CN213663764U - Special dustless static clothes of chip semiconductor manufacturing - Google Patents
Special dustless static clothes of chip semiconductor manufacturing Download PDFInfo
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- CN213663764U CN213663764U CN202022664139.XU CN202022664139U CN213663764U CN 213663764 U CN213663764 U CN 213663764U CN 202022664139 U CN202022664139 U CN 202022664139U CN 213663764 U CN213663764 U CN 213663764U
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Abstract
The utility model relates to a special dust-free electrostatic garment for manufacturing a chip semiconductor, which comprises an integrally formed coat and trousers, wherein the trousers are provided with an inlet for wearing from one trouser leg to the other trouser leg through a crotch part, and the inlet is sealed by a zipper; one end of each sleeve, which is close to the cuff, is provided with a first inner sleeve, one end of each inner sleeve is sewed with the inner wall of each sleeve, and the other end of each inner sleeve is suspended and does not exceed the cuff; one end of each trouser leg close to the leg opening is provided with a second inner sleeve, one end of each inner sleeve is sewed with the inner wall of each trouser leg, and the other end of each inner sleeve is suspended and does not exceed the leg opening. The utility model adopts the wearing mode of the crotch opening, thereby avoiding the influence of dust on the front chest part, and the zipper opening faces the ground, thereby facilitating the falling and treatment of particles and reducing the influence on the working area; the first inner oversleeve and the second inner oversleeve can be more conveniently arranged in the gloves and the dust-free shoe covers, the outer sleeves can be used as a second line of defense, the dustproof effect is better, and meanwhile, the convenience and the comfort in wearing are also considered.
Description
Technical Field
The utility model relates to a dustless clothes field especially relates to a special dustless static clothes of chip semiconductor manufacturing.
Background
The dust-free electrostatic garment special for manufacturing the chip semiconductor is widely applied to the fields of semiconductors, photoelectrons, biomedicines, aerospace and the like. With the continuous development and progress of science and technology, the dust-free requirement on a working room is continuously increased. It is known that human skin, hair, clothes contain a large amount of particles, fibers, bacteria, etc., and a human body constantly generates a large amount of particles during the movement of the head and the trunk, and these falling particles are fatal to some high-precision products.
Generally, a dust-free working room with higher requirements is required to wear the special dust-free electrostatic clothing for manufacturing the chip semiconductor connected with the cap, and meanwhile, protective glasses, gloves and dust-free shoes are also required to be worn. In addition, the gloves are not generally provided with elasticity for convenient wearing, the cuffs of the dust-free clothes are wrapped by the gloves for wearing, and the wearing still can not avoid accumulation and falling of particles, so that the dust-free control is not facilitated; if the cuff is plugged into the glove, the dust-free clothes are not convenient to wear and have poor comfort because the dust-free clothes are generally wide.
Disclosure of Invention
To the above problem, an object of the utility model is to provide a dustproof effect is better and dress comfortable special dustless static clothes of chip semiconductor manufacturing.
In order to achieve the purpose, the utility model discloses a special dust-free electrostatic garment for manufacturing a chip semiconductor, which comprises a coat and trousers which are integrally formed, wherein the coat comprises a cap and two sleeves, and the trousers comprise a crotch part and two trouser legs; the trousers are provided with an inlet for wearing from one trouser leg to the other trouser leg through the crotch part, and the inlet is closed through a zipper; one end of each sleeve, which is close to the cuff, is provided with a first inner sleeve, one end of each inner sleeve is sewn with the inner wall of each sleeve, and the other end of each inner sleeve is suspended and does not exceed the cuff; one end of each trouser leg close to the corresponding leg opening is provided with a second inner sleeve, one end of each inner sleeve is sewn with the inner wall of the corresponding trouser leg, and the other end of each inner sleeve is suspended and does not extend out of the corresponding leg opening.
Preferably made of herringbone lattice woven cloth.
Preferably, the suspended ends of the cuffs and the first inner cuffs are provided with elastic bands.
Preferably, an elastic band is arranged at the suspended end of the second inner sleeve.
Preferably, a mask and an eye exposing port are arranged on the cap; the mask comprises a first net cloth layer, an anti-static cloth layer and a second net cloth layer which are sequentially stacked from inside to outside; elastic bands are arranged at the upper edge and the lower edge of the eye exposing opening; the rear end of the hat is provided with a plurality of groups of adjusting belts for adjusting the size of the hat.
Preferably, the back of the coat is provided with a clothes hanging belt convenient to fold and hang.
Preferably, one or both of the sleeves are provided with pen bags, and the pen bags are formed by sewing double-layer woven fabrics on the sleeves.
Preferably, one or all of the trouser legs are provided with a mobile phone bag, and the bottom of the mobile phone bag is provided with a plurality of holes.
Preferably, the jacket is further provided with a waist adjusting portion which comprises a cover cloth, a contraction band with holes, a clamping ring and a buckle, the cover cloth is sewn on the inner wall of the jacket to form a cavity with an opening at one end for accommodating the contraction band, one end of the contraction band close to the opening of the cavity is connected with the clamping ring, the other end of the contraction band is sewn with the cavity, and the buckle is fixed close to the opening of the cavity and matched with the holes in the contraction band.
Preferably, the trousers are further provided with a wrapping edge for shielding the zipper.
The utility model discloses following beneficial effect has:
1. the utility model adopts the wearing mode of the crotch lower opening, thereby avoiding the influence of dust on the front chest part, and the zipper opening faces the ground, thereby being convenient for the dropping and treatment of particles and greatly reducing the influence on the working area; the first inner oversleeve and the second inner oversleeve which are close to the skin can be arranged in the gloves and the dust-free shoe covers more conveniently, the outer sleeves can be used as the second protective line, the dust-proof effect is better, and meanwhile, the convenience and the comfort in wearing are also taken into consideration.
2. The fabric is woven by adopting a herringbone lattice, so that the attachment of particles, dust and the like can be reduced.
3. The design of the waist adjusting part has large adjusting range, and the elastic band is easy to accumulate dust, and is arranged in the coat, thereby being more beneficial to dust-free control and avoiding the risk of work interference caused by swinging of the elastic band.
Drawings
Fig. 1 is a schematic view of the front side of the present invention.
Fig. 2 is a schematic view of the back of the present invention.
Fig. 3 is a schematic view of a waist adjusting part (hiding the front of the dust-free clothing).
Description of the main part symbols:
11: cap, 111: eye exposure, 112: mask, 113: elastic bands at the upper and lower edges of the eye, 114: adjusting belt, 12: sleeve, 121: cuff elastic band, 13: first inner sleeve, 131: elastic band of the first inner cuff, 14: pen bag, 15: hanging belt, 16: waist adjusting portion, 161: drape, 162: shrink band, 1621: holes in shrink band, 163: snap ring, 164: buckle, 21: trouser legs, 22: second inner sleeve, 221 elastic band of second inner sleeve, 23: cell phone bag, 24: edge covering, 25: a zipper.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more clearly understood, the present invention is further described in detail below with reference to the accompanying drawings and embodiments.
As shown in fig. 1-3, the utility model discloses a special dustless static clothes of chip semiconductor manufacturing is weaved by herringbone check and is made, can reduce adhering to of particle, dust etc. and pile up, is convenient for clear up. The dust-free electrostatic garment specially used for manufacturing the chip semiconductor comprises a coat and trousers which are integrally formed, wherein the coat comprises a hat 11 and two sleeves 12, and the trousers comprise a crotch part and two trouser legs 21.
An inlet for wearing is provided in the trousers from one leg 21 through the crotch portion to the other leg 21, which inlet is closed by means of a zip 25. The wearing mode of the crotch opening avoids dust from the chest opening of the traditional dust-free clothes, the chest is closed, and dust-free control is facilitated. In addition, the trousers are also provided with a covered edge 24 for shielding the zipper 25, the covered edge 24 is arranged at the front end of the zipper 25, and a notch formed by the covered edge 24 and the trousers faces to the rear end of the trousers. The hem 24 also serves to block and guide dust from the zipper 25 so that the dust falls toward the rear of the pants to avoid affecting the work area.
One end of the sleeve 12 close to the cuff is provided with a first inner sleeve 13 which is more close to the cuff, one end of the first inner sleeve is sewed with the inner wall of the sleeve 12, and the other end of the first inner sleeve is suspended and does not exceed the cuff. Elastic bands 121/131 are arranged at the suspended ends of the cuffs and the first inner sleeve 13, and the cuff opening of the first inner sleeve 13 is tightened, so that the glove is more convenient to wear and to block particles and the like in the first inner sleeve 13; the tightening of the cuffs of the outer sleeves can tighten the gloves to prevent particles in the gloves from falling out easily, and a second dustproof paying-off line can be constructed to facilitate dust-free control.
One end of each trouser leg 21 close to the foot opening is provided with a second inner sleeve 22 which is more close to the foot opening, one end of each inner sleeve is sewn with the inner wall of each trouser leg 21, and the other end of each inner sleeve is suspended and does not exceed the foot opening. The elastic belt 221 is arranged at the suspended end of the second inner oversleeve 22, so that the second inner oversleeve can penetrate into a dust-free shoe cover, and the difference is that the foot opening is not provided with the elastic belt, so that accumulation of particles and the like can be avoided, and the particles can fall off conveniently.
The mask 112 and the eye exposing opening 111 are arranged on the hat 11, elastic bands 113 are arranged on the upper edge and the lower edge of the eye exposing opening 111, so that the eye exposing opening 111 is more attached to the eyes of a wearer, and in addition, the elastic bands 113 are matched with goggles to achieve a good dustproof effect. The mask 112 includes a first mesh layer, an anti-static cloth layer, and a second mesh layer stacked in sequence from inside to outside, which are both breathable and anti-static. Two groups of adjusting belts 114 for adjusting the size of the hat 11 are arranged at the rear end of the hat 11, and the adjusting belts 114 adopt strip-shaped nylon buttons, so that the use is convenient.
In order to facilitate the storage of the dust-free electrostatic garment special for manufacturing the chip semiconductor, a clothes hanging belt 15 which is convenient to store and hang is arranged at the back of the garment.
The left sleeve 12 is provided with a pen bag 14, the pen bag 14 is formed by sewing double-layer woven fabric on the sleeve 12, the double-layer woven fabric is formed by folding anti-static woven fabric, and the thickened arrangement is convenient to accommodate.
The mobile phone bags 23 are arranged on the leg parts of the two trouser legs 21, and a plurality of holes are formed in the bottoms of the mobile phone bags 23.
The coat is also provided with a waist adjusting part 16 which comprises a cover cloth 161, a contraction band 162, a clamping ring 163 and a buckle 164, wherein the cover cloth 161 is sewn on the inner wall of the coat to form a cavity for accommodating the contraction band 162, only one end of the cavity is opened, one end of the contraction band 162 close to the cavity opening is connected with the clamping ring 163, and the clamping ring 163 is larger than the cavity opening so as to avoid the contraction band 162 from retracting into the cavity and being inconvenient to adjust; the other end of shrink-wrap band 162 is sewn to the cavity. Holes are uniformly distributed on the contraction band 162, and the buckle 164 is fixed close to the cavity opening and is matched with the holes on the contraction band 162 to form an adjusting structure. The waist adjusting portion 16 has a wider adjustment range than that of the conventional sewing adjustment, and is suitable for users of various body types, and the contraction band 162 is built in the jacket so as not to interfere with the outside. In addition, the waist is tightened to be positioned on the back of the jacket, so that the front chest part does not form wrinkles, thereby reducing the attachment of dust and being more comfortable to wear.
The above description is only for the preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any changes or substitutions that can be easily conceived by those skilled in the art within the technical scope of the present invention should be covered by the present invention.
Claims (10)
1. The utility model provides a special dustless static clothes of chip semiconductor manufacturing, includes integrated into one piece's jacket and trousers, the jacket includes cap and two coat-sleeves, and trousers include crotch portion and two trouser legs, its characterized in that: the trousers are provided with an inlet for wearing from one trouser leg to the other trouser leg through the crotch part, and the inlet is closed through a zipper; one end of each sleeve, which is close to the cuff, is provided with a first inner sleeve, one end of each inner sleeve is sewn with the inner wall of each sleeve, and the other end of each inner sleeve is suspended and does not exceed the cuff; one end of each trouser leg close to the corresponding leg opening is provided with a second inner sleeve, one end of each inner sleeve is sewn with the inner wall of the corresponding trouser leg, and the other end of each inner sleeve is suspended and does not extend out of the corresponding leg opening.
2. The dust-free electrostatic garment for chip semiconductor manufacturing according to claim 1, wherein: is made of herringbone lattice woven fabric.
3. The dust-free electrostatic garment for chip semiconductor manufacturing according to claim 1, wherein: elastic bands are arranged at the suspended ends of the cuffs and the first inner cuffs.
4. The dust-free electrostatic garment for chip semiconductor manufacturing according to claim 1, wherein: an elastic band is arranged at the suspended end of the second inner sleeve.
5. The dust-free electrostatic garment for chip semiconductor manufacturing according to claim 1, wherein: the cap is provided with a mask and an eye exposing port; the mask comprises a first net cloth layer, an anti-static cloth layer and a second net cloth layer which are sequentially stacked from inside to outside; elastic bands are arranged at the upper edge and the lower edge of the eye exposing opening; the rear end of the hat is provided with a plurality of groups of adjusting belts for adjusting the size of the hat.
6. The dust-free electrostatic garment for chip semiconductor manufacturing according to claim 1, wherein: the back of the coat is provided with a clothes hanging belt convenient to fold and hang.
7. The dust-free electrostatic garment for chip semiconductor manufacturing according to claim 1, wherein: one or all of the sleeves are provided with pen bags which are formed by sewing double-layer woven fabrics on the sleeves.
8. The dust-free electrostatic garment for chip semiconductor manufacturing according to claim 1, wherein: one or all of the trouser legs are provided with a mobile phone bag, and the bottom of the mobile phone bag is provided with a plurality of holes.
9. The dust-free electrostatic garment for chip semiconductor manufacturing according to claim 1, wherein: the jacket is further provided with a waist adjusting portion which comprises a cover cloth, a contraction band with holes, a clamping ring and a buckle, the cover cloth is sewn on the inner wall of the jacket to form an accommodating cavity with an opening at one end for accommodating the contraction band, one end of the contraction band close to the opening of the accommodating cavity is connected with the clamping ring, the other end of the contraction band is sewn with the accommodating cavity, and the buckle is close to the opening of the accommodating cavity and is fixed and matched with the holes in the.
10. The dust-free electrostatic garment for chip semiconductor manufacturing according to claim 1, wherein: the trousers are also provided with a wrapping edge used for shielding the zipper.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022664139.XU CN213663764U (en) | 2020-11-17 | 2020-11-17 | Special dustless static clothes of chip semiconductor manufacturing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022664139.XU CN213663764U (en) | 2020-11-17 | 2020-11-17 | Special dustless static clothes of chip semiconductor manufacturing |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN213663764U true CN213663764U (en) | 2021-07-13 |
Family
ID=76733480
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202022664139.XU Active CN213663764U (en) | 2020-11-17 | 2020-11-17 | Special dustless static clothes of chip semiconductor manufacturing |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN213663764U (en) |
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2020
- 2020-11-17 CN CN202022664139.XU patent/CN213663764U/en active Active
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| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20221214 Address after: No. 139, South Huxian Road, Zhihe Town, Pengzhou City, Chengdu, Sichuan, 611,930 Patentee after: Chengdu kaisarin Technology Co.,Ltd. Address before: No. 837, Lianting Road, Xiang'an District, Xiamen, Fujian 361000, 19 # 808, 809 Patentee before: Xiamen huifengcheng Water Technology Co.,Ltd. |