CN215031561U - Photomask base plate processing belt cleaning device - Google Patents

Abstract

The utility model belongs to the technical field of photomask substrate processing and cleaning devices, and provides a photomask substrate processing and cleaning device, which comprises a base, wherein both ends of the base are movably provided with threaded rods, one end of each threaded rod is movably provided with a movable block, one end of each movable block is fixedly provided with a fixture block, one end of each fixture block is fixedly provided with a first spring, the other end of each first spring is fixedly connected with the inner side of the base, both sides of the upper end of the base are respectively provided with a slide rail, the inner side of each slide rail is movably provided with a slide block, both ends of each slide rail are respectively and fixedly provided with a baffle plate, one end of each baffle plate is fixedly provided with a driving motor, the output end of each driving motor is fixedly provided with a lead screw, the lead screw is movably connected with the slide block, so that the photomask substrate can be effectively fixed and then cleaned, the whole working efficiency is improved, and water resources can be recycled in the cleaning process.

Description

Photomask base plate processing belt cleaning device

Technical Field

The utility model belongs to the technical field of photomask substrate processing belt cleaning device, especially, relate to a photomask substrate processing belt cleaning device.

Background

Photomasks are used in the whole process of semiconductor manufacturing, and one part of the process from layout to wafer manufacturing is photomask or reticle manufacturing. This part is a key part of the process connection, is the highest cost part in the process, and is one of the bottlenecks that limit the minimum line width, so the cleaning device for processing the photomask substrate is particularly important. The existing photomask substrate is cleaned manually, so that time and labor are wasted in operation, and meanwhile, the process is not recycled in the process of water resources, so that the water resource waste is serious.

SUMMERY OF THE UTILITY MODEL

The utility model provides a photomask base plate processing belt cleaning device can carry out effectual fixing then washs to the photomask base plate, makes holistic work efficiency obtain promoting, can carry out cyclic utilization to the water resource simultaneously at abluent in-process. The utility model is realized in such a way, a photomask substrate processing and cleaning device, which comprises a base, wherein both ends of the base are movably provided with a threaded rod, one end of the threaded rod is movably provided with a movable block, one end of the movable block is fixedly provided with a clamping block, one end of the clamping block is fixedly provided with a first spring, the other end of the first spring is fixedly connected with the inner side of the base, both sides of the upper end of the base are respectively provided with a sliding rail, the inner side of the sliding rail is movably provided with a sliding block, both ends of the sliding rail are respectively and fixedly provided with a baffle plate, one end of the baffle plate is fixedly provided with a driving motor, the output end of the driving motor is fixedly provided with a lead screw, the lead screw is movably connected with the sliding block, the upper end of the sliding block is fixedly provided with a fixed block, one end of the fixed block is provided with a through hole, the utility model discloses a water-saving spraying device, including base, screw hole, spray pipe, wash port, water header, water sump, suction pump, connecting pipe, the upper end of fixed block sets up threaded hole, the inboard movable mounting of screw hole has the bolt, the spray pipe is installed to the position of through-hole, the outside fixed mounting of spray pipe has the shower head, the wash port has been seted up to the inboard of base, and the one end fixed mounting of base has the header tank, the one end fixed mounting of header tank has the suction pump, the one end fixed mounting of suction pump has the connecting pipe, the other end of connecting pipe is connected with the outside of spray pipe. Preferably, the two threaded rods movably mounted on the inner side of the base are located on the same plane and are symmetrically distributed. Preferably, one end of the threaded rod is fixedly provided with a rotating handle, and the rotating handle is positioned on the outer side of the base. Preferably, the two slide rails fixedly mounted at the upper end of the base are positioned on the same horizontal plane and are parallel to each other. Preferably, a plurality of spray headers are fixedly mounted on the outer side of the spray pipe, and the spray headers are located on the same horizontal plane and distributed in a linear array. Preferably, the one end fixed mounting of baffle has the second spring, the one end fixed mounting of second spring has the buffer block, the buffer block is located the inboard of slide rail. The above technical scheme of the utility model has following profitable technological effect: through setting up driving motor, the slider, slide rail and shower, at first put the photomask base plate in the inside of base, then start driving motor, driving motor rotates and drives the lead screw and rotate, the lead screw rotates and drives slider reciprocating motion in the slide rail, the slider removes and drives the fixed block and remove, the fixed block removes and drives the shower and remove, thereby the shower removes and drives the shower head and remove and wash the inside photomask of base, then water after the washing gets into the header tank through the wash port, then get back to the shower again under the effect of suction pump, recycle, can carry out effectual fixing then washs to the photomask base plate, make holistic work efficiency obtain promoting, can carry out cyclic utilization to the water resource simultaneously at abluent in-process. Through setting up threaded rod, first spring, movable block and cardboard, through rotatory rotation handle, it drives the threaded rod and rotates to rotate the handle to promote the movable block, the movable block drives the cardboard again and removes, thereby makes the fixture block of both sides touch the base plate to carry out the centre gripping, prevents to be washed away by rivers when washing.

Drawings

Fig. 1 is a schematic structural view of a photomask substrate processing and cleaning apparatus according to the present invention. Fig. 2 is a schematic top view of the photomask substrate processing and cleaning apparatus according to the present invention. Fig. 3 is the utility model provides a photomask substrate processing belt cleaning device slider, fixed block and bolted connection structure sketch. Reference numerals: 1. a base; 2. a threaded rod; 3. a movable block; 4. a clamping block; 5. a first spring; 6. rotating the handle; 7. a slide rail; 8. a baffle plate; 9. a drive motor; 10. a screw rod; 11. a slider; 12. a fixed block; 13. a through hole; 14. a shower pipe; 15. a shower head; 16. a threaded hole; 17. a bolt; 18. a water collection tank; 19. a water pump; 20. and (4) connecting the pipes.

Detailed Description

In order to make the objects, technical solutions and advantages of the present invention more clearly understood, the present invention is further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention. As shown in FIGS. 1-3, the present invention provides a photomask substrate processing and cleaning device, which comprises a base 1, a threaded rod 2 movably mounted at both ends of the base 1, a movable block 3 movably mounted at one end of the threaded rod 2, a fixture block 4 fixedly mounted at one end of the movable block 3, a fixture block 4 fixedly mounted at one end of the fixture block 4, a first spring 5 fixedly mounted at one end of the fixture block 4, the other end of the first spring 5 is fixedly connected with the inner side of the base 1, slide rails 7 are mounted at both sides of the upper end of the base 1, a slider 11 movably mounted at the inner side of the slide rail 7, a baffle 8 fixedly mounted at both ends of the slide rail 7, a driving motor 9 fixedly mounted at one end of the baffle 8, a lead screw 10 fixedly mounted at the output end of the driving motor 9, the lead screw 10 is movably connected with the slider 11, a fixed block 12 is fixedly mounted at the upper end of the slider 11, a through hole 13 is opened at one end of the fixed block 12, the upper end of the fixed block 12 is provided with a threaded hole 16, a bolt 17 is movably mounted on the inner side of the threaded hole 16, a spray pipe 14 is mounted at the position of the through hole 13, a spray head 15 is fixedly mounted on the outer side of the spray pipe 14, a drain hole is formed on the inner side of the base 1, one end of the base 1 is fixedly mounted with a water collecting tank 18, one end of the water collecting tank 18 is fixedly mounted with a water suction pump 19, one end of the water suction pump 19 is fixedly mounted with a connecting pipe 20, and the other end of the connecting pipe 20 is connected with the outer side of the spray pipe 14; in this embodiment, the user firstly puts the photomask substrate inside the base 1, then starts the driving motor 9, the driving motor 9 rotates to drive the screw rod 10 to rotate, the screw rod 10 rotates to drive the slider 11 to reciprocate in the slide rail 7, the slider 11 moves to drive the fixed block 12 to move, the fixed block 12 moves to drive the spray pipe 14 to move, the spray pipe 14 moves to drive the spray head 15 to move so as to clean the photomask inside the base 1, then the cleaned water enters the water collecting tank 18 through the drain hole, then the cleaned water returns to the spray pipe 14 again under the action of the suction pump 19 for recycling, the photomask substrate can be effectively fixed and then cleaned, the whole working efficiency is improved, and meanwhile, the water resource can be recycled in the cleaning process. Furthermore, two threaded rods 2 movably mounted on the inner side of the base 1 are positioned on the same plane and are symmetrically distributed; in the embodiment, by rotating the rotating handle 6, the rotating handle 6 drives the threaded rod 2 to rotate, so as to push the movable block 3, and the movable block 3 drives the fixture blocks 4 to move, so that the fixture blocks 4 on two sides clamp the photomask substrate on the base 1, and further flushing by water flow during flushing is prevented, the rotating handle 6 is fixedly installed at one end of the threaded rod 2, and the rotating handle 6 is positioned on the outer side of the base 1; in the embodiment, the threaded rod 2 is driven to rotate by the rotating handle 6, so that the threaded rod 2 can be rotated more conveniently and more conveniently in a labor-saving manner. Further, two slide rails 7 fixedly mounted at the upper end of the base 1 are positioned on the same horizontal plane and are parallel to each other; in the present embodiment, the position of the shower pipe 14 is prevented from being shifted during the movement due to the uneven installation of the slide rails 7 on both sides of the upper end of the base 1. Further, a plurality of spray headers 15 are fixedly mounted on the outer sides of the spray pipes 14, and the spray headers 15 are located on the same horizontal plane and distributed in a linear array; in the present embodiment, the water mist is sprayed through the shower pipe 14, so that manual cleaning can be performed instead of manual cleaning, and the operation of the entire apparatus is more convenient. Furthermore, one end of the baffle 8 is fixedly provided with a second spring, one end of the second spring is fixedly provided with a buffer block, and the buffer block is positioned on the inner side of the slide rail 7; in this embodiment, when the slider 11 is slid to one end of the baffle 8, a buffering force can be provided to the slider 11 by the second spring and the buffer block, thereby preventing the slider 11 from being damaged. The utility model discloses a theory of operation and use flow: the user rotates the rotating handle 6, the rotating handle 6 drives the threaded rod 2 to rotate, so as to push the movable block 3, the movable block 3 drives the clamping blocks 4 to move, so that the clamping blocks 4 on the two sides clamp the photomask substrate on the base 1, the photomask substrate is prevented from being washed away by water flow during washing, the photomask substrate is placed in the base 1, then the driving motor 9 is started, the driving motor 9 rotates to drive the screw rod 10 to rotate, the screw rod 10 rotates to drive the sliding block 11 to reciprocate in the sliding rail 7, the sliding block 11 moves to drive the fixed block 12 to move, the fixed block 12 moves to drive the spray pipe 14 to move, the spray pipe 14 moves to drive the spray head 15 to move, so as to wash the photomask substrate in the base 1, then the washed water enters the water collecting tank 18 through the water discharging hole, then returns to the spray pipe 14 again under the action of the water suction pump 19 to be recycled, and the photomask substrate can be effectively fixed and then washed, the whole working efficiency is improved, and water resources can be recycled in the cleaning process. The above description is only exemplary of the present invention and should not be taken as limiting the scope of the present invention, as any modifications, equivalents, improvements and the like made within the spirit and principles of the present invention are intended to be included within the scope of the present invention.

Claims (6)

1. A photomask substrate processing and cleaning device comprises a base (1), and is characterized in that: the improved structure of the automobile seat is characterized in that threaded rods (2) are movably mounted at two ends of the base (1), a movable block (3) is movably mounted at one end of each threaded rod (2), a fixture block (4) is fixedly mounted at one end of each movable block (3), a fixture block (4) is fixedly mounted at one end of each fixture block (4), a first spring (5) is fixedly mounted at one end of each fixture block (4), the other end of each first spring (5) is fixedly connected with the inner side of the base (1), slide rails (7) are mounted on two sides of the upper end of the base (1), a sliding block (11) is movably mounted at the inner side of each slide rail (7), baffles (8) are fixedly mounted at two ends of each slide rail (7), a driving motor (9) is fixedly mounted at one end of each baffle (8), a lead screw (10) is fixedly mounted at an output end of the driving motor (9), and the lead screw (10) is movably connected with the sliding block (11), the utility model discloses a shower nozzle, including slider (11), through-hole (13), spray pipe (14), wash shower (15), wash port, one end fixed mounting of base (1), the one end fixed mounting of base (1) has fixed block (12), through-hole (13) have been seted up to the one end of fixed block (12), threaded hole (16) have been seted up to the upper end of fixed block (12), the inboard movable mounting of threaded hole (16) has bolt (17), spray pipe (14) are installed to the position of through-hole (13), the outside fixed mounting of spray pipe (14) has shower head (15), the wash port has been seted up to the inboard of base (1), and the one end fixed mounting of base (1) has header tank (18), the one end fixed mounting of header tank (18) has suction pump (19), the one end fixed mounting of suction pump (19) has connecting pipe (20), the other end of connecting pipe (20) is connected with the outside of spray pipe (14).

2. The cleaning apparatus for processing photomask substrates according to claim 1, wherein the two threaded rods (2) movably mounted on the inner side of the base (1) are located on the same plane and are symmetrically distributed.

3. The photomask substrate processing and cleaning device according to claim 1, wherein one end of the threaded rod (2) is fixedly provided with a rotating handle (6), and the rotating handle (6) is positioned outside the base (1).

4. The photomask substrate processing and cleaning device according to claim 1, wherein the two slide rails (7) fixedly mounted at the upper end of the base (1) are positioned on the same horizontal plane and are parallel to each other.

5. The photomask substrate processing and cleaning device according to claim 1, wherein a plurality of shower heads (15) are fixedly installed on the outer side of the shower pipe (14), and the shower heads (15) are located on the same horizontal plane and distributed in a linear array.

6. The photomask substrate processing and cleaning device according to claim 1, wherein one end of the baffle (8) is fixedly provided with a second spring, one end of the second spring is fixedly provided with a buffer block, and the buffer block is positioned on the inner side of the slide rail (7).

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