CN214863103U - Silicon etching liquid preparation system for wet etching process - Google Patents

Silicon etching liquid preparation system for wet etching process Download PDF

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Publication number
CN214863103U
CN214863103U CN202023286155.6U CN202023286155U CN214863103U CN 214863103 U CN214863103 U CN 214863103U CN 202023286155 U CN202023286155 U CN 202023286155U CN 214863103 U CN214863103 U CN 214863103U
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CN
China
Prior art keywords
shell
motor
welded
output shaft
wet etching
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Expired - Fee Related
Application number
CN202023286155.6U
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Chinese (zh)
Inventor
李虎宝
朱向洪
李忠平
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Jiangyin Chemical Reagent Factory Co ltd
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Jiangyin Chemical Reagent Factory Co ltd
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Priority to CN202023286155.6U priority Critical patent/CN214863103U/en
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Abstract

The utility model relates to a silicon etching solution preparation system for wet etching process, which comprises a first shell and a second shell, a first motor box is welded at the center of the top of the second shell, the top wall inside the first motor box is connected with a first motor through bolts and threads, the output shaft of the first motor is rotatably connected to the top of the second shell through a first bearing, the output shaft of the first motor penetrates through the top of the second shell and is matched with the first shell and the second shell, can reduce the time of the staff contacting the chemical agent, avoid the leakage of the chemical agent, also saved the process of manual stirring simultaneously, improved work efficiency, the pungent gas that gives off when can mixing chemical agent through the active carbon board filters, makes the first casing of discharge that it can be cleaner, has avoided the pollution of environment, also provides better operational environment for the staff simultaneously.

Description

Silicon etching liquid preparation system for wet etching process
Technical Field
The utility model relates to a preparation system especially relates to a preparation system of wet etching silicon etching solution for technology, belongs to the electronics chemical technology field.
Background
At present, wet etching is one of the important processes in integrated circuit manufacturing, and the etching process is as follows: and soaking the etching material (the exposed photoresist) in corrosive etching liquid for etching, so that the corresponding circuit pattern on the mask is photoetched at the etching position on the photoresist.
Nowadays, conventional corrosive liquid is when preparing, multiple chemical agent usually need to be used, these chemical agent contain corrosivity, some medicaments can also volatilize sharp gas, when now carrying out silicon corrosive liquid preparation, still need earlier carry out preliminary stirring with chemical agent, then pour mixed medicament into aquatic and stir, when adding chemical agent and adding mixed chemical agent into aquatic, all need the manual work to empty usually, when empting on one's hard can be toppled over staff's health, make the staff receive the injury, also can give off sharp gas when empting simultaneously, influence operating personnel's health. Therefore, a silicon etching solution preparation system for wet etching process is needed to solve the above problems.
SUMMERY OF THE UTILITY MODEL
The utility model aims to overcome the above-mentioned not enough, provide a safe and reliable's silicon etching solution preparation system for wet etching process.
The purpose of the utility model is realized like this:
a silicon corrosion liquid preparation system for a wet etching process comprises a first shell and a second shell, wherein a first motor box is welded at the center of the top of the second shell, a first motor is connected to the top wall of the first motor box through bolt threads, an output shaft of the first motor is connected to the top of the second shell through a first bearing in a rotating mode, the output shaft of the first motor penetrates through the top of the second shell, a first fixing rod is welded to the output shaft of the first motor, a stirring rod is welded to the outer side wall of the first fixing rod uniformly, a third discharging pipe is communicated with the bottom of one side of the second shell, a water inlet pipe is communicated with the top of one side of the second shell, a first shell is welded to one side of the top of the second shell, a second motor box is welded to one side of the first shell, and a second motor is connected to the inner side wall of the second motor box through bolt threads, the output shaft of second motor passes through the second bearing rotation and connects in one side of first casing, the output shaft of second motor runs through one side of first casing, the output shaft welding of second motor has the second dead lever, the lateral wall welding of second dead lever has stirring vane, bottom one side intercommunication of first casing has the second discharging pipe, the second discharging pipe runs through the top of second casing and installs the second solenoid valve, the even welding in top one side of first casing has the bin, the bottom intercommunication of bin has first discharging pipe, first discharging pipe runs through first casing and installs first solenoid valve.
The utility model relates to a wet etching is silicon etching solution preparation system for technology, top one side of bin has the case lid through the round pin axle is articulated, the case lid passes through buckle fixed connection with the bin.
The utility model relates to a wet etching is silicon etching solution preparation system for technology, the case lid all bonds with the adjacent one side of bin and has the rubber pad.
The utility model relates to a wet etching is silicon etching solution preparation system for technology, there is the activated carbon plate top one side of first casing through bolt threaded connection.
The utility model relates to a wet etching is silicon etching solution preparation system for technology, the observation window is installed to top one side of second casing.
The utility model relates to a wet etching is silicon etching solution preparation system for technology, the bottom symmetric welding of first casing has two first support columns, the bottom four corners symmetric welding of second casing has four second support columns.
Compared with the prior art, the beneficial effects of the utility model are that:
the utility model can reduce the time of the staff contacting the chemical agent through the mutual matching of the first shell and the second shell, thereby avoiding the situation that the staff is hurt because of the leakage of the chemical agent, simultaneously saving the process of manual stirring and improving the working efficiency; simultaneously, can filter the pungent gas that gives off when mixing chemical agent through the active carbon board, make its first casing of discharge that can be cleaner, avoid the pollution of environment, also provide better operational environment for the staff simultaneously.
Drawings
FIG. 1 is a schematic structural diagram of a system for preparing a silicon etching solution for a wet etching process according to the present invention;
FIG. 2 is a side view of the system for preparing silicon etching solution for wet etching process according to the present invention;
FIG. 3 is a top view of the system for preparing silicon etching solution for wet etching process according to the present invention;
fig. 4 is a schematic view of the sectioning structure of the second shell and the storage tank in the silicon etching solution preparation system for wet etching process of the present invention.
In the figure: 1. a box cover; 2. buckling; 3. a storage tank; 4. a first discharge pipe; 5. an activated carbon plate; 6. a rubber pad; 7. a first motor; 8. a first motor case; 9. an observation window; 10. a water inlet pipe; 11. a third discharge pipe; 12. a stirring rod; 13. a first fixing lever; 14. a first support column; 15. a second discharge pipe; 16. a first bearing; 17. a second solenoid valve; 18. a second support column; 19. a second motor; 20. a second motor case; 21. a second bearing; 22. a first solenoid valve; 23. a stirring blade; 24. a second fixing bar; 25. a first housing; 26. a second housing.
Detailed Description
Referring to fig. 1 to 4, the silicon etching solution preparation system for wet etching process according to the present invention comprises a first housing 25 and a second housing 26, a first motor box 8 is welded at the center of the top of the second housing 26, the top wall of the first motor box 8 is connected to a first motor 7 through a bolt and a thread, an output shaft of the first motor 7 is rotatably connected to the top of the second housing 26 through a first bearing 16, an output shaft of the first motor 7 penetrates the top of the second housing 26, a first fixing rod 13 is welded to the output shaft of the first motor 7, a stirring rod 12 is uniformly welded to the outer side wall of the first fixing rod 13, a third discharging pipe 11 is communicated with the bottom of one side of the second housing 26, a water inlet pipe 10 is communicated with the top of one side of the second housing 26, the first housing 25 is welded to one side of the top of the second housing 25, a second motor box 20 is welded to one side of the first housing 25, the inside wall of second motor case 20 has second motor 19 through bolt threaded connection, the output shaft of second motor 19 rotates through second bearing 21 and connects in one side of first casing 25, the output shaft of second motor 19 runs through one side of first casing 25, the output shaft welding of second motor 19 has second dead lever 24, the outer wall welding of second dead lever 24 has stirring vane 23, bottom one side intercommunication of first casing 25 has second discharging pipe 15, second discharging pipe 15 runs through the top of second casing 26 and installs second solenoid valve 17, the even welding in top one side of first casing 25 has storage box 3, the bottom intercommunication of storage box 3 has first discharging pipe 4, first discharging pipe 4 runs through first casing 25 and installs first solenoid valve 22.
Further, one side of the top of the storage box 3 is hinged with a box cover 1 through a pin shaft, and the box cover 1 is fixedly connected with the storage box 3 through a buckle 2; through the setting, pouring chemical into bin 3 inside back into, fix case lid 1 and bin 3 through buckle 2, buckle 2 divide into the son and detain and the box, and the son is detained and bin 3 welds, and the box welds with case lid 1, and the son is detained and the box joint, accomplishes bin 3 and the fixed of case lid 1.
Further, rubber pads 6 are bonded on the adjacent sides of the box cover 1 and the storage box 3; through the arrangement, the storage box 3 is sealed, so that the chemical agent in the storage box cannot leak out.
Further, an activated carbon plate 5 is connected to one side of the top of the first shell 25 through a bolt and a thread; through above setting, when chemical mixes, can give out pungent gas, filter gas through active carbon plate 5.
Further, an observation window 9 is installed on one side of the top of the second shell 26; through the arrangement, the interior of the second shell 26 can be observed more conveniently, so that a worker can know the mixing condition of the silicon corrosion liquid more quickly.
Further, two first support columns 18 are symmetrically welded at the bottom of the first shell 25, and four second support columns 14 are symmetrically welded at four corners of the bottom of the second shell 26; through the arrangement, the device is used for supporting the device and preventing the device from inclining or collapsing.
Further, the first motor 7 is model YBQ100-3-60B 01B.
Further, the second electric machine 19 is of type ZDY 108.
The utility model discloses a theory of operation does: opening the buckle 2, adding various chemical agents into the storage box 3 respectively, fixing the storage box 3 and the box cover 1 through the buckle 2, when silicon corrosion liquid needs to be prepared, opening the first electromagnetic valve 22 to enable the chemical agents in the storage box 3 to flow into the first shell 25 through the first discharge pipe 4, then starting the second motor 19, driving the second fixing rod 24 to rotate through the second motor 19, driving the stirring blade 23 to rotate through the second fixing rod 24, mixing the chemical agents through the stirring blade 23, after the chemical agents are mixed, injecting water into the second shell 26 through the water inlet pipe 10, then opening the second electromagnetic valve 17 to enable the mixed chemical agents to flow into the second shell 26 through the second discharge pipe 15, starting the first motor 7, and driving the first fixing rod 13 to rotate through the first motor 7, rotation of first dead lever 13 can drive stirring rod 12 and rotate, can mix chemical agent and water through stirring rod 12, take out silicon corrosion liquid through third discharging pipe 11 after mixing the completion, the activated carbon plate 5 at first casing 25 top can be when carrying out the chemical agent mixture, the pungent gas that will distribute filters, the observation window 9 at second casing 26 top can make the more convenient understanding of staff the inside mixed condition of second casing 26, this device is when carrying out the preparation of silicon corrosion liquid, the time of reduction manual contact chemical agent that can the at utmost, the condition that has avoided the staff to receive the injury appears.
In addition: it should be noted that the above-mentioned embodiment is only a preferred embodiment of the present patent, and any modification or improvement made by those skilled in the art based on the above-mentioned conception is within the protection scope of the present patent.

Claims (6)

1. A silicon etching solution preparation system for a wet etching process comprises a first shell (25) and a second shell (26), and is characterized in that: the improved water-saving device is characterized in that a first motor box (8) is welded at the center of the top of the second shell (26), a first motor (7) is connected to the top wall of the interior of the first motor box (8) through a bolt and a thread, an output shaft of the first motor (7) is rotatably connected to the top of the second shell (26) through a first bearing (16), the output shaft of the first motor (7) penetrates through the top of the second shell (26), a first fixing rod (13) is welded to the output shaft of the first motor (7), stirring rods (12) are uniformly welded to the outer side wall of the first fixing rod (13), a third discharging pipe (11) is communicated with the bottom of one side of the second shell (26), a water inlet pipe (10) is communicated with the top of one side of the second shell (26), a first shell (25) is welded to one side of the top of the second shell (26), and a second motor box (20) is welded to one side of the first shell (25), the inner side wall of the second motor box (20) is connected with a second motor (19) through bolt threads, the output shaft of the second motor (19) is rotationally connected with one side of the first shell (25) through a second bearing (21), an output shaft of the second motor (19) penetrates through one side of the first shell (25), a second fixing rod (24) is welded on the output shaft of the second motor (19), the outer side wall of the second fixed rod (24) is welded with a stirring blade (23), one side of the bottom of the first shell (25) is communicated with a second discharge pipe (15), the second discharge pipe (15) penetrates through the top of the second shell (26) and is provided with a second electromagnetic valve (17), the storage boxes (3) are uniformly welded on one side of the top of the first shell (25), the bottom intercommunication of bin (3) has first discharging pipe (4), first discharging pipe (4) run through first casing (25) and install first solenoid valve (22).
2. The system for preparing silicon etching solution for wet etching process according to claim 1, wherein: the top one side of bin (3) articulates through the round pin axle has case lid (1), case lid (1) passes through buckle (2) fixed connection with bin (3).
3. The system for preparing the silicon etching solution for the wet etching process according to claim 2, wherein: and a rubber pad (6) is bonded to one side of the case cover (1) adjacent to the storage case (3).
4. The system for preparing silicon etching solution for wet etching process according to claim 1, wherein: and one side of the top of the first shell (25) is connected with an activated carbon plate (5) through a bolt and a thread.
5. The system for preparing silicon etching solution for wet etching process according to claim 1, wherein: and an observation window (9) is arranged on one side of the top of the second shell (26).
6. The system for preparing silicon etching solution for wet etching process according to claim 1, wherein: the bottom symmetrical welding of first casing (25) has two first support columns (18), the bottom four corners symmetrical welding of second casing (26) has four second support columns (14).
CN202023286155.6U 2020-12-31 2020-12-31 Silicon etching liquid preparation system for wet etching process Expired - Fee Related CN214863103U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202023286155.6U CN214863103U (en) 2020-12-31 2020-12-31 Silicon etching liquid preparation system for wet etching process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202023286155.6U CN214863103U (en) 2020-12-31 2020-12-31 Silicon etching liquid preparation system for wet etching process

Publications (1)

Publication Number Publication Date
CN214863103U true CN214863103U (en) 2021-11-26

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ID=78926139

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202023286155.6U Expired - Fee Related CN214863103U (en) 2020-12-31 2020-12-31 Silicon etching liquid preparation system for wet etching process

Country Status (1)

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CN (1) CN214863103U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116313935A (en) * 2023-05-15 2023-06-23 常州市杰洋精密机械有限公司 Semiconductor silicon wafer texturing machine

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116313935A (en) * 2023-05-15 2023-06-23 常州市杰洋精密机械有限公司 Semiconductor silicon wafer texturing machine
CN116313935B (en) * 2023-05-15 2023-07-25 常州市杰洋精密机械有限公司 Semiconductor silicon wafer texturing machine

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Granted publication date: 20211126