CN214254342U - Equipment frame for assembling dry etching lower electrode - Google Patents
Equipment frame for assembling dry etching lower electrode Download PDFInfo
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- CN214254342U CN214254342U CN202023216378.5U CN202023216378U CN214254342U CN 214254342 U CN214254342 U CN 214254342U CN 202023216378 U CN202023216378 U CN 202023216378U CN 214254342 U CN214254342 U CN 214254342U
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Abstract
The utility model provides a PICP is carved the equipment frame for bottom electrode assembly futilely, be applied to PICP and carve bottom electrode assembly technical field futilely, PICP carve bottom electrode assembly equipment frame include frame body (1), frame body (1) upper surface side set up a plurality of locating plate (2) that extend to the outside, locating plate (2) and frame body (1) upper surface all set up the structure of horizontal arrangement, set up locating piece (3) respectively on each locating plate (2), locating piece (3) are convex cylinder structure, the level of the up end of locating piece (3) sets up to be higher than the level of frame body (1) upper surface, the equipment frame for PICP is carved the bottom electrode assembly futilely, simple structure, in PICP carves bottom electrode regeneration separation and equipment futilely, convenient and fast realization base plate accurate positioning, and ensure the uniformity that different PICP carves bottom electrode regeneration separation and equipment base plate location futilely, the product quality is improved.
Description
Technical Field
The utility model belongs to the technical field of dry etching bottom electrode equipment, more specifically say, relate to an equipment frame for dry etching bottom electrode equipment.
Background
The dry etching machine is a key device in the preparation process of liquid crystal panels and semiconductors, the lower electrode and the upper electrode are key components in the dry etching machine, and the lower electrode is of a typical sandwich structure (a bottom Al2O3 insulating layer, a middle tungsten conducting layer and a top Al2O3 dielectric layer). When the etching machine works, the glass substrate is placed on the surface of the lower electrode and is in direct contact with the dielectric layer of the lower electrode, the direct-current power supply is connected to the middle tungsten conducting layer through the direct-current electrode post at the back of the lower electrode to enable the tungsten conducting layer to be negatively charged, the lower surface of the glass generates induced positive charges, coulomb stress is generated between the positive charges and the negative charges to enable the glass to be adsorbed on the surface of the lower electrode, the substrate is prevented from moving in the etching process, the effectiveness and the stability of an etching process are guaranteed, and redundant film layers are etched to form a required fine circuit diagram under the chemical and physical actions of plasma gas in the upper surface of the glass substrate and an etching cavity. The surface of the upper electrode is uniformly distributed with air holes (0.5-1 mm), when the etching machine works, plasma etching gas enters the etching cavity through the air holes, the air holes on the surface of the upper electrode realize uniform distribution and adjustment of the plasma etching gas, voltage is applied between the upper electrode and the lower electrode, a high-voltage electric field is formed between the upper electrode and the lower electrode, and the plasma etching gas bombards and peels off the substrate under the action of the high-voltage electric field to perform dry etching. When the plasma etching gas is used for etching the glass substrate, the working surface of the upper electrode is etched, and particularly enters the air holes of the plasma gas. The power-off is a new structure of dry etching equipment and consists of a lower electrode and a substrate part. The lower electrode and the substrate are positioned by a positioning pin and fixed by screws, and the two plates are sealed by an O-shaped ring. Before electrode products are regenerated, the lower electrode and the substrate need to be separated, and after separation, the sealing ring is sprayed, removed and cleaned. After regeneration is finished, the sealing ring needs to be installed again for assembly. At present, the manual separation is not efficient. The positioning is inaccurate during the equipment, easily causes the sealing washer damage, and the operation is inconvenient, can't effectively satisfy the automated production demand.
SUMMERY OF THE UTILITY MODEL
The utility model discloses the technical problem that will solve is: aiming at the defects of the prior art, the equipment frame for assembling the dry etching lower electrode is simple in structure, can conveniently and quickly realize accurate positioning of the substrate in the dry etching lower electrode regeneration separation and assembly, ensures the consistency of the different dry etching lower electrode regeneration separation and assembly substrate positioning, and improves the product quality.
To solve the technical problem, the utility model discloses the technical scheme who takes does:
the utility model relates to an carve equipment frame for bottom electrode equipment futilely, carve equipment frame for bottom electrode equipment futilely include the frame body, frame body upper surface side sets up a plurality of locating plates that extend to the outside, locating plate and frame body upper surface all set up to the structure that the level was arranged, set up the locating piece on every locating plate respectively, the locating piece is convex cylinder structure, the level of the up end of locating piece sets up the level that is higher than frame body upper surface.
The frame body upper surface set up a plurality of backing plates, the backing plate adopts the POM material to make, frame body bottom set up a plurality of wheels that remove.
The upper surface of the frame body of the equipment frame for assembling the dry etching lower electrode comprises two body cross beams and two body longitudinal beams, wherein the two body cross beams and the two body longitudinal beams are arranged to form a frame body with a square frame structure.
A plurality of positioning plates are arranged at the outer side edge of a body beam of the frame body of the dry etching lower electrode assembling equipment frame according to gaps, and a plurality of positioning plates are arranged at the outer side edge of a body longitudinal beam of the frame body according to gaps.
A plurality of base plates are respectively arranged on a body cross beam and a body longitudinal beam on the upper surface of a frame body of the equipment frame for assembling the dry etching lower electrode.
The positioning block of the equipment frame is made of POM materials.
The moving wheel of the equipment frame for assembling the dry etching lower electrode comprises a directional wheel and a universal wheel, and a foot brake is arranged on the moving wheel.
The frame body of the dry etching lower electrode assembling equipment frame comprises a plurality of support columns, and a moving wheel is installed at the lower end of each support column.
Adopt the technical scheme of the utility model, can obtain following beneficial effect:
the utility model discloses an equipment frame for assembling electrode under dry etching, the locating plate sets up in frame body upper surface side position, and the locating plate sets up a plurality ofly, can set up at two adjacent sides, there is convex locating piece respectively on each locating plate, thus, in carrying out production process, through base plate hoist (lower hoist), the lower electricity (dry etching bottom electrode) that links together electrode and base plate is hoisted on equipment frame, the adjacent both sides edge of base plate of lower electricity supports respectively on the locating piece that the locating plate corresponds, and convex locating piece (can also be the reference column) realizes spacing from both sides, frame body upper surface bears the base plate, spacing from the lower part, make the base plate only need slightly promote after placing, just realize spacing, accurately find the position that needs to confirm, accurate realization location, operating personnel intensity of labour is effectively reduced, and location efficiency is greatly improved, effectively meeting the production rhythm of automatic production. Carve equipment frame for bottom electrode equipment futilely, simple structure, in carving bottom electrode regeneration separation and equipment futilely, convenient and fast realizes base plate accurate positioning to ensure that the difference is carved the uniformity that bottom electrode regeneration separation and equipment base plate were fixed a position futilely, improve product quality.
Drawings
The contents of the description and the references in the drawings are briefly described as follows:
fig. 1 is a schematic structural diagram of an apparatus frame for assembling a dry etching lower electrode according to the present invention;
in the drawings are labeled: 1. a frame body; 2. positioning a plate; 3. positioning blocks; 4. a base plate; 5. a moving wheel; 6. a body beam; 7. a body stringer; 8. a foot brake; 9. and (4) a support column.
Detailed Description
The following description of the embodiments of the present invention will be made in detail with reference to the accompanying drawings, wherein the embodiments of the present invention are described in detail with reference to the accompanying drawings, for example, the shapes, structures, mutual positions and connection relations of the components, the functions and operation principles of the components, and the like:
as shown in the accompanying drawing 1, the utility model relates to a dry etching equipment frame for bottom electrode equipment, dry etching equipment frame for bottom electrode equipment include frame body 1, frame body 1 upper surface side sets up a plurality of locating plates 2 that extend to the outside, locating plate 2 and frame body 1 upper surface all set up to the structure of horizontal arrangement, set up locating piece 3 on every locating plate 2 respectively, locating piece 3 is convex cylinder structure, the level of the up end of locating piece 3 sets up to the level that is higher than frame body 1 upper surface. In the structure, the positioning plates are arranged at the side edge positions of the upper surface of the frame body, and a plurality of positioning plates are arranged, can be arranged at two adjacent sides, and each positioning plate is respectively provided with a convex positioning block, thus, in the production process, a lower electrode (dry etching lower electrode) which connects the electrode and the substrate together is hung on the equipment frame through a substrate hanger (lower hanger), the edges of two adjacent sides of the lower electrode substrate are respectively abutted against the positioning blocks 3 corresponding to the positioning plates 2, the convex positioning blocks (also can be positioning columns) realize the limit from two side edges, the upper surface of the frame body bears the substrate, the limit is from the lower part, so that the substrate only needs to be slightly pushed after being placed to realize the limit, the position to be determined is accurately found, the positioning is accurately realized, the labor intensity of operators is effectively reduced, the positioning efficiency is greatly improved, and the production rhythm of automatic production is effectively met. Carve equipment frame for bottom electrode equipment futilely, simple structure, in carving bottom electrode regeneration separation and equipment futilely, convenient and fast realizes base plate accurate positioning to ensure that the difference is carved the uniformity that bottom electrode regeneration separation and equipment base plate were fixed a position futilely, improve product quality.
The upper surface of the frame body 1 of the equipment frame for assembling the dry etching lower electrode comprises two body cross beams 6 and two body longitudinal beams 7, and the two body cross beams 6 and the two body longitudinal beams 7 are arranged to form the frame body 1 with a square frame structure. In the structure, the two body cross beams 6 and the two body longitudinal beams 7 are at the same horizontal height to form a frame structure, so that the substrate is convenient to bear, and the substrate is not in direct contact with the upper surface of the frame body but is in contact with the cushion block.
A plurality of positioning plates 2 are arranged at the outer side edge of a body beam 6 of a frame body 1 of the dry etching lower electrode assembling equipment frame according to gaps, and a plurality of positioning plates 2 are arranged at the outer side edge of a body longitudinal beam 7 of the frame body 1 according to gaps. According to the structure, the positioning blocks are arranged on the outer side edges of the adjacent body cross beams and the adjacent body longitudinal beams respectively, and the positioning blocks of the positioning blocks are reliably limited.
The positioning block 3 of the equipment frame is made of POM material. Above-mentioned structure, the locating piece uses POM to process into cylindrical structure, and both reliable location base plate avoids the fish tail base plate again.
The moving wheel 5 of the equipment frame for assembling the dry etching lower electrode comprises a directional wheel and a universal wheel, and a foot brake 8 is arranged on the moving wheel 5. Above-mentioned structure, the cooperation of directional wheel and universal wheel, the equipment frame of being convenient for removes to arbitrary place, and the service brake is used for locking positioning device frame.
A plurality of backing plates 4 are respectively arranged on a body cross beam 6 and a body longitudinal beam 7 on the upper surface of a frame body 1 of the dry etching lower electrode assembling equipment frame. The frame body 1 of the dry etching lower electrode assembling equipment frame comprises a plurality of supporting columns 9, and a moving wheel 5 is installed at the lower end of each supporting column 9. The above structure further defines the apparatus frame.
The utility model discloses an equipment frame for assembling electrode under dry etching, the locating plate sets up in frame body upper surface side position, and the locating plate sets up a plurality ofly, can set up at two adjacent sides, there is convex locating piece respectively on each locating plate, thus, in carrying out production process, through base plate hoist (lower hoist), the lower electricity (dry etching bottom electrode) that links together electrode and base plate is hoisted on equipment frame, the adjacent both sides edge of base plate of lower electricity supports respectively on the locating piece that the locating plate corresponds, and convex locating piece (can also be the reference column) realizes spacing from both sides, frame body upper surface bears the base plate, spacing from the lower part, make the base plate only need slightly promote after placing, just realize spacing, accurately find the position that needs to confirm, accurate realization location, operating personnel intensity of labour is effectively reduced, and location efficiency is greatly improved, effectively meeting the production rhythm of automatic production. Carve equipment frame for bottom electrode equipment futilely, simple structure, in carving bottom electrode regeneration separation and equipment futilely, convenient and fast realizes base plate accurate positioning to ensure that the difference is carved the uniformity that bottom electrode regeneration separation and equipment base plate were fixed a position futilely, improve product quality.
The present invention has been described in detail with reference to the accompanying drawings, and it is obvious that the present invention is not limited by the above embodiments, and the present invention can be implemented in various ways without modification, and the present invention is not limited by the above embodiments.
Claims (8)
1. The utility model provides an equipment frame is used in electrode equipment under dry etching which characterized in that: dry carve equipment frame for electrode equipment includes frame body (1), frame body (1) upper surface side sets up a plurality of locating plates (2) that extend to the outside, locating plate (2) and frame body (1) upper surface all set up to the structure of horizontal arrangement, set up locating piece (3) on every locating plate (2) respectively, locating piece (3) are convex cylinder structure, the level of the up end of locating piece (3) sets up the level that is higher than frame body (1) upper surface.
2. The apparatus frame for dry etching lower electrode assembly according to claim 1, wherein: frame body (1) upper surface set up a plurality of backing plates (4), backing plate (4) adopt the POM material to make, frame body (1) bottom set up a plurality of wheels of removing (5).
3. The apparatus frame for dry etching lower electrode assembly according to claim 2, wherein: the upper surface of the frame body (1) of the equipment frame for assembling the dry etching lower electrode comprises two body cross beams (6) and two body longitudinal beams (7), and the two body cross beams (6) and the two body longitudinal beams (7) are arranged to form the frame body (1) with a square frame structure.
4. The apparatus frame for dry etching lower electrode assembly according to claim 3, wherein: the outer side edge of one body beam (6) of the frame body (1) of the dry etching lower electrode assembling equipment frame is provided with a plurality of positioning plates (2) according to gaps, and the outer side edge of one body longitudinal beam (7) of the frame body (1) is provided with a plurality of positioning plates (2) according to gaps.
5. The apparatus frame for dry etching lower electrode assembly according to claim 3, wherein: a plurality of backing plates (4) are respectively arranged on a body cross beam (6) and a body longitudinal beam (7) on the upper surface of a frame body (1) of the equipment frame for assembling the dry etching lower electrode.
6. The apparatus frame for dry etching lower electrode assembly according to claim 1 or 2, characterized in that: the positioning block (3) of the equipment frame is made of POM material.
7. The apparatus frame for dry etching lower electrode assembly according to claim 2, wherein: the movable wheel (5) of the equipment frame for assembling the dry etching lower electrode comprises a directional wheel and a universal wheel, and a foot brake (8) is arranged on the movable wheel (5).
8. The apparatus frame for dry etching lower electrode assembly according to claim 1 or 2, characterized in that: the frame body (1) of the dry etching lower electrode assembling equipment frame comprises a plurality of supporting columns (9), and one moving wheel (5) is installed at the lower end of each supporting column (9).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202023216378.5U CN214254342U (en) | 2020-12-28 | 2020-12-28 | Equipment frame for assembling dry etching lower electrode |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202023216378.5U CN214254342U (en) | 2020-12-28 | 2020-12-28 | Equipment frame for assembling dry etching lower electrode |
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| Publication Number | Publication Date |
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| CN214254342U true CN214254342U (en) | 2021-09-21 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202023216378.5U Active CN214254342U (en) | 2020-12-28 | 2020-12-28 | Equipment frame for assembling dry etching lower electrode |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112563112A (en) * | 2020-12-28 | 2021-03-26 | 芜湖芯通半导体材料有限公司 | PICP dry etching lower electrode regeneration separation and assembly equipment and separation and assembly method thereof |
| CN112563112B (en) * | 2020-12-28 | 2024-06-21 | 芜湖芯通半导体材料有限公司 | PICP dry etching lower electrode regeneration separation and assembly equipment and separation and assembly method thereof |
-
2020
- 2020-12-28 CN CN202023216378.5U patent/CN214254342U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112563112A (en) * | 2020-12-28 | 2021-03-26 | 芜湖芯通半导体材料有限公司 | PICP dry etching lower electrode regeneration separation and assembly equipment and separation and assembly method thereof |
| CN112563112B (en) * | 2020-12-28 | 2024-06-21 | 芜湖芯通半导体材料有限公司 | PICP dry etching lower electrode regeneration separation and assembly equipment and separation and assembly method thereof |
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