CN213558591U - Wiping device - Google Patents

Abstract

The utility model relates to the technical field of cleaning equipment, and discloses a wiping device, which comprises a frame; the discharging platform is arranged on the rack and used for bearing the substrate; the wiping mechanism is arranged on the rack and comprises a wiping head and a flexible wiping body conveying mechanism, and the wiping mechanism can move relative to the discharging platform along the X-axis direction, the Y-axis direction and the Z-axis direction; and the fixing assembly is arranged on the rack or the material placing platform and is configured to fix the substrate on the material placing platform. The wiping device can enable the wiping head to wipe the substrate locally; the fixed component is arranged on the rack or the discharging platform, the substrate can be fixed on the discharging platform through the fixed component, when the cleaning head is used for local cleaning, the movement of the substrate is avoided, and the cleaning effect is improved.

Description

Wiping device

Technical Field

The utility model relates to a cleaning device technical field especially relates to a wiping equipment.

Background

In the prior art, the hard substrate is usually wiped on the whole surface, and the substrate is not required to be locally positioned in the wiping process. However, in the actual production process, if the base material is not fixed, the base material is easily forced to slide to change the relative position with the wiping head in the local wiping process, and further the wiping effect is affected, especially for the flexible base material. Therefore, it is desirable to design a wiping device that can achieve partial wiping and can fix a substrate to prevent displacement during the partial wiping.

SUMMERY OF THE UTILITY MODEL

An object of the utility model is to provide a wiping equipment can realize the part and clean, can fix the substrate moreover, prevents to clean the in-process at the part and takes place the displacement.

To achieve the purpose, the utility model adopts the following technical proposal:

the utility model provides a wiping equipment, include:

a frame;

the discharging platform is arranged on the rack and used for bearing a substrate;

the wiping mechanism is arranged on the rack and comprises a wiping head and a flexible wiping body conveying mechanism, the wiping head can move relative to the discharging platform along the directions of an X axis, a Y axis and a Z axis, and a flexible wiping body of the flexible wiping body conveying mechanism is wound on the wiping head; and

the fixing assembly is arranged on the rack or the discharging platform and is configured to fix the substrate on the discharging platform.

The wiping equipment can bear the base material through the discharging platform, and the wiping mechanism can move relative to the discharging platform along the X-axis direction, the Y-axis direction and the Z-axis direction, so that the wiping head can wipe the base material locally; the flexible wiping body of the flexible wiping body conveying mechanism is wound on the wiping head, so that the wiping head can clean the base material during wiping; the fixed component is arranged on the rack or the discharging platform, the substrate can be fixed on the discharging platform through the fixed component, when the cleaning head is used for local cleaning, the movement of the substrate is avoided, and the cleaning effect is improved.

As a preferable mode of the above wiping apparatus, the fixing member includes:

the pressing plate is arranged on the rack or the discharging platform and can move along the Z-axis direction.

As a preferable scheme of the above wiping device, the fixing component further includes a pressing block, the pressing block is selectively magnetically matched with the pressing plate or the discharging platform, the pressing plate and the discharging platform are both electromagnets, the pressing block is a magnet, both the pressing plate and the discharging platform can be charged with current to generate a magnetic field, and the direction of the current charged into the pressing plate or the discharging platform is changed to change the magnetic field direction, so that the pressing block is selectively magnetically matched with the pressing plate or the discharging platform.

The direction of current passing through the pressing plate or the discharging platform is changed to change the direction of the magnetic field, and then the magnetic attraction cooperation of the pressing block and the pressing plate or the discharging platform is switched, so that the substrate is pressed on the discharging platform or separated from the discharging platform, and the control is convenient.

As a preferable scheme of the wiping device, the emptying platform is fixed on the rack; or

The discharging platform is movably arranged on the rack along the Y-axis direction, and the wiping mechanism can move relative to the rack along the X-axis and the Z-axis.

As a preferable mode of the above wiping apparatus, the fixing member further includes:

the fixed frame is connected with the rack or the material placing platform; and

a driving mechanism disposed on the fixing frame, the driving mechanism being configured to drive the platen to move in a Z-axis direction.

The pressure assembly is convenient to be connected with the rack or the discharging platform through the fixing frame, and the driving mechanism can drive the pressing plate to move along the Z-axis direction, so that the pressing block is magnetically attracted to the substrate, or the pressing block is separated from the substrate and is magnetically attracted to the pressing plate.

As a preferable mode of the above wiping device, the fixing component is a vacuum adsorption component for adsorbing the substrate onto the discharge platform.

The fixed subassembly is the vacuum adsorption subassembly to adsorb the substrate on the blowing platform, this fixed subassembly avoids producing mechanical damage to the substrate.

As a preferable mode of the above wiping apparatus, a positioning assembly is provided on the discharge platform, and the positioning assembly is configured to position the substrate on the discharge platform.

The setting of locating component is convenient for fix a position the substrate, makes the substrate install fast on the blowing platform.

As a preferable aspect of the wiping apparatus described above, the flexible wiping body transport mechanism includes:

a wiping frame;

the feeding reel is rotationally arranged on the wiping frame;

the material receiving reel is rotatably arranged on the wiping frame; and

the tensioning assembly is arranged on the wiping frame and used for tensioning the flexible wiping body;

the flexible wiping body is wound on the feeding reel and the receiving reel, and the wiping head can push the flexible wiping body to the base material.

The flexible wiping body conveying mechanism realizes the releasing and rolling actions of the flexible wiping body through the rotation of the feeding reel and the receiving reel, and the flexible wiping body is tensioned through the tensioning assembly, so that when the wiping head abuts against the flexible wiping body to press the base material, the base material can be wiped through the flexible wiping body.

As a preferable mode of the above wiping apparatus, when the wiping head moves in the X-axis direction relative to the substrate, the width of the wiping area of the wiping head is n, and the wiping length of the wiping head is a; when the wiping head moves relative to the base material along the Y-axis direction, the width of a wiping area of the wiping head is m, the wiping length of the wiping head is b, wherein n is less than or equal to a, and m is less than or equal to b.

The utility model also provides a wiping equipment, include:

a frame;

the discharging platform is arranged on the rack and used for bearing a substrate;

the fixed seat is arranged on the rack;

the rotating arm is rotatably arranged on the fixed seat around a first axis;

the wiping mechanism is arranged on the rotating arm in a rotating mode around a second axis and can move along the Z-axis direction relative to the rotating arm, the wiping mechanism comprises a wiping head and a flexible wiping body conveying mechanism, and a flexible wiping body of the flexible wiping body conveying mechanism is wound on the wiping head; and

the fixing assembly is arranged on the rack or the discharging platform and is configured to fix the substrate on the discharging platform.

The wiping device rotates around a first axis through the rotating arm, the wiping mechanism rotates around a second axis, and the wiping mechanism can move along the Z-axis direction relative to the rotating arm so as to realize that the wiping head wipes the substrate locally; the flexible wiping body of the flexible wiping body conveying mechanism is wound on the wiping head, so that the wiping head can clean the base material conveniently; the fixed component is arranged on the rack or the discharging platform, the substrate can be fixed on the discharging platform through the fixed component, when the cleaning head is used for local cleaning, the movement of the substrate is avoided, and the cleaning effect is improved.

The utility model has the advantages that:

the wiping equipment provided by the utility model can enable the wiping head to wipe the local part of the substrate; the flexible wiping body of the flexible wiping body conveying mechanism is wound on the wiping head, so that the wiping head can clean the base material conveniently; the fixed component is arranged on the rack or the discharging platform, the substrate can be fixed on the discharging platform through the fixed component, when the cleaning head is used for local cleaning, the movement of the substrate is avoided, and the cleaning effect is improved.

Drawings

Fig. 1 is a schematic structural diagram of a wiping device according to an embodiment of the present invention;

fig. 2 is a schematic structural diagram of a wiping apparatus provided in an embodiment of the present invention with a cover removed;

fig. 3 is a schematic structural view of a material placing platform, a fixing assembly and a waste collecting device according to a first embodiment of the present invention;

fig. 4 is a schematic structural diagram of a fixing assembly according to an embodiment of the present invention;

fig. 5 is a schematic structural diagram of a wiping mechanism according to an embodiment of the present invention;

fig. 6 is a schematic structural diagram of a wiping process of a wiping head according to a second embodiment of the present invention.

In the figure:

1. a frame;

2. a material placing platform; 21. a positioning assembly;

3. a wiping mechanism; 31. a wiping head; 32. a flexible wiping body transport mechanism; 321. a wiping frame; 322. feeding and coiling; 323. a material receiving reel; 324. a limiting member; 325. a first pinch roller; 326. a second pinch roller;

4. a wiping liquid conveying mechanism; 41. a wiping liquid storage mechanism;

5. a fixing assembly; 51. pressing a plate; 53. a fixed mount; 54. a drive mechanism;

6. a waste collection device; 7. an X-axis linear slide rail; 8. a Z-axis drive mechanism; 9. slide rail fixing base.

Detailed Description

In order to make the technical problems, technical solutions and technical effects achieved by the present invention more clear, the embodiments of the present invention will be described in further detail with reference to the accompanying drawings, and obviously, the described embodiments are only some embodiments, not all embodiments of the present invention. Based on the embodiments in the present invention, all other embodiments obtained by those skilled in the art without creative efforts belong to the protection scope of the present invention.

In the description of the present invention, unless expressly stated or limited otherwise, the terms "connected," "connected," and "fixed" are to be construed broadly, e.g., as meaning permanently connected, detachably connected, or integral to one another; can be mechanically or electrically connected; either directly or indirectly through intervening media, either internally or in any other relationship. The specific meaning of the above terms in the present invention can be understood according to specific situations by those skilled in the art.

In the present disclosure, unless expressly stated or limited otherwise, the first feature "on" or "under" the second feature may comprise direct contact between the first and second features, or may comprise contact between the first and second features not directly. Also, the first feature being "on," "above" and "over" the second feature includes the first feature being directly on and obliquely above the second feature, or merely indicating that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature includes the first feature being directly under and obliquely below the second feature, or simply meaning that the first feature is at a lesser elevation than the second feature.

The first embodiment is as follows:

the embodiment provides a wiping device, as shown in fig. 1 and 2, the wiping device includes a frame 1, and a material placing platform 2, a wiping mechanism 3 and a fixing component 5 which are arranged on the frame 1, a cover body is arranged on the frame 1, the material placing platform 2, the wiping mechanism 3 and the fixing component 5 can be covered by the cover body, the appearance is attractive, and the internal mechanism is protected. Blowing platform 2 is used for bearing the weight of the substrate, cleans mechanism 3 and is used for cleaning the part of substrate, and fixed subassembly 5 sets up in frame 1 or on blowing platform 2, can fix the substrate, prevents that the substrate from removing at the cleaning in-process.

As shown in fig. 1 and 2, a slide rail fixing seat 9 is arranged on the rack 1, an X-axis linear slide rail 7 and a mounting rack are arranged on the slide rail fixing seat 9, the mounting rack is arranged on one side of the X-axis linear slide rail 7, an X-axis servo motor is arranged on the mounting rack, the X-axis servo motor is connected with a lead screw through a coupling, a Z-axis driving mechanism 8 is arranged on the X-axis linear slide rail in a sliding manner and is connected with the lead screw in a rotating manner, and an output end of the Z-axis driving mechanism 8 is connected with. The lead screw is driven to rotate through the X-axis servo motor so as to drive the Z-axis driving mechanism 8 and the wiping mechanism 3 to move along the X-axis direction, and the Z-axis driving mechanism 8 can drive the wiping mechanism 3 to move along the Z-axis direction so as to realize the movement of the wiping mechanism 3 along the X-axis direction and the Z-axis direction.

Optionally, the discharging platform 2 is arranged on the rack 1 in a moving mode along the Y-axis direction, the arrangement enables the wiping head 31 to move in three dimensions of the X-axis, the Y-axis and the Z-axis relative to the discharging platform 2, and meanwhile when material loading and unloading are needed, the discharging platform 2 can be conveniently moved out along the Y-axis direction, so that the more convenient material loading and unloading process is achieved. The discharging platform 2 is arranged on the rack 1 in a moving mode along the Y-axis direction, so that the wiping head 31 does not need to move along the Y-axis direction, and the complexity of a driving device of the wiping head 31 is reduced.

Further, as shown in fig. 3, to solve the problem of inaccurate positioning when the discharging platform 2 discharges materials, a positioning assembly 21 is disposed on the discharging platform 2, and the positioning assembly 21 is used for positioning the substrate on the discharging platform 2. Optionally, a plurality of positioning assemblies 21 may be disposed on the discharge platform 2, and the substrate may be positioned by the plurality of positioning assemblies 21, so as to improve the positioning accuracy. The positioning component 21 may be a positioning block disposed on the discharging component, and in fig. 1, the positioning block is disposed on the discharging platform 2 so as to position the edge of the substrate. Of course, the arrangement of the specific positioning block can be set according to actual requirements. Preferably, the position of the positioning block is adjustable, and the positioning of the substrates with different sizes is realized by adjusting the position of the positioning block.

In order to avoid the position deviation of the substrate in the wiping process, the fixing component 5 is fixedly arranged on the machine frame 1, the fixing component 5 is used for fixing the substrate on the discharging platform 2, when the wiping head 31 carries out local wiping, the substrate is prevented from moving, and the wiping effect is improved.

As shown in fig. 3 and 4, the fixing assembly 5 includes a fixing frame 53, a pressing plate 51 and a driving mechanism 54, the fixing frame 53 is disposed on the frame 1, the pressing plate 51 is connected to the fixing frame 53 through the driving mechanism 54, and the driving mechanism 54 drives the pressing plate 51 to move along the Z-axis direction, so as to press the substrate against the placing platform 2.

Alternatively, the platen 51 of a different shape may be replaced according to the type of the substrate, the platen 51 having a regular shape, such as a square, a circle, an arc, etc., may be selected, and the platen 51 having a profiled shape may also be selected. The shape of the pressure plate 51 may be set as required.

The number and placement of the corresponding platens 51 will vary for substrates requiring different wiping areas. Since there may be many variations in the wiping area, such as a flat surface, a groove, a protrusion, etc., when the platen 51 is provided in plural, the platen 51 may be selected for use according to the actual condition of the substrate, and when the platen 51 is provided in plural, the distance between the platens 51 is determined according to the size of the wiping area. The problem of the changeable shape and size of the wiping area can be realized by designing the shape of the wiping head 31. Specifically, when the wiping area is located at the periphery of the substrate, the platen 51 may be fixed inside the area to be wiped. When the wiping area is located at the center portion of the substrate, the pressing plate 51 may be fixed to the side of the area to be wiped. Preferably, two pressing plates 51 may be arranged to respectively press against two sides of the area to be wiped so as to fix the substrate firmly, and the distance between the two pressing plates 51 is determined according to the size of the wiping area.

In other embodiments, the fixing assembly 5 may also be a vacuum adsorption assembly for adsorbing the substrate onto the discharge platform 2. Through set up the vacuum adsorption subassembly on blowing platform 2 in order to adsorb the substrate on blowing platform 2, specific structure belongs to conventional technique, no longer gives details here. The fixing component 5 is a vacuum adsorption component, so that the substrate is adsorbed on the discharging platform 2, and the fixing component 5 avoids mechanical damage to the substrate. Of course, the fixing assembly 5 can be provided in the above two ways to facilitate the user to select and use, or can be used at the same time to improve the fixing effect.

As shown in fig. 5, the wiping mechanism 3 further includes a flexible wiping body transfer mechanism 32, and the flexible wiping body of the flexible wiping body transfer mechanism 32 is wound on the wiping head 31, so that when the wiping head 31 wipes, wiping liquid flows into the flexible wiping body, thereby facilitating the cleaning of the substrate.

Alternatively, the wiping head 31 can be designed to match the shape of the designated area, so as to optimize the wiping effect. In order to improve the wiping efficiency, a plurality of wiping heads 31 may be provided, and each wiping head 31 may be driven by a separate driving device, so that the plurality of wiping heads 31 may be wiped separately and flexibly used.

To the problem that wiping head 31 and substrate surface contact distance and pressure can't accurate control, solve this problem through setting up inductor and CCD on wiping head 31, specific inductor and CCD's setting belongs to conventional technology, no longer gives unnecessary details here.

As shown in fig. 5, the flexible wiping body conveying mechanism 32 includes a wiping frame 321, a feeding reel 322, a receiving reel 323, and a tensioning assembly, the feeding reel 322 is rotatably disposed on the wiping frame 321, the receiving reel 323 is rotatably disposed on the wiping frame 321, the tensioning assembly is disposed on the wiping frame 321 for tensioning the flexible wiping body, the flexible wiping body is wound on the feeding reel 322 and the receiving reel 323, and the wiping head 31 can push the flexible wiping body against the substrate. The flexible wiping body transmission mechanism 32 realizes the releasing and rolling actions of the flexible wiping body through the rotation of the feeding reel 322 and the receiving reel 323, so that when the wiping head 31 presses the flexible wiping body against the base material, the base material can be wiped through the flexible wiping body.

Specifically, the tensioning assembly comprises a first pinch roller 325 and a second pinch roller 326, the first pinch roller 325 is rotatably arranged on the wiping frame 321, the second pinch roller 326 is rotatably arranged on the pressing cylinder, the flexible wiping body is positioned between the first pinch roller 325 and the second pinch roller 326, and the flexible wiping body is pressed between the first pinch roller 325 and the second pinch roller 326 through the pressing cylinder so as to tension the flexible wiping body. The pressing cylinder controls the pressing and releasing of the second pressing wheel 326, and the rolling and updating of the incoming materials of the flexible wiping body are accurately controlled through a sensor.

Optionally, stoppers 324 are disposed on two sides of the wiping head 31, and the flexible wiping body is inserted into the stoppers 324 to prevent the flexible wiping body from shifting.

Optionally, the flexible wiping body is wiping cloth, the material of the wiping cloth can be determined according to the material of a substrate to be wiped, preferably, cloth with good toughness, such as metal cloth, fiber cloth, nylon cloth, and the like, the wiping solution can be determined according to the material to be wiped, the material and hardness of the wiping head 31 can be determined according to wiping requirements, and preferably, the wiping head 31 is made of plastic material, the hardness is 50-80 shore hardness, so that the substrate is prevented from being scratched due to the fact that the wiping head 31 is too hard; too soft a friction force does not meet the requirements, so that the wiping effect is poor.

As shown in fig. 1 and 2, the wiping apparatus may further include a wiping liquid delivery mechanism 4, and the wiping liquid delivery mechanism 4 is used for delivering wiping liquid to the position of the wiping head 31 of the wiping mechanism 3 to clean the substrate. Wiping liquid conveying mechanism 4 is including wiping liquid storage mechanism 41 and wiping liquid conveying line, wiping liquid storage mechanism 41 is used for storing wiping liquid, it enters the mouth and wipes the liquid export to be provided with wiping liquid on the wiping head 31, the flexible body of wiping of flexible body transport mechanism 32 is around establishing the liquid export of wiping at wiping head 31, wiping liquid storage mechanism 41 is linked together with wiping liquid entry through wiping liquid conveying line, be provided with the control valve on the wiping liquid conveying line, can control the switching and the flow size of the wiping liquid of inputing in wiping head 31 through carrying the control valve, it is comparatively convenient to control.

As shown in fig. 3, the wiping device further includes a waste collecting device 6, the waste collecting device 6 is disposed on the frame 1 and located on one side of the material placing platform 2, and the waste collecting device 6 can collect the product to wipe the residual waste material, so as to realize timely collection and cleaning. Optionally, an air blowing system is provided within the platen 51, by which wiped waste is blown off the substrate surface into the waste collection device 6.

In this embodiment, the discharge platform 2, the wiping mechanism 3, the driving mechanism 54, and the Z-axis driving mechanism 8 are all electrically connected to the control device, and the automatic operation of wiping the substrate is realized by the control of the control device.

Wiping process:

the feeding platform 2 is controlled to move along the positive direction of the Y axis through a program, a substrate to be wiped is placed on the feeding platform 2, the control device controls the pressing plate 51 to press down to press the substrate on the feeding platform 2, at the moment, vacuum adsorption is started to fix the substrate, the feeding platform 2 moves to the position near the lower part of the wiping head 31 in the negative direction of the Y axis, a corresponding wiping program is started, the wiping head 31 presses down to the position above a substrate wiping area to be wiped, the substrate wiping platform moves along an appointed path, and wiping of the appointed area is completed through the friction effect of the wiping head 31 and the wiping area.

Example two:

since the fixing component in the first embodiment is fixed on the frame, once the substrate is pressed under the pressing plate, the motion of the discharging platform along the Y-axis direction is limited. Therefore, although the motion device of the wiping head is in three-axis linkage, when the wiping action is actually executed, only the linear wiping action can be completed.

The present embodiment provides an apparatus capable of realizing curve wiping, which is different from the first embodiment in that in the present embodiment, a slide rail fixing seat of an X-axis driving mechanism supporting a wiping mechanism is movable along a Y-axis.

When the wiping path is a curve, the wiping head moves along the X-axis direction, and meanwhile, the sliding rail of the X-axis driving mechanism supporting the wiping mechanism is fixed to move along the Y-axis, so that curve wiping is completed.

As shown in fig. 6, while the wiping head 31 is moved in the X-axis direction, the wiping area of the wiping head 31 has a width n and the effective wiping length of the wiping head 31 is a; when the wiping head 31 moves longitudinally along the Y axis relative to the base material, the wiping area width of the wiping head 31 is m, the effective wiping length of the wiping head 31 is b, further, n is less than or equal to a, and m is less than or equal to b.

Example three:

the present embodiment provides a device capable of realizing curvilinear wiping, which is different from the first embodiment in that in the present embodiment, the fixing component is configured to be movable along the Y-axis. For example, a Y-axis guide rail is arranged at a fixed frame of the fixed assembly, the fixed frame is connected with the guide rail in a sliding manner, and a corresponding servo motor is arranged, so that the Y-axis movement of the fixed assembly is realized.

When the wiping path is a curve, the wiping head moves along the X-axis direction, and the discharging platform 2 can simultaneously drive the substrate and the pressing plate to move along the Y-axis relative to the table-board, so that the curve wiping is completed.

Example four:

the embodiment provides a wiping device, which is different from the first embodiment in that in the first embodiment, a structure of a fixing assembly is different from that of the first embodiment, the fixing assembly includes a fixing frame, a pressing plate, a pressing block and a driving mechanism, the fixing frame is disposed on the discharging platform, the pressing plate is connected to the fixing frame through the driving mechanism, and the driving mechanism drives the pressing plate to move along the Z-axis direction. The briquetting selectivity is in magnetic attraction cooperation with clamp plate or blowing platform to make briquetting magnetic attraction in blowing platform or magnetic attraction in the clamp plate, this setting can be according to the demand selectivity with the substrate support pressure on blowing platform.

Specifically, the pressing plate and the discharging platform are both electromagnets, the pressing block is a magnet, current is introduced into the pressing plate and the discharging platform to generate a magnetic field, and the direction of the magnetic field is changed by changing the direction of the current introduced into the pressing plate or the discharging platform, so that the pressing block is selectively matched with the pressing plate or the discharging platform in a magnetic attraction mode. The direction of current led into the pressing plate or the discharging platform is changed to switch the magnetic attraction matching of the pressing block and the pressing plate or the discharging platform, and the control is convenient.

Usually briquetting and clamp plate electromagnetism are inhaled mutually, let in forward current in the clamp plate this moment, when the substrate removes to clean the head below and need carry out the curve and clean, the clamp plate pushes down, the briquetting supports presses down to pushing down the substrate on the substrate after, this moment, lead to reverse current for the clamp plate, lead to forward current for the blowing platform, the rule gives the electro-magnet circular current after, it is forward current to inhale then the current with the magnet mutually, repel then the current is reverse current with the magnet mutually, the briquetting is inhaled with blowing platform looks magnetism, with the clamp plate phase separation, the clamp plate lifts up this moment, support the substrate through the briquetting and press on the blowing platform. After the curve wiping action is finished, the pressing plate is pressed downwards and is in contact with the pressing block, forward current is conducted to the pressing plate, reverse current is conducted to the discharging platform, and the pressing plate can suck the pressing block so that the pressing block can be conveniently retracted.

Wiping process:

the cleaning device comprises a program control material placing platform, a control device, a pressing plate, a pressing block, a vacuum adsorption fixing base material, a cleaning head and a cleaning head, wherein the program control material placing platform extends the positive direction of a Y axis to move, the base material to be cleaned is placed on the material placing platform, the control device controls the pressing plate to press downwards and leads reverse current to the pressing plate, the positive platform leads the positive platform to the material placing platform, the pressing block supports the base material to be pressed on the material placing platform, the vacuum adsorption fixing base material is started at the moment, the material placing platform moves to the position near the lower part of the cleaning head in the negative direction of the Y axis, a corresponding cleaning program is started.

Example five:

the present embodiment provides a wiping apparatus, which is different from the first embodiment in that the wiping head can move along the X-axis, the Y-axis and the Z-axis relative to the frame in the present embodiment, and the discharging platform is fixedly disposed on the frame. The specific manner of moving the wiping head in the three-dimensional direction can be realized by a linkage manner of three axes, four axes, five axes and the like, and the specific structure is not particularly limited herein as long as the wiping head can move in the three-dimensional direction.

Example six:

this embodiment provides a wiping equipment, which comprises a frame, the blowing platform, a fixed base, wiping mechanism, clean liquid conveying mechanism and fixed subassembly, the blowing platform sets up in the frame, the blowing platform is used for bearing the substrate, the fixing base sets up in the frame, the swinging boom rotates around the primary axis and sets up on the fixing base, wiping mechanism rotates around the secondary axis and sets up on the swinging boom, and wiping mechanism can remove along Z axle direction by the swinging boom relatively, this wiping equipment passes through the swinging boom and rotates around the primary axis, wiping mechanism rotates around the secondary axis, and wiping mechanism can remove along Z axle direction by the swinging boom relatively, in order to realize wiping the head and carry out the part along the curve to the substrate and clean. Wherein the first axis is arranged in parallel with the second axis.

Wiping mechanism is including wiping head and flexible wiping body transport mechanism, it is provided with the wiping solution entry and wipes the liquid export to wipe overhead, the flexible body winding of wiping of flexible wiping body transport mechanism is in the liquid export of wiping head, it sets up in the frame to wipe liquid transport mechanism, it is linked together with the wiping solution entry to wipe liquid transport mechanism, it is used for carrying wiping solution to wipe in the head to wipe liquid transport mechanism, the flexible body of wiping through flexible wiping body transport mechanism is around establishing the liquid export of wiping at wiping head, can make the wiping head when wiping, it flows into on the flexible wiping body to wipe the liquid, be convenient for clean the substrate.

The fixed component is arranged on the rack or the discharging platform and used for fixing the substrate on the discharging platform, and when the wiping head is used for locally wiping, the substrate is prevented from moving, and the wiping effect is improved.

Specifically, the fixing assembly may adopt the manner of the pressing plate or the vacuum absorption assembly in the first embodiment or a combination of the two, and the substrate can be fixed on the placing platform by the fixing assembly, so as to prevent the substrate from moving.

When the base material is wiped, the rotating arm can rotate around the fixed seat for 360 degrees, and the wiping mechanism can rotate within a small range so as to perform curvilinear motion, thereby cleaning and wiping a curvilinear path. The wiping mechanism is connected with the Z-axis moving mechanism, so that the cleaning and the up-and-down movement of the wiping mechanism can be realized.

In the description herein, it is to be understood that the terms "upper", "lower", "right", and the like are used in a descriptive sense or positional relationship based on the orientation or positional relationship shown in the drawings for convenience of description and simplicity of operation, and do not indicate or imply that the referenced device or element must have a particular orientation, be constructed in a particular orientation, and be operated, and therefore should not be construed as limiting the present invention. Furthermore, the terms "first" and "second" are used merely for descriptive purposes and are not intended to have any special meaning.

In the description herein, references to the description of "an embodiment," "an example" or the like are intended to mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example.

In addition, the foregoing is only the preferred embodiment of the present invention and the technical principles applied thereto. It will be understood by those skilled in the art that the present invention is not limited to the particular embodiments described herein, but is capable of various obvious changes, rearrangements and substitutions as will now become apparent to those skilled in the art without departing from the scope of the invention. Therefore, although the present invention has been described in greater detail with reference to the above embodiments, the present invention is not limited to the above embodiments, and may include other equivalent embodiments without departing from the scope of the present invention.

Claims (10)

1. A wiping device, characterized by comprising:

a frame (1);

the feeding platform (2) is arranged on the rack (1), and the feeding platform (2) is used for bearing a substrate;

the wiping mechanism (3) is arranged on the rack (1), the wiping mechanism (3) comprises a wiping head (31) and a flexible wiping body conveying mechanism (32), the wiping head (31) can move relative to the discharging platform (2) along the X-axis direction, the Y-axis direction and the Z-axis direction, and the flexible wiping body of the flexible wiping body conveying mechanism (32) is wound on the wiping head (31); and

a fixing component (5) arranged on the rack (1) or the discharging platform (2), wherein the fixing component (5) is configured to fix the substrate on the discharging platform (2).

2. Wiping device according to claim 1, characterized in that the fixing assembly (5) comprises:

a pressing plate (51) disposed on the rack (1) or the discharging platform (2), wherein the pressing plate (51) is configured to be movable along a Z-axis direction.

3. The wiping device according to claim 2, characterized in that the fixing assembly (5) further comprises a pressing block, the pressing block is selectively magnetically matched with the pressing plate (51) or the discharging platform (2), the pressing plate (51) and the discharging platform (2) are both electromagnets, the pressing block is a magnet, both the pressing plate (51) and the discharging platform (2) can be electrified to generate a magnetic field, and the direction of the magnetic field is changed by changing the direction of the electrified current in the pressing plate (51) or the discharging platform (2), so that the pressing block is selectively magnetically matched with the pressing plate (51) or the discharging platform (2).

4. Wiping device according to claim 1,

the discharging platform (2) is fixed on the rack (1); or

The feeding platform (2) is movably arranged on the rack (1) along the Y-axis direction, and the wiping mechanism (3) can move relative to the rack (1) along the X-axis and the Z-axis.

5. A wiping device according to claim 2, characterized in that the securing assembly (5) further comprises:

the fixing frame (53) is connected with the rack (1) or the feeding platform (2); and

a drive mechanism (54) provided on the mount (53), the drive mechanism (54) being configured to drive the platen (51) to move in a Z-axis direction.

6. Wiping device according to claim 1, wherein the fixing assembly (5) is a vacuum suction assembly for sucking the substrate onto the drop platform (2).

7. The wiping device according to one of claims 1 to 5, characterized in that a positioning assembly (21) is arranged on the emptying platform (2), the positioning assembly (21) being configured to position the substrate on the emptying platform (2).

8. Wiping device according to any one of claims 1 to 5, characterized in that the flexible wiping body transport mechanism (32) comprises:

a wiping holder (321);

the feeding reel (322) is rotationally arranged on the wiping frame (321);

the material receiving reel (323) is rotatably arranged on the wiping frame (321); and

the tensioning assembly is arranged on the wiping frame (321) and is used for tensioning the flexible wiping body;

the flexible wiping body is wound on the feeding reel (322) and the receiving reel (323), and the wiping head (31) can push the flexible wiping body to the base material.

9. A wiping device according to any one of claims 1 to 5, characterized in that the wiping head (31) has a wiping area with a width n and a wiping length a of the wiping head (31) when the wiping head (31) is moved in the X-axis direction relative to the substrate; when the wiping head (31) moves relative to the base material along the Y-axis direction, the width of a wiping area of the wiping head (31) is m, the wiping length of the wiping head (31) is b, wherein n is less than or equal to a, and m is less than or equal to b.

10. A wiping device, characterized by comprising:

a frame (1);

the feeding platform (2) is arranged on the rack (1), and the feeding platform (2) is used for bearing a substrate;

the fixed seat is arranged on the rack (1);

the rotating arm is rotatably arranged on the fixed seat around a first axis;

the wiping mechanism (3) is rotatably arranged on the rotating arm around a second axis, the wiping mechanism (3) can move along the Z-axis direction relative to the rotating arm, the wiping mechanism (3) comprises a wiping head (31) and a flexible wiping body conveying mechanism (32), and a flexible wiping body of the flexible wiping body conveying mechanism (32) is wound on the wiping head (31); and

a fixing component (5) arranged on the rack (1) or the discharging platform (2), wherein the fixing component (5) is configured to fix the substrate on the discharging platform (2).

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