CN214496456U

CN214496456U - Double-beam excitation type metal-gas ionization equipment

Info

Publication number: CN214496456U
Application number: CN202120382598.0U
Authority: CN
Inventors: 钱若棨; 刘思南; 钱敬吉
Original assignee: Suzhou Daoyizhicheng Nano Material Technology Co ltd
Current assignee: Suzhou Daoyizhicheng Nano Material Technology Co ltd
Priority date: 2021-02-20
Filing date: 2021-02-20
Publication date: 2021-10-26
Anticipated expiration: 2031-02-20

Abstract

The utility model provides a two bundle of excitation formula metal-gas ionization equipment, includes vacuum chamber, sets up the crucible dish in vacuum chamber inside, there are four at least crucible caves on the crucible dish to and set up the crucible on the crucible cave, crucible dish the place ahead in vacuum chamber inside is provided with the electron gun, crucible dish top in vacuum chamber inside is provided with the base plate, the base plate is connected with vacuum chamber top, its characterized in that, crucible dish center is provided with the ion source. The utility model provides a two bundle excitation formula metal-gas ionization equipment can improve the overlap portion of electron gun gasification scope and ion source ionization scope, then can improve the volume that the metal was ionized, improves the quality of film behind the coating film.

Description

Double-beam excitation type metal-gas ionization equipment

Technical Field

The utility model relates to an excitation formula metal-gas ionization equipment especially relates to a two-beam excitation formula metal-gas ionization equipment.

Background

The physical vapor deposition technique is a technique of vaporizing a solid raw material or a liquid surface thereof into gaseous atoms, molecules or partially ionized ions by a physical method under a vacuum condition, and depositing a thin film having a certain function on a substrate surface by low-pressure gas or plasma. The technology can be used for depositing metal films, alloy films, deposited compounds, polymer films, ceramics, semiconductors and the like, and is widely applied. The technology needs to apply components such as an electron gun, an ion source and the like, and the prior art has the limitation that only part of the film material in the crucible can be ionized into ions, so that the yield is low when a multi-component compound or a high-entropy alloy is synthesized, and a mixture film formed by the high-entropy alloy, the multi-component compound and the used material is deposited on a substrate instead of a compound film.

In the prior art, when an ion source assists an electron gun in evaporation plating, the ion source can ionize most of gas. However, since the ion source is far from the electron gun and it is difficult to cover most of the evaporated metal ion groups, atomic groups, and molecular groups, the effect on the evaporated metal is small, and the metal deposited on the substrate is not uniformly distributed, which makes it difficult to synthesize a multi-component compound and a medium-and high-entropy alloy.

SUMMERY OF THE UTILITY MODEL

In order to solve the defects of the prior art, the utility model provides a two-beam excitation type metal-gas ionization equipment, which improves the overlapping part of the ionization range of the electron gun and the ionization range of the ion source, and can improve the ionized amount of the metal and the quality of the film after the film coating.

The utility model discloses the technical problem that will solve realizes through following technical scheme:

the utility model provides a two bundle of excitation formula metal-gas ionization equipment, includes vacuum chamber, sets up the crucible dish in vacuum chamber inside, there are four at least crucible caves on the crucible dish to and set up the crucible on the crucible cave, the crucible dish below in vacuum chamber inside is provided with the electron gun, the crucible dish top in vacuum chamber inside is provided with the base plate, the base plate is connected with vacuum chamber top, its characterized in that, crucible dish center is provided with the ion source.

Furthermore, the crucible tray is circular, the crucible cavity is waist-shaped, circular or two types of mixed and overlapped and is matched with the crucible in shape, and the crucible is used for placing the film forming material.

Furthermore, the crucibles are uniformly distributed on the crucible disc in a ring shape.

Further, a gear transmission structure is arranged between the crucible disc and the ion source.

Further, the gear transmission structure is annular.

Further, the gear transmission structure is used for driving the crucible disc and the crucible to rotate around the ion source.

Furthermore, at least three electron guns are arranged in front of the crucible disc.

Further, the electron gun irradiates an electron beam to the film formation material in the crucible and evaporates it, and the evaporated film formation material and the ionized gas emitted from the ion source adhere to the substrate.

Further, the electron gun vaporization range overlaps with the ion source ionization range and is projected on the substrate.

Further, the film-forming materials placed in the crucibles may be the same or different.

The double-beam excitation type metal-gas ionization equipment provides a crucible disc and an ion source arranged in the center of the crucible disc, the ion source and the electron gun are closer to each other, the overlapping part of the gasification range of the electron gun and the ionization range of the ion source is enlarged, the ionized amount of metal is increased, and the film quality is improved. Meanwhile, the arrangement of a plurality of crucibles, the arrangement of a plurality of electron guns and the rotatable crucible disc driven by the gear transmission device increases the application range of EBPVD and increases the applications in the aspects of hardening, corrosion resistance, wear resistance, catalysis and the like.

Drawings

Fig. 1 is a schematic diagram of a structure of a dual-beam excitation type metal-gas ionization apparatus provided by the present invention;

fig. 2 is a top view of the structure of the dual-beam excitation type metal-gas ionization apparatus provided by the present invention.

1. A vacuum bin; 2. a crucible tray; 3. a crucible; 4. a gear transmission structure; 5. an ion source; 6. a substrate; 7. an electron gun; 8. And (5) steaming resistance.

Detailed Description

It should be noted that the embodiments and features of the embodiments in the present application may be combined with each other without conflict. The present invention will be described in detail below with reference to the accompanying drawings in conjunction with embodiments.

It should be noted that the following detailed description is exemplary and is intended to provide further explanation of the disclosure. Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs.

It is noted that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of example embodiments according to the present application. As used herein, the singular forms "a", "an" and "the" are intended to include the plural forms as well, and it should be understood that when the terms "comprises" and/or "comprising" are used in this specification, they specify the presence of stated features, steps, operations, devices, components, and/or combinations thereof, unless the context clearly indicates otherwise.

The present invention will be described in detail with reference to the accompanying drawings and examples.

As shown in fig. 1, the structure of the dual-beam excitation type metal-gas ionization apparatus of the present embodiment includes a vacuum chamber 1, a crucible tray 2 is disposed in the vacuum chamber 1, the crucible tray 2 is circular, six crucible cavities are uniformly distributed on the crucible tray 2, a crucible 3 is disposed on each crucible cavity, the crucible 3 is a waist-shaped crucible, the crucible 3 may also be a circular crucible, the crucible 3 is annularly and uniformly disposed on the crucible tray 2, and the crucible 3 is used for containing a film forming material. The central position of the crucible tray 2 is provided with a gear transmission structure 4, and the gear transmission structure 4 is used for driving the crucible tray 2 to rotate. An ion source 5 is arranged in the center of the gear transmission structure 4, the ion source 5 is used for ionizing ion clusters, the gear transmission structure 4 is annularly arranged between the crucible disc 2 and the ion source 5, and the ion source 5 does not rotate along with the gear transmission structure 4. Above the ion source 5, a substrate 6 is arranged. The double-beam excitation type metal-gas ionization equipment structure comprises three electron guns 7 and two evaporation prevention devices 8, wherein the electron guns 7 are positioned in front of a crucible disc 2, the electron guns 7 irradiate electron beams to a film forming material in a crucible forming 3 and evaporate the film forming material, a cone-shaped ion beam area is generated by an ion source 5, the connecting part of the electron guns 7 and a substrate 6 is an atomic group area and a molecular group area evaporated by the electron beams, the atomic group area and the molecular group area are partially overlapped and superposed on the substrate 6 to realize the film coating function, and the evaporation prevention devices 8 and the electron guns 7 have the same function.

The structure of the crucible plate 2 of the dual-beam excitation type metal-gas ionization device structure of the present embodiment is specifically shown in fig. 2, eight crucible cavities are uniformly distributed on the crucible plate 2 in an annular manner, each crucible cavity is provided with one crucible 3, the crucible 3 is a waist-shaped crucible, a groove is formed in the crucible 3 for placing a film forming material, three electron guns 7 are arranged inside the vacuum chamber 1, and the electron guns 7 irradiate electron beams to the film forming material in the crucible 3 and evaporate the film forming material. A circular gear transmission structure 4 is arranged at the central part of the crucible tray 2 and is used for driving the crucible tray 2 and a crucible 3 arranged on the crucible tray 2 to rotate. An ion source 5 is arranged centrally in the gear transmission 4, the ion source 5 being used to emit ionized ion packets. The ionized ion clusters emitted by the ion source 5 and the film-forming material irradiated and evaporated by the electron gun 7 are deposited on the substrate 6 together, so that the film-coating effect is realized. The film forming materials placed in each crucible 3 can be the same or different, the film coating of different substrates can be realized for a plurality of times under the condition that the film forming materials are not frequently supplemented by placing the same film forming materials, and the continuous film coating of different films of the same substrate can be realized under the condition that the vacuum chamber 1 is not opened by placing different film forming materials. The ion source 5 is arranged at the central position of the crucible disc 2 and is closer to the relative position of the electron gun 7, so that the overlapping part of the gasification range of the electron gun 7 and the ionization range of the ion source 5 is increased, the ionized amount of metal is increased, and the quality of a film on a coated substrate is improved.

Spatially relative terms, such as "above … …," "above … …," "above … …," "above," and the like, may be used herein for ease of description to describe one device or feature's spatial relationship to another device or feature as illustrated in the figures. It will be understood that the spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. For example, if a device in the figures is turned over, devices described as "above" or "on" other devices or configurations would then be oriented "below" or "under" the other devices or configurations. Thus, the exemplary term "above … …" can include both an orientation of "above … …" and "below … …". The device may be otherwise variously oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein interpreted accordingly.

The above is only a preferred embodiment of the present invention, and is not intended to limit the present invention, and various modifications and changes will occur to those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims

1. The utility model provides a two bundle excitation formula metal-gas ionization equipment, its characterized in that, including vacuum chamber (1), set up crucible dish (2) inside vacuum chamber (1), crucible dish (2) are gone up and are had four at least crucible caves to and set up crucible (3) on the crucible cave, crucible dish (2) the place ahead is provided with electron gun (7), crucible dish (2) top is provided with base plate (6), base plate (6) and vacuum chamber top are connected, the center of crucible dish (2) is provided with ion source (5).

2. The dual beam excitation-type metal-gas ionization apparatus according to claim 1, wherein the crucible cavity is waist-shaped, circular or a mixture of both and is adapted to the shape of the crucible (3).

3. The dual beam excitation type metal-gas ionization apparatus according to claim 2, wherein the crucibles (3) are uniformly distributed on the crucible plate (2) in a ring shape.

4. The dual beam excitation type metal-gas ionization apparatus according to claim 1, wherein a gear transmission structure (4) is provided between the crucible plate (2) and the ion source (5), the gear transmission structure (4) having a ring shape.

5. The dual-beam excitation type metal-gas ionization apparatus according to claim 1, wherein the number of the electron guns (7) is at least three.

6. The dual-beam excitation type metal-gas ionization apparatus according to claim 1, wherein the electron gun (7) vaporization range overlaps with the ion source (5) ionization range and is projected on the substrate.

7. The dual-beam excitation type metal-gas ionization apparatus according to claim 1, wherein the film formation materials placed in the crucible (3) are the same or different.