CN213108238U - Polishing and softening treatment device for fused deposition model - Google Patents
Polishing and softening treatment device for fused deposition model Download PDFInfo
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- CN213108238U CN213108238U CN202021530823.2U CN202021530823U CN213108238U CN 213108238 U CN213108238 U CN 213108238U CN 202021530823 U CN202021530823 U CN 202021530823U CN 213108238 U CN213108238 U CN 213108238U
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- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
Abstract
The utility model discloses a polishing and softening treatment device for a fused deposition model, which comprises a shell, wherein the top of the shell is provided with an opening, and a treatment chamber is formed inside the shell; the upper cover is detachably connected to the opening at the top of the shell, the upper cover is partially transparent and is used for sealing the opening, a window is formed in the upper cover, and a sealing cover is connected to the window in an openable mode; the heating element is arranged at the bottom of the shell and is in heat conduction contact with the shell; and the controller is in control connection with the heating element and is used for adjusting the heating temperature of the heating element. The user can add treatment fluid, air or water from the window to with treatment fluid vapor concentration and humidity control in reasonable within range in the treatment chamber, adjust heating element's heating temperature through the controller, make the model can realize the softening of different degrees at the in-process of being treated fluid vapor polishing, thereby improve the performance of model, obtain better surface quality, toughness and shock resistance, can realize the polishing and the softening of model simultaneously in once processing.
Description
Technical Field
The utility model relates to a macromolecular material shaping and processing technology field, in particular to a polishing and softening processing apparatus for fused deposition model.
Background
The Fused Deposition Modeling (FDM) technique is widely used because of its advantages such as low cost, easy operation, high utilization rate of raw materials, safety, and non-toxicity. According to the technology, thermoplastic wires are melted and extruded to form profile sheets on a working platform, and the profile sheets are stacked layer by layer to obtain a three-dimensional object.
The thermoplastic material (such as polylactic acid PLA) is a wire material which is widely applied in an FDM process, has good tensile strength, compressive strength, bending strength, ductility and toughness, has smooth surface, uniform diameter and no collapse after being processed into the wire material, has good flexibility at normal temperature, also has proper fluidity in a molten state and small shrinkage after fast cold curing. Due to the surface step effect caused by the forming principle of the FDM process, the surface of the prepared model is still rough.
In the prior art, polishing operations are usually performed on fused deposition models by means of conventional mechanical polishing processes or by chemical post-treatment using PLA polishing liquids. Mechanical polishing processes commonly use sand paper to sand the surface of a pattern. The chemical post-treatment polishing process of the PLA polishing solution is commonly characterized in that a model is soaked in the PLA polishing solution for a plurality of seconds and then taken out for drying, the PLA polishing solution is an organic reagent capable of dissolving thermoplastic materials, the main components of the PLA polishing solution comprise trichloromethane, chloroform and the like, and the trichloromethane is liquid at normal temperature and is volatile and reacts with oxygen when being irradiated by light. However, such PLA slurries are generally toxic and need to be carried out in a ventilated environment. However, no matter the model is sanded by sand paper or simply soaked in PLA polishing solution, the polishing effect of the model is not ideal, and the surface quality of the model is not high. In addition, after the model is formed by fused deposition, the rigidity and the brittleness are higher, the toughness and the impact resistance are poor, and moisture or redundant materials are inevitably stored in the inner cavity and are difficult to remove.
SUMMERY OF THE UTILITY MODEL
In order to solve the above technical problem, the present invention provides a device capable of simultaneously polishing and softening a fused deposition model to obtain better surface quality, toughness and impact resistance.
To this end, the present invention provides a polishing and softening apparatus for a fused deposition model, comprising:
a housing having an opening at the top and a processing chamber formed therein;
the upper cover is detachably connected to the top of the shell and used for opening or closing the opening, a part of the upper cover is transparent, a window is arranged on the upper cover, and a sealing cover used for opening or closing the window is connected to the upper cover;
a heating element disposed at a bottom of the housing and in heat-conducting contact with the housing;
and the controller is in control connection with the heating element and is used for adjusting the heating temperature of the heating element.
The utility model discloses a polishing and softening device, including casing, upper cover, lid, water, processing liquid, heating element, controller, the user's accessible is opened the upper cover and is arranged the model in the process chamber of casing, seal the upper cover at the casing opening part again, through opening the closing cap on the upper cover, add the processing liquid from the window, thereby make the processing liquid volatilize in the process chamber, the accessible is opened the window on the upper cover and is added the air, water or will handle the liquid, thereby with the control of processing liquid steam concentration and humidity in the process chamber at reasonable within range, adjust heating element's heating temperature through the controller, make the model can realize the not flexible processing of degree by the in-process of processing liquid steam polishing, thereby improve the performance of model, obtain better surface quality, toughness and shock resistance, can realize the polishing and.
As a preferred scheme of the utility model, the casing includes siphonozooid and evaporating dish, the siphonozooid is open structure from top to bottom, the evaporating dish is connected the lower tip of siphonozooid, tip under the siphonozooid with the inside and outside both sides of evaporating dish junction are provided with first seal structure and second seal structure respectively. The sealing structures are arranged on the inner side and the outer side of the joint of the evaporating dish and the tubular body respectively, the double-sealing structure is better in sealing effect, the steam concentration of the treatment liquid in the treatment chamber can be guaranteed, the treatment liquid steam in the treatment chamber is prevented from leaking to cause damage to operators, and the model polishing and softening efficiency is improved.
As a further preferable mode of the above technical solution, the first sealing structure is a sealing ring made of PMMA material. The first sealing structure is a sealing ring made of a known PMMA material, and based on the characteristic that the PMMA material can be dissolved by trichloromethane in the treatment liquid, the sealing ring is dissolved to form colloidal liquid with certain fluidity when being contacted with the vapor of the treatment liquid, so that a gap at the joint of the lower end part of the tubular body and the evaporating dish is filled, and a liquid sealing layer is formed; when the concentration of the treatment fluid in the treatment chamber is reduced, the PMMA material can be cured again, so that the tubular body and the evaporation dish are connected together in a fastening mode, the process is repeated, and the sealing and the connection between the tubular body and the evaporation dish are made to be more reliable due to the similar self-sealing structure.
As a further preferable mode of the above technical solution, an annular chamber is configured between the outer peripheral wall surface of the tubular body and the inner peripheral wall surface of the evaporation pan, and the second sealing structure includes a sealing filler filled in the annular chamber and a gland covering the top of the annular chamber. The sealing structure not only avoids the potential safety hazard of virulent phosgene caused by the visible light reaction of the trichloromethane in the treatment liquid, but also can further control the concentration of steam, and has better polishing and softening effects.
As a further preferable mode of the above technical solution, the tubular body is made of PMMA material, and a layer of metal thin film is compounded on an inner peripheral wall surface of the tubular body. The tubular body is made of known PMMA material, so that the structural cost is reduced, and the metal film is compounded on the inner peripheral wall surface of the tubular body, so that the trichloromethane gas in the treatment fluid is effectively isolated from the chemical reaction with the PMMA material, and the corrosion is avoided.
As a further preferred scheme of the above technical scheme, the bottom of the evaporation dish is provided with a supporting component, the supporting component comprises a base and a heat dissipation shell, the heat dissipation shell is annular, the bottom of the heat dissipation shell is fixed on the base, the top edge of the heat dissipation shell is supported and abutted against the outer edge of the evaporation dish, the heat dissipation shell is provided with heat dissipation holes arranged in the circumferential direction, and the controller is installed on the base. When supporting the evaporating dish, can in time give off the heat that heating element produced to external environment in, avoid the device when carrying out the softening to the model, the bottom temperature is too high for the model takes place the local excessive softening, influences its performance.
As another preferred scheme of the utility model, the upper cover is including sealed clamping ring, transparent cover and packing ring, sealed clamping ring joint is in casing top outer fringe and its top upwards outstanding draw-in groove that forms, transparent cover inlays in the draw-in groove and will the packing ring compresses tightly transparent cover with between the sealed clamping ring. The upper cover is connected to the upper end opening of the shell in a clamping mode, so that the upper cover can be detached, the model is conveniently placed into the treatment chamber, the gasket is pressed between the transparent cover plate and the sealing pressure ring, and the upper cover can play a good sealing role when being covered at the opening of the upper end of the shell.
As a further preferable mode of the above technical means, the transparent cover plate is a transparent glass plate. The known transparent glass plate is used as the transparent cover plate, so that operators can directly observe the surface quality of parts when polishing and softening the model, treatment liquid, air or water is added through the window on the upper cover according to the specific situation of the model, the concentration, humidity and temperature of steam in a treatment chamber are changed, polishing and softening can be simultaneously realized in one treatment process, and the performance of the model is improved in multiple aspects.
As still another preferred aspect of the present invention, the cover is rotatably connected to the upper cover by a vertically upwardly extending shaft. The operator can conveniently open the sealing cover in a rotating mode.
As another preferred embodiment of the present invention, a rack for supporting the fused deposition model is provided in the housing.
Drawings
Fig. 1 is a schematic structural diagram of the present invention;
FIG. 2 is a schematic structural view of the upper cover of the present invention;
FIG. 3 is a partially enlarged view of the junction between the lower end of the tubular body and the evaporating dish of the present invention (the vapor of the treating fluid does not chemically react with the sealing ring);
FIG. 4 is a partially enlarged view of the junction between the lower end of the tubular body and the evaporating dish of the present invention (the vapor of the treating fluid chemically reacts with the sealing ring, and the sealing ring dissolves to form a gel-like liquid to fill the gap at the junction);
FIG. 5 is a schematic view of the polishing of a fused deposition mold with process fluid vapor in accordance with the present invention;
wherein: 100. polishing and softening processing device for fused deposition model; 200. a model;
1. a housing; 11. a tubular body; 12. an evaporating dish; 13. a seal ring; 14. sealing and filling; 15. a gland; 16. a metal thin film; 17. a base; 18. a heat dissipation housing; 181. heat dissipation holes; 19. a material rack;
2. an upper cover; 21. sealing the pressure ring; 22. a transparent cover plate; 23. a gasket; 24. sealing the cover; 25. a shaft;
3. a heating element;
4. and a controller.
Detailed Description
To explain the technical content, structural features, achieved objects and functions of the present invention in detail, the following detailed description is made with reference to the accompanying drawings. The following examples are intended only to illustrate the invention in detail, and are not intended to limit the scope of the invention in any way.
As shown in fig. 1, a polishing and softening processing apparatus 100 for a fused deposition pattern includes a housing 1, an upper cover 2, a heating element 3, and a controller 4.
The casing 1 comprises a tubular body 11 and an evaporation pan 12, wherein the tubular body 11 is of an upper and lower open structure, the evaporation pan 12 is connected to the lower end part of the tubular body 11, the upper end of the tubular body 11 is open to form an opening for placing a model, and a space enclosed by the tubular body 11 and the evaporation pan 12 forms a processing chamber. A rack 19 for supporting a fused deposition model is arranged in the housing 1. The evaporation pan 13 is made of stainless steel material, the tubular body 11 is made of PMMA material, and a layer of metal film 16 is compounded on the inner peripheral wall surface of the tubular body 11. The tubular body 11 is made of known PMMA material, so that the structure cost can be reduced, and the metal film 16 is compounded on the inner peripheral wall surface of the tubular body 11, so that the trichloromethane steam in the treatment fluid is effectively isolated from the chemical reaction with the PMMA material, and the corrosion is avoided.
The inner side and the outer side of the joint of the lower end part of the tubular body 11 and the evaporating dish 12 are respectively provided with a first sealing structure and a second sealing structure. Through setting up seal structure respectively in the inside and outside both sides of the junction of evaporating dish 12 and siphonozooid 11, the sealed effect of this kind of double seal structure is better, can guarantee the vapour concentration of the treatment fluid in the treatment chamber, avoids the treatment fluid vapour in the treatment chamber to leak and causes the injury to operating personnel, improves model polishing and softening efficiency.
Specifically, as shown in fig. 1, 3 and 4, a first sealing structure is disposed inside the joint of the tubular body 11 and the evaporation pan 12, and the first sealing structure is a sealing ring 13 made of PMMA material. Based on the characteristic that the PMMA material can be dissolved by chloroform in the processing liquid, when the sealing ring 13 contacts with the vapor of the processing liquid, the PMMA material is dissolved to form a colloidal liquid with a certain fluidity, so as to fill the gap between the lower end of the tubular body 11 and the connection of the evaporating dish 12, thereby forming a liquid sealing layer. The PMMA material can again be re-solidified when the concentration of the process fluid in the process chamber decreases, thereby securely connecting the tubular body 11 and the evaporation dish 12, and so on, like a self-sealing structure, so that the sealing and connection between the tubular body 11 and the evaporation dish 12 is increasingly reliable.
The second sealing structure is arranged outside the joint of the tubular body 11 and the evaporation pan 12, an annular cavity is formed between the outer peripheral wall surface of the tubular body 11 and the inner peripheral wall surface of the evaporation pan 12, and the second sealing structure comprises a sealing filler 14 filled in the annular cavity and a gland 15 covering the top of the annular cavity. The sealing structure not only avoids the potential safety hazard of highly toxic phosgene caused by the visible light reaction of the trichloromethane in the treatment liquid, but also can further control the concentration of the vapor of the treatment liquid, thereby achieving better polishing and softening effects.
The upper cover 2 is detachably connected to the casing 1 and used for opening or closing an opening at the top of the casing 1, a part of the upper cover 2 is transparent, a window is arranged on the upper cover 2, and a sealing cover 24 used for opening or closing the window is connected to the upper cover 2.
Specifically, as shown in fig. 1 and 2, the upper cover 2 includes a sealing press ring 21, a transparent cover plate 22 and a gasket 23, the sealing press ring 21 is clamped at the outer edge of the top of the housing 1, and the top end of the sealing press ring protrudes upwards to form a clamping groove, and the transparent cover plate 22 is embedded in the clamping groove and compresses the gasket 23 between the transparent cover plate 22 and the sealing press ring 21. Connect upper cover 2 at casing 1 upper end opening through the mode of joint to make upper cover 2 can dismantle, make things convenient for the model to put into the process chamber, packing ring 23 is compressed tightly between transparent cover plate 22 and sealed clamping ring 21, and upper cover 2 lid can play good sealed effect again when closing casing 1 upper end opening part. The transparent cover plate 22 is a glass plate. The known transparent glass plate is used as the transparent cover plate, so that an operator can conveniently and directly observe the surface quality of the model when polishing and softening the model, treatment liquid, air or water is added through the window on the upper cover according to the specific situation of the model, the concentration, humidity and temperature of steam in the treatment chamber are changed, the polishing and softening can be simultaneously realized in one treatment process, and the performance of the model is improved in multiple aspects.
To facilitate the opening of the cover 24 by the operator. The cover 24 is rotatably connected to the upper cover 2 by a vertically upwardly extending shaft 25. The operator opens the lid 24 in a rotating manner, and adds air, water, treatment liquid, and the like from the window of the upper lid 2, thereby increasing the vapor concentration, humidity, and the like in the treatment chamber. Of course, the vapor concentration may also be reduced by drawing the process fluid vapor from the process chamber through an external pumping assembly.
The heating element 3 is arranged at the bottom of the housing 1 and is in heat conducting contact with the housing 1. The controller 4 is in control connection with the heating element 3 for adjusting the heating temperature of the heating element 3. Specifically, as shown in fig. 1, the bottom of the evaporation pan 12 is provided with a support assembly, the support assembly includes a base 17 and a heat dissipation casing 18, the heat dissipation casing 18 is annular, the bottom of the heat dissipation casing 18 is fixed on the base 17, the top edge of the heat dissipation casing 18 supports and abuts against the outer edge of the evaporation pan 12, the heat dissipation casing 18 is provided with heat dissipation holes 181 arranged in the circumferential direction, and the controller 4 is installed on the base 17. When supporting evaporating dish 12, can in time give off the heat that heating element 3 produced to external environment in, avoid the device when carrying out the softening to the model, the bottom temperature is too high for the model takes place the local excessive softening, influences its performance.
The working principle of polishing and softening the fused deposition model by using the device is realized as follows:
the user arranges the model in the treatment chamber of casing 1 through opening upper cover 2, again with upper cover 2 sealed at casing 1 opening part, through opening closing cap 24 on upper cover 2, add the treatment fluid from the window department, thereby make the treatment fluid volatilize in the treatment chamber, the accessible opens the window on upper cover 2 and adds air, water or with the treatment fluid, thereby with treatment fluid steam concentration and humidity control in reasonable scope in the treatment chamber, adjust the heating temperature of heating element 3 through controller 4, make the model can realize the flexibility of different degrees at the in-process of being handled the polishing of liquid steam, thereby improve the performance of model, obtain better surface quality, toughness and shock resistance, can realize the polishing and the flexibility of model in once processing simultaneously.
Specifically, as shown in fig. 5, in the polishing process, the heating temperature of the heating element 3 is controlled to be 30 to 40 ℃, and the thermoplastic materials such as PLA are dissolved and degraded into small molecules when encountering the chloroform vapor in the processing liquid. For a fused deposition model, a corrugated structure is generated on the surface of the model due to the step effect, and the volatile solvent vapor treatment is adopted, so that fluid liquid drops are formed at the peaks and the valleys of the surface of the model 200. Under the action of the surface tension of the liquid and gravity, the two liquid drops are fused, so that the wave crest is reduced, the wave trough is filled, the roughness of the surface of the model is reduced after balance, and the polishing effect is achieved.
During softening treatment, the heating temperature of the heating element 3 is controlled to be 80-90 ℃, trichloromethane steam permeates into the reticular filling structure in the model, part of materials in the model are dissolved, moisture in air absorbed by the thermoplastic material in the fused deposition forming process is removed, the rigidity and the brittleness of the fused deposition model are reduced, the softening phenomenon occurs, and the toughness and the impact resistance are enhanced.
In the embodiment, the processing liquid which takes trichloromethane as a main component is adopted, the trichloromethane is volatile, the trichloromethane can be quickly evaporated by proper temperature rise, and the vapor concentration required by polishing can be quickly reached in the processing chamber, so that the model is not forced to be locally softened in the polishing process due to overhigh temperature, and the time for polishing the model can be shortened.
In this embodiment, gland, base, sealed clamping ring, heat dissipation shell are colored PLA finished piece, and in case equipment takes place to leak, the phenomenon that fades can appear in the colored PLA material that high concentration's treatment fluid vapour can make the position of leaking, and the inhomogeneous plaque of color can appear rapidly in the part surface to play leakage warning and cushioning effect. And meanwhile, a large number of heat dissipation holes are formed between the base and the heat dissipation shell, so that the phenomenon that the temperature of the bottom of the equipment is too high when the equipment is subjected to softening treatment, and the PLA part is locally softened to influence the performance of the PLA part is avoided.
In this embodiment, in addition to the polylactic acid (PLA) listed above, other thermoplastic materials such as (ABS (acrylonitrile-butadiene-styrene copolymer) resin, polycarbonate, PPSF (polyphenylsulfone) resin, and polyetherimide may be used.
The above embodiments are only for illustrating the technical concept and features of the present invention, and the purpose of the embodiments is to enable people skilled in the art to understand the contents of the present invention and to implement the present invention, which cannot limit the protection scope of the present invention. All equivalent changes and modifications made according to the spirit of the present invention should be covered within the protection scope of the present invention.
Claims (10)
1. A polishing and softening apparatus for a fused deposition modeling, comprising:
a housing (1) having an opening at the top and a processing chamber inside;
the upper cover (2) is detachably connected to the top of the shell (1) and used for opening or closing the opening, part of the upper cover (2) is transparent, a window is arranged on the upper cover (2), and a sealing cover (24) used for opening or closing the window is connected to the upper cover (2);
a heating element (3) arranged at the bottom of the housing (1) and in heat-conducting contact with the housing (1);
and the controller (4) is in control connection with the heating element (3) and is used for adjusting the heating temperature of the heating element (3).
2. The polishing and softening apparatus for a fused deposition modeling according to claim 1, wherein: casing (1) includes siphonozooid (11) and evaporating dish (12), siphonozooid (11) are upper and lower open structure, evaporating dish (12) are connected the lower tip of siphonozooid (11), down tip under siphonozooid (11) with the inside and outside both sides of evaporating dish (12) junction are provided with first seal structure and second seal structure respectively.
3. The polishing and softening apparatus for a fused deposition modeling according to claim 2, wherein: the first sealing structure is a sealing ring (13) made of PMMA material.
4. The polishing and softening apparatus for a fused deposition modeling according to claim 2, wherein: an annular cavity is formed between the outer peripheral wall surface of the tubular body (11) and the inner peripheral wall surface of the evaporating dish (12), and the second sealing structure comprises a sealing filler (14) filled in the annular cavity and a gland (15) covering the top of the annular cavity.
5. The polishing and softening apparatus for a fused deposition modeling according to claim 2, wherein: the tubular body (11) is made of PMMA material, and a layer of metal film (16) is compounded on the inner peripheral wall surface of the tubular body (11).
6. The polishing and softening apparatus for a fused deposition modeling according to claim 2, wherein: evaporating dish (12) bottom is provided with supporting component, supporting component includes base (17) and heat dissipation shell (18), heat dissipation shell (18) are cyclic annular, the bottom of heat dissipation shell (18) is fixed on base (17), top edge with evaporating dish (12) outward flange supports the butt mutually, be equipped with louvre (181) that circumference was arranged on heat dissipation shell (18), install controller (4) on base (17).
7. The polishing and softening apparatus for a fused deposition modeling according to claim 1, wherein: the upper cover (2) comprises a sealing press ring (21), a transparent cover plate (22) and a gasket (23), the sealing press ring (21) is connected with the outer edge of the top of the shell (1) and the top end of the shell protrudes upwards to form a clamping groove, the transparent cover plate (22) is embedded in the clamping groove and the gasket (23) is pressed between the transparent cover plate (22) and the sealing press ring (21).
8. The polishing and softening apparatus for a fused deposition modeling according to claim 7, wherein: the transparent cover plate (22) is a glass plate.
9. The polishing and softening apparatus for a fused deposition modeling according to claim 1, wherein: the cover (24) is rotatably connected to the upper cover (2) by a vertically upwardly extending shaft (25).
10. The polishing and softening apparatus for a fused deposition modeling according to claim 1, wherein: the shell (1) is internally provided with a material rack (19) for supporting a fused deposition model.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202021530823.2U CN213108238U (en) | 2020-07-29 | 2020-07-29 | Polishing and softening treatment device for fused deposition model |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202021530823.2U CN213108238U (en) | 2020-07-29 | 2020-07-29 | Polishing and softening treatment device for fused deposition model |
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| CN213108238U true CN213108238U (en) | 2021-05-04 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114103123A (en) * | 2021-12-01 | 2022-03-01 | 成都小火箭科技有限公司 | Photocuring 3D prints aftertreatment and disappears line equipment |
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2020
- 2020-07-29 CN CN202021530823.2U patent/CN213108238U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114103123A (en) * | 2021-12-01 | 2022-03-01 | 成都小火箭科技有限公司 | Photocuring 3D prints aftertreatment and disappears line equipment |
| CN114103123B (en) * | 2021-12-01 | 2023-12-08 | 成都小火箭科技有限公司 | Photo-curing 3D printing post-treatment wrinkle eliminating equipment |
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Assignee: MARINE RESOURCES DEVELOPMENT INSTITUTE OF JIANGSU (LIANYUNGANG) Assignor: Jiangsu Ocean University Contract record no.: X2023980048267 Denomination of utility model: A polishing and softening device for molten deposition models Granted publication date: 20210504 License type: Common License Record date: 20231128 |
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