CN213583699U - Radio frequency electrodeless excimer curing lamp - Google Patents
Radio frequency electrodeless excimer curing lamp Download PDFInfo
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- CN213583699U CN213583699U CN202023252806.XU CN202023252806U CN213583699U CN 213583699 U CN213583699 U CN 213583699U CN 202023252806 U CN202023252806 U CN 202023252806U CN 213583699 U CN213583699 U CN 213583699U
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Abstract
The embodiment of the utility model provides a radio frequency electrodeless excimer curing lamp relates to curing lamp technical field. The radio frequency electrodeless excimer curing lamp comprises a plasma lamp tube, a reflecting cover, two focalizers and two radio frequency sources, wherein a luminescent substance for ionization excitation is filled in the plasma lamp tube and used for emitting ultraviolet light, the two focalizers are respectively arranged at two ends of the plasma lamp tube, at least part of the luminescent substance is positioned in a focusing area of the focalizers, the two radio frequency sources are respectively arranged on the two focalizers, the reflecting cover is covered on the plasma lamp tube, and the reflecting cover is used for adjusting the irradiation direction of the plasma lamp tube. The radio frequency electrodeless excimer curing lamp can improve the service life and the irradiation intensity of the lamp tube and output light energy stably.
Description
Technical Field
The utility model relates to a curing lamp technical field particularly, relates to a radio frequency electrodeless excimer curing lamp.
Background
Vacuum ultraviolet is a radiation photon with higher energy, which can realize substance energy level transition and chemical reaction which are difficult to be completed by other methods, break molecular bonds and change the surface property of materials. The shorter the uv wavelength, the more strongly the substance absorbs it, and therefore the vacuum uv radiation can be absorbed by the very thin surface layer. By virtue of this property, vacuum ultraviolet rays can be used to guide photopolymerization of a specific paint, varnish, adhesive, or the like, and this process is called ultraviolet curing. The ultraviolet curing technology is widely applied to the industries of photocureable coating, photocureable printing ink, photocureable adhesive, photoresist, laser three-dimensional imaging, three-dimensional modeling and the like.
Vacuum ultraviolet light is typically generated by excimer decay. The excimer is in a high energy state with a bound (lifetime 10)-6～10-7s) and repulsive (weakly bound) ground state molecules (lifetime 10)-13s) is a generic term. The emission wavelengths of different excimer molecules differ.
Most of the existing Excimer ultraviolet (Excimer UV) lamps are products of japan, germany and the like, most of Excimer ultraviolet light sources are monopolized by foreign enterprises, and manufacturers of related light sources are urgently needed in China along with the transformation and upgrading of industries.
The light-emitting principle of the excimer ultraviolet light source is that high-voltage and high-frequency electric field energy is loaded outside an ultraviolet lamp tube to bombard rare gas in the lamp tube to emit single 172nm ultraviolet rays. The voltage applied to the lamp tube was 15W/cm, and the irradiation intensity of the lamp tube was 50mW/cm2The lamp life is about 700-1500 hours, and it is not high.
Therefore, the design of an excimer curing lamp can improve the service life and the irradiation intensity of the lamp tube, and the output light energy is stable, which is a technical problem to be solved urgently at present.
SUMMERY OF THE UTILITY MODEL
The utility model aims at providing a radio frequency electrodeless excimer curing lamp, it can improve fluorescent tube life-span and irradiation intensity to output light energy is stable.
The embodiment of the utility model discloses a can realize like this:
in a first aspect, the utility model provides a radio frequency electrodeless excimer curing lamp, radio frequency electrodeless excimer curing lamp includes:
the plasma lamp tube is filled with a luminescent substance excited by ionization, and the luminescent substance is used for emitting ultraviolet light;
two focalizers respectively arranged at two ends of the plasma lamp tube, wherein the luminescent substance is at least partially positioned in the focusing area of the focalizers;
two radio frequency sources respectively arranged on the two focalizers;
and the reflecting cover is covered on the plasma lamp tube and used for adjusting the irradiation direction of the plasma lamp tube.
In an alternative embodiment, the reflector comprises:
the frame is covered on the plasma lamp tube and provided with a light outlet;
the plasma lamp tube is positioned at the focus position of the ellipsoidal cylindrical reflector formed by the two ellipsoidal mirrors, and the ellipsoidal mirrors are used for reflecting ultraviolet light emitted by the plasma lamp tube to the light outlet and forming strip-shaped light spots to act on an object to be illuminated.
In an alternative embodiment, the outer wall of the frame is provided with heat dissipating fins.
In an alternative embodiment, the rf electrodeless excimer curing lamp further comprises:
and the two radiators are respectively arranged on the two radio frequency sources and are used for radiating heat of the radio frequency sources.
In an alternative embodiment, the heat sink comprises:
a substrate mounted on a radio frequency source;
a radiating pipe installed on the base body, the radiating pipe being in a bent form;
the inlet joint is arranged at one end of the radiating pipe and is used for accessing the cooling liquid;
and the outlet connector is arranged at the other end of the radiating pipe and is used for discharging the cooling liquid.
In an alternative embodiment, the focuser comprises:
the bottom cover is made of a conductive material;
the upper cover is made of a conductive material and is connected with the bottom cover;
the radio frequency antenna penetrates through the bottom cover and is connected to the upper cover, and insulating materials are filled between the radio frequency antenna and the bottom cover;
the metal column runs through the upper cover and is connected to the upper cover on the end, and the metal column sets up with the upper cover interval, and the metal column includes first section and second section, and the second section is kept away from the bottom for first section, and stretches out from the upper cover, and the diameter of second section is greater than the diameter of first section, and the tip of second section is seted up flutedly, and the plasma fluorescent tube is installed in the recess.
In an alternative embodiment, the upper cover is a stepped cylinder, and the upper cover includes:
the first circular side wall is vertically connected to the bottom cover and surrounds the radio frequency antenna and the metal column;
the outer peripheral surface of the circular side wall is connected to one end of the first circular side wall, the circular side wall is parallel to the bottom cover, and the radio frequency antenna is connected to the circular side wall;
and the second circular side wall is connected to the inner circumferential surface of the circular side wall, surrounds the metal column and is arranged at intervals with the metal column.
In an alternative embodiment, the axial length of the first circular sidewall is greater than or equal to the length of the first segment, the first circular sidewall and the first segment form a first-stage annular capacitor, the axial length of the second circular sidewall is less than or equal to the length of the second segment, and the second circular sidewall and the second segment form a second-stage annular capacitor.
In an alternative embodiment, the focuser comprises:
the shell is of a cylindrical structure, and a cylindrical cavity is formed in the shell;
the radio frequency antenna penetrates through the shell along the axis direction of the shell and penetrates through the cylindrical cavity, and the radio frequency antenna is eccentrically arranged relative to the axis of the shell;
the metal column runs through the casing, just passes cylindrical cavity along the axis direction of casing, and the metal column is for the axis eccentric settings of casing, and the one end that the metal column stretches out the casing is seted up flutedly, and the plasma lamp is installed in the recess.
In an alternative embodiment, the rf antenna and the metal post are located on opposite sides of the axis of the housing.
The embodiment of the utility model provides an electrodeless excimer lamp's of radio frequency beneficial effect includes:
1. the plasma lamp tube is an electrodeless light source, and because no high-voltage electrode is arranged in the plasma lamp tube, no chemical reaction exists between gas in the lamp tube and the electrode, the output light energy is stable, and the service life of the lamp tube is greatly prolonged;
2. the luminescent material filled in the plasma lamp tube is ionized under the focusing energy of the two focalizers to emit high-intensity ultraviolet light, and the curing efficiency is high;
3. two focalizers are respectively arranged at two ends of the plasma lamp tube and provide energy for the plasma lamp tube simultaneously, so that luminescent substances in the plasma lamp tube are uniformly and fully excited, and the uniformity of luminescence is improved.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings that are required to be used in the embodiments will be briefly described below, it should be understood that the following drawings only illustrate some embodiments of the present invention, and therefore should not be considered as limiting the scope, and for those skilled in the art, other related drawings can be obtained according to the drawings without inventive efforts.
Fig. 1 is a schematic structural diagram of a first viewing angle of a radio frequency electrodeless excimer curing lamp according to an embodiment of the present invention;
fig. 2 is a schematic structural diagram of a second viewing angle of the rf electrodeless excimer curing lamp according to an embodiment of the present invention;
fig. 3 is a schematic structural diagram of a third viewing angle of the rf electrodeless excimer curing lamp according to the embodiment of the present invention;
fig. 4 is a schematic diagram of a full-section structure of a radio frequency electrodeless excimer curing lamp provided by an embodiment of the present invention;
fig. 5 is a schematic full-section structural diagram of a focuser in a first form according to an embodiment of the present invention;
fig. 6 is a schematic full-section structural diagram of a focuser of a second form according to an embodiment of the present invention.
Icon: 100-radio frequency electrodeless excimer curing lamps; 110-a plasma lamp tube; 120-a radio frequency source; 130-a heat sink; 131-a substrate; 132-radiating pipes; 133-an inlet fitting; 134-outlet connection; 140-a reflector; 141-a frame; 142-heat dissipating fins; 143-ellipsoidal mirror; 150-a focuser; 151-bottom cover; 152-an upper cover; 1521-a first circular sidewall; 1522-circular side wall; 1523-second circular sidewall; 153-a radio frequency antenna; 154-metal posts; 1541-first stage; 1542-second section; 155-shell.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, but not all, embodiments of the present invention. The components of embodiments of the present invention, as generally described and illustrated in the figures herein, may be arranged and designed in a wide variety of different configurations.
Thus, the following detailed description of the embodiments of the present invention, presented in the accompanying drawings, is not intended to limit the scope of the invention, as claimed, but is merely representative of selected embodiments of the invention. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative efforts belong to the protection scope of the present invention.
It should be noted that: like reference numbers and letters refer to like items in the following figures, and thus, once an item is defined in one figure, it need not be further defined and explained in subsequent figures.
In the description of the present invention, it should be noted that, if the terms "upper", "lower", "inner", "outer", etc. indicate the position or positional relationship based on the position or positional relationship shown in the drawings, or the position or positional relationship which is usually placed when the products of the present invention are used, the description is only for convenience of description and simplification, but the indication or suggestion that the indicated device or element must have a specific position, be constructed and operated in a specific orientation, and thus, should not be interpreted as a limitation of the present invention.
Furthermore, the appearances of the terms "first," "second," and the like, if any, are used solely to distinguish one from another and are not to be construed as indicating or implying relative importance.
It should be noted that the features of the embodiments of the present invention may be combined with each other without conflict.
Referring to fig. 1 and 2, the present embodiment provides an rf electrodeless excimer lamp 100, where the rf electrodeless excimer lamp 100 includes a plasma lamp tube 110, a focuser 150, an rf source 120, a reflector 140 and a heat sink 130.
The plasma lamp 110 is a tubular enclosure, and a luminescent material for ionization excitation is filled in the plasma lamp 110 and is used for emitting ultraviolet light. By adjusting the components of the luminescent material in the plasma lamp tube 110, characteristic peaks of different energies can be obtained, thereby meeting the requirements of different customers on radiation spectra.
The material, thickness and shape of the plasma lamp 110 are not particularly limited, and those skilled in the art can freely select the material, thickness and shape according to actual needs.
In this embodiment, the luminescent material in the plasma lamp 110 comprises mercury, a metal halide and an inert gas, wherein the metal halide is present in an amount of between 10% and 90%. The light emitting substance in the plasma lamp tube 110 is ionized in the radio frequency energy focusing range to excite plasma, and incoherent high-intensity vacuum ultraviolet light with a wave band of 172nm is radiated outwards.
The present embodiment provides a way for the rf electrodeless excimer lamp 100 to excite vacuum ultraviolet radiation, which is different from any of the existing ways for excimer excitation. The radio frequency electrodeless excimer lamp 100 provided by this embodiment is excited by electrodeless radio frequency, and the lifetime of the vacuum ultraviolet light source can be increased to more than 10000 hours.
Two focalizers 150 are respectively installed at both ends of the plasma lamp tube 110, and the light emitting substance is at least partially located in the focusing area of the focalizers 150. The two radio frequency sources 120 are respectively arranged on the two focalizers 150, the radio frequency input by the radio frequency sources 120 is between 100MHz and 10GHz, and the input power is between 50W and 5 KW.
Two heat sinks 130 are respectively installed on the two rf sources 120, and the heat sinks 130 are used for dissipating heat from the rf sources 120. The reflector 140 covers the plasma lamp 110, and the reflector 140 is used to adjust the irradiation direction of the plasma lamp 110.
Referring to fig. 3, the radiator 130 includes a base 131, a radiating pipe 132, an inlet connector 133 and an outlet connector 134, wherein the base 131 is mounted on the rf source 120, the radiating pipe 132 is mounted on the base 131, the radiating pipe 132 is in a bent form, the inlet connector 133 is mounted at one end of the radiating pipe 132, the inlet connector 133 is used for receiving the coolant, the outlet connector 134 is mounted at the other end of the radiating pipe 132, and the outlet connector 134 is used for discharging the coolant.
The rf source 120 generates a large amount of heat during operation, and the two heat sinks 130 are installed to remove the heat to ensure that the operating temperature of the rf source 120 is moderate.
Referring to fig. 4, the reflector 140 includes a frame 141 and two ellipsoidal mirrors 143, wherein the frame 141 covers the plasma lamp tube 110, the frame 141 has a light outlet, and the outer wall of the frame 141 is provided with heat dissipation fins 142 (see fig. 1), so as to ensure that the temperature of the ellipsoidal mirrors 143 is not too high during operation, and prevent the ellipsoidal mirrors 143 from deforming due to the too high temperature and affecting the use effect.
Two ellipsoidal mirrors 143 are respectively installed at opposite sides in the frame 141, and the ellipsoidal mirrors 143 are used to reflect the ultraviolet light emitted from the plasma lamp tube 110 toward the light outlet. The two ellipsoidal mirrors 143 maximize the energy coupling to the focuser 150 and transfer the rf energy to the luminescent material.
The rf electrodeless excimer lamp 100 provided in this embodiment may take various formsThe electric field intensity formed inside the focuser 150 is more than 107The high-density radio frequency electric field of V/m can reach 10 theoretically8V/m, and improves the luminous efficiency of ultraviolet light.
Referring to fig. 5, in a first form of the focalizer 150 adopted in the present embodiment, the focalizer 150 includes a bottom cover 151, an upper cover 152, a radio frequency antenna 153 and a metal pillar 154, wherein the bottom cover 151 and the upper cover 152 are both made of a conductive material, the upper cover 152 is connected to the bottom cover 151, the radio frequency antenna 153 penetrates through the bottom cover 151 and is connected to the upper cover 152, an insulating material is filled between the radio frequency antenna 153 and the bottom cover 151, the metal pillar 154 penetrates through the upper cover 152 and is connected to the bottom cover 151, and the metal pillar 154 and the upper cover 152 are disposed at an interval.
Specifically, the metal column 154 includes a first section 1541 and a second section 1542, the second section 1542 is far away from the bottom cover 151 relative to the first section 1541 and extends from the upper cover 152, the diameter of the second section 1542 is larger than that of the first section 1541, a groove is formed at an end of the second section 1542, and the plasma lamp tube 110 is installed in the groove.
The upper cover 152 is in a stepped cylindrical shape, the upper cover 152 includes a first circular sidewall 1521, a circular sidewall 1522 and a second circular sidewall 1523, wherein the first circular sidewall 1521 is vertically connected to the bottom cover 151 and surrounds the rf antenna 153 and the metal column 154, the outer peripheral surface of the circular sidewall 1522 is connected to one end of the first circular sidewall 1521, the circular sidewall 1522 is parallel to the bottom cover 151, the rf antenna 153 is connected to the circular sidewall 1522, the second circular sidewall 1523 is connected to the inner peripheral surface of the circular sidewall 1522, and the second circular sidewall 1523 surrounds the metal column 154 and is spaced from the metal column 154.
The axial length of first circular sidewall 1521 is greater than or equal to the length of first segment 1541, first circular sidewall 1521 and first segment 1541 form a first-stage annular capacitor, the axial length of second circular sidewall 1523 is less than or equal to the length of second segment 1542, and second circular sidewall 1523 and second segment 1542 form a second-stage annular capacitor.
Thus, the upper cover 152 and the bottom cover 151 are connected to form a rf focusing cavity, the rf antenna 153 is connected to the upper cover 152, the metal pillar 154 penetrates through the upper cover 152 and is connected to the bottom cover 151, the upper cover 152 and the metal pillar 154 form an annular capacitor structure, rf energy is fed into the rf focusing cavity of the annular capacitor structure by the rf antenna 153, and an electromagnetic field is formed, so that electromagnetic field energy can be effectively coupled and focused on a region where the plasma lamp tube 110 is located, so that the plasma lamp tube 110 emits light, moreover, the metal pillar 154 as a whole has a structural form with a thick upper portion and a thin middle portion, a diameter of a first-stage annular capacitor formed by the first section 1541 and the first circular side wall 1521 is larger than a diameter of a second-stage annular capacitor formed by the second section 1542 and the second circular side wall 1523, so that electromagnetic field energy can undergo coupling of multi-stage annular capacitors, thereby increasing an electric field intensity focused on the region where the, thereby increasing the conversion rate of energy and enhancing the luminous intensity of the plasma lamp tube 110.
Referring to fig. 6, in the focusing device 150 of the second form adopted in the present embodiment, the focusing device 150 includes a housing 155, an rf antenna 153 and a metal column 154, wherein the housing 155 is a cylindrical structure, a cylindrical cavity is formed in the housing 155, the rf antenna 153 penetrates through the housing 155 along an axial direction of the housing 155 and penetrates through the cylindrical cavity, the rf antenna 153 is eccentrically disposed with respect to the axial line of the housing 155, the metal column 154 penetrates through the housing 155 along the axial direction of the housing 155 and penetrates through the cylindrical cavity, the metal column 154 is eccentrically disposed with respect to the axial line of the housing 155, and the rf antenna 153 and the metal column 154 are respectively located at two opposite sides of the axial line of the housing 155. The end of the metal post 154 extending out of the housing 155 is recessed and the plasma lamp 110 is mounted in the recess.
Like this, casing 155 is cylindrical structure, radio frequency antenna 153 and metal post 154 are for the eccentric setting of the axis of casing 155, for metal post 154 and casing 155 coaxial arrangement, in this embodiment, can make full use of the cross sectional area of casing 155 or cylindrical cavity, the space that radio frequency antenna 153 and metal post 154 occupy is less, can design casing 155 more miniaturized, and improve the conversion rate of radio frequency energy, and, after casing 155's size dwindles, the length of metal post 154 can be designed littleer, like this, metal post 154 receives environmental shock to influence and reduces, the stability and the life of equipment work have been improved, and avoid the complicated radio frequency energy transmission process who brings of structure to damage too big defect, improve the radio frequency energy conversion rate.
The working principle of the radio frequency electrodeless excimer curing lamp 100 provided by the embodiment is as follows: the two radio frequency sources 120 respectively generate radio frequency energy and input the radio frequency energy into the two focalizers 150, the two focalizers 150 respectively focus the energy into the plasma lamp tube 110, a luminescent substance in the plasma lamp tube 110 emits light by ionization, the plasma lamp tube 110 is positioned at the focal position of an ellipsoidal cylindrical reflector formed by the two ellipsoidal mirrors 143, and the ellipsoidal mirrors 143 reflect ultraviolet light emitted by the plasma lamp tube 110 to a light outlet and form strip-shaped light spots to act on an object to be illuminated.
The radio frequency electrodeless excimer lamp 100 provided by the embodiment of the invention is excited to generate excimer ultraviolet light output of 172nm, which is different from any existing excimer generation mode. The radio frequency electrodeless excimer curing lamp 100 provided by the embodiment emits vacuum ultraviolet rays with the central wavelength of 172nm, and is an incoherent, large-area and high-power domestic excimer ultraviolet curing light source required by the large-scale UV industry.
The radio frequency electrodeless excimer curing lamp 100 provided by the embodiment can be applied to large-scale UV curing equipment, and the acrylate in the UV coating formula does not need to be added with a photoinitiator, so that all adverse effects caused by the use of the photoinitiator are avoided, and the UV curing effect with a matte surface can be realized.
The present embodiment provides the beneficial effects of the rf electrodeless excimer curing lamp 100, including:
1. the plasma lamp tube 110 is an electrodeless light source, and because no high-voltage electrode is arranged in the plasma lamp tube, no chemical reaction exists between gas in the lamp tube and the electrode, the output light energy is stable, the intensity is high, and the service life of the lamp tube is greatly prolonged;
2. if one focuser 150 is used, the plasma luminous energy in the longer plasma lamp tube 110 is unevenly distributed, the side closer to the focuser 150 is strong, and the side far away from the focuser 150 is weak, two focusers 150 are respectively arranged at two ends of the plasma lamp tube 110 and simultaneously provide energy for the plasma lamp tube 110, so that the luminous substance in the plasma lamp tube 110 is positioned in the focusing area of the focuser 150 as much as possible, the luminous substance can be evenly and fully excited, the deviation between the strongest position and the weakest position in the plasma lamp tube 110 is within 15%, the luminous uniformity is improved, indirectly, the strip-shaped light spots focused by the ellipsoidal cylindrical reflector are also more uniform, and all parts on the surface of an irradiated object can obtain more uniform 172nm ultraviolet radiation;
3. the radiator 130 in the liquid cooling mode is used for cooling, vibration is smaller than that of air cooling by a fan, light spots cannot shake slightly, impurities such as dust cannot be blown, the surface of an irradiated object is kept clean, and equipment can also work normally in a vacuum environment;
4. by using the specially designed focuser 150, the electric field intensity greater than 10 is formed inside the focuser 1507The high-density radio frequency electric field of V/m can reach 10 theoretically8V/m, which is a main factor for realizing the improvement of the luminous efficiency of the ultraviolet light;
5. the radio frequency electrodeless excimer lamp 100 has high optical power density, smaller structural size, rapid start and more stable work.
The above embodiments are only specific embodiments of the present invention, but the scope of the present invention is not limited thereto, and any changes or substitutions that can be easily conceived by those skilled in the art within the technical scope of the present invention should be covered by the scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the protection scope of the claims.
Claims (10)
1. A radio frequency electrodeless excimer curing lamp, comprising:
the plasma lamp tube (110), the luminescent material for ionization excitation is filled in the plasma lamp tube (110), and the luminescent material is used for emitting ultraviolet light;
two focalizers (150) respectively installed at two ends of the plasma lamp tube (110), wherein the luminescent substance is at least partially located in a focusing area of the focalizers (150);
two radio frequency sources (120) respectively mounted on the two focalizers (150);
the reflector (140) is covered on the plasma lamp tube (110), and the reflector (140) is used for adjusting the irradiation direction of the plasma lamp tube (110).
2. The radio frequency electrodeless excimer curing lamp of claim 1, wherein the reflector (140) comprises:
a frame (141) covering the plasma lamp tube (110), wherein the frame (141) is provided with a light outlet;
the plasma lamp tube comprises two ellipsoidal mirrors (143) which are respectively arranged on two opposite sides in the frame (141), the plasma lamp tube (110) is positioned at the focal position of an ellipsoidal cylindrical reflector formed by the two ellipsoidal mirrors (143), and the ellipsoidal mirrors (143) are used for reflecting ultraviolet light emitted by the plasma lamp tube (110) to the light outlet and forming strip-shaped light spots to act on an object to be irradiated.
3. The rf electrodeless excimer curing lamp of claim 2, wherein the frame (141) is provided with heat dissipating fins (142) on an outer wall thereof.
4. The rf electrodeless excimer curing lamp of claim 1, further comprising:
two radiators (130) respectively mounted on the two radio frequency sources (120), wherein the radiators (130) are used for radiating the radio frequency sources (120).
5. The radio frequency electrodeless excimer curing lamp of claim 4, wherein the heat sink (130) comprises:
a base (131) mounted on the radio frequency source (120);
a heat radiating pipe (132) mounted on the base body (131), the heat radiating pipe (132) being in a bent form;
an inlet joint (133) installed at one end of the radiating pipe (132), the inlet joint (133) being used for receiving a cooling liquid;
an outlet connector (134) installed at the other end of the radiating pipe (132), the outlet connector (134) for discharging the coolant.
6. The radio frequency electrodeless excimer curing lamp of claim 1, wherein the focuser (150) comprises:
a bottom cover (151) made of a conductive material;
the upper cover (152) is made of a conductive material, and the upper cover (152) is connected with the bottom cover (151);
a radio frequency antenna (153) penetrating through the bottom cover (151) and connected to the upper cover (152), wherein an insulating material is filled between the radio frequency antenna (153) and the bottom cover (151);
the metal column (154) penetrates through the upper cover (152) and is connected to the bottom cover (151), the metal column (154) and the upper cover (152) are arranged at intervals, the metal column (154) comprises a first section (1541) and a second section (1542), the second section (1542) is far away from the bottom cover (151) relative to the first section (1541) and extends out of the upper cover (152), the diameter of the second section (1542) is larger than that of the first section (1541), a groove is formed in the end portion of the second section (1542), and the plasma lamp tube (110) is installed in the groove.
7. The rf electrodeless excimer curing lamp of claim 6, wherein the upper cover (152) is a stepped cylinder, the upper cover (152) comprising:
a first circular sidewall (1521) vertically connected to the bottom cover (151) and surrounding the RF antenna (153) and the metal post (154);
the outer peripheral surface of the circular side wall (1522) is connected to one end of the first circular side wall (1521), the circular side wall (1522) is parallel to the bottom cover (151), and the radio frequency antenna (153) is connected to the circular side wall (1522);
and a second circular side wall (1523) connected to the inner circumferential surface of the circular side wall (1522), wherein the second circular side wall (1523) surrounds the metal post (154) and is arranged at an interval from the metal post (154).
8. The radio frequency electrodeless excimer curing lamp of claim 7, wherein the axial length of the first circular sidewall (1521) is greater than or equal to the length of the first segment (1541), the first circular sidewall (1521) forms a first stage annular capacitance with the first segment (1541), the axial length of the second circular sidewall (1523) is less than or equal to the length of the second segment (1542), and the second circular sidewall (1523) forms a second stage annular capacitance with the second segment (1542).
9. The radio frequency electrodeless excimer curing lamp of claim 1, wherein the focuser (150) comprises:
the shell (155), the shell (155) is a cylindrical structure, and the shell (155) is internally provided with a cylindrical cavity;
a radio frequency antenna (153) penetrating the housing (155) in an axial direction of the housing (155) and passing through the cylindrical cavity, the radio frequency antenna (153) being eccentrically disposed with respect to an axis of the housing (155);
the metal column (154) penetrates through the shell (155) along the axial direction of the shell (155) and penetrates through the cylindrical cavity, the metal column (154) is eccentrically arranged relative to the axial line of the shell (155), a groove is formed in one end, extending out of the shell (155), of the metal column (154), and the plasma lamp is installed in the groove.
10. The rf electrodeless excimer curing lamp of claim 9, wherein the rf antenna (153) and the metal post (154) are located on opposite sides of an axis of the housing (155).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202023252806.XU CN213583699U (en) | 2020-12-29 | 2020-12-29 | Radio frequency electrodeless excimer curing lamp |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202023252806.XU CN213583699U (en) | 2020-12-29 | 2020-12-29 | Radio frequency electrodeless excimer curing lamp |
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| CN213583699U true CN213583699U (en) | 2021-06-29 |
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| CN202023252806.XU Active CN213583699U (en) | 2020-12-29 | 2020-12-29 | Radio frequency electrodeless excimer curing lamp |
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