CN213318355U - Full-automatic marking machine with 3-axis adjustment marking mechanism - Google Patents
Full-automatic marking machine with 3-axis adjustment marking mechanism Download PDFInfo
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- CN213318355U CN213318355U CN202022337764.3U CN202022337764U CN213318355U CN 213318355 U CN213318355 U CN 213318355U CN 202022337764 U CN202022337764 U CN 202022337764U CN 213318355 U CN213318355 U CN 213318355U
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Abstract
The utility model discloses a full-automatic marking machine with marking mechanism is adjusted to 3 axles, which comprises a frame, frame top surface mid-mounting has fourth linear guide slip table, fourth linear guide slip table is equipped with the material loading board, wavelength monitoring mechanism is installed to fourth linear guide slip table one side, wavelength monitoring mechanism comprises first portal frame, support, first sleeve pipe and raman spectroscopy, current monitoring mechanism is installed on wavelength monitoring mechanism right side, current monitoring mechanism comprises second portal frame, electric putter, layer board, galvanometer, buffering spring frame and metal shrapnel, current monitoring mechanism one side is equipped with adjustment mechanism. The utility model discloses a fourth linear guide slip table can drive the work piece operation on the year flitch to make the work piece loop through wavelength monitoring mechanism, current monitoring mechanism and adjustment mechanism, and then can detect wavelength, the current grade of work piece and go on the automation to beat mark treatment effect to the work piece parameter.
Description
Technical Field
The utility model relates to a marking machine technical field specifically is a full-automatic marking machine with marking mechanism is adjusted to 3 axles.
Background
The marking machine is mainly divided into three types of pneumatic, laser and electric corrosion, the pneumatic marking machine is controlled by a computer, and a printing needle performs high-frequency impact motion under the action of compressed air, so that a mark with a certain depth is printed on a workpiece, and the mark has a larger depth; the laser marking machine is used for marking permanent marks on the surfaces of various materials by using laser beams, and the marking effect is that deep-layer materials are exposed through the evaporation of surface-layer materials, so that exquisite patterns, trademarks and characters are carved.
When the existing marking machine is used, the marking range is small, so that the use range of the marking machine is reduced, and meanwhile, the existing marking machine cannot detect the wavelength and the current grade of a workpiece, so that the use function of the marking machine is further reduced, and the automatic marking treatment of the marking machine is not facilitated.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide a full-automatic marking machine with marking mechanism is adjusted to 3 axles to solve the problem that proposes in the above-mentioned background art.
In order to solve the technical problem, the utility model provides a following technical scheme: a full-automatic marking machine with a 3-axis adjusting marking mechanism comprises a machine frame, wherein a fourth linear guide rail sliding table is arranged in the middle of the surface of the top of the machine frame, a material carrying plate is arranged on the fourth linear guide rail sliding table, a wavelength monitoring mechanism is arranged on one side of the fourth linear guide rail sliding table, the wavelength monitoring mechanism consists of a first portal frame, a support, a first sleeve and a Raman spectrometer, a current monitoring mechanism is arranged on the right side of the wavelength monitoring mechanism, the current monitoring mechanism consists of a second portal frame, an electric push rod, a support plate, an ammeter, a buffering spring frame and a metal elastic sheet, an adjusting mechanism is arranged on one side of the current monitoring mechanism, the adjusting mechanism consists of a first linear guide rail sliding table, a second linear guide rail sliding table and a third linear guide rail sliding table, a sliding block is arranged at the output end of the first linear guide rail sliding table, and a second sleeve is, the laser marking head is installed in the inner cavity of the second sleeve, and the fourth linear guide rail sliding table can drive a workpiece on the material carrying plate to run, so that the workpiece can sequentially pass through the wavelength monitoring mechanism, the current monitoring mechanism and the adjusting mechanism, the wavelength and the current grade of the workpiece can be detected, and the workpiece parameters can be subjected to automatic marking processing.
Further, a support is installed at the top of the inner cavity of the first portal frame, a first sleeve is installed on the surface of the support, and a Raman spectrometer is installed in the inner cavity of the first sleeve, so that a foundation can be provided for the first sleeve through the first portal frame and the support, and further the first sleeve can be fixedly installed on the Raman spectrometer, so that the Raman spectrometer can monitor the wavelength of a workpiece on the material loading plate, and the Raman spectrometer can send monitoring data to external control equipment.
Further, electric putter is installed at second portal frame inner chamber top, the layer board is installed to electric putter bottom output, buffering spring bracket is all installed to layer board bottom surface both sides, buffering spring bracket bottom surface mounting has metal shrapnel to can provide the support to electric putter through the second portal frame, and then can make electric putter drive layer board move from top to bottom, so that can make metal shrapnel contact work piece, through buffering spring bracket, can cushion the pressure of metal shrapnel to the work piece, can prevent again that metal shrapnel from damaging.
Furthermore, an ammeter is installed on one side of the top surface of the supporting plate, and the two groups of metal elastic pieces are connected with the anode and the cathode of the ammeter through wires respectively, so that the ammeter and the two groups of metal elastic pieces can be matched with each other, the current level of a workpiece can be monitored, and then the ammeter can send monitoring data to external control equipment.
Furthermore, second linear guide sliding tables are installed at two ends of the first linear guide sliding table, and third linear guide sliding tables are installed at the bottoms of the second linear guide sliding tables, so that the multiple groups of linear guide sliding tables can be matched with each other flexibly to adjust the position of the second sleeve.
Furthermore, the first linear guide rail sliding table, the second linear guide rail sliding table and the third linear guide rail sliding table are all of the same type in size and specification, so that the maintenance and the processing of later-period equipment can be facilitated.
Compared with the prior art, the utility model discloses the beneficial effect who reaches is:
(1) the utility model discloses a frame, can be for fourth linear guide slip table, equipment such as wavelength monitoring mechanism provides the installation basis, fourth linear guide slip table can drive simultaneously and carry the flitch operation again, and then can make and carry the flitch and loop through wavelength monitoring mechanism, current monitoring mechanism and adjustment mechanism department, through first portal frame and support in the wavelength monitoring mechanism, can provide the basis for first sleeve, and then can make first sleeve install fixed to the raman spectroscopy, so that can make the raman spectroscopy to carry out the wavelength monitoring to the work piece on carrying the flitch, then the raman spectroscopy can be with monitoring data transmission to external controlgear again.
(2) The utility model discloses a second portal frame in the current monitoring mechanism, can provide the support to electric putter, and then can make electric putter drive the layer board and move from top to bottom, so that can make metal shrapnel contact work piece, because the ampere meter is installed to layer board top surface one side, and two sets of metal shrapnel link to each other with the positive negative pole of ampere meter through the wire respectively, thereby can make ampere meter and two sets of metal shrapnel mutually support, and then can monitor the current level of work piece, then the ampere meter can be again with monitoring data transmission to external control equipment in, through the buffering spring bracket, can cushion the pressure of metal shrapnel to the work piece, can prevent the metal shrapnel damage again.
(3) The utility model discloses a first linear guide slip table, second linear guide slip table and third linear guide slip table among the adjustment mechanism mutually support to regulation second sheathed tube position that can be nimble, and then enlarge laser marking head working range, marking the head through laser, but external controlgear and laser printing host computer, thereby can print data such as the wavelength of work piece, electric current grade on the work piece, and then can accomplish the movablely and beat the mark and handle.
Drawings
The accompanying drawings are included to provide a further understanding of the invention, and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention, and together with the description serve to explain the invention and not to limit the invention. In the drawings:
fig. 1 is a schematic view of the overall structure of the present invention;
fig. 2 is a schematic side view of the present invention;
fig. 3 is a schematic structural diagram of the wavelength monitoring mechanism of the present invention;
fig. 4 is a schematic structural view of the current monitoring mechanism of the present invention;
fig. 5 is a schematic structural diagram of the adjusting mechanism of the present invention;
in the figure: 1. a frame; 2. a fourth linear guide rail sliding table; 3. a wavelength monitoring mechanism; 301. a first gantry; 302. a support; 303. a first sleeve; 304. a Raman spectrometer; 4. a current monitoring mechanism; 401. a second gantry; 402. an electric push rod; 403. a support plate; 404. an ammeter; 405. a buffer spring holder; 406. a metal spring sheet; 5. an adjustment mechanism; 501. a first linear guide rail sliding table; 502. a second linear guide rail sliding table; 503. a third linear guide rail sliding table; 6. a second sleeve; 7. and (5) laser marking the head.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
Referring to fig. 1-5, the present invention provides a technical solution: the utility model provides a full-automatic marking machine with marking mechanism is adjusted to 3 axles, includes frame 1, frame 1 top surface mid-mounting has fourth linear guide slip table 2, fourth linear guide slip table 2 is equipped with the material loading board, wavelength monitoring mechanism 3 is installed to fourth linear guide slip table 2 one side, wavelength monitoring mechanism 3 comprises first portal frame 301, support 302, first sleeve 303 and raman spectroscopy 304, current monitoring mechanism 4 is installed on wavelength monitoring mechanism 3 right side, current monitoring mechanism 4 comprises second portal frame 401, electric putter 402, layer board 403, galvanometer 404, buffering spring frame 405 and metal shrapnel 406, current monitoring mechanism 4 one side is equipped with adjustment mechanism 5, adjustment mechanism 5 comprises first linear guide slip table 501, second linear guide slip table 502 and third linear guide slip table 503, the slider is installed to first linear guide slip table 501 output, and first linear guide slip table 501 surface mounting has second sleeve 6, the laser marking head 7 is installed to the 6 inner chambers of second sleeve, through fourth linear guide slip table 2, can drive the work piece operation on the year flitch to make the work piece loop through wavelength monitoring mechanism 3, current monitoring mechanism 4 and adjustment mechanism 5, and then can detect the wavelength, the current grade of work piece and carry out automatic marking processing to the work piece parameter.
An ammeter 404 is installed on one side of the top surface of the supporting plate 403, and the two groups of metal elastic pieces 406 are respectively connected with the anode and the cathode of the ammeter 404 through leads, so that the ammeter 404 and the two groups of metal elastic pieces 406 can be matched with each other, the current level of a workpiece can be monitored, and then the ammeter 404 can send monitoring data to external control equipment.
Second linear guide slip table 502 is all installed at first linear guide slip table 501 both ends, third linear guide slip table 503 is all installed to second linear guide slip table 502 bottom to can make the position of the nimble regulation second sleeve 6 of three group linear guide slip tables of mutually supporting, and then enlarge 7 working ranges of mark are beaten to the laser.
The first linear guide rail sliding table 501, the second linear guide rail sliding table 502 and the third linear guide rail sliding table 503 are all of the same type, so that the maintenance and the processing of later-period equipment can be facilitated.
The utility model discloses a theory of operation: during operation, the fourth linear guide rail sliding table 2 is arranged in the middle of the surface of the top of the rack 1, and the fourth linear guide rail sliding table 2 is provided with the material carrying plate, so that an installation base can be provided for equipment such as the fourth linear guide rail sliding table 2 and the wavelength monitoring mechanism 3 through the rack 1, meanwhile, the fourth linear guide rail sliding table 2 can drive the material carrying plate to run, so that the material carrying plate can sequentially pass through the wavelength monitoring mechanism 3, the current monitoring mechanism 4 and the adjusting mechanism 5, because the wavelength monitoring mechanism 3 is arranged on one side of the fourth linear guide rail sliding table 2, the wavelength monitoring mechanism 3 is composed of a first portal frame 301, a support 302, a first sleeve 303 and a Raman spectrometer 304, the top of an inner cavity of the first portal frame 301 is provided with the support 302, the surface of the support 302 is provided with the first sleeve 303, the inner cavity of the first sleeve 303 is provided with the Raman spectrometer 304, so that a base can be provided for the first sleeve 303, and then the first sleeve 303 can be used for installing and fixing the raman spectrometer 304, so that the raman spectrometer 304 can be used for monitoring the wavelength of the workpiece on the loading plate, then the raman spectrometer 304 can also send the monitoring data to an external control device, because the right side of the wavelength monitoring mechanism 3 is provided with the current monitoring mechanism 4, the current monitoring mechanism 4 consists of a second portal frame 401, an electric push rod 402, a supporting plate 403, an ammeter 404, a buffer spring frame 405 and a metal shrapnel 406, meanwhile, the top of the inner cavity of the second portal frame 401 is provided with the electric push rod 402, the output end of the bottom of the electric push rod 402 is provided with the supporting plate 403, both sides of the bottom surface of the supporting plate 403 are provided with the buffer spring frame 405, the surface of the bottom of the buffer spring frame 405 is provided with the metal shrapnel 406, thereby the electric push rod 402 can be used for supporting the electric push rod 402, so that the metal elastic sheet 406 can contact the workpiece, because one side of the top surface of the supporting plate 403 is provided with the galvanometer 404, and the two groups of metal elastic sheets 406 are respectively connected with the positive electrode and the negative electrode of the galvanometer 404 through leads, the galvanometer 404 and the two groups of metal elastic sheets 406 can be matched with each other, so that the current level of the workpiece can be monitored, then the galvanometer 404 can send monitoring data to an external control device, the pressure of the metal elastic sheets 406 on the workpiece can be buffered through the buffer spring frame 405, and the metal elastic sheets 406 can be prevented from being damaged, through arranging the adjusting mechanism 5 at one side of the current monitoring mechanism 4, the adjusting mechanism 5 consists of a first linear guide rail sliding table 501, a second linear guide rail sliding table 502 and a third linear guide rail sliding table 503, meanwhile, the second linear guide rail sliding tables 502 are arranged at two ends of the first linear guide rail sliding table 501, and the third linear guide rail sliding, thereby can make the nimble position of adjusting second sleeve 6 of three linear guide slip tables of group mutually supporting, and then enlarge 7 working ranges of mark are marked to laser, mark 7 through laser, can external controlgear and laser printing host computer, thereby can be with the wavelength of work piece, data such as electric current grade are printed on the work piece, and then can accomplish the mobilization and beat the mark processing, because first linear guide slip table 501, second linear guide slip table 502, third linear guide slip table 503 all adopts the same model of big small dimension, thereby can make things convenient for the maintenance of later stage equipment to handle.
The raman spectrometer was used with model number Portman-785.
It is noted that, herein, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus.
Finally, it should be noted that: although the present invention has been described in detail with reference to the foregoing embodiments, it will be apparent to those skilled in the art that modifications may be made to the embodiments described in the foregoing embodiments, or equivalents may be substituted for elements thereof. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (6)
1. The utility model provides a full-automatic marking machine with marking mechanism is adjusted to 3 axles, includes frame (1), its characterized in that: the optical fiber Raman spectrometer is characterized in that a fourth linear guide rail sliding table (2) is arranged in the middle of the surface of the top of the rack (1), a material carrying plate is arranged on the fourth linear guide rail sliding table (2), a wavelength monitoring mechanism (3) is arranged on one side of the fourth linear guide rail sliding table (2), the wavelength monitoring mechanism (3) is composed of a first portal frame (301), a support (302), a first sleeve (303) and a Raman spectrometer (304), a current monitoring mechanism (4) is arranged on the right side of the wavelength monitoring mechanism (3), the current monitoring mechanism (4) is composed of a second portal frame (401), an electric push rod (402), a support plate (403), an ammeter (404), a buffer spring frame (405) and a metal elastic sheet (406), an adjusting mechanism (5) is arranged on one side of the current monitoring mechanism (4), and the adjusting mechanism (5) is composed of a first linear guide rail sliding table (501), a second linear guide rail sliding table (502) and a third linear guide rail sliding, the slider is installed to first linear guide rail slip table (501) output, and first linear guide rail slip table (501) surface mounting has second sleeve pipe (6), laser marking head (7) are installed to second sleeve pipe (6) inner chamber.
2. The full-automatic marking machine with the 3-axis adjusting marking mechanism as claimed in claim 1, characterized in that: a support (302) is installed at the top of an inner cavity of the first gantry (301), a first sleeve (303) is installed on the surface of the support (302), and a Raman spectrometer (304) is installed in the inner cavity of the first sleeve (303).
3. The full-automatic marking machine with the 3-axis adjusting marking mechanism as claimed in claim 1, characterized in that: electric putter (402) is installed at second portal frame (401) inner chamber top, layer board (403) are installed to electric putter (402) bottom output, buffer spring frame (405) are all installed to layer board (403) bottom surface both sides, buffer spring frame (405) bottom surface mounting has metal shrapnel (406).
4. The full-automatic marking machine with the 3-axis adjusting marking mechanism as claimed in claim 1, characterized in that: and an ammeter (404) is arranged on one side of the top surface of the supporting plate (403), and the two groups of metal elastic sheets (406) are respectively connected with the anode and the cathode of the ammeter (404) through leads.
5. The full-automatic marking machine with the 3-axis adjusting marking mechanism as claimed in claim 1, characterized in that: second linear guide sliding tables (502) are installed at two ends of the first linear guide sliding table (501), and third linear guide sliding tables (503) are installed at the bottoms of the second linear guide sliding tables (502).
6. The full-automatic marking machine with the 3-axis adjusting marking mechanism as claimed in claim 1, characterized in that: the first linear guide rail sliding table (501), the second linear guide rail sliding table (502) and the third linear guide rail sliding table (503) are of the same type.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022337764.3U CN213318355U (en) | 2020-10-20 | 2020-10-20 | Full-automatic marking machine with 3-axis adjustment marking mechanism |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022337764.3U CN213318355U (en) | 2020-10-20 | 2020-10-20 | Full-automatic marking machine with 3-axis adjustment marking mechanism |
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| CN213318355U true CN213318355U (en) | 2021-06-01 |
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| CN202022337764.3U Active CN213318355U (en) | 2020-10-20 | 2020-10-20 | Full-automatic marking machine with 3-axis adjustment marking mechanism |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114526923A (en) * | 2022-02-16 | 2022-05-24 | 武汉桐创汽车科技有限责任公司 | Power assembly test system for new energy automobile |
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2020
- 2020-10-20 CN CN202022337764.3U patent/CN213318355U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114526923A (en) * | 2022-02-16 | 2022-05-24 | 武汉桐创汽车科技有限责任公司 | Power assembly test system for new energy automobile |
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