CN214516179U

CN214516179U - Water-based gel eluting device for monocrystalline silicon wafers

Info

Publication number: CN214516179U
Application number: CN202120138326.6U
Authority: CN
Inventors: 陈锋; 沈国君; 陆勇; 赖锦香
Original assignee: Zhejiang Zhongjing Electronic Co ltd
Current assignee: Zhejiang Zhongjing Electronic Co ltd
Priority date: 2021-01-19
Filing date: 2021-01-19
Publication date: 2021-10-29
Anticipated expiration: 2031-01-19

Abstract

The utility model relates to a silicon chip washing technical field just discloses a monocrystalline silicon piece washing mucilage binding is put, which comprises a bod, the interior diapire fixedly connected with L shape seat of organism, the inside swing joint of L shape seat has the support plate, the washing tank has been seted up in the front of support plate, the inside fixed mounting of washing tank has the silicon chip body, the equal fixedly connected with fixed plate in the positive left and right sides of L shape seat, two one side fixedly connected with slide bar that the fixed plate is relative. This monocrystalline silicon piece water degumming device through rotating the rotary disk, makes the double-screw bolt rotate, drives the movable plate and moves down, makes two link joints take place to rotate, makes two pole covers of promotion move on the back of the body on the slide bar mutually to make the pad of rubbing at two pole cover backs transversely scrub silicon chip in the washing tank, and the connecting plate of movable plate both sides moves down, makes both sides rub the strip and carry out vertical rubbing and wash to silicon chip in the washing tank, makes the cleaning performance of reinforcing silicon chip, and then makes monocrystalline silicon piece come unstuck thoroughly.

Description

Water-based gel eluting device for monocrystalline silicon wafers

Technical Field

The utility model relates to a silicon chip washing technical field specifically is a monocrystalline silicon piece water washing mucilage binding is put.

Background

In the production of semiconductor devices, silicon wafers are strictly cleaned, the devices are also disabled due to trace pollution, and the cleaning aims to remove surface pollution impurities including organic matters and inorganic matters. Some of these impurities exist in an atomic state or an ionic state, and some of them exist in a thin film form or a particle form on the surface of the silicon wafer, and cause various defects. The existing silicon wafer washing device has poor cleaning effect, the surface of the cleaned silicon wafer has the phenomenon of incomplete degumming, the yield of the monocrystalline silicon wafer is reduced, and the production of the monocrystalline silicon wafer is not facilitated.

SUMMERY OF THE UTILITY MODEL

Technical problem to be solved

The utility model provides a not enough to prior art, the utility model provides a monocrystalline silicon piece water washing mucilage binding is put, possesses that the cleaning performance is good, come unstuck thoroughly and advantage such as easy and simple to handle, and it is not good to have solved current silicon chip washing device's cleaning performance, and the silicon chip surface after the washing has the incomplete phenomenon that comes unstuck, has reduced monocrystalline silicon piece's yield, is unfavorable for the problem of monocrystalline silicon piece production.

(II) technical scheme

In order to achieve the above object, the utility model provides a following technical scheme: a monocrystalline silicon piece water gel-eluting device comprises a machine body, wherein an L-shaped seat is fixedly connected to the inner bottom wall of the machine body, a carrier plate is movably connected to the inner portion of the L-shaped seat, a cleaning tank is arranged on the front side of the carrier plate, a silicon piece body is fixedly mounted inside the cleaning tank, fixing plates are fixedly connected to the left side and the right side of the front side of the L-shaped seat, a slide bar is fixedly connected to one side of the two opposite fixing plates, two bar sleeves are movably sleeved on the side surface of the slide bar, connecting frames are rotatably connected to the top portions of the two bar sleeves in the front side, mounting blocks are fixedly sleeved on the side surface of the slide bar, studs are rotatably connected to the top portions of the mounting blocks, a movable plate is in threaded connection with the side surface of the studs, one ends of the two connecting frames opposite to each other are rotatably connected to the front side of the movable plate, a rotating disc is rotatably connected to the top portion of the machine body, and the bottom of the rotating disc is fixedly connected to the top ends of the studs, the back of the two rod sleeves is fixedly connected with rubbing pads, the back of each rubbing pad is movably connected with the left side and the right side of the front face of the support plate, the left side and the right side of the movable plate are fixedly connected with connecting plates, the bottom of each connecting plate is fixedly connected with rubbing strips, the back of each rubbing strip is movably connected with the left side and the right side of the front face of the silicon wafer body, and the bottom of the machine body is fixedly connected with supporting legs.

Preferably, a through groove is formed in the rear side of the top of the machine body, and the support plate is matched with the inside of the through groove.

Preferably, the inner top wall of the machine body is fixedly connected with a frame plate, the bottom of the frame plate is fixedly connected with the top of the L-shaped seat, and the carrier plate is movably connected with the inside of the frame plate.

Preferably, the left side and the right side of the front face of the L-shaped seat are fixedly connected with L-shaped positioning blocks, and the left side and the right side of the carrier plate are movably connected with the interiors of the two L-shaped positioning blocks respectively.

Preferably, two equal fixedly connected with spring in the relative one side of rod cover, the slide bar is located the inside of two springs, two the relative one end of spring respectively with the left and right sides fixed connection of installation piece.

Preferably, the bottom of the front surface of the moving plate is fixedly connected with an installation shaft, and one ends of the two connecting frames, which are far away from the two rod sleeves, are movably sleeved with the side surface of the installation shaft.

Compared with the prior art, the utility model provides a monocrystalline silicon piece water washing mucilage binding is put possesses following beneficial effect:

1. this monocrystalline silicon piece water degumming device, through setting up the rod cover, the link, double-screw bolt and movable plate, rotate the rotary disk, make the double-screw bolt rotate, drive the movable plate that is connected with double-screw bolt side surface screw thread and move down, make two positive links of movable plate take place to rotate, make two rod covers of promotion move back to back on the slide bar mutually, thereby make the pad of rubbing at two rod cover backs transversely scrub the silicon chip in the washing tank, and the connecting plate of movable plate both sides moves down, make both sides rub the strip and carry out vertical rubbing and wash the silicon chip in the washing tank, make the cleaning performance of reinforcing silicon chip, and then make monocrystalline silicon piece come unstuck thoroughly.

2. According to the monocrystalline silicon wafer water degumming device, the frame plate and the L-shaped positioning block are arranged, so that the support plate is placed in the through groove and then enters the L-shaped positioning block along the frame plate, the support plate is stably placed on the L-shaped seat, and the support plate is prevented from shaking when the rubbing pad and the rubbing strip move, so that the cleaning effect of a silicon wafer body in the support plate is improved, and the washing degumming operation of the monocrystalline silicon wafer is facilitated.

Drawings

FIG. 1 is a sectional view of the present invention;

FIG. 2 is a top view of the present invention;

fig. 3 is a sectional view of the top structure of the L-shaped seat of the present invention.

Wherein: 1. a body; 2. an L-shaped seat; 3. a carrier plate; 4. a cleaning tank; 5. a fixing plate; 6. a slide bar; 7. a rod sleeve; 8. a connecting frame; 9. mounting blocks; 10. a stud; 11. moving the plate; 12. rotating the disc; 13. rubbing and cushioning; 14. a connecting plate; 15. rubbing the strips; 16. a through groove; 17. a frame plate; 18. an L-shaped positioning block; 19. a spring; 20. and (5) supporting legs.

Detailed Description

The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.

Referring to fig. 1-3, a monocrystalline silicon wafer water gel-stripping device comprises a body 1, an L-shaped base 2 fixedly connected to an inner bottom wall of the body 1, a carrier plate 3 movably connected to an inside of the L-shaped base 2, a cleaning tank 4 disposed on a front surface of the carrier plate 3, a silicon wafer body fixedly mounted inside the cleaning tank 4, a through groove 16 disposed on a rear side of a top of the body 1, the carrier plate 3 adapted to an inside of the through groove 16, a frame plate 17 fixedly connected to an inner top wall of the body 1, a bottom of the frame plate 17 fixedly connected to a top of the L-shaped base 2, the carrier plate 3 movably connected to an inside of the frame plate 17, L-shaped positioning blocks 18 fixedly connected to left and right sides of the front surface of the L-shaped base 2, the carrier plate 3 movably connected to inside of the two L-shaped positioning blocks 18, the frame plate 17 and the L-shaped positioning blocks 18, the carrier plate 3 being placed from the through groove 16 on the top of the body 1 so as to enter the two L-shaped positioning blocks 18, the carrier plate 3 is stably placed on the L-shaped seat 2, the carrier plate 3 is prevented from shaking when the rubbing pads 13 and the rubbing strips 15 move, the cleaning effect of a silicon wafer body in the carrier plate 3 is improved, and the washing and degumming operation of the monocrystalline silicon wafer is facilitated, the left side and the right side of the front surface of the L-shaped seat 2 are fixedly connected with the fixed plates 5, one opposite sides of the two fixed plates 5 are fixedly connected with the slide rod 6, two rod sleeves 7 are movably sleeved on the side surfaces of the slide rod 6, the top parts of the front surfaces of the two rod sleeves 7 are rotatably connected with the connecting frames 8, the side surfaces of the slide rod 6 are fixedly sleeved with the mounting blocks 9, one opposite sides of the two rod sleeves 7 are fixedly connected with the springs 19, the slide rod 6 is positioned in the two springs 19, one opposite ends of the two springs 19 are respectively fixedly connected with the left side and the right side of the mounting blocks 9, the springs 19 are arranged, and when the moving plate 11 moves upwards, the springs are restored through the elasticity of the two springs 19, the two rod sleeves 7 are pulled to move relatively, the connecting frames 8 on the two rod sleeves 7 are convenient to rotate, the two rubbing pads 13 are convenient to move relatively, the silicon wafer body in the cleaning tank 4 is convenient to scrub horizontally, the top of the mounting block 9 is rotatably connected with the stud 10, the side surface of the stud 10 is in threaded connection with the moving plate 11, the opposite ends of the two connecting frames 8 are rotatably connected with the front surface of the moving plate 11, the front bottom of the moving plate 11 is fixedly connected with the mounting shaft, the ends of the two connecting frames 8, far away from the two rod sleeves 7, are movably sleeved with the side surface of the mounting shaft, the rod sleeves 7, the connecting frames 8, the stud 10 and the moving plate 11 are arranged, the rotating disc 12 is rotated to rotate the stud 10 to drive the moving plate 11 in threaded connection with the side surface of the stud 10 to move downwards, the two connecting plates 8 on the front surface of the moving plate 11 are rotated, and the two rod sleeves 7 are pushed to move back on the sliding rod 6, therefore, the rubbing pads 13 on the back surfaces of the two rod sleeves 7 transversely scrub the silicon wafers in the cleaning tank 4, the connecting plates 14 on the two sides of the moving plate 11 move downwards, the rubbing strips 15 on the two sides vertically scrub the silicon wafers in the cleaning tank 4, the cleaning effect of the silicon wafers is enhanced, the monocrystalline silicon wafers are thoroughly degummed, the top of the machine body 1 is rotatably connected with the rotating disc 12, the bottom of the rotating disc 12 is fixedly connected with the top end of the stud 10, the rubbing pads 13 are fixedly connected with the back surfaces of the two rod sleeves 7, the back surfaces of the two rubbing pads 13 are respectively movably connected with the left side and the right side of the front surface of the support plate 3, the connecting plates 14 are fixedly connected with the left side and the right side of the moving plate 11, the rubbing strips 15 are fixedly connected with the bottom of the two connecting plates 14, the back surfaces of the two rubbing strips 15 are respectively movably connected with the left side and the right side of the front surface of the silicon wafer body, and the bottom of the machine body 1 is fixedly connected with the supporting legs 20.

When in use, a user firstly puts the carrier plate 3 into the through groove 16 at the top of the machine body 1, so that the carrier plate enters the two L-shaped positioning blocks 18 along the inside of the frame plate 17, the carrier plate 3 is stably placed on the L-shaped seat 2, then the rotary disk 12 is rotated, the stud 10 is rotated, the movable plate 11 in threaded connection with the side surface of the stud 10 is driven to move downwards, the two connecting frames 8 at the front of the movable plate 11 are rotated, the two rod sleeves 7 are pushed to move back to back on the sliding rods 6, so that the rubbing pads 13 at the back of the two rod sleeves 7 can transversely scrub the silicon wafers in the cleaning tank 4, the connecting plates 14 at the two sides of the movable plate 11 move downwards, the rubbing strips 15 at the two sides can scrub the silicon wafers in the cleaning tank 4 vertically, the colloid on the surfaces of the silicon wafer bodies is rubbed down, the monocrystalline silicon wafer water degumming device can repeatedly scrub the surfaces of the silicon wafer bodies horizontally and vertically by rotating the rotary disk 12, the cleaning effect of the silicon wafer body is enhanced, and the monocrystalline silicon wafer is degummed thoroughly.

Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.

Claims

1. A monocrystalline silicon piece water degumming device comprises a machine body (1) and is characterized in that: the cleaning machine comprises a machine body (1), wherein an L-shaped seat (2) is fixedly connected to the inner bottom wall of the machine body (1), a support plate (3) is movably connected to the inside of the L-shaped seat (2), a cleaning groove (4) is formed in the front side of the support plate (3), a silicon wafer body is fixedly mounted in the cleaning groove (4), fixing plates (5) are fixedly connected to the left side and the right side of the front side of the L-shaped seat (2), two sliding rods (6) are fixedly connected to one side of the fixing plates (5) opposite to each other, two rod sleeves (7) are movably sleeved on the side surface of each sliding rod (6), connecting frames (8) are rotatably connected to the top of the front side surfaces of the two rod sleeves (7), a mounting block (9) is fixedly sleeved on the side surface of each sliding rod (6), a stud moving plate (10) is rotatably connected to the top of the mounting block (9), and a stud moving plate (11) is in threaded connection with the side surface of the stud (10), two the one end that link (8) are relative all rotates with the front of movable plate (11) to be connected, the top of organism (1) is rotated and is connected with rotary disk (12), the top fixed connection of the bottom of rotary disk (12) and double-screw bolt (10), two the equal fixedly connected with in the back of rod cover (7) rubs pad (13), two rub the back of pad (13) respectively with support plate (3) positive left and right sides swing joint, the equal fixedly connected with connecting plate (14) in the left and right sides of movable plate (11), two the equal fixedly connected with in bottom of connecting plate (14) rubs strip (15), two rub the back of strip (15) respectively with the positive left and right sides swing joint of silicon chip body, the bottom fixedly connected with supporting leg (20) of organism (1).

2. The single crystal silicon wafer water degumming device according to claim 1, characterized in that: a through groove (16) is formed in the rear side of the top of the machine body (1), and the carrier plate (3) is matched with the inside of the through groove (16).

3. The single crystal silicon wafer water degumming device according to claim 1, characterized in that: the inner top wall of the machine body (1) is fixedly connected with a frame plate (17), the bottom of the frame plate (17) is fixedly connected with the top of the L-shaped seat (2), and the carrier plate (3) is movably connected with the inside of the frame plate (17).

4. The single crystal silicon wafer water degumming device according to claim 1, characterized in that: the left side and the right side of the front face of the L-shaped seat (2) are fixedly connected with L-shaped positioning blocks (18), and the left side and the right side of the carrier plate (3) are movably connected with the interiors of the two L-shaped positioning blocks (18) respectively.

5. The single crystal silicon wafer water degumming device according to claim 1, characterized in that: two equal fixedly connected with spring (19) in the relative one side of rod cover (7), slide bar (6) are located the inside of two springs (19), two the relative one end of spring (19) respectively with the left and right sides fixed connection of installation piece (9).

6. The single crystal silicon wafer water degumming device according to claim 1, characterized in that: the positive bottom fixedly connected with installation axle of movable plate (11), two one end that link (8) kept away from two rod cover (7) all cup joints with the side surface activity of installation axle.