CN214504123U

CN214504123U - Adjustable double-sided photoetching machine

Info

Publication number: CN214504123U
Application number: CN202023125163.2U
Authority: CN
Inventors: 张其文
Original assignee: Sichuan Hongyuan Dingxin Technology Co ltd
Current assignee: Sichuan Hongyuan Dingxin Technology Co ltd
Priority date: 2020-12-22
Filing date: 2020-12-22
Publication date: 2021-10-26
Anticipated expiration: 2030-12-22

Abstract

The utility model discloses an adjustable two-sided lithography machine, including organism and activity dish, the organism right-hand member is provided with the rack, and is fixed with the workstation on the organism, workstation upside right-hand member is connected with the display screen, and workstation upside rear end is provided with the panel board, the activity dish is connected in workstation upper end middle part, and bonds in the activity dish outside has the antiskid stopper, activity dish lower extreme is connected with the drive shaft, and the drive shaft lower extreme is provided with the work motor. This adjustable two-sided lithography machine is provided with auxiliary strut, and the auxiliary strut that the cyclic annular equidistance of activity dish lower extreme distributes can evenly support the activity dish, protects the stability of equipment such as lithography machines that activity dish and upper end set up, and further auxiliary strut lower extreme is fixed with the gyro wheel, can roll in the cyclic annular spout, plays the promotion effect at the in-process of activity dish rotation regulation, improves its flexibility, reduces frictional resistance and wearing and tearing consumption.

Description

Adjustable double-sided photoetching machine

Technical Field

The utility model relates to a two-sided lithography machine technical field specifically is an adjustable two-sided lithography machine.

Background

The double-sided photoetching machine is a process test instrument used in the field of power and electrical engineering, is also called a mask alignment exposure machine, an exposure system, a photoetching system and the like, and is core equipment for manufacturing chips. It uses the technology similar to photo printing to print the fine pattern on the mask plate on the silicon chip by the exposure of light.

The double-sided photoetching machine in the market has the advantages that the adjusting degree of the machine body is insufficient, the machine body cannot be rotated and adjusted in multiple directions conveniently, the surface space of the workbench is small, and the machine body is inconvenient to use.

SUMMERY OF THE UTILITY MODEL

An object of the utility model is to provide an adjustable two-sided lithography machine to the two-sided lithography machine on the market that proposes in solving above-mentioned background is not enough to the regulation degree of organism itself, and diversified rotation regulation work of being not convenient for, and its workstation surface space is less moreover, awkward problem.

In order to achieve the above object, the utility model provides a following technical scheme: an adjustable double-sided photoetching machine comprises a machine body and a movable disc, wherein a machine cabinet is arranged at the right end of the machine body, a workbench is fixed at the upper end of the machine body, a display screen is connected at the right end of the upper side of the workbench, an instrument panel is arranged at the rear end of the upper side of the workbench, the movable disc is connected at the middle part of the upper end of the workbench, an anti-skid plug is bonded at the outer side of the movable disc, a driving shaft is connected at the lower end of the movable disc, a working motor is arranged at the lower end of the driving shaft, an auxiliary supporting rod is fixed at the outer edge of the lower side of the movable disc, a roller wheel is arranged at the lower end of the auxiliary supporting rod, sliding grooves are formed in parallel at the lower side of the movable disc, a frame is arranged at the upper end of the movable disc, a photoetching machine body is connected at the upper end of the frame, a reinforcing baffle plate is movably connected at the lower side of the left end of the workbench, a damping shaft penetrates through the middle part of the right end of the reinforcing baffle plate, a groove is formed at the lower end of the left end of the workbench, and the left end of the groove is connected with a lengthening plate.

Preferably, the structural size of the outer opening of the movable disc is matched with that of the inner opening of the workbench, and the movable disc is movably connected with the workbench.

Preferably, the movable disc and the anti-skid plug are in a semi-surrounding structure, and the anti-skid plug is in a flexible structure.

Preferably, the movable disc forms a transmission structure with the working motor through the driving shaft, and the vertical central axis of the movable disc coincides with the vertical central axis of the workbench.

Preferably, the auxiliary supporting rods are distributed in an annular shape at equal intervals by using a vertical central axis of the movable plate, and the auxiliary supporting rods are fixedly connected with the rollers.

Preferably, the sliding groove is annular, and the sliding groove is movably connected with the roller.

Preferably, the reinforcing separation blades form a turnover structure between the damping shaft and the workbench, and the reinforcing separation blades are symmetrically distributed about the central axis of the workbench.

Preferably, the lengthened plate forms a buckle structure through the groove and the workbench, and the lengthened plate is in sliding connection with the reinforcing baffle.

Compared with the prior art, the beneficial effects of the utility model are that: the movable disc matched with the structural size of the workbench can drive the driving shaft to move under the driving of the working motor, so that the movable disc is driven to rotate, the rack arranged at the upper end of the movable disc rotates along with the movable disc, the whole photoetching machine is rotationally adjusted, and the flexibility of the movable disc is ensured;

the auxiliary supporting rods which are annularly and equidistantly distributed at the lower end of the movable disc can uniformly support the movable disc, so that the stability of the movable disc and equipment such as a photoetching machine and the like arranged at the upper end of the movable disc is protected, and further, the lower ends of the auxiliary supporting rods are fixedly provided with the rollers which can roll along the annular sliding grooves, so that the auxiliary supporting rods play a promoting role in the rotation adjustment process of the movable disc, the flexibility of the movable disc is improved, and the friction resistance and the abrasion consumption are reduced;

the reinforcing separation blade can be turned outwards in compliance with the movement of the damping shaft, so that the reinforcing separation blade is exposed, the corresponding lengthening plate is in compliance with the reinforcing separation blade which is symmetrical around two sides, the reinforcing separation blade is enabled to be attached to the left side face of the workbench until the reinforcing separation blade enters the groove to be buckled, the reinforcing separation blade plays a role in supporting and reinforcing the reinforcing separation blade, the reinforcing separation blade is prevented from being loosened, the length of the workbench of the double-sided photoetching machine is further adjusted, the photoetching machine is convenient to integrally store, and the practicability is improved.

Drawings

FIG. 1 is a schematic view of the overall structure of the present invention;

FIG. 2 is a schematic view of the movable plate of the present invention;

fig. 3 is a schematic view of the connecting structure between the reinforcing baffle and the bottom of the workbench.

In the figure: 1. a body; 2. a cabinet; 3. a work table; 4. a display screen; 5. an instrument panel; 6. a movable tray; 7. an anti-slip plug; 8. a drive shaft; 9. a working motor; 10. an auxiliary strut; 11. a chute; 12. a roller; 13. a frame; 14. a lithography machine body; 15. reinforcing the baffle plate; 16. a damping shaft; 17. a groove; 18. and (5) lengthening the plate.

Detailed Description

The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.

Referring to fig. 1-3, the present invention provides a technical solution: an adjustable double-sided photoetching machine comprises a machine body 1, a machine cabinet 2, a workbench 3, a display screen 4, an instrument panel 5, a movable disc 6, an anti-skid plug 7, a driving shaft 8, a working motor 9, an auxiliary supporting rod 10, a sliding chute 11, a roller 12, a frame 13, a photoetching machine body 14, a reinforcing baffle 15, a damping shaft 16, a groove 17 and a lengthening plate 18, wherein the machine cabinet 2 is arranged at the right end of the machine body 1, the workbench 3 is fixed at the upper end of the machine body 1, the display screen 4 is connected at the right end of the upper side of the workbench 3, the instrument panel 5 is arranged at the rear end of the upper side of the workbench 3, the movable disc 6 is connected to the middle part of the upper end of the workbench 3, the anti-skid plug 7 is bonded at the outer side of the movable disc 6, the movable disc 6 and the anti-skid plug 7 are in a semi-surrounding structure, the anti-skid plug 7 is in a flexible structure, a circle of anti-skid plug 7 is arranged at the outer side of the movable disc 6, on one hand, the friction force between the movable disc 6 and the workbench 3 is increased by the flexible anti-skid plug 7, the stability of the movable disc 6 is improved, and on the other hand, the anti-slip plug 7 can prevent substances such as dust, scraps and the like from entering, so that the inside of the movable disc is blocked and damaged, foreign matters are accumulated to cause poor driving effect of the driving shaft 8 and cause erosion and rust on internal devices;

the lower end of the movable disc 6 is connected with a driving shaft 8, the lower end of the driving shaft 8 is provided with a working motor 9, the movable disc 6 forms a transmission structure with the working motor 9 through the driving shaft 8, the vertical central axis of the movable disc 6 coincides with the vertical central axis of the workbench 3, the structural size of the outer opening of the movable disc 6 is matched with the structural size of the inner opening of the workbench 3, the movable disc 6 is movably connected with the workbench 3, the movable disc 6 matched with the structural size of the workbench 3 can drive the driving shaft 8 to move under the driving of the working motor 9, and further the movable disc 6 is driven to rotate, so that a rack 13 mounted at the upper end of the movable disc 6 rotates along with the rack, the whole photoetching machine is rotatably adjusted, and the flexibility of the movable disc 6 is guaranteed;

an auxiliary supporting rod 10 is fixed at the outer edge of the lower side of the movable disc 6, a roller 12 is arranged at the lower end of the auxiliary supporting rod 10, a sliding groove 11 is arranged in parallel at the lower side of the movable disc 6, the upper end of the movable disc 6 is provided with a frame 13, the auxiliary supporting rods 10 are distributed in a ring shape with equal distance by the vertical central axis of the movable disc 6, the auxiliary supporting rods 10 are fixedly connected with the rollers 12, the sliding grooves 11 are annular, the sliding grooves 11 are movably connected with the rollers 12, the auxiliary supporting rods 10 which are annularly and equidistantly distributed at the lower end of the movable disc 6 can uniformly support the movable disc 6 to protect the stability of the movable disc 6 and equipment such as a photoetching machine and the like arranged at the upper end of the movable disc 6, the rollers 12 are further fixed at the lower ends of the auxiliary supporting rods 10 and can roll along the annular sliding grooves 11, the rotating adjusting device plays a promoting role in the rotating adjusting process of the movable disc 6, improves the flexibility of the movable disc, and reduces the frictional resistance and the abrasion consumption;

the upper end of the frame 13 is connected with a photoetching machine body 14, the lower side of the left end of the workbench 3 is movably connected with a reinforcing baffle 15, the middle part of the right end of the reinforcing baffle 15 is penetrated with a damping shaft 16, the middle part of the left lower end of the workbench 3 is provided with a groove 17, the left end of the groove 17 is connected with a lengthened plate 18, the reinforcing baffle 15 forms an overturning structure with the workbench 3 through the damping shaft 16, the reinforcing baffles 15 are symmetrically distributed around the central axis of the workbench 3, the lengthened plate 18 forms a buckling structure with the workbench 3 through the groove 17, the lengthened plate 18 is in sliding connection with the reinforcing baffles 15, the reinforcing baffles 15 can outwards overturn in compliance with the movement of the damping shaft 16 to expose the reinforcing baffles, the corresponding lengthened plate 18 slides in compliance with the two reinforcing baffles 15 which are symmetrical front and back to be jointed with the left side of the workbench 3 until the reinforcing baffles enter the groove 17 for buckling, and the two reinforcing baffles 15 play a role of supporting and reinforcing, the lengthened plate 18 is prevented from being separated and loosened, the length of the workbench 3 of the double-sided photoetching machine is further adjusted, the photoetching machine is convenient to integrally store articles, and the practicability is improved.

The working principle is as follows: for the adjustable double-sided photoetching machine, firstly, the damping shaft 16 is used for movably overturning the reinforcing baffle sheets 15, so that the two symmetrically distributed reinforcing baffle sheets 15 are vertically distributed with the side surface of the workbench 3, further, the lengthened plate 18 is made to conform to the two reinforcing baffle sheets 15 which are symmetrical front and back to slide, the lengthened plate is made to be attached to the left side surface of the workbench 3 until the lengthened plate enters the groove 17 for buckling, the two reinforcing baffle sheets 15 play a role in supporting and reinforcing, the lengthened plate 18 is prevented from being separated from loosening, the length adjustment of the workbench 3 of the double-sided photoetching machine is further realized, photoetching machine articles are convenient to be integrally stored, the practicability is improved, then, the driving shaft 8 is made to move by the movable disc 6 which is mutually matched with the structural size of the workbench 3 under the driving of the working motor 9, and then the movable disc 6 is driven to rotate, so that the rack 13 arranged at the upper end of the movable disc 6 rotates along with the workbench, further, the whole photoetching machine is subjected to automatic rotation adjustment, the flexibility of the movable disc 6 is ensured, a circle of anti-slip plug 7 is arranged on the outer side of the movable disc 6, on one hand, the contact friction force between the anti-slip plug 7 and the workbench 3 is increased when the movable disc 6 moves, the stability of the movable disc 6 is improved, on the other hand, the anti-slip plug 7 can prevent the substances such as dust, scraps and the like from entering, so as to block and damage the inside, the driving effect of the driving shaft 8 is poor due to the accumulation of foreign matters, and the erosion and the rusting are caused to internal devices, in addition, the auxiliary supporting rods 10 which are annularly and equidistantly distributed at the lower end of the movable disc 6 can uniformly support the movable disc 6, the stability of the movable disc 6 and equipment such as a photoetching machine and the like arranged at the upper end of the movable disc 6 is protected, the rollers 12 are further fixed at the lower end of the auxiliary supporting rods 10 and can roll along the annular sliding chute 11, the promotion effect is realized in the rotation adjustment process of the movable disc 6, and the flexibility is improved, the friction resistance and the abrasion consumption are reduced, so that the use process of the whole adjustable double-sided photoetching machine is completed.

Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.

Claims

1. The utility model provides a two-sided lithography machine of adjustable, includes organism (1) and activity dish (6), its characterized in that: the machine is characterized in that a cabinet (2) is arranged at the right end of the machine body (1), a workbench (3) is fixed at the upper end of the machine body (1), a display screen (4) is connected at the right end of the upper side of the workbench (3), a meter panel (5) is arranged at the rear end of the upper side of the workbench (3), the movable disc (6) is connected to the middle of the upper end of the workbench (3), an anti-skid plug (7) is bonded to the outer side of the movable disc (6), a driving shaft (8) is connected to the lower end of the movable disc (6), a working motor (9) is arranged at the lower end of the driving shaft (8), an auxiliary supporting rod (10) is fixed at the outer edge of the lower side of the movable disc (6), rollers (12) are arranged at the lower end of the auxiliary supporting rod (10), a sliding groove (11) is formed in parallel at the lower side of the movable disc (6), a rack (13) is arranged at the upper end of the movable disc (6), a photoetching machine body (14) is connected to the rack (13), workstation (3) left end downside swing joint has reinforcement separation blade (15), and reinforcement separation blade (15) right-hand member middle part runs through damping axle (16), workstation (3) left side lower extreme middle part is seted up flutedly (17), and recess (17) left end is connected with extension board (18).

2. The adjustable double-sided lithography machine according to claim 1, wherein: the outer opening structure size of the movable disc (6) is matched with the inner opening structure size of the workbench (3), and the movable disc (6) is movably connected with the workbench (3).

3. The adjustable double-sided lithography machine according to claim 1, wherein: the movable disc (6) and the anti-skid plug (7) are of a semi-surrounding structure, and the anti-skid plug (7) is of a flexible structure.

4. The adjustable double-sided lithography machine according to claim 1, wherein: the movable disc (6) forms a transmission structure with the working motor (9) through the driving shaft (8), and the vertical central axis of the movable disc (6) coincides with the vertical central axis of the workbench (3).

5. The adjustable double-sided lithography machine according to claim 1, wherein: the auxiliary supporting rods (10) are distributed in an annular shape at equal intervals by using a vertical central axis of the movable plate (6), and the auxiliary supporting rods (10) are fixedly connected with the rollers (12).

6. The adjustable double-sided lithography machine according to claim 1, wherein: the sliding groove (11) is annular, and the sliding groove (11) is movably connected with the roller (12).

7. The adjustable double-sided lithography machine according to claim 1, wherein: consolidate separation blade (15) and constitute flip structure between workstation (3) through damping axle (16), and consolidate separation blade (15) and be the symmetric distribution about workstation (3) axis.

8. The adjustable double-sided lithography machine according to claim 1, wherein: the lengthened plate (18) forms a buckling structure with the workbench (3) through the groove (17), and the lengthened plate (18) is in sliding connection with the reinforcing baffle plate (15).