CN214880365U

CN214880365U - Plasma processor based on micro-nano technology

Info

Publication number: CN214880365U
Application number: CN202121218817.8U
Authority: CN
Inventors: 王红卫; 刘鑫培; 沈文凯
Original assignee: Suzhou Fengyuanbao Agricultural Technology Co ltd
Current assignee: Suzhou Fengyuanbao Agricultural Technology Co ltd
Priority date: 2021-06-02
Filing date: 2021-06-02
Publication date: 2021-11-26
Anticipated expiration: 2031-06-02

Abstract

The utility model relates to a plasma processor based on micro-nano technology, which comprises a case, a plasma generator, a power supply, a dissolved air tank, an air compressor, a hydraulic pump, an air inlet pipe, a water inlet pipe and a micro-nano bubble discharge pipe; a rack is arranged in the case, and the power supply is fixed on the rack; the air inlet pipe is communicated with the plasma generator, the water inlet pipe is communicated with the hydraulic pump, the hydraulic pump and the air compressor are both communicated with the dissolved air tank, and the micro-nano bubble discharge pipe is communicated with the dissolved air tank; the utility model discloses will be earlier with the micro-nano ization of plasma bubble, let in pure water with it again, generate plasma water, then adopt plasma washing treatment mode, with the interval and the washing effect interval of production of plasma water separately, reuse plasma water carries out comprehensive washing to fruit vegetables surface to reach better non-heat sterilization effect.

Description

Plasma processor based on micro-nano technology

Technical Field

The utility model belongs to the technical field of plasma equipment technique and specifically relates to a plasma treater based on micro-nano technique.

Background

With the rapid development of the planting technology of fruit and vegetable agricultural products, a large amount of fruit and vegetable products are processed into various foods after being harvested, and the first step of processing is to comprehensively clean and effectively sterilize the fruits and vegetables. Most fruit and vegetable products belong to heat-sensitive food, the traditional methods such as heat sterilization and the like are used for processing the fruit and vegetable products as far as possible in the processing process, and non-heat sterilization technologies such as irradiation, high pressure and the like have problems in the aspects of safety, practicability and industrialization. The situation seriously restricts the rapid development of the modern food industry.

Therefore, various technologies for prolonging the shelf life of the processed fruit and vegetable products and enlarging the sales radius by a non-thermal sterilization and preservation method are rapidly developed. Among various sterilization and preservation treatment methods such as physical treatment, chemical treatment, mechanical treatment and the like, the plasma treatment technology is rapidly developed due to the advantages of low temperature, cleanness, high efficiency, low energy consumption, no harmful residues and the like.

At present, most of the common plasma treatment methods are to directly act ionized plasma gas on the surface of an object to be treated, and the method can only treat the surface exposed to the outside but can not treat the surface contacted with a bearing surface, and has the disadvantages of limited treatment distance, high operation safety risk and lower efficacy.

Therefore, how to provide a plasma treater to realize that plasma bubble micro-nano changes earlier, let in pure water with it, generate plasma water, then adopt plasma washing treatment mode, carry out comprehensive washing to fruit vegetables surface with plasma water, improve the treatment effeciency, improve the effect that the sterilization is fresh-keeping, satisfy food industry production needs, the technical problem that technical staff in the field had a urgent need to solve at present.

SUMMERY OF THE UTILITY MODEL

In view of this, the purpose of this application is to provide a plasma treater based on micro-nano technique to realize that plasma bubble micro-nano first, let in pure water with it again, generate plasma water, then adopt the plasma washing treatment mode, carry out comprehensive washing to fruit vegetables surface with plasma water, improve the treatment effeciency, improve the effect that the sterilization is fresh-keeping, satisfy food industry production needs.

In order to achieve the above object, the present application provides the following technical solutions.

A plasma processor based on micro-nano technology comprises a case, a plasma generator, a power supply, a dissolved air tank, an air compressor, a hydraulic pump, an air inlet pipe, a water inlet pipe and a micro-nano bubble discharge pipe;

a rack is arranged in the case, and the power supply is fixed on the rack;

the intake pipe with plasma generator intercommunication, the inlet tube with the hydraulic pump intercommunication, hydraulic pump, air compressor machine all with dissolve the gas pitcher intercommunication, micro-nano bubble discharge pipe with dissolve the gas pitcher intercommunication.

Preferably, an exhaust pipe is arranged on the plasma generator, a first rotor flowmeter is arranged on the exhaust pipe, and the exhaust pipe is communicated with the hydraulic pump.

Preferably, the exhaust pipe and the water inlet pipe are communicated with the hydraulic pump through three communicators; and a second rotor flow meter is arranged between the air compressor and the dissolved air tank.

Preferably, the plasma generator comprises a positive electrode, a negative electrode, a first glass tube and a second glass tube;

the positive electrode is arranged on the periphery outside the first glass tube, the negative electrode is arranged in the second glass tube, and the second glass tube is arranged in the first glass tube.

Preferably, both ends of the first glass tube and the second glass tube are fixed by a fixing frame, both ends of the negative electrode penetrate through the fixing frame, and sealing rings are arranged at the contact positions of both ends of the first glass tube and the fixing frame.

Preferably, both ends of the plasma generator are provided with an air distribution block and an insulating cover plate, and the air distribution block is provided with an air pipe joint.

Preferably, a heat dissipation fan is arranged in the chassis, and the heat dissipation fan is arranged outside the plasma generator.

Preferably, a temperature control meter is arranged in the case and fixed on the rack through a temperature control fixing seat.

Preferably, a time relay, a button switch, an indicator light, a knob switch and an emergency stop button are arranged in front of the case; a pipeline bracket and a power socket are arranged at the rear part of the case; the two sides of the case are provided with corresponding handles; and supporting legs are arranged at four corners below the case.

Preferably, one end of the micro-nano bubble discharge pipe is connected with a micro-nano bubble generator, and the micro-nano bubble generator is fixed on the pipeline bracket.

The utility model discloses the beneficial technological effect who obtains:

1) the utility model solves the problems that the plasma processing mode in the prior art can not process the surface contacted with the bearing surface, the processing distance is limited, the operation safety risk is high, the efficacy is lower, and the like, the utility model firstly carries out micro-nano treatment on the plasma bubbles, then leads the plasma bubbles into pure water to generate plasma water, increases the contact area between the plasma and the water, improves the processing effect of the plasma, then adopts the plasma washing processing mode to separate the generation interval and the washing action interval of the plasma water, and then carries out comprehensive cleaning on the surface of fruits and vegetables by using the plasma water so as to achieve better non-thermal sterilization effect;

2) the utility model adopts the tubular DBD discharge mode, can generate low-temperature plasma under the normal temperature condition, has little influence on the medium temperature, and effectively meets the requirement of non-thermal sterilization; firstly, micro-nano bubbles of plasma are formed, ultra-fine particle bubbles (also called micro-nano bubbles) below 50um rise slowly due to small bubbles and are continuously reduced under water pressure, and finally the ultra-fine particle bubbles are completely dissolved in water, so that the plasma is completely sent into the water and is used for treating different sterilization objects;

3) the utility model discloses medium plasma power supply adopts the alternating current discharge mode, has avoided direct current discharge's high voltage, has improved the security of equipment use.

The foregoing description is only an overview of the technical solutions of the present application, so that the technical means of the present application can be more clearly understood and the present application can be implemented according to the content of the description, and in order to make the above and other objects, features and advantages of the present application more clearly understood, the following detailed description is made with reference to the preferred embodiments of the present application and the accompanying drawings.

The above and other objects, advantages and features of the present application will become more apparent to those skilled in the art from the following detailed description of specific embodiments thereof, taken in conjunction with the accompanying drawings.

Drawings

In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings needed to be used in the description of the embodiments or the prior art will be briefly introduced below, and it is obvious that the drawings in the following description are some embodiments of the present application, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts. Throughout the drawings, like elements or portions are generally identified by like reference numerals. In the drawings, elements or portions are not necessarily drawn to scale.

Fig. 1 is a schematic structural diagram of a plasma processor based on micro-nano technology in an embodiment of the present disclosure;

FIG. 2 is a first schematic structural diagram of a micro-nano technology-based plasma processor according to an embodiment of the present disclosure;

fig. 3 is a schematic diagram of an internal structure of a plasma processor based on micro-nano technology in an embodiment of the present disclosure;

fig. 4 is a schematic diagram of an internal structure of a plasma processor based on micro-nano technology in an embodiment of the present disclosure;

FIG. 5 is a schematic view of a plasma generator according to an embodiment of the present disclosure;

fig. 6 is a cross-sectional view of a plasma generator in one embodiment of the present disclosure.

In the above drawings: 1. a chassis; 101. a time relay; 102. a push button switch; 103. an indicator light; 104. an emergency stop button; 105. a pipeline support; 106. a power socket; 107. a handle; 108. a support leg; 2. a plasma generator; 201. a positive electrode; 202. a negative electrode; 203. a first glass tube; 204. a second glass tube; 205. a fixed mount; 206. a gas distribution block; 207. an insulating cover plate; 208. an electrode connecting base; 209. an electrode mesh pressing plate; 3. a heat radiation fan; 4. a dissolved air tank; 5. an air compressor; 6. a hydraulic pump; 7. an air inlet pipe; 8. a water inlet pipe; 9. a micro-nano bubble discharge pipe; 10. an exhaust pipe; 11. a first rotor flowmeter; 12. a second rotameter.

Detailed Description

In order to make the objects, technical solutions and advantages of the embodiments of the present application clearer, the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are some embodiments of the present application, but not all embodiments. In the following description, specific details such as specific configurations and components are provided only to help the embodiments of the present application be fully understood. Accordingly, it will be apparent to those skilled in the art that various changes and modifications may be made to the embodiments described herein without departing from the scope and spirit of the present application. In addition, descriptions of well-known functions and constructions are omitted in the embodiments for clarity and conciseness.

It should be appreciated that reference throughout this specification to "one embodiment" or "the embodiment" means that a particular feature, structure or characteristic described in connection with the embodiment is included in at least one embodiment of the present application. Thus, the appearances of the phrase "one embodiment" or "the present embodiment" in various places throughout this specification are not necessarily all referring to the same embodiment. Furthermore, the particular features, structures, or characteristics may be combined in any suitable manner in one or more embodiments.

Further, the present application may repeat reference numerals and/or letters in the various examples. This repetition is for the purpose of simplicity and clarity and does not in itself dictate a relationship between the various embodiments and/or configurations discussed.

The term "and/or" herein is merely an association describing an associated object, meaning that three relationships may exist, e.g., a and/or B, may mean: a exists alone, B exists alone, and A and B exist at the same time, and the term "/and" is used herein to describe another association object relationship, which means that two relationships may exist, for example, A/and B, may mean: a alone, and both a and B alone, and further, the character "/" in this document generally means that the former and latter associated objects are in an "or" relationship.

The term "at least one" herein is merely an association relationship describing an associated object, and means that there may be three relationships, for example, at least one of a and B, may mean: a exists alone, A and B exist simultaneously, and B exists alone.

It is further noted that, herein, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion.

Example 1

A plasma processor based on micro-nano technology comprises a case 1, a plasma generator 2, a power supply, a dissolved air tank 4, an air compressor 5, a hydraulic pump 6, an air inlet pipe 7, a water inlet pipe 8 and a micro-nano bubble discharge pipe 9.

A rack (not marked in the drawing) is arranged in the case 1, and the power supply is fixed on the rack.

Dissolve gas pitcher 4, air compressor machine 5 and all fix through the base in the frame, hydraulic pump 6 is fixed through the fixing base frame top.

As shown in fig. 1 and 2, a time relay 101, a button switch 102, an indicator light 103, a knob switch, and an emergency stop button 104 are arranged in front of the chassis 1; a pipeline bracket 105 and a power socket 106 are arranged at the rear part of the case 1; the two sides of the case 1 are provided with corresponding handles 107; the four corners of the lower part of the chassis 1 are provided with support legs 108.

And one end of the micro-nano bubble discharge pipe 9 is connected with a micro-nano bubble generator, and the micro-nano bubble generator is fixed on the pipeline bracket 105.

As shown in the attached figures 3 and 4, the air inlet pipe 7 is communicated with the plasma generator 2, the water inlet pipe 8 is communicated with the hydraulic pump 6, the hydraulic pump 6 and the air compressor 5 are both communicated with the dissolved air tank 4, and the micro-nano bubble discharge pipe 9 is communicated with the dissolved air tank 4.

An exhaust pipe 10 is arranged on the plasma generator 2, a first rotor flowmeter 11 is arranged on the exhaust pipe 10, and the first rotor flowmeter 11 is used for controlling the gas flow in the exhaust pipe 10; the exhaust pipe 10 communicates with the hydraulic pump 6.

The exhaust pipe 10 and the water inlet pipe 8 are communicated with the hydraulic pump 6 through three communicating vessels; a second rotameter 12 is arranged between the air compressor 5 and the dissolved air tank 4, and the second rotameter 12 is used for controlling the pressurizing value of the dissolved air tank 4.

As shown in fig. 5 and 6, the plasma generator 2 includes a positive electrode 201, a negative electrode 202, a first glass tube 203, and a second glass tube 204.

The positive electrode 201 is arranged on the outer periphery of the first glass tube 203, the negative electrode 202 is arranged in the second glass tube 204, and the second glass tube 204 is arranged in the first glass tube 203.

A discharge area is formed between the positive electrode 201 and the negative electrode 202, plasma is generated, and the plasma enters the hydraulic pump 6 along with discharge gas through the exhaust pipe 10.

Further, an electrode mesh pressing plate 209 is arranged on the outer side of the positive electrode 201, and the electrode mesh pressing plate 209 is used for fixing the positive electrode 201; and one side of the electrode mesh pressing plate 209 is provided with an electrode column, and the electrode column is connected with the power supply.

Further, both ends of the negative electrode 202 are fixedly connected through an electrode connecting seat 208.

The two ends of the first glass tube 203 and the second glass tube 204 are fixed by a fixing frame 205, the two ends of the negative electrode 202 penetrate through the fixing frame 205, and sealing rings are arranged at the contact positions of the two ends of the first glass tube 203 and the fixing frame 205.

Both ends of the plasma generator 2 are provided with an air distribution block 206 and an insulating cover plate 207, one end of the air distribution block 206 is provided with an air pipe joint, and the other end of the air distribution block is provided with a plug; the air pipe joint is used for connecting with the exhaust pipe 10/the air inlet pipe 7.

And sealing rings are arranged at the contact positions of the fixed frame 205 and the air distribution block 206.

The plasma generator 2 is connected with a reflecting cover, a heat radiation fan 3 is arranged in the case 1, the heat radiation fan 3 is arranged on the outer side of the reflecting cover, and the heat radiation fan 3 is used for adjusting the temperature in the case 1.

A temperature control meter is arranged in the case 1 and fixed on the rack through a temperature control fixing seat.

The working principle of the plasma processor based on the micro-nano technology is as follows: gas enters the plasma generator 2 through the gas inlet pipe 7, discharge is carried out between a positive electrode 201 and a negative electrode 202 in the plasma generator 2, plasma is discharged through the gas outlet pipe 10 along with the discharge gas, the flow of the discharge gas is controlled through the second rotor flow meter 12, water enters through the water inlet pipe 8 and enters the hydraulic pump 6 together with the plasma through the three communicating vessels to be mixed, the mixed gas and liquid are pumped into the dissolved gas tank 4, meanwhile, the air compressor 5 pressurizes the dissolved gas tank 4, the pressure value is controlled through the second rotor flow meter 12, the plasma, the discharge gas and the water generate micro-nano bubbles in the dissolved gas tank 4, and finally, the micro-nano bubbles are discharged through the micro-nano bubble discharge pipe 9. The micro-nano bubbles are used for carrying out comprehensive plasma treatment on the fruit and vegetable agricultural products, so that the treatment efficiency is improved, the sterilization and preservation effects are improved, and the production requirements of the food industry are met.

The plasma processor based on the micro-nano technology adopts a tubular DBD discharge mode, can generate low-temperature plasma at normal temperature, has little influence on the temperature of a medium, and effectively meets the requirement of non-thermal sterilization; the micro-nano bubble generator micro-nano converts plasma bubbles into micro-nano bubbles, ultra-fine bubbles (also called micro-nano bubbles) below 50um rise slowly due to small bubbles and continuously become small under water pressure, and finally are completely dissolved in water, so that the plasma is completely sent into the water and is used for treating different sterilization objects; the plasma power supply adopts an alternating current discharge mode, so that high voltage of direct current discharge is avoided, and the use safety of equipment is improved.

Above-mentioned plasma treater based on micro-nano technology has solved among the prior art plasma processing mode and can't handle the surface with the loading end contact, and handles the interval limited, and the operation safety risk is high, and the efficiency is lower grade defect, the utility model discloses a plasma washing processing mode, with the interval part of production and the washing effect interval of plasma water, with plasma bubble micro-nano back, let in it in the pure water again, make plasma water, reuse plasma water carries out comprehensive washing to fruit vegetables surface to reach better non-heat sterilization effect.

The above description is only a preferred embodiment of the present invention, and it is not intended to limit the scope of the present invention, and various modifications and changes may be made by those skilled in the art. All changes, modifications, substitutions, integrations and parameter changes to the embodiments, which are within the spirit and principle of the invention, can be made by conventional substitution or can realize the same function without departing from the principle and spirit of the invention, and all fall into the protection scope of the invention.

Claims

1. A plasma processor based on micro-nano technology is characterized by comprising a case (1), a plasma generator (2), a power supply, a dissolved air tank (4), an air compressor (5), a hydraulic pump (6), an air inlet pipe (7), a water inlet pipe (8) and a micro-nano bubble discharge pipe (9);

a rack is arranged in the case (1), and the power supply is fixed on the rack;

intake pipe (7) with plasma generator (2) intercommunication, inlet tube (8) with hydraulic pump (6) intercommunication, hydraulic pump (6), air compressor machine (5) all with dissolve gas pitcher (4) intercommunication, micro-nano bubble discharge pipe (9) with dissolve gas pitcher (4) intercommunication.

2. The micro-nano technology based plasma processor according to claim 1, wherein the plasma generator (2) is provided with an exhaust pipe (10), the exhaust pipe (10) is provided with a first rotor flow meter (11), and the exhaust pipe (10) is in communication with the hydraulic pump (6).

3. The micro-nano technology based plasma processor according to claim 2, wherein the exhaust pipe (10) and the water inlet pipe (8) are in communication with the hydraulic pump (6) through three communicators; and a second rotor flow meter (12) is arranged between the air compressor (5) and the dissolved air tank (4).

4. The micro-nano technology based plasma processor according to any of the claims 1-3, characterized in that the plasma generator (2) comprises a positive electrode (201), a negative electrode (202), a first glass tube (203), a second glass tube (204);

the positive electrode (201) is arranged on the outer periphery of the first glass tube (203), the negative electrode (202) is arranged in the second glass tube (204), and the second glass tube (204) is arranged in the first glass tube (203).

5. The micro-nano technology based plasma processor according to claim 4, wherein both ends of the first glass tube (203) and the second glass tube (204) are fixed by a fixing frame (205), both ends of the negative electrode (202) pass through the fixing frame (205), and both ends of the first glass tube (203) are provided with sealing rings at the contact positions with the fixing frame (205).

6. The micro-nano technology based plasma processor according to claim 4, wherein the plasma generator (2) is provided with a gas distribution block (206) and an insulating cover plate (207) at both ends, and the gas distribution block (206) is provided with a gas pipe joint.

7. The micro-nano technology based plasma processor according to any of the claims 1-3, characterized in that a heat dissipation fan (3) is arranged in the cabinet (1), the heat dissipation fan (3) being arranged outside the plasma generator (2).

8. The micro-nano technology based plasma processor according to any of the claims 1-3, wherein a temperature controlled meter is arranged in the cabinet (1), and the temperature controlled meter is fixed on the frame by a temperature controlled fixing seat.

9. The micro-nano technology based plasma processor according to any of the claims 1-3, characterized in that a time relay (101), a button switch (102), an indicator light (103), a knob switch, an emergency stop button (104) are arranged in front of the cabinet (1); a pipeline bracket (105) and a power socket (106) are arranged at the rear part of the case (1); two sides of the case (1) are provided with corresponding handles (107); supporting legs (108) are arranged at four corners below the case (1).

10. The micro-nano technology based plasma processor according to claim 9, wherein one end of the micro-nano bubble discharge pipe (9) is connected with a micro-nano bubble generator, and the micro-nano bubble generator is fixed on the pipeline bracket (105).