CN213528678U - Oxidation furnace convenient to move for semiconductor material production and processing - Google Patents
Oxidation furnace convenient to move for semiconductor material production and processing Download PDFInfo
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- CN213528678U CN213528678U CN202022533796.0U CN202022533796U CN213528678U CN 213528678 U CN213528678 U CN 213528678U CN 202022533796 U CN202022533796 U CN 202022533796U CN 213528678 U CN213528678 U CN 213528678U
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Abstract
The utility model discloses a semiconductor material production and processing is with oxidation furnace convenient to remove, comprising a base plate, the four corners of bottom plate bottom is all through bracing piece fixedly connected with universal wheel, the middle part fixedly connected with vertical plate of bottom plate bottom, the positive bottom of vertical plate is rotated through the pivot and is connected with the main wheel body, the positive middle part fixedly connected with transmission sill bar of main wheel body, the left middle part fixedly connected with fixed plate in bottom plate bottom, the front of fixed plate is rotated and is connected with the transmission ejector pin. This semiconductor material production and processing is with oxidation furnace easy operation convenient to remove, the practicality is strong, and the use of universal wheel, vertical plate, main wheel body, transmission sill bar, pushing hands handle body, fixed plate, transmission ejector pin, conveyer belt, square piece, double-shaft motor, telescopic link and square groove is favorable to the removal of device, and the use of fan, oxidation furnace body, hot plate, air-out return bend, pan feeding pipe and row's material pipe has realized semiconductor material's oxidation processing.
Description
Technical Field
The utility model relates to an oxidation furnace technical field specifically is a semiconductor material production and processing is with oxidation furnace convenient to remove.
Background
The semiconductor material is a kind of electronic material with semiconductor performance and can be used for manufacturing semiconductor devices and integrated circuits, and is one of the main raw materials for future information technology development.
SUMMERY OF THE UTILITY MODEL
Technical problem to be solved
The utility model provides a semiconductor material production and processing is with oxidation furnace convenient to remove to prior art not enough, the utility model provides a current incomplete problem of device structure has been solved.
(II) technical scheme
In order to achieve the above purpose, the utility model discloses a following technical scheme realizes: a conveniently-moved oxidation furnace for producing and processing semiconductor materials comprises a bottom plate, universal wheels are fixedly connected to four corners of the bottom plate through supporting rods, a vertical plate is fixedly connected to the middle of the bottom plate, a main wheel body is rotatably connected to the front bottom of the vertical plate through a rotating shaft, a transmission bottom rod is fixedly connected to the front middle of the main wheel body, a fixed plate is fixedly connected to the left middle of the bottom plate, a transmission ejector rod is rotatably connected to the front of the fixed plate, the outer side of the transmission ejector rod is connected to the outer side of the transmission bottom rod through a conveyor belt in a transmission manner, a square block is fixedly connected to the front of the transmission ejector rod, a double-shaft motor is fixedly connected to the front of the left side of the bottom plate through, the positive fixedly connected with fan of the positive output shaft of biax motor, connecting block fixed connection is passed through at the bottom of bottom plate in the top of fan, the four corners at bottom plate top middle part all is through supporting leg fixedly connected with oxidation furnace body, the inboard bottom fixedly connected with hot plate of oxidation furnace body, the positive bottom intercommunication of fan has the air-out return bend, the other end of air-out return bend runs through the bottom plate and communicates the bottom at the oxidation furnace body.
Further preferably, the bottom of the main wheel body and the bottom of the universal wheel are located on the same horizontal plane.
Further preferably, a handle pushing body is fixedly connected to the left side of the top of the bottom plate.
Further preferably, the square blocks correspond to the square grooves.
Further preferably, the top of the oxidation furnace body is communicated with a feeding pipe.
More preferably, the bottom of the right side of the oxidation furnace body is communicated with a discharge pipe.
(III) advantageous effects
The utility model provides a semiconductor material production and processing is with oxidation furnace convenient to remove possesses following beneficial effect:
(1) this semiconductor material production and processing is with oxidation furnace easy operation who is convenient for remove, and the practicality is strong, and the use of universal wheel, vertical plate, main pulley body, transmission sill bar, pushing hands handle body, fixed plate, transmission ejector pin, conveyer belt, square piece, biax motor, telescopic link and square groove is favorable to the removal of device.
(2) The use of the fan, the oxidation furnace body, the heating plate, the air outlet bent pipe, the feeding pipe and the discharging pipe realizes the oxidation processing of the semiconductor material.
Drawings
FIG. 1 is a schematic structural view of the present invention;
FIG. 2 is a schematic view of the back view structure of the present invention;
fig. 3 is a front sectional view of the present invention.
In the figure: 1 bottom plate, 2 universal wheels, 3 vertical plates, 4 main wheel bodies, 5 transmission bottom rods, 6 pushing handle bodies, 7 fixed plates, 8 transmission ejector rods, 9 conveyor belts, 10 square blocks, 11 double-shaft motors, 12 telescopic rods, 13 square grooves, 14 fans, 15 oxidation furnace bodies, 16 heating plates, 17 air outlet bent pipes, 18 feeding pipes and 19 discharging pipes.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
Referring to fig. 1-3, the present invention provides a technical solution: a conveniently-moved oxidation furnace for producing and processing semiconductor materials is simple in operation and strong in practicability, and comprises a bottom plate 1, wherein four corners of the bottom plate 1 are fixedly connected with universal wheels 2 through supporting rods, the middle part of the bottom plate 1 is fixedly connected with a vertical plate 3, the front bottom of the vertical plate 3 is rotatably connected with a main wheel body 4 through a rotating shaft, the bottom of the main wheel body 4 and the bottom of the universal wheels 2 are positioned on the same horizontal plane, the front middle part of the main wheel body 4 is fixedly connected with a transmission bottom rod 5, the left side of the top of the bottom plate 1 is fixedly connected with a handle pushing body 6, the left middle part of the bottom plate 1 is fixedly connected with a fixed plate 7, the front of the fixed plate 7 is rotatably connected with a transmission ejector rod 8, the outer side of the transmission ejector rod 8 is in transmission connection with the outer side of the transmission bottom rod, the back of the output shaft at the back of the double-shaft motor 11 is fixedly connected with an expansion link 12, the back of the expansion link 12 is provided with a square groove 13, a square block 10 corresponds to the square groove 13, a universal wheel 2, a vertical plate 3, a main wheel body 4, a transmission bottom rod 5, a handle pushing body 6, a fixing plate 7, a transmission top rod 8, a conveyor belt 9, the square block 10, the double-shaft motor 11, the expansion link 12 and the square groove 13 are used for facilitating the movement of the device, the front of the output shaft at the front of the double-shaft motor 11 is fixedly connected with a fan 14, the top of the fan 14 is fixedly connected with the bottom of the bottom plate 1 through a connecting block, four corners at the middle of the top of the bottom plate 1 are fixedly connected with an oxidation furnace body 15 through supporting legs, the bottom of the inner side of the oxidation furnace body 15 is fixedly connected with a heating plate 16, the top of the oxidation furnace body 15 is communicated with a feeding pipe 18, the bottom of the right side of the oxidation furnace body 15 is communicated with a discharging pipe 19, and the fan 14, the oxidation furnace body 15, the heating plate 16, the air outlet bent pipe 17, the feeding pipe 18 and the discharging pipe 19 are used for realizing the oxidation processing of semiconductor materials.
The working principle is as follows: throw into the raw materials from pan feeding pipe 18, the hot plate 16 heaies up, heat up the oxidation to the raw materials, open double-shaft motor 11 simultaneously, make 14 work of fan, make air-out return bend 17 air-out, the hole row on the rethread hot plate 16 is to the raw materials, supplementary oxidation, after, the raw materials is discharged through arranging material pipe 19, and when the device needs to remove, extend telescopic link 12, make the outside at square 10 of square 13 block of groove, double-shaft motor 11 work, make transmission ejector pin 8 drive transmission sill bar 5 and rotate, make main wheel body 4 rotate, the removal of the device of being convenient for.
Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention.
Claims (6)
1. A semiconductor material production and processing is with oxidation furnace convenient to remove, includes bottom plate (1), its characterized in that: the four corners of the bottom plate (1) are fixedly connected with universal wheels (2) through supporting rods, the middle of the bottom plate (1) is fixedly connected with a vertical plate (3), the front bottom of the vertical plate (3) is rotatably connected with a main wheel body (4) through a rotating shaft, the front middle of the main wheel body (4) is fixedly connected with a transmission bottom rod (5), the left middle of the bottom plate (1) is fixedly connected with a fixed plate (7), the front of the fixed plate (7) is rotatably connected with a transmission ejector rod (8), the outer side of the transmission ejector rod (8) is in transmission connection with the outer side of the transmission bottom rod (5) through a conveyor belt (9), the front of the transmission ejector rod (8) is fixedly connected with a square block (10), the left front of the bottom plate (1) is fixedly connected with a double-shaft motor (, square groove (13) have been seted up at the back of telescopic link (12), positive fixedly connected with fan (14) of the positive output shaft of double-shaft motor (11), connecting block fixed connection is passed through at the bottom of bottom plate (1) at the top of fan (14), the four corners at bottom plate (1) top middle part all is through supporting leg fixedly connected with oxidation furnace body (15), the inboard bottom fixedly connected with hot plate (16) of oxidation furnace body (15), the positive bottom intercommunication of fan (14) has air-out return bend (17), the other end of air-out return bend (17) runs through bottom plate (1) and communicates the bottom at oxidation furnace body (15).
2. The portable oxidation furnace for producing and processing semiconductor materials as claimed in claim 1, wherein: the bottom of the main wheel body (4) and the bottom of the universal wheel (2) are both positioned on the same horizontal plane.
3. The portable oxidation furnace for producing and processing semiconductor materials as claimed in claim 1, wherein: the left side of the top of the bottom plate (1) is fixedly connected with a push handle body (6).
4. The portable oxidation furnace for producing and processing semiconductor materials as claimed in claim 1, wherein: the square block (10) corresponds to the square groove (13).
5. The portable oxidation furnace for producing and processing semiconductor materials as claimed in claim 1, wherein: the top of the oxidation furnace body (15) is communicated with a feeding pipe (18).
6. The portable oxidation furnace for producing and processing semiconductor materials as claimed in claim 1, wherein: the bottom of the right side of the oxidation furnace body (15) is communicated with a discharge pipe (19).
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CN202022533796.0U CN213528678U (en) | 2020-11-05 | 2020-11-05 | Oxidation furnace convenient to move for semiconductor material production and processing |
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CN202022533796.0U CN213528678U (en) | 2020-11-05 | 2020-11-05 | Oxidation furnace convenient to move for semiconductor material production and processing |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113619994A (en) * | 2021-09-06 | 2021-11-09 | 湖南兴众科技有限公司 | Hydraulic valve block quality detection device and detection method |
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2020
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113619994A (en) * | 2021-09-06 | 2021-11-09 | 湖南兴众科技有限公司 | Hydraulic valve block quality detection device and detection method |
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