CN213708138U - Support for depositing quartz loose body - Google Patents
Support for depositing quartz loose body Download PDFInfo
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- CN213708138U CN213708138U CN202022644823.1U CN202022644823U CN213708138U CN 213708138 U CN213708138 U CN 213708138U CN 202022644823 U CN202022644823 U CN 202022644823U CN 213708138 U CN213708138 U CN 213708138U
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Abstract
The utility model discloses a support for depositing a quartz loose body, which is a conical quartz rod for depositing the quartz loose body; the support is a conical structure with a thin upper part and a thick lower part; the diameter of the upper end of the support is R1, the diameter of the lower end of the support is R2, the length of the support is L, and the taper of the support is (R2-R1): L; the taper of the support is controlled to be 1: 800-1: 500; the support is rotated in a vertical direction about its longitudinal axis for depositing silica powder to form a silica soot body. The support can not only not pollute the inner wall of the hollow quartz loose body, but also can be easily drawn out of the quartz loose body, and can avoid the cracking of the hollow quartz loose body.
Description
Technical Field
The utility model belongs to the technical field of the quartz device is made, in particular to a supporter that is used for the loose body of deposit quartz.
Background
Hollow cylinders of synthetic quartz glass are commonly used as optical fiber preforms or intermediate products for a large number of quartz devices in the optical and chemical industries. The production mainly comprises a deposition process and a sintering process. In the deposition process, OVD or VAD method is generally adopted, and silicon-containing raw materials are subjected to flame hydrolysis or pyrolysis to generate silica particles; the generated silicon dioxide particles are deposited on a cylindrical support rotating around a longitudinal axis and grow into a porous silicon dioxide blank body, namely a loose body, layer by layer; removing the support before sintering to obtain a hollow cylindrical loose body; the sintering process is to place the hollow loose body in a heating furnace and vitrify the hollow loose body in the atmosphere of chlorine gas, so as to obtain the transparent quartz cylinder with low hydroxyl. The difficulty with this manufacturing process is primarily in removing the support after deposition.
In the methods known so far, a carbon layer is generally coated on the surface of alumina as a support, or BN powder is coated on the surface of quartz glass or silicon carbideAs a support, or graphite may be used directly as a support. Since the deposition process in the known method is horizontal, the process of removing the support puts higher demands on the breaking strength of the support under the condition that the required loose body has a small inner hole and a large outer diameter and weight. Moreover, the application field of the quartz cylinder has higher requirements on the purity of the quartz cylinder. In the above mentioned support materials, alumina, quartz and graphite do not have the high breaking strength required for producing large-outer-diameter small-inner-hole loose bodies in a horizontal deposition process; while the coating or graphite support is helpful for removing the support, the coating or graphite support is easy to pollute the inner hole wall of the loose body, and the surface coating often needs to carry out complex surface treatment on the support; the silicon carbide has higher fracture strength, but in order to ensure that the inner hole wall of the loose body is not polluted, the surface treatment is required to be carried out on the silicon carbide; patent CN102596829B describes a method for using silicon carbide as a support material, the support used in this method being silicon-infiltrated silicon carbide (SiSiC), which is treated in an oxidizing atmosphere at a temperature of 1200 ℃ prior to deposition to obtain a layer of SiO on the surface2To avoid contamination of the loose bodies. However, the method has a complicated pretreatment process for the support, and as the number of times of production increases, the support is gradually consumed, so that the production cost increases.
SUMMERY OF THE UTILITY MODEL
In order to solve the above technical problems, the present invention provides a support for depositing a loose quartz body; the support can not only not pollute the inner wall of the hollow loose body, but also can be easily drawn out of the quartz loose body, and can avoid the cracking of the hollow quartz loose body.
For realizing above-mentioned technical purpose, reach above-mentioned technological effect, the utility model discloses a following technical scheme realizes:
a supporter for depositing a quartz loose body is a conical quartz rod for depositing the quartz loose body; the support is a conical structure with a thin upper part and a thick lower part; the diameter of the uppermost end of the support is R1, the diameter of the lowermost end of the support is R2, the length of the support is L, and the taper of the support is (R2-R1): L; the taper of the support is controlled to be 1: 800-1: 500; the support is rotated around the longitudinal axis thereof in the vertical direction for depositing the silica powder to form a quartz loose body; the upper end of the support is also provided with a pin hole, and a pin is arranged in the pin hole.
As a preferred scheme of the utility model, the tapering of supporter is 1: 600.
As another preferred scheme of the utility model, the tapering of support is 1: 700.
Further, the extraction force of the support when the support is extracted from the quartz loose body is 95-110N.
As a further improvement of the technical scheme of the utility model, the upper end of supporter is equipped with the pinhole, installs a pin in this pinhole.
The utility model has the advantages that:
the support of the utility model is a conical quartz rod which is in a vertical state in the deposition process and is matched with a conical structure with a thin upper part and a thick lower part, so that the weight of the deposited quartz loose body can be uniformly distributed on the whole support, thereby greatly reducing the requirement of large-size products on the strength of the support; moreover, the conical structure of the support is more beneficial to moving out the support; the taper of the support is designed to be 1: 800-1: 500, the taper is beneficial to the extraction of the support, and the force for extracting the support can be controlled, so that the cracking of the loose quartz body can be avoided;
the utility model discloses a support adopts quartz rod, but reuse, low in manufacturing cost, and workable, need not carry out complicated preliminary treatment to its surface, can not cause the pollution to the quartz cylinder inner wall.
Furthermore, the utility model discloses an upper end of support is equipped with the pinhole, installs the pin in the pinhole, and the pin can be used for being fixed in the deposit lathe with the support on, and the support of being convenient for is rotatory at the deposit in-process.
Drawings
Fig. 1 is a schematic view of a support for depositing a quartz loose body, which is provided by embodiment 1 of the present invention, when the support is used for depositing the quartz loose body.
Detailed Description
The technical solutions of the present invention will be described clearly and completely with reference to the following specific embodiments, and it should be understood that the described embodiments are only some embodiments, but not all embodiments of the present invention. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
Example 1
As shown in fig. 1, the support 1 is a conical quartz rod for depositing a loose body 2 of quartz; the support 1 is a conical structure with a thin upper part and a thick lower part; the diameter of the uppermost end of the support 1 is set to be 38mm for R1, 43mm for R2 and the length of the support 1 is 3000mm, the taper of the support is (R2-R1) 1: 600; the upper end of the support 1 is provided with a pin hole, and a pin 11 is arranged in the pin hole; the support 1 is vertically fixed to the deposition lathe by the pin 11, and the support 1 can be rotated about its longitudinal axis while reciprocating up and down.
During deposition, a plurality of blowlamps 3 are arranged and fixed on the blowlamp bracket 4 at equal intervals, and the central axis of the blowlamp and the longitudinal axis of the support are ensured to be positioned on the same vertical plane; the blowtorch support 4 is provided with a slide rail in the horizontal direction, and the blowtorch gradually moves along with the increase of the diameter of the quartz loose body so as to keep the distance between the blowtorch and the quartz loose body; the silicon-containing raw materials are subjected to combustion reaction to generate silicon dioxide particles, the silicon dioxide particles are sprayed onto a support through a plurality of blowlamps, and the silicon dioxide particles grow layer by layer to obtain a quartz loose body; when the diameter of the quartz loose body reaches 350mm, the deposition process is stopped.
After the deposition is finished, the quartz loose body 2 is moved out of the deposition lathe, the pin 11 is pulled out, the support 1 is moved out, and the extraction force for extracting the support is 100N. The hollow quartz loose body 2 is vertically transferred into a sintering furnace by a certain holding device, and the quartz loose body 2 is dehydrated and vitrified at the high temperature of 1400-1500 ℃ in the atmosphere of chlorine gas to obtain a quartz cylinder with the average inner diameter of 35mm and the outer diameter of 150 mm.
Example 2
The support is a conical quartz rod for depositing a quartz loose body; the support is a conical structure with a thin upper part and a thick lower part; the diameter of the uppermost end of the support is set to be R1-40 mm, the diameter of the lowermost end of the support is set to be R2-44 mm, and the length of the support is set to be L2800 mm, so that the taper of the support is (R2-R1) L is 1: 700; the upper end of the support is provided with a pin hole, and a pin is arranged in the pin hole; the support is vertically fixed on the deposition lathe by the pin, and can rotate around the longitudinal axis of the support and move up and down in a reciprocating mode.
During deposition, silicon-containing raw materials are subjected to combustion reaction to generate silica particles, the silica particles are sprayed onto a support through a plurality of blowlamps, and the silica particles grow layer by layer to obtain a quartz loose body; and (3) driving the blast burner to move in the horizontal direction by the blast burner support along with the increase of the outer diameter of the quartz loose body so as to keep the distance from the surface of the quartz loose body, and stopping the deposition process when the diameter of the loose body reaches 350 mm.
After deposition, the loose quartz body is moved out of the deposition lathe, the pin is pulled out, the support is moved out, and the pulling force for pulling out the support is 108N. The hollow quartz loose body is vertically transferred into a sintering furnace by a certain holding device, and is dehydrated and vitrified at the high temperature of 1400-1500 ℃ in the atmosphere of chlorine gas to obtain a quartz cylinder with the average inner diameter of 38mm and the outer diameter of 153 mm.
The above only is the embodiment of the present invention, not limiting the patent scope of the present invention, all the equivalent structures or equivalent processes that are used in the specification and the attached drawings or directly or indirectly applied to other related technical fields are included in the patent protection scope of the present invention.
Claims (5)
1. A support for depositing a quartz loose body, characterized in that: the support is a conical quartz rod for depositing a quartz loose body; the support is a conical structure with a thin upper part and a thick lower part; the diameter of the uppermost end of the support is R1, the diameter of the lowermost end of the support is R2, the length of the support is L, and the taper of the support is (R2-R1): L; the taper of the support is controlled to be 1: 800-1: 500; the support is rotated in a vertical direction about its longitudinal axis for depositing silica powder to form a silica soot body.
2. A support for depositing a quartz loose body according to claim 1, characterized in that: the taper of the support is 1: 600.
3. A support for depositing a quartz loose body according to claim 1, characterized in that: the taper of the support is 1: 700.
4. A support for depositing a quartz loose body according to claim 1, characterized in that: and the extraction force of the support when the support is extracted from the quartz loose body is 95-110N.
5. A support for depositing a quartz loose body according to claim 1, characterized in that: the upper end of the support is provided with a pin hole, and a pin is arranged in the pin hole.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022644823.1U CN213708138U (en) | 2020-11-16 | 2020-11-16 | Support for depositing quartz loose body |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022644823.1U CN213708138U (en) | 2020-11-16 | 2020-11-16 | Support for depositing quartz loose body |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN213708138U true CN213708138U (en) | 2021-07-16 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202022644823.1U Active CN213708138U (en) | 2020-11-16 | 2020-11-16 | Support for depositing quartz loose body |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN213708138U (en) |
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2020
- 2020-11-16 CN CN202022644823.1U patent/CN213708138U/en active Active
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