CN214160740U - Dry ice cleaning equipment for semiconductor element - Google Patents
Dry ice cleaning equipment for semiconductor element Download PDFInfo
- Publication number
- CN214160740U CN214160740U CN202023107912.9U CN202023107912U CN214160740U CN 214160740 U CN214160740 U CN 214160740U CN 202023107912 U CN202023107912 U CN 202023107912U CN 214160740 U CN214160740 U CN 214160740U
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- CN
- China
- Prior art keywords
- dry ice
- cleaning chamber
- cleaning
- exhaust fan
- semiconductor element
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 title claims abstract description 119
- 235000011089 carbon dioxide Nutrition 0.000 title claims abstract description 93
- 238000004140 cleaning Methods 0.000 title claims abstract description 53
- 239000004065 semiconductor Substances 0.000 title claims abstract description 20
- 230000007246 mechanism Effects 0.000 claims abstract description 38
- 238000005507 spraying Methods 0.000 claims abstract description 24
- 229910002092 carbon dioxide Inorganic materials 0.000 claims abstract description 13
- 239000001569 carbon dioxide Substances 0.000 claims abstract description 13
- 239000007788 liquid Substances 0.000 claims abstract description 11
- 238000003860 storage Methods 0.000 claims abstract description 11
- 238000000746 purification Methods 0.000 claims abstract description 4
- 238000009434 installation Methods 0.000 claims description 3
- 239000007921 spray Substances 0.000 claims description 2
- 239000012535 impurity Substances 0.000 abstract description 9
- 230000003749 cleanliness Effects 0.000 abstract description 5
- 239000008187 granular material Substances 0.000 abstract description 3
- 239000013618 particulate matter Substances 0.000 abstract description 3
- 238000010926 purge Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 241001233242 Lontra Species 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 238000004887 air purification Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- -1 burrs Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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Abstract
The utility model discloses a dry ice cleaning device for semiconductor elements, which comprises a device frame body, a dry ice generating mechanism, a dry ice spraying mechanism, a dry ice purifying mechanism and a cleaning chamber, wherein the dry ice generating mechanism, the dry ice spraying mechanism, the dry ice purifying mechanism and the cleaning chamber are arranged on the device frame body; the dry ice generating mechanism comprises a liquid carbon dioxide storage tank and a dry ice generator; the dry ice spraying mechanism comprises a dry ice spraying head seat for installing a dry ice spraying nozzle and a manipulator for driving the dry ice spraying head seat to move; the dry ice purification mechanism comprises an air inlet machine and an exhaust fan, the air inlet machine is communicated with the cleaning chamber, and the exhaust fan is communicated with the cleaning chamber; the cleaning chamber is separated into an upper cleaning part and a lower collecting part by a screen plate, a placing plate used for placing products is fixed on the screen plate, an air outlet is formed in the cleaning chamber, and the air outlet is communicated with the exhaust fan. The utility model discloses utilize the dry ice granule to carry out the breakage to impurity such as the burr on semiconductor element surface, particulate matter, make the requirement that semiconductor surface reaches high cleanliness.
Description
Technical Field
The utility model belongs to the technical field of the semiconductor washs, especially relate to a dry ice cleaning equipment for semiconductor element.
Background
Due to the increasing development of technology, semiconductor chips are increasingly miniaturized, and most of the chips are electronic components with different functions, these electronic components are usually soldered on a substrate having electronic circuits by using solder, so that the electronic components can operate normally, but due to the miniaturization of the electronic components, impurities generated during the production of chips seriously affect the quality of the chips, and in the manufacturing process of semiconductor chips, if the wafer is polluted by dust particles and metal, the functions of circuits in the wafer are easily damaged, short circuits or open circuits are formed, the failure of integrated circuits is caused, and the formation of geometrical characteristics is influenced, therefore, higher and higher requirements are put on the cleanliness of the surface of the semiconductor chip in the manufacturing process, however, the conventional chemical cleaning method consumes a large amount of water and chemical reagents, resulting in unnecessary waste of resources.
SUMMERY OF THE UTILITY MODEL
The utility model discloses the main technical problem who solves provides a dry ice cleaning equipment for semiconductor element utilizes the dry ice granule to carry out the breakage to impurity such as the burr on semiconductor element surface, particulate matter, makes the requirement that semiconductor surface reaches high cleanliness factor.
In order to solve the technical problem, the utility model discloses a technical scheme be: a dry ice cleaning device for semiconductor elements comprises a device frame body, a dry ice generating mechanism, a dry ice spraying mechanism, a dry ice purifying mechanism and a cleaning chamber, wherein the dry ice generating mechanism, the dry ice spraying mechanism, the dry ice purifying mechanism and the cleaning chamber are arranged on the device frame body;
the dry ice generating mechanism comprises a liquid carbon dioxide storage tank and a dry ice generator, and the liquid carbon dioxide storage tank and the dry ice generator are connected through a hose;
the dry ice spraying mechanism comprises a dry ice spraying head seat used for installing a dry ice nozzle and a manipulator driving the dry ice spraying head seat to move, the dry ice nozzle is connected with the dry ice generator through a hose, and the dry ice nozzle and the manipulator are positioned in the cleaning chamber;
the dry ice purification mechanism comprises an air inlet machine and an exhaust fan, the air inlet machine is positioned above the cleaning chamber and communicated with the cleaning chamber, and the exhaust fan is communicated with the cleaning chamber;
the cleaning chamber is divided into an upper cleaning part and a lower collecting part by a screen plate, a placing plate for placing a product is fixed on the screen plate, an air outlet is formed in the cleaning chamber, and the air outlet is communicated with the exhaust fan;
the liquid carbon dioxide storage tank, the dry ice generator, the manipulator, the air inlet machine and the exhaust fan are respectively and electrically connected with a control system.
The utility model discloses a solve the further technical scheme that its technical problem adopted and be:
further, the dry ice nozzle seat is also provided with an installation opening for installing a compressed air hose.
Further, the dry ice spraying mechanism further comprises a positioning sensor, and the positioning sensor is fixedly connected with the manipulator.
Furthermore, a filter is arranged between the air inlet machine and the cleaning chamber.
Further, the manipulator is a three-axis manipulator.
The beneficial effects of the utility model are that following several points have at least:
1. the utility model comprises a dry ice generating mechanism and a dry ice spraying mechanism, under the action of high-pressure air flow, dry ice particles can be sprayed to the surface of a product at high speed, so that the breakage rate of impurities such as burrs, particles and the like on the surface of the product is improved, and the effect of cleaning the impurities on the surface of the product is achieved;
2. the utility model locates the position of the product through the positioning sensor, the manipulator walks according to the outline track of the product, the full-automatic crushing of the impurities on the surface of the product is realized, and the cleaning efficiency is high;
3. the utility model uses solid carbon dioxide to break off burrs on the surface of the product, and then the formed gaseous carbon dioxide is discharged through the exhaust fan; the crushed residues can fall to a material collecting part through the screen plate and then are pumped out of the equipment by an exhaust fan, so that the cleanliness of the surface of the screen plate is ensured;
4. the utility model discloses the upper portion of purge chamber has the air inlet machine, is equipped with the filter between air inlet machine and the purge chamber for with external air purification backward downstream flow purge chamber, discharge through the air exhauster at last, the pushing down air current that forms does benefit to the impurity whereabouts on the otter board and discharges to the portion of gathering materials, guarantees the inside holistic cleanliness factor of purge chamber.
Drawings
Fig. 1 is one of the overall structural schematic diagrams of the present invention;
fig. 2 is a second schematic view of the overall structure of the present invention;
FIG. 3 is an enlarged view of portion A of FIG. 2;
the parts in the drawings are marked as follows:
the equipment comprises an equipment frame body 1, a liquid carbon dioxide storage tank 2, a dry ice generator 3, a dry ice nozzle 4, a dry ice nozzle seat 5, a manipulator 6, an air inlet machine 7, a cleaning part 8, a material collecting part 9, a screen plate 10, a placing plate 11, an air outlet 12, a mounting opening 13, a positioning sensor 14 and a filter 15.
Detailed Description
The following detailed description of the preferred embodiments of the present invention will be provided in conjunction with the accompanying drawings, so as to enable those skilled in the art to more easily understand the advantages and features of the present invention, and thereby define the scope of the invention more clearly and clearly.
Example (b): a dry ice cleaning device for semiconductor elements is shown in figures 1-3 and comprises a device frame body 1, a dry ice generating mechanism, a dry ice spraying mechanism, a dry ice purifying mechanism and a cleaning chamber, wherein the dry ice generating mechanism, the dry ice spraying mechanism, the dry ice purifying mechanism and the cleaning chamber are arranged on the device frame body;
the dry ice generating mechanism comprises a liquid carbon dioxide storage tank 2 and a dry ice generator 3, and the liquid carbon dioxide storage tank and the dry ice generator are connected through a hose;
the dry ice spraying mechanism comprises a dry ice spraying head seat 5 for installing a dry ice nozzle 4 and a manipulator 6 for driving the dry ice spraying head seat to move, the dry ice nozzle is connected with the dry ice generator through a hose, and the dry ice nozzle and the manipulator are positioned in the cleaning chamber;
the dry ice purification mechanism comprises an air inlet machine 7 and an exhaust fan, the air inlet machine is positioned above the cleaning chamber and communicated with the cleaning chamber, and the exhaust fan is communicated with the cleaning chamber;
the cleaning chamber is divided into an upper cleaning part 8 and a lower collecting part 9 by a screen plate 10, a placing plate 11 for placing products is fixed on the screen plate, an air outlet 12 is formed in the cleaning chamber, and the air outlet is communicated with the exhaust fan;
the liquid carbon dioxide storage tank, the dry ice generator, the manipulator, the air inlet machine and the exhaust fan are respectively and electrically connected with a control system.
And the dry ice spray head seat is also provided with an installation opening 13 for installing a compressed air hose.
The dry ice spraying mechanism further comprises a positioning sensor 14, and the positioning sensor is fixedly connected with the manipulator.
A filter 15 is arranged between the air inlet machine and the cleaning chamber.
The manipulator is a three-axis manipulator. The manipulator of this embodiment is a three-axis manipulator composed of an X axis, a Y axis, and a Z axis, the X axis is horizontally fixed on the equipment frame body, the Y axis is perpendicular to the X axis and moves back and forth along the X axis under the driving of a motor, the Z axis is perpendicular to the Y axis and moves left and right along the Y axis under the driving of a motor, the Z axis can move up and down under the driving of a motor, and the lower end of the Z axis fixes the dry ice nozzle base.
The working principle of the utility model is as follows:
the utility model discloses under high-pressure draught's effect, the dry ice granule can high-speed jet to the product surface, improves the percentage of damage of impurity such as product surface burr, particulate matter to reach the effect of wasing product surface impurity
The above only is the embodiment of the present invention, not limiting the scope of the present invention, all the equivalent structure changes made in the specification and the attached drawings or directly or indirectly applied to other related technical fields are included in the same principle as the present invention.
Claims (5)
1. A dry ice cleaning apparatus for a semiconductor element, characterized in that: the dry ice cleaning device comprises a device frame body (1), and a dry ice generating mechanism, a dry ice spraying mechanism, a dry ice purifying mechanism and a cleaning chamber which are arranged on the device frame body;
the dry ice generating mechanism comprises a liquid carbon dioxide storage tank (2) and a dry ice generator (3), and the liquid carbon dioxide storage tank and the dry ice generator are connected through a hose;
the dry ice spraying mechanism comprises a dry ice spraying head seat (5) used for installing a dry ice nozzle (4) and a mechanical arm (6) driving the dry ice spraying head seat to move, the dry ice nozzle is connected with the dry ice generator through a hose, and the dry ice nozzle and the mechanical arm are positioned in the cleaning chamber;
the dry ice purification mechanism comprises an air inlet machine (7) and an exhaust fan, the air inlet machine is positioned above the cleaning chamber and communicated with the cleaning chamber, and the exhaust fan is communicated with the cleaning chamber;
the cleaning chamber is divided into an upper cleaning part (8) and a lower collecting part (9) by a screen plate (10), a placing plate (11) for placing products is fixed on the screen plate, an air outlet (12) is formed in the cleaning chamber, and the air outlet is communicated with the exhaust fan;
the liquid carbon dioxide storage tank, the dry ice generator, the manipulator, the air inlet machine and the exhaust fan are respectively and electrically connected with a control system.
2. A dry ice cleaning apparatus for a semiconductor element as claimed in claim 1, wherein: the dry ice spray head seat is also provided with an installation opening (13) for installing a compressed air hose.
3. A dry ice cleaning apparatus for a semiconductor element as claimed in claim 1, wherein: the dry ice spraying mechanism further comprises a positioning sensor (14), and the positioning sensor is fixedly connected with the manipulator.
4. A dry ice cleaning apparatus for a semiconductor element as claimed in claim 1, wherein: and a filter (15) is arranged between the air inlet machine and the cleaning chamber.
5. A dry ice cleaning apparatus for a semiconductor element as claimed in claim 1, wherein: the manipulator is a three-axis manipulator.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202023107912.9U CN214160740U (en) | 2020-12-22 | 2020-12-22 | Dry ice cleaning equipment for semiconductor element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202023107912.9U CN214160740U (en) | 2020-12-22 | 2020-12-22 | Dry ice cleaning equipment for semiconductor element |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN214160740U true CN214160740U (en) | 2021-09-10 |
Family
ID=77608223
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202023107912.9U Active CN214160740U (en) | 2020-12-22 | 2020-12-22 | Dry ice cleaning equipment for semiconductor element |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN214160740U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112657944A (en) * | 2020-12-22 | 2021-04-16 | 苏州睿智源自动化科技有限公司 | Dry ice cleaning equipment for semiconductor element |
| KR102473797B1 (en) * | 2022-05-13 | 2022-12-06 | 디에이치 주식회사 | CO2 blast cleaning device |
-
2020
- 2020-12-22 CN CN202023107912.9U patent/CN214160740U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112657944A (en) * | 2020-12-22 | 2021-04-16 | 苏州睿智源自动化科技有限公司 | Dry ice cleaning equipment for semiconductor element |
| KR102473797B1 (en) * | 2022-05-13 | 2022-12-06 | 디에이치 주식회사 | CO2 blast cleaning device |
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| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CP01 | Change in the name or title of a patent holder | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 215300 room 5, 1881, North Shuixiu Road, Yushan Town, Kunshan City, Suzhou City, Jiangsu Province Patentee after: Ruizhiyuan Semiconductor Technology (Suzhou) Co.,Ltd. Address before: 215300 room 5, 1881, North Shuixiu Road, Yushan Town, Kunshan City, Suzhou City, Jiangsu Province Patentee before: Suzhou ruizhiyuan Automation Technology Co.,Ltd. |