CN213225744U

CN213225744U - Splash-proof device for polishing equipment polishing solution circulation

Info

Publication number: CN213225744U
Application number: CN202021418779.6U
Authority: CN
Inventors: 高令; 谭志强; 李叶明; 张红超; 张建国
Original assignee: Shenzhen Xikoe Industrial Co ltd
Current assignee: Shenzhen Xikoe Industrial Co ltd
Priority date: 2020-07-17
Filing date: 2020-07-17
Publication date: 2021-05-18
Anticipated expiration: 2030-07-17

Abstract

The utility model relates to a circulating anti-splash device of polishing equipment polishing solution, include: the water tank is sleeved on the fixed shaft sleeve and connected with the sweeping disc cushion plate, and the water retaining ring is arranged on the water tank. The utility model provides a burnishing device polishing solution endless anti-splash device passes through the setting of manger plate circle and lower basin, and the solution lower basin is when high-speed rotatory, and the polishing solution flows into the problem that the basin takes place to spatter outward easily at a distance from the sky, and is with low costs, simple to operate shortens the maintenance and the clean time of equipment, extension equipment life.

Description

Splash-proof device for polishing equipment polishing solution circulation

Technical Field

The utility model relates to a glass polishing technical field, in particular to polishing equipment polishing solution endless splashproof device.

Background

In the prior art, the circulation modes of polishing solutions of polishing equipment in the market are mainly divided into two types: firstly, adopt the rotary joint mode, this mode is with high costs, and life is short. The other mode is a non-connection shunting mode, and the mode has low cost, simple installation and long service life; the only defect is that the polishing liquid in the lower water tank can be splashed out when the polishing disc rotates at a high speed, so that the polishing liquid is everywhere on the equipment, the accelerated aging of the equipment is seriously influenced, and the service life of the polishing shaft is shortened.

SUMMERY OF THE UTILITY MODEL

The utility model provides a burnishing equipment polishing solution endless anti-splash device solves the basin when high-speed rotatory down, and the polishing solution is not spattered the problem outward when flowing into the basin at a distance from the sky.

In order to achieve the above object, the present invention provides the following technical solutions:

an anti-splash device for polishing equipment polishing solution circulation comprises: the optical disk scanning device comprises a fixed shaft sleeve 1, a water retaining ring 2, a lower water tank 3 and a scanning optical disk cushion plate 4, wherein the lower water tank 3 is sleeved on the fixed shaft sleeve 1 and is connected with the scanning optical disk cushion plate 4, and the water retaining ring 2 is arranged on the lower water tank 3.

Preferably, the polishing device further comprises a rotating shaft 11, the fixed shaft sleeve 1 is sleeved on the rotating shaft 11, one end of the rotating shaft 11 is used for being connected with a polishing device, and the other end of the rotating shaft 11 is connected with the optical disc sweeping base plate 4.

Preferably, the water discharge tank 3 is provided with a plurality of flow distribution holes 5, the optical disc sweeping base plate 4 is provided with a plurality of flow guide holes 6, and the flow distribution holes 5 correspond to the flow guide holes 6.

Preferably, the water retaining ring 2 is made of flexible materials, and a plurality of liquid draining holes 7 and a plurality of first fixing holes 8 are formed in the water retaining ring 2.

Preferably, the polishing solution polishing device further comprises flow guide pipes with the same number as the liquid discharge holes 7, wherein one end of each flow guide pipe is connected with the polishing solution circulating pump, and the other end of each flow guide pipe is connected with the liquid discharge holes 7.

Preferably, the flow guide device further comprises a flow guide frame 9, the flow guide frame 9 is arranged on the fixed shaft sleeve 1, the flow guide pipe is connected with the flow guide frame 9, and the first fixed hole 8 is connected with the flow guide frame 9 through an elastic material.

Preferably, a second fixing hole 10 is formed in the disc-sweeping backing plate 4, and the rotating shaft 11 is fixedly connected with the disc-sweeping backing plate 4 through the second fixing hole 10.

Through implementing above technical scheme, have following technological effect: the utility model provides a burnishing device polishing solution endless anti-splash device passes through the setting of manger plate circle and lower basin, and the solution lower basin is when high-speed rotatory, and the polishing solution flows into the problem that the basin takes place to spatter outward easily at a distance from the sky, and is with low costs, simple to operate shortens the maintenance and the clean time of equipment, extension equipment life.

Drawings

Fig. 1 is a schematic structural view (a perspective view) of a splash guard for polishing solution circulation of a polishing device provided by the present invention;

fig. 2 is a schematic structural diagram (exploded view) of the splash-proof device for polishing liquid circulation of the polishing apparatus provided by the present invention.

Detailed Description

For better understanding of the technical solutions of the present invention, the following describes the embodiments of the present invention in detail with reference to fig. 1-2.

An anti-splash device for polishing equipment polishing solution circulation comprises: fixed axle sleeve 1, manger plate circle 2, lower basin 3 and sweep

CD backing plate

4, 3 covers of basin are in down the cover is established on the fixed axle sleeve 1, and with sweep CD backing plate 4 and connect, manger plate circle 2 sets up on the basin 3, still include

rotation axis

11, 1 covers of fixed axle sleeve are established on the rotation axis 11, rotation axis 11 one end is used for connecting with burnishing device, the other end with sweep CD backing plate 4 and connect.

In this embodiment, the water discharge groove 3 is sleeved on the fixed shaft sleeve 1 and connected with the optical disc sweeping pad 4, the fixed shaft sleeve 1 is sleeved on the rotating shaft 11, the water blocking ring 2 is arranged on the water discharge groove 3 and contacts with the water discharge groove 3, after the polishing device starts to operate, the rotating shaft 11 rotates at a high speed to drive the optical disc sweeping pad 4 connected with the rotating shaft 11 to rotate at a high speed, the water discharge groove 3 is connected with the optical disc sweeping pad 4, so that the water discharge groove 3 starts to rotate at a high speed, one end of the flow guide pipe is used for being connected with the polishing liquid circulating pump, the other end of the flow guide pipe extends into the water blocking ring 2, the polishing liquid of the polishing device enters the water blocking ring 2 through the flow guide pipe and then enters the water discharge groove 3, and the polishing liquid rotates along with the outer side of the water discharge groove 3 under the action of centrifugal force in the water discharge groove, the polishing liquid in the water discharge tank 3 enters a polishing processing area through the optical disk sweeping base plate 4, the fixed shaft sleeve 1, the water retaining ring 2 and the flow guide pipe are in a static state, and slight friction is generated between the water retaining ring 2 and the bottom of the rotating water discharge tank 3, so that the sealing effect is achieved, and the polishing liquid is prevented from splashing outside in the high-speed rotating process.

On the basis of the above embodiment, in other embodiments, more specifically, the water discharge tank 3 is provided with a plurality of diversion holes 5, the optical disc sweeping backing plate 4 is provided with a plurality of diversion holes 6, and the diversion holes 5 correspond to the diversion holes 6.

In this embodiment, the water discharge channel 3 is provided with a plurality of diversion holes 5, the number of the diversion holes 5 may be 3, 4 or 5, the optical disc sweeping pad 4 is provided with a plurality of diversion holes 6, the number of the diversion holes 6 may be 3, 4 or 5, and the diversion holes 5 correspond to the diversion holes 6, so that the water discharge channel 3 and the optical disc sweeping pad 4 are fixed together.

On the basis of the above embodiment, in other embodiments, more specifically, the water baffle ring 2 is made of a flexible material, and the water baffle ring 2 is provided with a plurality of liquid drainage holes 7 and a plurality of first fixing holes 8.

In this embodiment, honeycomb duct one end is used for being connected with the polishing solution circulating pump, the other end with lower liquid hole 7 is connected, manger plate circle 2 adopts flexible material to make, with lower basin 3 contact avoids taking place to damage at high-speed rotatory in-process, adopts flexible material to make simultaneously manger plate circle 2 can be better with lower basin 3 forms inclosed space, improves the splashproof effect.

On the basis of the above embodiment, in other embodiments, the fluid guide device further includes a fluid guide frame 9, the fluid guide frame 9 is disposed on the fixed shaft sleeve 1, the fluid guide pipe is connected to the fluid guide frame 9, and the first fixed hole 8 is connected to the fluid guide frame 9 through an elastic material.

In this embodiment, water conservancy diversion frame 9 sets up on fixed axle sleeve 1, the honeycomb duct with water conservancy diversion frame 9 is connected, avoids the honeycomb duct to take place to buckle, causes the interior smooth through of polishing liquid flow of honeycomb duct, first fixed orifices 8 pass through elastic material with water conservancy diversion frame 9 is connected, forms certain pulling force, makes water retaining ring 2 can not take place to cave in, improves the splashproof effect.

On the basis of the above embodiment, in other embodiments, more specifically, the disc-sweeping backing plate 4 is provided with a second fixing hole 10, and the rotating shaft 11 is fixedly connected with the disc-sweeping backing plate 4 through the second fixing hole 10.

In this embodiment, the rotating shaft 11 is fixedly connected to the disc sweeping backing plate 4 through the second fixing hole 10, and the polishing solution in the water tank 3 enters the polishing work area through the disc sweeping backing plate 4.

The above is right the utility model provides a splash guard of polishing equipment polishing solution circulation introduces in detail, to the general technical personnel in this field, according to the utility model discloses the thought of embodiment all has the change part on concrete implementation mode and range of application, to sum up, this description content should not be understood as the restriction of the utility model.

Claims

1. An anti-splash device for polishing equipment polishing solution circulation is characterized by comprising: the optical disk drive comprises a fixed shaft sleeve (1), a water retaining ring (2), a lower water tank (3) and an optical disk sweeping base plate (4), wherein the lower water tank (3) is sleeved on the fixed shaft sleeve (1) and connected with the optical disk sweeping base plate (4), and the water retaining ring (2) is arranged on the lower water tank (3).

2. The polishing device polishing solution circulation splash-proof device according to claim 1, further comprising a rotating shaft (11), wherein the fixed shaft sleeve (1) is sleeved on the rotating shaft (11), one end of the rotating shaft (11) is used for being connected with a polishing device, and the other end of the rotating shaft (11) is connected with the optical disc sweeping backing plate (4).

3. The anti-splash device for polishing device polishing solution circulation according to claim 1, wherein the water discharge tank (3) is provided with a plurality of diversion holes (5), the optical disc sweeping backing plate (4) is provided with a plurality of diversion holes (6), and the diversion holes (5) correspond to the diversion holes (6).

4. The splash-proof device for polishing solution circulation of polishing equipment according to claim 1, characterized in that the water baffle ring (2) is made of flexible material, and the water baffle ring (2) is provided with a plurality of liquid discharge holes (7) and a plurality of first fixing holes (8).

5. The anti-splash device for polishing solution circulation of the polishing equipment according to claim 4, further comprising flow guide pipes with the same number as the number of the lower solution holes (7), wherein one end of each flow guide pipe is used for being connected with the polishing solution circulation pump, and the other end of each flow guide pipe is connected with the lower solution hole (7).

6. The splash-proof device for the polishing solution circulation of the polishing equipment is characterized by further comprising a flow guide frame (9), wherein the flow guide frame (9) is arranged on the fixed shaft sleeve (1), the flow guide pipe is connected with the flow guide frame (9), and the first fixing hole (8) is connected with the flow guide frame (9) through an elastic material.

7. The splash-proof device for the polishing device polishing solution circulation according to claim 2, wherein a second fixing hole (10) is formed in the optical disc sweeping backing plate (4), and the rotating shaft (11) is fixedly connected with the optical disc sweeping backing plate (4) through the second fixing hole (10).