development silicon chip that sets up, develop the silicon chip and rotate the platform and can follow the rubber coating development silicon chip lower surface and be close to the border position and drive the rubber coating development silicon chip, let the rubber coating development silicon chip rotate, it is more stable to rotate the process, avoid the rubber coating development silicon chip to rotate the in-process position and change and influence the next step after the washing, and develop the silicon chip and rotate platform and develop silicon chip area of contact little with the rubber coating, it is dismantled and assembled with the rubber ring in the bearing outside to develop the silicon chip, make the antiskid cover of rubber ring removable, reduce the pollution to the rubber coating development silicon chip after the washing, clean the clamp through the setting, clean the clamp and can clear away unnecessary water stain and dust in rubber coating development silicon chip surface, make clean the effect better, and clean the curved surface sponge strip dismouting of being convenient for in the clamp.

Drawings

FIG. 1 is a schematic view of the overall structure of an upper cover cleaning device for a glue-spreading developing machine according to the present invention;

FIG. 2 is an exploded view of the whole structure of the cleaning device for the upper cover of the gumming developing machine of the present invention;

FIG. 3 is an exploded view of a cleaning clip of the cleaning device for the upper cover of the gumming developing machine of the present invention;

FIG. 4 is a schematic view of a fixed shaft structure of the cleaning device for the upper cover of the gumming developing machine of the present invention;

FIG. 5 is an enlarged schematic view of part A of FIG. 2 of the cleaning device for the upper cover of the gumming developing machine of the present invention;

fig. 6 is an enlarged schematic view of a part B in fig. 2 of the cleaning device for the upper cover of the gumming developing machine of the present invention.

In the figure: 1. a work table; 101. a circular through hole; 102. a first electric telescopic rod; 2. a fixed table; 3. a cleaning liquid injection device; 4. a water spraying device; 5. developing the silicon chip rotating platform; 501. an opening I; 502. a first electric drive device; 503. a second opening; 504. a fixed shaft; 505. a fixing ring; 506. a bearing; 507. a stationary ring; 508. a rubber ring; 509. an anti-slip sleeve; 510. a right-angle fixing rod; 6. wiping the clips; 601. fixing the pile; 602. a second electric telescopic rod; 603. a lower plate clamp; 604. a fixing plate; 605. a second electric drive device; 606. a plate feeding clamp; 607. magic tape; 608. a curved surface sponge strip; 7. a waterproof cloth bag; 8. a fixing frame; 9. a funnel; 10. and a water discharge pipe.

Detailed Description

In order to make the technical means, creation features, achievement purposes and functions of the present invention easy to understand, the present invention is further described below with reference to the following embodiments.

As shown in fig. 1-6, a cleaning device for an upper cover of a gluing developing machine comprises a workbench 1, wherein a fixed table 2 is fixed at the middle position between the front surface and the rear surface at two sides of the workbench 1, a cleaning solution injection device 3 is fixedly arranged at the central position of the upper surface of the fixed table 2 at one side of the workbench 1, a water spraying device 4 is fixedly arranged at the central position of the upper surface of the fixed table 2 at the side of the workbench 1 away from the cleaning solution injection device 3, a developing silicon wafer rotating table 5 is fixedly arranged at the inner side of the workbench 1, a wiping clamp 6 is fixedly arranged at the position of the inner side of the workbench 1 close to the front surface, a water-proof cloth bag 7 is fixedly connected at the position of the inner side of the upper surface of the workbench 1, a fixed frame 8 is fixedly connected at the upper end of the water-proof cloth bag 7, a funnel 9 is fixedly connected at the position of the inner side of the lower surface of the workbench 1, and a drain pipe 10 is fixedly connected at the lower surface of the funnel 9;

a circular through hole 101 is formed in the upper surface of the workbench 1 at a position close to four corners, a first electric telescopic rod 102 is fixed inside the circular through hole 101, and the upper end of the first electric telescopic rod 102 is fixedly connected with the lower surface of the fixing frame 8; a first opening 501 is formed in the position, close to the rear surface of the workbench 1, of the lower surface of the developing silicon wafer rotating table 5, a first electric driving device 502 is fixed inside the first opening 501, a second opening 503 is formed in the inner side of the developing silicon wafer rotating table 5, the number of the second openings 503 is four, and the second openings 503 are uniformly formed in the inner side of the developing silicon wafer rotating table 5; a fixed shaft 504 is fixed on one surface of the inside of the second opening 503 close to the outer side of the developing silicon wafer rotating table 5, a fixed ring 505 is fixed on one end of the outer side of the fixed shaft 504 far away from the developing silicon wafer rotating table 5, a bearing 506 is fixedly installed between one end of the outer side of the fixed shaft 504 far away from the developing silicon wafer rotating table 5 and the fixed ring 505, a fixed ring 507 is fixedly installed on the outer side of the rotating shaft of the first electric driving device 502, rubber rings 508 are respectively arranged on the outer sides of the fixed ring 507 and the bearing 506, an anti-slip sleeve 509 is fixed on the outer side of the rubber rings 508, right-angle fixing rods 510 are fixedly installed on the lower surface of the developing silicon wafer rotating table 5, the number of the right-angle fixing rods 510 is four, the right-angle fixing rods 510 are uniformly installed on the lower surface of the developing silicon wafer rotating table 5, and the developing silicon wafer rotating table 5 is fixedly installed on the inner side of the workbench 1 through the right-angle fixing rods 510; the wiping clamp 6 comprises a fixing pile 601, a second electric telescopic rod 602, a lower plate clamp 603, a fixing plate 604, a second electric driving device 605, an upper plate clamp 606, a magic tape 607 and a curved sponge strip 608; the spud pile 601 is fixed in the inboard position that is close to the front surface of workstation 1, No. two electric telescopic handle 602 fixed mounting are in the one end that workstation 1 was kept away from to spud pile 601, lower plate holder 603 is fixed in the position that No. two electric telescopic handle 602 outsides are close to the upper end, fixed plate 604 is fixed in No. two electric telescopic handle 602 upper surfaces, No. two electric drive device 605 inlays and is fixed in the position that No. two electric telescopic handle 602 one side was kept away from to the fixed plate 604 upper surface, upper plate holder 606 is fixed in the axis of rotation outside on No. two electric drive device 605, magic subsides 607 is fixed in lower plate holder 603 upper surface and upper plate holder 606 lower surface, curved surface sponge strip 608 is fixed in magic subsides 607 and keeps away from one side of lower plate holder 603 and upper plate holder 606, it is close to the inboard position that is close to the front surface of workstation 1 through spud pile 601 fixed mounting to clean clamp 6.

It should be noted that, the utility model relates to a cleaning device for the upper cover of a gluing developing machine, when in use, the gluing developing silicon wafer is placed in the groove on the upper surface of a developing silicon wafer rotating platform 5 through a developing machine transmission device, the cleaning device is started, the rotating shaft of a second electric driving device 605 in a wiping clamp 6 rotates, a second electric telescopic rod 602 contracts, a lower plate clamp 603 and an upper plate clamp 606 clamp the gluing developing silicon wafer, a curved sponge strip 608 on a magic paste 607 is contacted with the upper surface and the lower surface of the gluing developing silicon wafer, a first electric telescopic rod 102 in a circular through hole 101 raises a fixing frame 8, a water-proof cloth bag 7 is pulled up, a first electric driving device 502 in a first opening 501 rotates a fixing ring 507 on the rotating shaft, the gluing developing silicon wafer rotates, an outer ring of a bearing 506 outside the fixing shaft 504 rotates, the lower surface of the gluing developing silicon wafer is close to the edge position to drive the gluing developing silicon wafer, the gummed silicon wafer is enabled to rotate, the rotation process is more stable, the situation that the next step after cleaning is influenced by the change of the position of the gummed silicon wafer in the rotation process is avoided, the contact area between the developing silicon wafer rotating table 5 and the gummed developing silicon wafer is small, the fixed ring 507 and the rubber ring 508 on the outer side of the bearing 506 are detachable, the anti-slip sleeve 509 of the rubber ring 508 can be replaced, the pollution to the gummed developing silicon wafer after cleaning is reduced, the cleaning solution injection device 3 and the water spray device 4 wash the surface of the gummed developing silicon wafer, the curved sponge strip 608 on the magic tape 607 wipes the surface of the gummed developing silicon wafer in the rotation process of the gummed developing silicon wafer, the excessive water stain and dust on the surface of the gummed developing silicon wafer are removed, the cleaning effect is better, when the curved sponge strip 608 needs to be replaced, the magic tape 607 is directly torn, the magic tape 607 with a new curved sponge strip 608 is re-pasted, after cleaning, the first electric telescopic rod 102 lowers the height of the fixing frame 8, the waterproof cloth bag 7 is pulled down and pulled up, the rotating shaft of the second electric driving device 605 in the wiping clamp 6 rotates, the glue-coated developing silicon wafer is taken out through the developing machine conveying equipment, the funnel 9 is responsible for collecting cleaned wastewater, and the wastewater is discharged through the drain pipe 10.

The basic principles and the main features of the invention and the advantages of the invention have been shown and described above. It will be understood by those skilled in the art that the present invention is not limited to the above embodiments, and that the foregoing embodiments and descriptions are provided only to illustrate the principles of the present invention without departing from the spirit and scope of the present invention. The scope of the invention is defined by the appended claims and equivalents thereof.

Claims (6)

1. The utility model provides a rubber coating developing machine upper cover belt cleaning device which characterized in that: comprises a workbench (1), wherein two sides of the workbench (1) are fixedly provided with a fixed table (2) at the middle part between the front surface and the rear surface, the upper surface center of the fixed table (2) at one side of the workbench (1) is fixedly provided with a cleaning solution injection device (3), the upper surface center of the fixed table (2) at one side of the cleaning solution injection device (3) away from the workbench (1) is fixedly provided with a water spraying device (4), the inner side of the workbench (1) is fixedly provided with a developing silicon wafer rotating table (5), the position of the inner side of the workbench (1) close to the front surface is fixedly provided with a wiping clamp (6), the position of the upper surface of the workbench (1) close to the inner side is fixedly connected with a water-proof cloth bag (7), the upper end of the water-proof cloth bag (7) is fixedly connected with a fixed frame (8), the position of the lower surface of the workbench (1) close to the inner side is fixedly connected with a funnel (9), the lower surface of the funnel (9) is fixedly connected with a drain pipe (10).

2. The cleaning device for the upper cover of the gumming developing machine as set forth in claim 1, wherein: circular through-hole (101) have been seted up to the position that workstation (1) upper surface is close to the four corners, circular through-hole (101) inside is fixed with electric telescopic handle (102), the lower fixed surface of the upper end of electric telescopic handle (102) and fixed frame (8) is connected.

3. The cleaning device for the upper cover of the gumming developing machine as set forth in claim 1, wherein: the developing silicon wafer rotating table is characterized in that an opening (501) is formed in the position, close to the rear surface of a working table (1), of the lower surface of the developing silicon wafer rotating table (5), a power driving device (502) is fixed inside the opening (501), a second opening (503) is formed in the inner side of the developing silicon wafer rotating table (5), the number of the second opening (503) is four, and the inner side of the developing silicon wafer rotating table (5) is uniformly formed in the second opening (503).

4. The cleaning device for the upper cover of the gumming developing machine as set forth in claim 3, wherein: one surface of the inside of the second opening (503) close to the outer side of the developing silicon wafer rotating table (5) is fixed with a fixed shaft (504), one end of the outer side of the fixed shaft (504) far away from the developing silicon wafer rotating table (5) is fixed with a fixed ring (505), a bearing (506) is fixedly arranged between one end of the outer side of the fixed shaft (504) far away from the developing silicon wafer rotating table (5) and the fixed ring (505), a fixed ring (507) is fixedly arranged on the outer side of the rotating shaft of the first electric driving device (502), rubber rings (508) are arranged on the outer sides of the fixed ring (507) and the bearing (506), an anti-slip sleeve (509) is fixed on the outer side of the rubber ring (508), right-angle fixing rods (510) are fixedly arranged on the lower surface of the developing silicon wafer rotating table (5), the number of the right-angle fixing rods (510) is four, and the right-angle fixing rods (510) are uniformly arranged on the lower surface of the developing silicon wafer rotating table (5), the developing silicon wafer rotating table (5) is fixedly arranged on the inner side of the workbench (1) through a right-angle fixing rod (510).

5. The cleaning device for the upper cover of the gumming developing machine as set forth in claim 1, wherein: the wiping clamp (6) comprises a fixing pile (601), a second electric telescopic rod (602), a lower plate clamp (603), a fixing plate (604), a second electric driving device (605), an upper plate clamp (606), a magic tape (607) and a curved sponge strip (608).

6. The cleaning device for the upper cover of the gumming developing machine as set forth in claim 5, wherein: the fixing pile (601) is fixed at a position, close to the front surface, of the inner side of the workbench (1), the second electric telescopic rod (602) is fixedly installed at one end, far away from the workbench (1), of the fixing pile (601), the lower plate clamp (603) is fixed at a position, close to the upper end, of the outer side of the second electric telescopic rod (602), the fixing plate (604) is fixed at the upper surface of the second electric telescopic rod (602), the second electric driving device (605) is embedded and fixed at a position, far away from one side of the second electric telescopic rod (602), of the upper plate clamp (606) is fixed at the outer side of an upper rotating shaft of the second electric driving device (605), the magic tapes (607) are fixed at the upper surface of the lower plate clamp (603) and the lower surface of the upper plate clamp (606), and the curved sponge strips (608) are fixed at one side, far away from the lower plate clamp (603) and the upper plate clamp (606), of the magic tapes (607), the wiping clamp (6) is fixedly arranged at the position close to the front surface on the inner side of the workbench (1) through a fixing pile (601).

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