CN213266067U - Semiconductor substrate wafer production wastewater treatment system - Google Patents
Semiconductor substrate wafer production wastewater treatment system Download PDFInfo
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- CN213266067U CN213266067U CN202022073617.XU CN202022073617U CN213266067U CN 213266067 U CN213266067 U CN 213266067U CN 202022073617 U CN202022073617 U CN 202022073617U CN 213266067 U CN213266067 U CN 213266067U
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- fixed mounting
- neutralization
- semiconductor substrate
- substrate wafer
- filter screen
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Abstract
The utility model discloses a semiconductor substrate wafer waste water treatment system, which comprises a bracket, fixed mounting has neutralization case and flowing back fill between two supports, the last surface right side fixed mounting of neutralization case has the feed liquor pipe, the lower extreme fixed mounting of neutralization case has the solenoid valve, the lower surface left side fixed mounting of neutralization case has drive arrangement, drive arrangement installs filter equipment on drive arrangement's right side, filter equipment is located the upside of flowing back fill, filter equipment is including installing the inboard support cylinder at drive arrangement, the inside lower extreme fixed mounting of support cylinder has the filter screen, the filter screen is half spherical structure, the lower extreme fixed mounting of filter screen has the vibrator, the inboard of support cylinder and filter screen closely laminates there is compound filter bag, the opening of compound filter bag is located the downside of solenoid valve. This device can be after neutralization waste water, filters the separation to the impurity of qualified aquatic doping or production to innocent treatment makes the water of discharging safer environmental protection.
Description
Technical Field
The utility model relates to a waste water treatment technical field specifically is semiconductor substrate wafer production wastewater treatment system.
Background
In the production of semiconductor devices, it is necessary to polish and clean the main surface of a semiconductor substrate wafer to obtain a high-quality substrate wafer, and then grow an epitaxial structure on the main surface of the substrate wafer by using a molecular beam epitaxy technique or an organometallic compound vapor phase epitaxy technique.
The corrosive wastewater generated during processing of the semiconductor substrate wafer can be discharged only after being qualified through neutralization treatment, the conventional wastewater treatment system directly discharges the wastewater after mixing the wastewater and a neutralizing agent to acid-base balance, impurities doped or generated are not separated and treated, and direct discharge causes certain pollution.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide a semiconductor substrate wafer waste water treatment system to solve the problem that proposes among the above-mentioned background art.
In order to achieve the above object, the utility model provides a following technical scheme: semiconductor substrate wafer waste water treatment system, which comprises a bracket, the quantity of support is two, two fixed mounting has neutralization case and leakage fluid dram between the support, the upper surface right side fixed mounting of neutralization case has the feed liquor pipe, the lower extreme fixed mounting of neutralization case has the solenoid valve, the lower surface left side fixed mounting of neutralization case has drive arrangement, filter equipment is installed on drive arrangement's right side, filter equipment is located the upside of leakage fluid dram, filter equipment is including installing the support cylinder in drive arrangement inboard, the inside lower extreme fixed mounting of support cylinder has the filter screen, the filter screen is hemispherical structure, the lower extreme fixed mounting of filter screen has the vibrator, the inboard of support cylinder and filter screen closely laminates and has compound the filter bag, the opening of compound filter bag is located the downside of solenoid valve.
Preferably, the driving device comprises a rotating motor fixedly mounted on the left side of the lower surface of the middle and box, an overturning motor is fixedly mounted at the lower end of an output shaft of the rotating motor, a supporting frame is fixedly mounted at the right end of the output shaft of the overturning motor, one end of an air spring part is uniformly and fixedly mounted on the inner surface of the supporting frame, and the other end of the air spring part is fixedly assembled with the outer surface of the supporting cylinder.
Preferably, the upper end of the neutralizing tank is fixedly provided with a stirrer, and a stirring frame of the stirrer is rotatably arranged inside the neutralizing tank.
Preferably, one end of a dosing pipe and one end of a clean water pipe are fixedly mounted on the left side of the upper surface of the neutralization box, the other end of the dosing pipe is connected and assembled with an external dosing system, and the other end of the clean water pipe is connected and assembled with a clean water supply system.
Preferably, a pH meter is fixedly arranged on the lower side of the interior of the neutralization tank.
Compared with the prior art, the beneficial effects of the utility model are that: the semiconductor substrate wafer production wastewater treatment system can filter and separate impurities doped or generated in qualified water after neutralizing wastewater so as to carry out harmless treatment, so that discharged water is safer and more environment-friendly.
Drawings
Fig. 1 is a schematic cross-sectional view of the structure of the present invention.
Fig. 2 is a schematic cross-sectional view of the structure of the filtering device of the present invention.
In the figure: the device comprises a support 1, a liquid discharge hopper 2, a driving device 3, a rotating motor 31, a turnover motor 32, a supporting frame 33, an air spring part 34, a filtering device 4, a supporting cylinder 41, a filtering screen 42, a composite filtering bag 43, a vibrator 44, a neutralizing box 5, a dosing pipe 6, a clean water pipe 7, a stirrer 8, a liquid inlet pipe 9, a pH meter 10 and an electromagnetic valve 11.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
Referring to fig. 1 and fig. 2, the present invention provides a technical solution: semiconductor substrate wafer production wastewater treatment system, including support 1, the quantity of support 1 is two, and fixed mounting has neutralization tank 5 and flowing back fill 2 between two support 1, and the upper surface right side fixed mounting of neutralization tank 5 has feed liquor pipe 9, and the lower extreme fixed mounting of neutralization tank 5 has solenoid valve 11, and the lower surface left side fixed mounting of neutralization tank 5 has drive arrangement 3, and filter equipment 4 is installed on drive arrangement 3's right side, and filter equipment 4 is located the upside of flowing back fill 2.
The bracket 1 plays a role in supporting and fixing and can input wastewater into the neutralization tank 5 through the liquid inlet pipe 9; the solenoid valve 11 can control the discharge of neutralization water, and the qualified water that filter 4 filtered can be collected and discharge to the flowing back fill 2, and impurity is emptyd to the collection box pending through drive arrangement 3 left side transfer is concentrated.
The filtering device 4 comprises a supporting cylinder 41 arranged on the inner side of the driving device 3, a filtering net 42 is fixedly arranged at the lower end of the inner part of the supporting cylinder 41, the filtering net 42 is of a hemispherical structure, a vibrator 44 is fixedly arranged at the lower end of the filtering net 42, a composite filtering bag 43 is tightly attached to the inner sides of the supporting cylinder 41 and the filtering net 42, and an opening of the composite filtering bag 43 is positioned on the lower side of the electromagnetic valve 11.
The supporting cylinder 41 in the filtering device 4 can fix the filtering net 42, the composite filtering bag 43 can finely filter the passing liquid, and the vibrator 44 can make the filtering net 42 and the composite filtering bag 43 vibrate, which is beneficial to the dumping of impurities after overturning.
The driving device 3 comprises a rotating motor 31 fixedly installed on the left side of the lower surface of the neutralization box 5, a turnover motor 32 is fixedly installed at the lower end of an output shaft of the rotating motor 31, a supporting frame 33 is fixedly installed at the right end of the output shaft of the turnover motor 32, one end of an air spring part 34 is uniformly and fixedly installed on the inner surface of the supporting frame 33, and the other end of the air spring part 34 is fixedly assembled with the outer surface of a supporting cylinder 41.
The upper end of the neutralizing tank 5 is fixedly provided with a stirrer 8, and a stirring frame of the stirrer 8 is rotatably arranged inside the neutralizing tank 5.
The stirrer 8 can mix and stir the wastewater and the neutralizing agent in the neutralizing tank 5, so that the reaction is rapidly and fully carried out.
The left side of the upper surface of the neutralization box 5 is fixedly provided with one end of a dosing pipe 6 and one end of a clean water pipe 7, the other end of the dosing pipe 6 is connected and assembled with an external dosing system, and the other end of the clean water pipe 7 is connected and assembled with a clean water supply system.
The neutralizing agent in the external drug delivery system can be introduced into the neutralizing tank 5 through the drug delivery pipe 6 to be mixed with the wastewater, and the clear water pipe 7 can introduce the clear water in the external clear water supply system into the neutralizing tank 5 to flush the clear water.
A pH meter 10 is fixedly installed on the inner lower side of the neutralization tank 5.
The pH meter 10 can detect the pH value of the mixed liquid in the neutralization tank 5 in real time and transmit the data to the control tank.
The working principle is as follows: the vibrator 44, the rotating motor 31, the overturning motor 32, the stirrer 8 and the pH meter 10 are electrically connected with an external control box through leads. When the device works, waste liquid is introduced into the neutralizing tank 5 through the liquid inlet pipe 9, the pH meter 10 detects the pH value of the waste water in the neutralizing tank 5, the neutralizer in an external drug delivery system is introduced into the neutralizing tank 5 through the drug delivery pipe 6, and the stirrer 8 is used for stirring and mixing; when the qualified pH value is reached, the electromagnetic valve 11 is opened, and the liquid falls into the liquid discharge hopper 2 for centralized discharge after being filtered by the composite filter bag 43; impurities retained on the composite filter bag 43 are turned leftwards by rotating the motor 31, and the turning motor 32 is turned downwards, then the opening of the filter bag 43 is turned downwards to correspond to the placed recovery box, meanwhile, the vibrator 44 generates vibration, which is beneficial to fully separating the impurities, and the air spring part 34 can absorb the vibration on the supporting cylinder 41, so that the vibration is prevented from being transmitted to the supporting frame 33, and the whole equipment is vibrated; and after the completion, resetting, and leading clean water of an external clean water supply system into the neutralizing tank 5 for comprehensive flushing through a clean water pipe 7 according to requirements.
It is obvious to a person skilled in the art that the invention is not restricted to details of the above-described exemplary embodiments, but that it can be implemented in other specific forms without departing from the spirit or essential characteristics of the invention. The present embodiments are therefore to be considered in all respects as illustrative and not restrictive, the scope of the invention being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein. Any reference sign in a claim should not be construed as limiting the claim concerned.
Furthermore, it should be understood that although the present description refers to embodiments, not every embodiment may contain only a single embodiment, and such description is for clarity only, and those skilled in the art should integrate the description, and the embodiments may be combined as appropriate to form other embodiments understood by those skilled in the art.
Claims (5)
1. Semiconductor substrate wafer waste water processing system, its characterized in that: the device comprises two supports (1), a neutralization box (5) and a liquid discharge hopper (2) are fixedly installed between the two supports (1), a liquid inlet pipe (9) is fixedly installed on the right side of the upper surface of the neutralization box (5), an electromagnetic valve (11) is fixedly installed at the lower end of the neutralization box (5), a driving device (3) is fixedly installed on the left side of the lower surface of the neutralization box (5), a filtering device (4) is installed on the right side of the driving device (3), and the filtering device (4) is located on the upper side of the liquid discharge hopper (2);
filter equipment (4) are including installing support cylinder (41) at drive arrangement (3) inboard, the inside lower extreme fixed mounting of support cylinder (41) has filter screen (42), filter screen (42) are the hemisphere structure, the lower extreme fixed mounting of filter screen (42) has vibrator (44), the inboard of support cylinder (41) and filter screen (42) is closely laminated and is had compound filter bag (43), the opening of compound filter bag (43) is located the downside of solenoid valve (11).
2. The semiconductor substrate wafer production wastewater treatment system according to claim 1, characterized in that: drive arrangement (3) include fixed mounting in with case (5) lower surface left rotation motor (31), the output shaft lower extreme fixed mounting who rotates motor (31) has upset motor (32), the output shaft right-hand member fixed mounting of upset motor (32) has carriage (33), the even fixed mounting in internal surface of carriage (33) has the one end of air spring spare (34), the other end and the outer fixed surface of a support section of thick bamboo (41) of air spring spare (34) assemble.
3. The semiconductor substrate wafer production wastewater treatment system according to claim 1, characterized in that: the upper end fixed mounting of neutralization case (5) has agitator (8), the agitator of agitator (8) rotates and installs in the inside of neutralization case (5).
4. The semiconductor substrate wafer production wastewater treatment system according to claim 1, characterized in that: the upper surface left side fixed mounting of neutralization case (5) has the one end of dosing pipe (6) and clear water pipe (7), the other end and the outside delivery system of dosing pipe (6) are connected the assembly, the other end and the clear water feed system of clear water pipe (7) are connected the assembly.
5. The semiconductor substrate wafer production wastewater treatment system according to claim 1, characterized in that: and a pH meter (10) is fixedly arranged on the lower side of the interior of the neutralization tank (5).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022073617.XU CN213266067U (en) | 2020-09-21 | 2020-09-21 | Semiconductor substrate wafer production wastewater treatment system |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022073617.XU CN213266067U (en) | 2020-09-21 | 2020-09-21 | Semiconductor substrate wafer production wastewater treatment system |
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| CN213266067U true CN213266067U (en) | 2021-05-25 |
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| CN202022073617.XU Active CN213266067U (en) | 2020-09-21 | 2020-09-21 | Semiconductor substrate wafer production wastewater treatment system |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114570083A (en) * | 2022-04-01 | 2022-06-03 | 栾川县山川生态农业开发有限公司 | Oil separator is used in walnut oil processing |
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2020
- 2020-09-21 CN CN202022073617.XU patent/CN213266067U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114570083A (en) * | 2022-04-01 | 2022-06-03 | 栾川县山川生态农业开发有限公司 | Oil separator is used in walnut oil processing |
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