CN214193422U - Novel source electrode device for plasma solid-state metallurgy - Google Patents

Novel source electrode device for plasma solid-state metallurgy Download PDF

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Publication number
CN214193422U
CN214193422U CN202120134277.9U CN202120134277U CN214193422U CN 214193422 U CN214193422 U CN 214193422U CN 202120134277 U CN202120134277 U CN 202120134277U CN 214193422 U CN214193422 U CN 214193422U
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CN
China
Prior art keywords
source electrode
barrel
metallurgy
concave
chamfered
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Expired - Fee Related
Application number
CN202120134277.9U
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Chinese (zh)
Inventor
王成磊
谢映光
梁朝杰
杨纪洁
刘伟杰
梁慕林
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Guilin University of Electronic Technology
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Guilin University of Electronic Technology
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Priority to CN202120134277.9U priority Critical patent/CN214193422U/en
Application granted granted Critical
Publication of CN214193422U publication Critical patent/CN214193422U/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Abstract

The utility model discloses a novel source electrode device for plasma solid metallurgy, which comprises a hollow prismatic cylinder body with openings at two ends, wherein each cylinder wall at the inner side of the cylinder body is provided with a concave platform, the bottom of the concave platform is provided with a clamping groove, each edge of the cylinder body is chamfered into a round angle, and the circumference of the cylinder body corresponding to each round angle is provided with a round hole; the prismatic barrel body is a quadrangular barrel body, each edge is chamfered into a round angle, 2 concave platforms are respectively arranged on one pair of parallel barrel body inner side barrel walls, and 1 concave platform is respectively arranged on the other pair of parallel barrel body inner side barrel walls; the device simple structure, source electrode target simple to operate has reduced the source electrode melting, and the convenient adjustment of distance between target and the pre-infiltration substrate can adopt platelike source electrode target and bar-shaped source electrode target to carry out solid-state metallurgy to the co-infiltration of pre-infiltration substrate simultaneously.

Description

Novel source electrode device for plasma solid-state metallurgy
Technical Field
The utility model relates to a solid-state metallurgical technical field of plasma specifically is a novel source electrode device for solid-state metallurgy of plasma.
Background
The plasma solid metallurgy technology is a new surface modification technology for alloying the surface of metal material. The technology can be used for carrying out plasma surface alloying technology for permeating all solid metal elements and nonmetal elements. The geometric structure of the source electrode target material is an important part of plasma solid-state metallurgical equipment, and directly influences the surface diffusion layer effect of a workpiece and the consumption of a source electrode.
In the existing source electrode device, the structure is complex, or only one shape of source electrode material can be installed to carry out solid-state metallurgy on a pre-infiltration base material, so that the source electrode material infiltrated into the base material is unevenly distributed.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to overcome prior art not enough, and provide a novel source electrode device for plasma solid state metallurgy.
Realize the utility model discloses the technical scheme of purpose is:
the utility model provides a novel source electrode device for metallurgical solid-state of plasma, includes both ends open-ended cavity prismatic stack shell, is equipped with the concave station on each section of thick bamboo wall of stack shell inboard, and the bottom of concave station is equipped with the draw-in groove, and each edges and corners department of stack shell is chamfered into the fillet, is equipped with the round hole on the stack shell circumference that each fillet corresponds.
The prismatic barrel body is a quadrangular barrel body, each edge angle is chamfered into a round angle, 2 concave platforms are respectively arranged on one pair of parallel barrel body inner side barrel walls, and 1 concave platform is respectively arranged on the other pair of parallel barrel body inner side barrel walls.
The round angle is R30-R50.
The clamping groove is rectangular and used for inserting and placing source plate targets.
The round holes are arranged in an array type period.
The utility model provides a pair of a novel source electrode device for plasma solid state metallurgy, the device simple structure, source electrode target simple to operate has reduced the source electrode melting, and target and the convenient adjustment of distance between the base material that oozes in advance can adopt platelike source electrode target and bar-shaped source electrode target to ooze the base material in advance simultaneously and ooze altogether and carry out solid state metallurgy.
Drawings
FIG. 1 is an isometric view of a novel source device for plasma solid state metallurgy;
FIG. 2 is a front cross-sectional view of FIG. 1;
FIG. 3 is a top view of FIG. 1;
FIG. 4 is a schematic diagram of a novel source device for plasma solid state metallurgy in operation;
in the figure: 1. the barrel body 2, the fillet 3, the concave platform 4, the round hole 5, the draw-in groove 6, the plate-shaped source electrode 7, the rod-shaped source electrode.
Detailed Description
The present invention will be further explained with reference to the drawings and examples, but the present invention is not limited thereto.
Example (b):
as shown in fig. 1, 2 and 3:
a novel source electrode device for plasma solid metallurgy comprises hollow quadrangular prism-shaped cylinder bodies with openings at two ends, wherein 2 concave platforms are respectively arranged on the inner side cylinder walls of one pair of parallel cylinder bodies, 1 concave platform is respectively arranged on the inner side cylinder walls of the other pair of parallel cylinder bodies, and a rectangular clamping groove is arranged at the bottom of each concave platform and used for inserting a source electrode plate; each edge of the barrel body is chamfered into a round angle, round holes which are arrayed periodically are arranged on the circumference of the barrel body corresponding to each round angle, and the round holes are used for inserting rod-shaped source electrodes.
The round angle is R30-R50.
When the device is used, the device is vertically placed on a working disc of double-cathode plasma solid-state metallurgical equipment connected with a source pulse power supply, a plate-shaped source target material is inserted into a clamping groove at the bottom of a concave table on the inner side of a cylinder body, a rod-shaped source target material is inserted into a round hole, a pre-infiltration base material is suspended into a hollow cylinder body of the device and is not contacted with the plate-shaped and rod-shaped source target material.

Claims (5)

1. The utility model provides a novel source electrode device for metallurgical of plasma solid state, its characterized in that, includes both ends open-ended cavity prismatic form stack shell, is equipped with the concave station on each section of thick bamboo wall of stack shell inboard, and the bottom of concave station is equipped with the draw-in groove, and each edges and corners department of stack shell is chamfered into the fillet, is equipped with the round hole on the stack shell circumference that each fillet corresponds.
2. The source device as claimed in claim 1, wherein the prism-shaped barrel is a quadrangular prism-shaped barrel, each corner is chamfered to form a round corner, and one pair of parallel barrel inner side barrel walls are respectively provided with 2 concave platforms, and the other pair of parallel barrel inner side barrel walls are respectively provided with 1 concave platform.
3. The novel source device for plasma solid state metallurgy of claim 1, wherein the rounded corner is R30-R50.
4. The source device of claim 1, wherein the slot is rectangular for insertion of a source plate.
5. The novel source device for plasma solid state metallurgy according to claim 1, wherein the circular holes are arranged in an array type period.
CN202120134277.9U 2021-01-19 2021-01-19 Novel source electrode device for plasma solid-state metallurgy Expired - Fee Related CN214193422U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202120134277.9U CN214193422U (en) 2021-01-19 2021-01-19 Novel source electrode device for plasma solid-state metallurgy

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202120134277.9U CN214193422U (en) 2021-01-19 2021-01-19 Novel source electrode device for plasma solid-state metallurgy

Publications (1)

Publication Number Publication Date
CN214193422U true CN214193422U (en) 2021-09-14

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN202120134277.9U Expired - Fee Related CN214193422U (en) 2021-01-19 2021-01-19 Novel source electrode device for plasma solid-state metallurgy

Country Status (1)

Country Link
CN (1) CN214193422U (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114015988A (en) * 2021-11-04 2022-02-08 上海交通大学 Method and apparatus for surface alloying treatment
CN114164410A (en) * 2021-12-15 2022-03-11 上海交通大学 Method and device for adjusting distance between source electrode and workpiece to be subjected to surface alloying treatment

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114015988A (en) * 2021-11-04 2022-02-08 上海交通大学 Method and apparatus for surface alloying treatment
CN114015988B (en) * 2021-11-04 2022-11-29 上海交通大学 Method and apparatus for surface alloying treatment
CN114164410A (en) * 2021-12-15 2022-03-11 上海交通大学 Method and device for adjusting distance between source electrode and workpiece to be subjected to surface alloying treatment

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Granted publication date: 20210914