CN214913886U - A filter equipment for monocrystalline silicon piece polishing solution is retrieved - Google Patents
A filter equipment for monocrystalline silicon piece polishing solution is retrieved Download PDFInfo
- Publication number
- CN214913886U CN214913886U CN202023143530.1U CN202023143530U CN214913886U CN 214913886 U CN214913886 U CN 214913886U CN 202023143530 U CN202023143530 U CN 202023143530U CN 214913886 U CN214913886 U CN 214913886U
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- CN
- China
- Prior art keywords
- polishing solution
- filter
- monocrystalline silicon
- blender
- filter screen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- 238000005498 polishing Methods 0.000 title claims abstract description 45
- 229910021421 monocrystalline silicon Inorganic materials 0.000 title claims abstract description 16
- 238000001914 filtration Methods 0.000 claims abstract description 15
- 239000007788 liquid Substances 0.000 claims description 30
- 238000002156 mixing Methods 0.000 claims description 7
- 238000003756 stirring Methods 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 3
- 238000007580 dry-mixing Methods 0.000 claims description 2
- 238000000926 separation method Methods 0.000 abstract description 3
- 230000009977 dual effect Effects 0.000 abstract description 2
- 238000000034 method Methods 0.000 description 6
- 238000009826 distribution Methods 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 239000013078 crystal Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000009827 uniform distribution Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
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- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
Abstract
The utility model provides a filter equipment for monocrystalline silicon piece polishing solution is retrieved, have feed liquor pipe and the jar body that the bottom intercommunication has the drain pipe including the top intercommunication, jar internal filter screen that is provided with, the fixed blender that is equipped with in below of filter screen, the blender include that cylinder and longitudinal separation are fixed to be set up the hybrid tube in the drum, the below of blender is provided with the cartridge filter. The utility model discloses set up filter screen and cartridge filter, can be with polishing solution through dual filtration back recycle, filter more thoroughly, filtration efficiency is high, is worth wideling popularize.
Description
Technical Field
The utility model relates to a monocrystalline silicon piece processing technology field specifically is a filter equipment that is used for monocrystalline silicon piece polishing solution to retrieve.
Background
Monocrystalline silicon piece: a single crystal of silicon is a crystal having a substantially complete lattice structure. Different directions have different properties and are good semiconducting materials. Single crystal silicon wafers, drawn and refined from common silica sand, are the most commonly used semiconductor material.
Monocrystalline silicon need cut into slices the processing after making, need use the polishing solution among the prior art after the multi-thread cutting process, and the polishing solution that makes is used directly to be discharged and is caused the waste, for reducing manufacturing cost, needs to carry out reuse to the polishing solution, only filters the recovery through the filter screen among the prior art, filters unclean, and it is great to product processingquality influence during the recycle, therefore needs the filter equipment that a polishing solution was retrieved to urgent need to solve above-mentioned problem.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide a filter equipment for monocrystalline silicon piece polishing solution is retrieved to solve the problem that provides among the above-mentioned background art.
In order to solve the technical problem, the utility model provides a following technical scheme: the utility model provides a filter equipment for monocrystalline silicon piece polishing solution is retrieved, includes that the top intercommunication has the feed liquor pipe and the bottom intercommunication has the jar body of drain pipe, jar internal filter screen that is provided with, the fixed blender that is equipped with in below of filter screen, the blender includes that cylinder and longitudinal separation fix the hybrid tube that sets up in the cylinder, the below of blender is provided with the cartridge filter.
The feed liquor intraductal of jar body is fixed with the liquid distribution board, just the below of liquid distribution board is equipped with liquid equipartition board.
And a plurality of radiating fins are arranged on the wall of the tank body between the liquid uniform distribution plate and the filter screen along the periphery.
And a plurality of dry mixing plates are fixed in the mixing pipe in a staggered manner from top to bottom.
The filter cartridge is internally and transversely provided with a stirrer, a stirring shaft of the stirrer penetrates through the wall of the tank body to be mechanically connected with an output shaft of a low-speed motor, and the low-speed motor is fixedly arranged on a supporting table on the outer side of the tank body.
Compared with the prior art, the utility model discloses the beneficial effect who reaches is:
1. the utility model discloses set up filter screen and cartridge filter, can be with polishing solution through dual filtration back recycle, filter more thoroughly, filtration efficiency is high, is worth wideling popularize.
2. The utility model discloses the blender can mix the polishing solution after filtering for the first time, guarantees the homogeneity of polishing solution, improves filterable efficiency once more, and then improves the purity of polishing solution.
3. The utility model discloses the feed liquor intraductal of the jar body is fixed with the branch liquid board, and the below of branch liquid board is equipped with liquid equipartition board, and it is internal that the branch liquid board can fall into two parts entering jar with the polishing solution for the even distribution of polishing solution flows in the both sides of liquid equipartition board, and liquid equipartition board can make the even flow of polishing solution to the filter screen on, has improved filterable efficiency.
4. The utility model discloses wear to be equipped with a plurality of radiating fin along week on the tank wall between liquid equipartition board and the filter screen, the in-process of filter screen is flowed down by liquid equipartition board to the polishing solution, and radiating fin can be followed to its heat and distributed away, prevents that the internal temperature of jar is too high, and causes pressure too big.
5. The utility model discloses transversely be equipped with the agitator in the cartridge filter, when the agitator can stir the polishing solution disturbance, improve filtration efficiency, avoid debris to adhere to in a large number in the cartridge filter surface, be worth wideling popularize.
Drawings
The accompanying drawings are included to provide a further understanding of the invention, and are incorporated in and constitute a part of this specification. In the drawings:
fig. 1 is a schematic structural diagram of the present invention;
FIG. 2 is a schematic diagram of the mixer of the present invention;
FIG. 3 is a schematic structural view of the liquid separating plate of the present invention;
in the figure: 1, a tank body; 2, filtering a screen; 3, a mixer; 31 a cylindrical body; 32 a mixing tube; 4, filtering the filter cartridge; 5, a liquid separating plate; 6 liquid uniform distribution plate; 7 heat dissipation fins; 8, mixing a material plate; 9 a stirrer; 10 a low-speed motor; and 11, supporting the table.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
Referring to fig. 1-3, the present invention provides a technical solution: the utility model provides a filter equipment for monocrystalline silicon piece polishing solution is retrieved, has feed liquor pipe and the jar body 1 that the bottom intercommunication has the drain pipe including the top intercommunication, and jar internal filter screen 2 that is provided with, the fixed blender 3 that is equipped with in below of filter screen 2, blender 3 include cylinder 31 and the fixed hybrid tube 32 that sets up in cylinder 31 of longitudinal separation, and the below of blender 3 is provided with cartridge filter 4.
The feed liquor intraductal of the jar body 1 is fixed with the branch liquid board 5, and the below of branch liquid board 5 is equipped with liquid equipartition board 6, divides liquid board 5 can fall into two parts with the polishing solution and gets into jar body 1 in for the even distribution of polishing solution flows in the both sides of liquid equipartition board 6, and liquid equipartition board 6 can make the even flow of polishing solution to filter screen 2 on, has improved filterable efficiency.
Wear to be equipped with a plurality of radiating fin 7 along week on the 1 wall of jar body between liquid equipartition board 6 and the filter screen 2, the in-process that the polishing solution flowed down the filter screen 2 by liquid equipartition board 6, its heat can distribute away from radiating fin 7, prevents jar internal temperature too high, and causes pressure too big.
Stagger from top to bottom in the hybrid tube 32 and be fixed with a plurality of compounding boards 8, can increase the flow that the polishing solution flows, and then further improve the efficiency that the polishing solution mixes, improve the homogeneity of polishing solution, improve filterable efficiency once more, and then improve the purity of polishing solution.
Transversely be equipped with agitator 9 in the cartridge filter 4, when agitator 9 can stir the inside polishing solution of polishing solution disturbance cartridge filter 4, improve filtration efficiency, avoid debris to attach to the cartridge filter surface in a large number, the (mixing) shaft of agitator 9 passes the output shaft mechanical connection of 1 wall of jar body and low-speed motor 10, and low-speed motor 10 fixed mounting is on the brace table 11 in the jar body 1 outside.
It is specific, the polishing solution is by jar body 1 the feed liquor pipe get into jar body 1 in, make the polishing solution reposition of redundant personnel to the both sides of liquid equipartition board 6 through branch liquid board 5, liquid equipartition board 6 can make the even flow of polishing solution to filter screen 2 on, filter screen 2 carries out the first back of filtering with the polishing solution, flow in blender 3, and mixing plate 8 in the blender 3 has increased the flow that the polishing solution flows, and then further improve the efficiency that the polishing solution mixes, improve the homogeneity of polishing solution, then in the polishing solution gets into cartridge filter 4, start low-speed motor 10 and drive agitator 9 and rotate, can stir the polishing solution disturbance simultaneously, improve filtration efficiency, avoid debris to adhere to in a large number on cartridge filter 4 surfaces.
It is noted that relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus.
Finally, it should be noted that: although the present invention has been described in detail with reference to the foregoing embodiments, it will be apparent to those skilled in the art that modifications may be made to the embodiments described in the foregoing embodiments, or equivalents may be substituted for elements thereof. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (5)
1. The utility model provides a filter equipment for monocrystalline silicon piece polishing solution is retrieved, includes that the top intercommunication has feed liquor pipe and the bottom intercommunication has jar body (1) of drain pipe, its characterized in that: the utility model discloses a filter tank, including jar body (1), be provided with filter screen (2) in the jar body (1), the below of filter screen (2) is fixed and is equipped with blender (3), blender (3) are including cylinder (31) and vertical interval fixed mixing tube (32) of setting in cylinder (31), the below of blender (3) is provided with cartridge filter (4).
2. The filtering device for recovering the polishing solution of the monocrystalline silicon wafer according to claim 1, wherein: the feed liquor intraductal of jar body (1) is fixed with and divides liquid board (5), just the below of dividing liquid board (5) is equipped with liquid equipartition board (6).
3. The filtering device for recovering the polishing solution of the monocrystalline silicon wafer according to claim 2, wherein: between liquid equipartition board (6) and filter screen (2) along week on jar body (1) wall wear to be equipped with a plurality of radiating fin (7).
4. The filtering device for recovering the polishing solution of the monocrystalline silicon wafer according to claim 1, wherein: and a plurality of dry mixing material plates (8) are staggered and fixed in the mixing pipe (32) from top to bottom.
5. The filtering device for recovering the polishing solution of the monocrystalline silicon wafer according to claim 1, wherein: the filter cartridge (4) is internally and transversely provided with a stirrer (9), a stirring shaft of the stirrer (9) penetrates through the wall of the tank body (1) and is mechanically connected with an output shaft of a low-speed motor (10), and the low-speed motor (10) is fixedly arranged on a support table (11) on the outer side of the tank body (1).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202023143530.1U CN214913886U (en) | 2020-12-23 | 2020-12-23 | A filter equipment for monocrystalline silicon piece polishing solution is retrieved |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202023143530.1U CN214913886U (en) | 2020-12-23 | 2020-12-23 | A filter equipment for monocrystalline silicon piece polishing solution is retrieved |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN214913886U true CN214913886U (en) | 2021-11-30 |
Family
ID=79114786
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202023143530.1U Expired - Fee Related CN214913886U (en) | 2020-12-23 | 2020-12-23 | A filter equipment for monocrystalline silicon piece polishing solution is retrieved |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN214913886U (en) |
-
2020
- 2020-12-23 CN CN202023143530.1U patent/CN214913886U/en not_active Expired - Fee Related
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| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20211130 |