CN213222923U - Cleaning disc and cleaning device for photoresist gluing tray - Google Patents
Cleaning disc and cleaning device for photoresist gluing tray Download PDFInfo
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- CN213222923U CN213222923U CN202021177746.7U CN202021177746U CN213222923U CN 213222923 U CN213222923 U CN 213222923U CN 202021177746 U CN202021177746 U CN 202021177746U CN 213222923 U CN213222923 U CN 213222923U
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Abstract
The utility model provides a clean dish and cleaning device for photoresist rubber coating tray, clean dish includes front panel and back dish, back dish surface is provided with central circular area and outer lane annular district, outer lane annular district is close to clean dish outward flange department is provided with protruding annular district, protruding annular district surface distribution is provided with a plurality of protruding granules, front panel is close to outward flange department and is provided with annular boss structure, annular boss structure surface is provided with a plurality of inclined holes, inclined holes inserts and runs through clean dish, cleaning device includes foretell clean dish, still includes cushion cap platform, cleaning solution sprinkler structure, adjusts rotary mechanism, the utility model discloses a clean dish and cleaning device have good clean effect to photoresist rubber coating tray, have shortened the scavenging period.
Description
Technical Field
The utility model relates to a photoetching technical field especially relates to a cleaning disc and cleaning device for photoresist rubber coating tray.
Background
With the importance of microelectronic fabrication becoming more prominent, the technology is continuously innovated and developed as the key ring of microelectronic fabrication, and the requirement for the photolithography technology is also increased. The photoetching process comprises a gluing process, an exposure process and a developing process, wherein the gluing process is used as the basis of the photoetching process, and the gluing process is frequently used in a production line, so that the cleaning of the gluing tray is very important.
At present, the mainstream cleaning equipment for the gluing tray has different designs aiming at common three-layer and four-layer trays, and the cleaning process is different, so that the equipment is inconvenient to daily maintenance and management.
In the prior art, the patent application No. 201920861749.3 entitled "a self-cleaning gluing device and a sheet bearing tray for the same" includes a protective cover upper cover, a protective cover base, a sheet bearing tray, a cleaning device, a vacuum adsorption system, a driving motor and a rotating shaft. An obliquely upward pipeline is arranged in the radial direction in the wafer bearing tray and used for spraying cleaning liquid, and the wafer bearing tray can fully clean the side wall of the protective cover in the rotating process; the cleaning device comprises a cleaning liquid supply device and a cleaning liquid pipe; the cleaning liquid pipe is connected with the bottom of the wafer bearing tray. The side wall of the upper cover of the protective cover is arc-shaped in the area corresponding to and above the wafer and is used for changing the sputtering direction of the photoresist and solving the problems of the comet tail of the surface of the photoresist and the like; an obliquely upward cleaning liquid channel is formed in the wafer bearing tray and used for spraying cleaning liquid to comprehensively clean the inner wall of the protective cover; the side wall of the bottom of the protective cover is in the shape of an arc slope, so that waste liquid after cleaning is easily discharged, and the operation is simple. The whole device has low complexity and low cost.
The mainstream cleaning equipment for the tray has a single structure, so that the cleaning effect on the local area of the gluing tray is poor, and the requirement cannot be met
Therefore, there is a need to provide a novel cleaning tray and cleaning device for a photoresist coating tray to solve the above-mentioned problems in the prior art.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide a cleaning disc and cleaning device for photoresist rubber coating tray can effectively clean each position of photoresist rubber coating tray.
In order to realize the above-mentioned purpose, the utility model discloses a clean dish for photoresist rubber coating tray, including front panel and back panel, back panel surface is provided with central circular area and outer lane annular district, outer lane annular district is close to clean dish outward flange department is provided with protruding annular district, protruding annular district surface distribution is provided with a plurality of protruding granules, front panel is close to outward flange department and is provided with annular boss structure, annular boss structure surface is provided with a plurality of inclined hole ways, inclined hole way inserts and runs through clean dish.
The beneficial effects of the utility model reside in that: the cleaning plate of above-mentioned structure passes through a plurality of protruding granules on the protruding annular region, can be when clean to the rubber coating tray, break up the atomizing with the cleaning solution that the cleaning plate surface flowed through, and make atomizing cleaning solution can move farther place, thereby play better cleaning effect to the rubber coating tray, and annular boss structure is through blockking the effect with among the cleaning solution guide gets into a plurality of inclined hole ways, make the cleaning solution can flow into the position that the rubber coating tray leaned on more, improve the cleaning effect of cleaning solution to the rubber coating tray.
Preferably, the surface of the convex particles is of a smooth structure or a frosted structure.
Preferably, the diameter of the convex particles is 0.1 to 5 mm.
Preferably, the width of the raised annular region is 5-40 mm.
Preferably, the inclined ducts are uniformly distributed on the annular boss structure, and the distribution angle between adjacent inclined ducts on the cleaning disc is 5-60 degrees.
Above-mentioned angle evenly distributed's slope pore canal distribution interval is reasonable, can block partial cleaning solution on the cleaning tray and evenly introduce into the slope pore canal to in the position more leaning on of rubber coating tray is arranged into through the slope pore canal, improve the cleaning performance.
Preferably, the outer ring annular region is made of polymer material.
Preferably, the central circular area is made of a material with hardness not less than that of sapphire.
The central circular area made of the materials has high hardness, so that the whole cleaning disc is easy to deform after being subjected to surface vacuum adsorption, and the outer ring annular area made of the polymer materials enables the whole cleaning disc to have certain flexibility, so that the problem that the whole cleaning disc is fragile due to high hardness is avoided.
Preferably, the central circular area has a diameter in the range of 20 to 200mm and a thickness of 0.1 to 10 mm.
The utility model also provides a cleaning device for the photoresist gluing tray, which comprises the cleaning tray, a wafer bearing table, a cleaning solution spraying mechanism and an adjusting and rotating mechanism;
the cleaning disc is arranged on the wafer bearing table, the front surface of the cleaning disc is in contact with the wafer bearing table, and the back surface of the cleaning disc faces upwards;
the cleaning solution spraying mechanism is arranged outside the wafer bearing table and comprises a first spray head and a second spray head, the first spray head is arranged outside the wafer bearing table, the spray head of the first spray head faces the back face of the cleaning disc, one end of the second spray head is connected with a mechanical arm, the mechanical arm is located at the center above the back face of the cleaning disc, and the spray head of the second spray head faces the back face of the cleaning disc;
the adjusting and rotating mechanism is installed at the bottom end of the wafer bearing platform and used for driving the wafer bearing platform to rotate and adjusting the rotating speed.
Above-mentioned cleaning device with cleaning disc, through the regulation rotary mechanism that can freely adjust the rotational speed, when the cleaning disc was placed at the wafer bearing bench, the rotational speed through changing regulation rotary mechanism drove wafer bearing platform and cleaning disc and is rotatory with different rotational speeds to improve the cleaning solution on the cleaning disc and to the clean effect of rubber coating tray on every side, shorten clean time, can realize the all-round cover to rubber coating tray upper and lower position simultaneously, further improve holistic clean effect.
Preferably, the sheet bearing platform is further provided with a sucker, and the sucker adsorbs the cleaning disc on the sheet bearing platform.
Preferably, the adjusting and rotating mechanism is a servo motor.
Drawings
FIG. 1 is a schematic view of the overall structure of the cleaning device of the present invention;
FIG. 2 is a schematic view of a top view of the back of the cleaning plate of the present invention;
FIG. 3 is a schematic front top view of the cleaning plate of the present invention;
FIG. 4 is a schematic cross-sectional view of a part of the boss structure of the present invention;
fig. 5 is a schematic perspective view of the back of the cleaning plate of the present invention;
fig. 6 is a schematic front perspective view of the cleaning plate of the present invention.
Reference numbers in the figures:
1-cleaning the disc;
101-a central circular area;
102-an outer annular ring zone; 1021-a raised annular region; 1022-raised particles; 103-annular boss structure;
104-inclined ducts;
2-a wafer bearing platform;
3-cleaning solution spraying mechanism; 301-a first spray head; 302-a second showerhead; 303-a robotic arm; 4-adjusting the rotating mechanism; 5-sucker.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention clearer, the drawings of the present invention are combined to clearly and completely describe the technical solutions in the embodiments of the present invention, and obviously, the described embodiments are some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative efforts belong to the protection scope of the present invention. Unless defined otherwise, technical or scientific terms used herein shall have the ordinary meaning as understood by one of ordinary skill in the art to which this invention belongs. As used herein, the word "comprising" and similar words are intended to mean that the element or item listed before the word covers the element or item listed after the word and its equivalents, but does not exclude other elements or items.
To the problem that prior art exists, as shown in fig. 2 to 6, the embodiment of the utility model provides a cleaning disc for photoresist rubber coating tray, including front disc and back disc, back disc surface is provided with central circular region 101 and outer lane annular region 102, outer lane annular region 102 is close to 1 outward flange department of cleaning disc is provided with protruding annular region 1021, protruding annular region 1021 surface distribution is provided with a plurality of protruding granules 1022, front disc is close to outward flange department and is provided with annular boss structure 103, annular boss structure 103 surface is provided with a plurality of inclined hole 104, inclined hole 104 inserts and runs through cleaning disc 1.
The cleaning disc 1 of above-mentioned structure has good water conservancy diversion and dispersion effect to being used for clear cleaning solution, cleaning solution wherein is for being used for the abluent photoresistance diluent of photoresist rubber coating tray, when using, through rotating cleaning disc 1, make the cleaning solution that sprays on cleaning disc 1 on the one hand broken up the atomizing by a plurality of protruding granule 1022 of protruding annular district 1021, move farther position through the air current of airing exhaust and carry out cleaning treatment to the rubber coating tray, improve clean effect, and annular boss structure 103 blocks partial cleaning solution, and make partial cleaning solution enter into inside the inclined hole way 104, thereby enter into the position more under the needs clear rubber coating tray inner wall, the realization is to the comprehensive cleanness of rubber coating tray, further improve clean effect.
In one possible embodiment, the surfaces of the raised particles 1022 are smooth structures or frosted structures.
Further, the diameter of the raised particles 1022 is 0.1-5mm, and the raised particles 1022 can scatter and atomize the cleaning liquid into atomized particles with a suitable size, so as to achieve a better cleaning effect when the gluing tray is cleaned.
In one possible embodiment, the width of the raised annular region 1021 is 5-40 mm.
In a possible embodiment, the inclined ducts 104 are uniformly distributed on the annular boss structure 103, and the distribution angle between adjacent inclined ducts 104 on the cleaning disk 1 is 5-60 °.
In one possible embodiment, the outer annular region 102 is a polymer material.
In a possible embodiment, the central circular area 101 is made of a material having a hardness not less than that of sapphire.
It should be noted that the central circular area made of the above materials has high hardness, so that the whole cleaning disc is easy to deform after vacuum adsorption on the surface, and the outer ring annular area made of the polymer material enables the whole cleaning disc to have certain flexibility, thereby avoiding the problem that the whole cleaning disc is fragile due to high hardness.
In this embodiment, PPS material is used for the outer annular region 102, and sapphire material is used for the central annular region 101.
It should be noted that, in this embodiment, the material used for the outer ring annular region 102 is a high-strength polymer material, and the material used for the central circular region 101 is a high-hardness material, such as sapphire, and the materials meeting the above requirements can be applied to this embodiment, and are not limited herein.
In one possible embodiment, the central circular area 101 has a diameter in the range of 20 to 200mm and a thickness of 0.1 to 10 mm.
As shown in fig. 1, the utility model also provides a cleaning device for a photoresist gluing tray, which comprises the cleaning tray 1, a wafer bearing table 2, a cleaning solution spraying mechanism 3 and an adjusting and rotating mechanism 4;
the cleaning disc 1 is arranged on the wafer bearing table 2, the front surface of the cleaning disc 1 is in contact with the wafer bearing table 2, and the back surface of the cleaning disc 1 faces upwards;
cleaning solution spraying mechanism 3 sets up wafer stage 2 outsides, cleaning solution spraying mechanism 3 includes first shower nozzle 301 and second shower nozzle 302, first shower nozzle 301 sets up wafer stage 2 outsides, just the shower nozzle orientation of first shower nozzle 301 the cleaning dish 1 back, the one end of second shower nozzle 302 is connected with robotic arm 303, robotic arm 303 is located the center department of cleaning dish 1 back top, the shower nozzle orientation of second shower nozzle 302 the cleaning dish 1 back.
Further, the first shower head 301 is located at a position near the outer edge of the rear surface of the cleaning tray 1, and the second shower head 302 is located at the center above the rear surface of the cleaning tray 1.
Further, in the present embodiment, the first showerhead 301 is a BSR showerhead for spraying BSR solution, which is a photoresist thinner, and the main components are propylene glycol monomethyl ether and glycol monomethyl ether acetate; the second nozzle 302 is an RRC nozzle for spraying an RRC solution, is a light resistance diluent and mainly comprises propylene glycol monomethyl ether and glycol monomethyl ether acetate;
and the adjusting and rotating mechanism 4 is arranged at the bottom end of the wafer bearing platform 2 and is used for driving the wafer bearing platform 2 to rotate and adjusting the rotating speed.
When specifically using, through the regulation rotary mechanism 4 that can freely adjust the rotational speed, when cleaning disc 1 places on cushion cap platform 2, the rotational speed through changing regulation rotary mechanism 4 drives cushion cap platform 2 and cleaning disc 1 and rotates with the rotational speed of difference, thereby improve the cleaning solution on the cleaning disc 1 and to the cleaning effect of rubber coating tray on every side, shorten clean time, cooperate the special structure of annular bellied district 1021 and annular bellied structure 103 on the cleaning disc 1 simultaneously, break up the atomizing with the cleaning solution respectively, and lead-in partial cleaning solution to the more lower part position of rubber coating tray through inclined hole 104, improve the cleaning effect to the rubber coating tray, can realize the all-round cover to rubber coating tray upper and lower position simultaneously, further improve holistic cleaning effect.
In a possible embodiment, a suction cup 5 is further installed on the sheet bearing platform 2, and the cleaning disc 1 is sucked on the sheet bearing platform 2 by the suction cup 5.
The cleaning disc 1 is adsorbed on the wafer bearing platform 2 through the sucking disc 5, so that the stability of the cleaning disc 1 is ensured, and a vacuum sucking disc is preferred.
In one possible embodiment, the adjusting and rotating mechanism 4 is a servomotor.
It should be noted that, the adjusting and rotating mechanism 4 in this embodiment is used for driving the wafer bearing platform 2 to rotate and adjust the rotating speed, and the rotating device in the prior art that can rotate and adjust can be applied to this embodiment, and the adjusting and rotating mechanism 4 in this embodiment includes, but is not limited to, the above-mentioned servo motor.
Although the embodiments of the present invention have been described in detail hereinabove, it is apparent to those skilled in the art that various modifications and variations can be made to these embodiments. However, it is to be understood that such modifications and variations are within the scope and spirit of the present invention as set forth in the appended claims. Moreover, the invention as described herein is capable of other embodiments and of being practiced or of being carried out in various ways.
Claims (11)
1. The utility model provides a clean dish for photoresist rubber coating tray, its characterized in that, includes front panel and back panel, back panel surface is provided with central circular area and outer lane annular district, outer lane annular district is close to clean dish outward flange department is provided with protruding annular district, protruding annular district surface distribution is provided with a plurality of protruding granules, front panel is close to outward flange department and is provided with annular boss structure, annular boss structure surface is provided with a plurality of inclined hole ways, inclined hole way inserts and runs through clean dish.
2. A cleaning tray according to claim 1, wherein the surface of the convex particles is of a smooth texture or a frosted texture.
3. A cleaning tray for a photoresist spreading tray according to claim 2, wherein the diameter of the protrusion particles is 0.1-5 mm.
4. A cleaning disk for a photoresist spreading tray according to claim 1 wherein the width of the raised annular region is 5-40 mm.
5. A cleaning plate for a photoresist spreading tray according to claim 1, wherein the inclined tunnels are uniformly distributed on the annular boss structure, and the distribution angle between adjacent inclined tunnels on the cleaning plate is 5-60 °.
6. A cleaning disk for a photoresist dispense tray according to claim 1, wherein the outer annular region is of a polymeric material.
7. A cleaning plate for a resist spreading tray according to claim 1, wherein the central circular region is made of a material having a hardness not less than sapphire.
8. A cleaning tray according to claim 1, wherein the central circular area has a diameter in the range of 20-200mm and a thickness of 0.1-10 mm.
9. A cleaning apparatus for a resist coating tray, comprising the cleaning tray according to any one of claims 1 to 8, further comprising a stage, a cleaning liquid spraying mechanism, an adjusting rotating mechanism;
the cleaning disc is arranged on the wafer bearing table, the front surface of the cleaning disc is in contact with the wafer bearing table, and the back surface of the cleaning disc faces upwards;
the cleaning solution spraying mechanism is arranged outside the wafer bearing table and comprises a first spray head and a second spray head, the first spray head is arranged outside the wafer bearing table, the spray head of the first spray head faces the back face of the cleaning disc, one end of the second spray head is connected with a mechanical arm, the mechanical arm is located at the center above the back face of the cleaning disc, and the spray head of the second spray head faces the back face of the cleaning disc;
the adjusting and rotating mechanism is installed at the bottom end of the wafer bearing platform and used for driving the wafer bearing platform to rotate and adjusting the rotating speed.
10. A cleaning apparatus for a photoresist spreading tray according to claim 9, wherein a suction cup is further mounted on the stage, and the suction cup sucks the cleaning plate on the stage.
11. The cleaning apparatus for a photoresist spreading tray according to claim 9, wherein the adjusting rotation mechanism is a servo motor.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202021177746.7U CN213222923U (en) | 2020-06-23 | 2020-06-23 | Cleaning disc and cleaning device for photoresist gluing tray |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202021177746.7U CN213222923U (en) | 2020-06-23 | 2020-06-23 | Cleaning disc and cleaning device for photoresist gluing tray |
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| Publication Number | Publication Date |
|---|---|
| CN213222923U true CN213222923U (en) | 2021-05-18 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202021177746.7U Active CN213222923U (en) | 2020-06-23 | 2020-06-23 | Cleaning disc and cleaning device for photoresist gluing tray |
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| CN (1) | CN213222923U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115228864A (en) * | 2022-09-05 | 2022-10-25 | 宁波润华全芯微电子设备有限公司 | Cleaning disc for spin-coating waste liquid collecting cup and spin-coating device |
-
2020
- 2020-06-23 CN CN202021177746.7U patent/CN213222923U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115228864A (en) * | 2022-09-05 | 2022-10-25 | 宁波润华全芯微电子设备有限公司 | Cleaning disc for spin-coating waste liquid collecting cup and spin-coating device |
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