CN214252875U

CN214252875U - Photoetching machine camera position adjusting mechanism and photoetching machine

Info

Publication number: CN214252875U
Application number: CN202023194947.0U
Authority: CN
Inventors: 霍锦充
Original assignee: Dongguan Wkk Machinery Co ltd
Current assignee: Dongguan Wkk Machinery Co ltd
Priority date: 2020-12-23
Filing date: 2020-12-23
Publication date: 2021-09-21
Anticipated expiration: 2030-12-23

Abstract

The utility model relates to the technical field of photoetching machines, which relates to a photoetching machine camera position adjusting mechanism and a photoetching machine using the same, wherein the photoetching machine camera position adjusting mechanism comprises a frame, a movable block and a left and right driving mechanism for driving the movable block to move left and right are arranged on the frame, and a lifting block and a height adjusting device for adjusting the height of the lifting block are arranged on the movable block; the camera is arranged on the lifting block, and a front-back driving mechanism for driving the camera to move back and forth is also arranged on the lifting block; the height adjusting mechanism comprises an adjusting screw and an elastic piece, a thread through hole is formed in the movable block, the adjusting screw is used for penetrating through the thread through hole and abutting against one side of the lifting block in the height direction, and the elastic piece is used for providing force for the lifting block to move towards the adjusting screw. According to the technical scheme of the utility model, the position of camera can all be adjusted in front and back, upper and lower and left and right sides three direction, so can adjust the camera to the position that can aim at the wafer as required.

Description

Photoetching machine camera position adjusting mechanism and photoetching machine

Technical Field

The utility model relates to a lithography machine technical field, in particular to lithography machine camera position control mechanism and use its lithography machine.

Background

Photolithography, which is a process of sequentially transferring chip patterns on a series of masks to corresponding layers of a silicon wafer by exposure, is a very important process in the semiconductor manufacturing process and is considered as a core step in the large-scale integrated circuit manufacturing. A series of complex and time-consuming photolithography processes in semiconductor manufacturing are mainly performed by corresponding photolithography machines.

The photoetching machine comprises a camera and a wafer placing plate, wherein the camera is used for photographing wafers on the wafer placing plate so as to collect related information of the wafers, and the wafers can be conveniently subjected to photoetching processing. After the wafer is placed on the wafer placing plate, the wafer often does not correspond to the position of the camera, so that the camera cannot accurately acquire the information of the wafer, and therefore improvement is urgently needed.

SUMMERY OF THE UTILITY MODEL

In view of this, the utility model provides a lithography machine camera position control mechanism and use its lithography machine mainly will solve the technical problem: how to enable the camera to be aligned with the wafer so as to improve the accuracy of the camera for acquiring the wafer information.

In order to achieve the above object, the utility model mainly provides the following technical scheme:

on one hand, the embodiment of the utility model provides a photo-etching machine camera position adjustment mechanism, including the frame, be equipped with the movable block in the frame and be used for driving the movable block left and right sides actuating mechanism that moves, be equipped with the elevator on the movable block and be used for the height adjusting device who adjusts the height of elevator; the camera is arranged on the lifting block, and a front-back driving mechanism for driving the camera to move back and forth is further arranged on the lifting block;

wherein, height adjusting mechanism includes adjusting screw and elastic component, be equipped with the screw thread via hole on the movable block, adjusting screw is used for passing the screw thread via hole, and with one side of elevator direction of height offsets, the elastic component is used for providing the elevator orientation the power of adjusting screw motion.

Optionally, a connecting through hole is formed in the movable block, a sleeve is arranged in the connecting through hole, the sleeve can be detached from the connecting through hole, and the inner side of the sleeve is provided with the threaded through hole.

Optionally, a guide block is arranged on the movable block and used for guiding the lifting of the lifting block; wherein the guide block is detachable relative to the movable block.

Optionally, a sliding portion is disposed on the lifting block, and the lifting block is lifted relative to the movable block through the sliding portion, wherein the sliding portion can be detached relative to the lifting block.

Optionally, one side of the lifting block in the height direction is provided with a wear-resistant part, and the lifting block abuts against the end part of the adjusting screw rod through the wear-resistant part.

Optionally, one side of elevator along direction of height is equipped with the mounting groove, wearing parts inlays and establishes in the mounting groove.

Optionally, the front-back driving mechanism includes a lead screw motor to drive the camera to move back and forth through the lead screw motor.

Optionally, the left-right driving mechanism comprises a driving cylinder, so that the driving cylinder drives the movable block to move left and right.

On the other hand, the embodiment of the present invention further provides a lithography machine, which may include any one of the above-mentioned lithography machine position adjusting mechanisms.

Borrow by above-mentioned technical scheme, the utility model discloses lithography machine camera position control mechanism and use its lithography machine has following beneficial effect at least:

1. the camera can move back and forth under the driving of the front and back driving mechanism, can be driven by the lifting block to lift, and can move left and right under the driving of the movable block, so that the position of the camera can be adjusted in the front and back direction, the up and down direction and the left and right direction, the camera can be adjusted to the position capable of being aligned with the wafer according to the requirement, and the accuracy of the camera for acquiring the wafer information can be improved;

2. the elevator block offsets with adjusting screw through wear-resisting piece, can prevent that adjusting screw from often striking the elevator block and taking place the damage.

The above description is only an overview of the technical solution of the present invention, and in order to make the technical means of the present invention clearer and can be implemented according to the content of the description, the following detailed description is made with reference to the preferred embodiments of the present invention and accompanying drawings.

Drawings

Fig. 1 is a schematic structural diagram of a camera position adjustment mechanism of a lithography machine according to an embodiment of the present invention;

FIG. 2 is a front view of the camera position adjustment mechanism of the lithography machine of FIG. 1;

FIG. 3 is a schematic diagram of a movable block;

FIG. 4 is a schematic view of the camera when mounted in the elevator block;

fig. 5 is a positional relationship diagram when the lead screw motor and the camera are disassembled.

Reference numerals: 1. a frame; 2. a movable block; 3. a lifting block; 4. a drive cylinder; 5. a screw motor; 6. adjusting the screw rod; 7. connecting blocks; 8. a sleeve; 9. a camera; 10. a wear part; 21. a guide block; 31. A sliding part; 51. a groove; 61. a ball bearing; 91. a plug-in part; 92. a limiting flange; 301. a lead screw motor mounting section; 302. a lens guide section; 303. and (7) clamping the table.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

It should be noted that, if directional indications (such as up, down, left, right, front, and back … …) are involved in the embodiment of the present invention, the directional indications are only used to explain the relative positional relationship between the components, the movement situation, and the like in a specific posture (as shown in the drawing), and if the specific posture is changed, the directional indications are changed accordingly.

In addition, if there is a description of "first", "second", etc. in an embodiment of the present invention, the description of "first", "second", etc. is for descriptive purposes only and is not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one such feature. In addition, technical solutions between various embodiments may be combined with each other, but must be realized by a person skilled in the art, and when the technical solutions are contradictory or cannot be realized, such a combination should not be considered to exist, and is not within the protection scope of the present invention.

As shown in fig. 1 and fig. 2, an embodiment of the present invention provides a position adjustment mechanism for a photo-etching machine, which includes a frame 1, wherein the frame 1 is provided with a movable block 2 and a left and right driving mechanism, and the left and right driving mechanism is used for driving the movable block 2 to move along a left and right direction on the frame 1. The movable block 2 is provided with a lifting block 3 and a height adjusting device, the lifting block 3 can lift relative to the movable block 2, and the height adjusting device is used for adjusting the height of the lifting block 3. The camera 9 is arranged on the lifting block 3, and a front-back driving mechanism is further arranged on the lifting block 3 and used for driving the camera 9 to move along the front-back direction.

Here, it should be noted that: the side of the figure facing the paper in fig. 2 is front, correspondingly, the back of the figure in fig. 2 is back, the left and right sides of the figure in fig. 2 correspond to the left and right, and the upper and lower sides of the figure in fig. 2 correspond to the upper and lower.

Wherein, camera 9 except can be in front and back actuating mechanism drive down the fore-and-aft movement, still can go up and down under the drive of elevator 3 to and the side-to-side motion under the drive of movable block 2, thereby make camera 9's position all adjust around, up and down and about, three direction, so can adjust camera 9 as required to the position that can aim at the wafer, thereby can improve the accuracy that camera 9 gathered wafer information.

In order to achieve the function of the height adjusting mechanism, as shown in fig. 3, the height adjusting mechanism may include an adjusting screw 6 and an elastic member, which may be a spring or flexible plastic. The movable block 2 is provided with a threaded through hole, and the adjusting screw 6 is used for penetrating through the threaded through hole and abutting against one side of the lifting block 3 in the height direction. The elastic member serves to provide a force for moving the elevator block 3 toward the adjusting screw 6. In a specific application example, the adjusting screw 6 is positioned above the lifting block 3, when the adjusting screw 6 is screwed to one side, the adjusting screw 6 pushes the lifting block 3 to descend, and the elastic part is elastically deformed and accumulates energy; when the adjusting screw 6 is screwed to the other side, the adjusting screw 6 releases the lifting block 3, and the elastic part releases the accumulated energy and pushes the lifting block 3 to ascend until the lifting block 3 abuts against the adjusting screw 6.

As shown in fig. 3, the movable block 2 may be provided with a connecting through hole, a sleeve 8 is disposed in the connecting through hole, and the inner side of the sleeve 8 is provided with the threaded through hole. Wherein, sleeve 8 can be dismantled in the connect through hole relatively, for example sleeve 8 can screw thread in connect through hole, perhaps sleeve 8 joint is in connect through hole, so when revolving often to twist adjusting screw 6 and lead to the screw thread on the sleeve 8 impaired, can in time pull down sleeve 8 and change.

In a specific application example, as shown in fig. 3, the movable block 2 may be provided with a connecting block 7, and the connecting block 7 is fixed on the movable block 2 by screws. The connecting block 7 is provided with the connecting through hole.

As shown in fig. 3, the movable block 2 may further include a guide block 21, and the guide block 21 may guide the elevation of the elevator block 3. Wherein, the guide block 21 can be detached relative to the movable block 2, preferably, the guide block 21 can be connected with the movable block 2 by a screw. The guide block 21 is in sliding fit with the lifting block 3, and when the guide block 21 is frequently abraded due to friction with the lifting block 3, the guide block can be detached in time for replacement.

As shown in fig. 4, the lift block 3 is provided with a slide portion 31, and the lift block 3 is moved up and down with respect to the movable block 2 by the slide portion 31. The sliding portion 31 is detachable with respect to the elevator block 3, and preferably, the sliding portion 31 may be connected to the elevator block 3 by a screw. The sliding part 31 is slidably engaged with the guide block 21 of the movable block 2, and can be removed and replaced in time when the sliding part 31 is frequently abraded by friction with the guide block 21.

The guide block 21 and the sliding part 31 can be identical in structure and are strip-shaped, so that the types of parts can be saved, and the processing is convenient.

As shown in fig. 4, a wear-resistant member 10 may be disposed on one side of the lifting block 3 along the height direction, and the wear-resistant member 10 may be a plastic member or the like. The lifting block 3 is abutted against the end part of the adjusting screw 6 through the wear-resistant part 10, so that the lifting block 3 is prevented from being damaged due to the fact that the adjusting screw 6 is often abutted against the lifting block 3.

In order to install the wear-resistant member 10, preferably, one side of the lifting block 3 in the height direction may be provided with an installation groove, and the wear-resistant member 10 is embedded in the installation groove. The wear part 10 may be transition or clearance fitted with the mounting groove for replacement after the wear part 10 is damaged.

In order to further reduce friction, it is preferable that one end of the adjusting screw 6 is embedded with a ball 61 so as to be abutted against the wear-resistant member through the ball 61.

As shown in fig. 4, the front and rear driving mechanism may include a lead screw motor 5 to drive the camera 9 to move back and forth by the lead screw motor 5. As shown in fig. 5, one end of the lens has a plug portion 91, an output end of the lead screw motor 5 has a groove 51, and the plug portion 91 is inserted into the groove 51 and is in transition fit with the groove 51.

The elevating block 3 is provided with a mounting groove, as shown in fig. 4, the mounting groove has a screw motor mounting section 301 and a lens guiding section 302 which are connected in sequence, a clamping table 303 is formed between the lens guiding section 302 and the screw motor mounting section 301, the screw motor 5 is used for being mounted in the screw motor mounting section 301, the lens is used for being slidably arranged in the lens guiding section 302, the lens is further provided with a limit flange 92, and the limit flange 92 is used for abutting against the clamping table 303 to limit the distance of the forward and backward sliding of the camera 9.

As shown in fig. 1, the left and right driving mechanism may include a driving cylinder 4 to drive the movable block 2 to move left and right through the driving cylinder 4, wherein the driving cylinder 4 may be an air cylinder or a hydraulic cylinder, and may be specifically selected according to actual needs, which is not described herein again.

The embodiment of the utility model provides a lithography machine is still provided, it can include any kind of above-mentioned lithography machine position control mechanism. In this example, because the above-mentioned photo-etching machine position adjustment mechanism is adopted by the photo-etching machine, the position of the camera 9 can be adjusted in all three directions, i.e. front and back, up and down, left and right, so that the camera 9 can be adjusted to a position capable of aligning with the wafer according to the requirement, and the accuracy of the wafer information acquired by the camera 9 can be improved.

The working principle and preferred embodiments of the present invention are described below.

The utility model discloses lie in designing a lithography machine camera position control mechanism and use its lithography machine, wherein, lithography machine camera position control mechanism can be including front and back actuating mechanism, control actuating mechanism and high adjustment mechanism, front and back actuating mechanism can drive camera 9 seesaw, control actuating mechanism accessible movable block 2 and drive camera 9 side-to-side motion, high adjustment mechanism accessible elevator 3 drives camera 9 and goes up and down, like this camera 9's position can be around, three direction all adjusts about and from top to bottom, so can adjust camera 9 to the position that can aim at the wafer as required, thereby can improve the accuracy that camera 9 gathered the wafer information.

Here, it should be noted that: in the case of no conflict, a person skilled in the art may combine the related technical features in the above examples according to actual situations to achieve corresponding technical effects, and details of various combining situations are not described herein.

It is above only the utility model discloses a preferred embodiment, the utility model discloses a scope of protection does not only confine above-mentioned embodiment, the all belongs to the utility model discloses a technical scheme under the thinking all belongs to the utility model discloses a scope of protection. It should be noted that, for those skilled in the art, various modifications and decorations can be made without departing from the principle of the present invention, and these modifications and decorations should also be regarded as the protection scope of the present invention.

Claims

1. A photo-etching machine position adjusting mechanism is characterized by comprising a rack (1), wherein a movable block (2) and a left-right driving mechanism for driving the movable block (2) to move left and right are arranged on the rack (1), and a lifting block (3) and a height adjusting device for adjusting the height of the lifting block (3) are arranged on the movable block (2); the camera (9) is arranged on the lifting block (3), and a front-back driving mechanism for driving the camera (9) to move back and forth is further arranged on the lifting block (3);

wherein, height adjusting mechanism includes adjusting screw (6) and elastic component, be equipped with the screw thread via hole on movable block (2), adjusting screw (6) are used for passing the screw thread via hole, and with one side of elevator (3) direction of height offsets, the elastic component is used for providing elevator (3) orientation the power of adjusting screw (6) motion.

2. The camera position adjustment mechanism of a lithography machine according to claim 1,

be equipped with connect the via hole on movable block (2), be equipped with sleeve (8) in the connect the via hole, sleeve (8) can be relative connect the via hole and dismantle, the inboard of sleeve (8) has the screw thread via hole.

3. The photo-etching machine position adjustment mechanism according to claim 1 or 2,

the movable block (2) is provided with a guide block (21), and the guide block (21) is used for guiding the lifting block (3) to lift; wherein the guide block (21) is detachable relative to the movable block (2).

4. The photo-etching machine position adjustment mechanism according to claim 1 or 2,

be equipped with sliding part (31) on lift piece (3), lift piece (3) pass through sliding part (31) are relative movable block (2) go up and down, wherein, sliding part (31) can be relative lift piece (3) are dismantled.

5. The photo-etching machine position adjustment mechanism according to claim 1 or 2,

one side of the lifting block (3) in the height direction is provided with a wear-resistant part, and the lifting block (3) is abutted to the end part of the adjusting screw rod (6) through the wear-resistant part.

6. The camera position adjustment mechanism of a lithography machine according to claim 5,

one side of elevator (3) along direction of height is equipped with the mounting groove, wearing parts inlays to be established in the mounting groove.

7. The photo-etching machine position adjustment mechanism according to claim 1, 2 or 6,

the front and back driving mechanism comprises a screw motor (5) so as to drive the camera (9) to move back and forth through the screw motor (5).

8. The photo-etching machine position adjustment mechanism according to claim 1, 2 or 6,

the left and right driving mechanism comprises a driving cylinder (4) so as to drive the movable block (2) to move left and right through the driving cylinder (4).

9. A lithography machine comprising the lithography machine position adjustment mechanism according to any one of claims 1 to 8.