CN213106226U

CN213106226U - Improved monocrystalline silicon double-sided polishing machine

Info

Publication number: CN213106226U
Application number: CN202021754896.XU
Authority: CN
Inventors: 陈�峰
Original assignee: Zhejiang Zhongjing Electronic Co ltd
Current assignee: Zhejiang Zhongjing Electronic Co ltd
Priority date: 2020-08-20
Filing date: 2020-08-20
Publication date: 2021-05-04
Anticipated expiration: 2030-08-20

Abstract

The utility model discloses an improved generation monocrystalline silicon double-sided burnishing machine, including base, support column, polishing subassembly, regulation pole, movable block, locking knob, mounting panel, centre gripping subassembly and monocrystalline silicon body, the top fixed mounting of base has the support column, the right side of support column is provided with polishing subassembly, the top fixed mounting of base has the regulation pole, the surface sliding of adjusting the pole is connected with the movable block, the positive surface of movable block is provided with the locking knob, the top fixed mounting of movable block has the mounting panel, the left side fixed surface of mounting panel installs the centre gripping subassembly. The utility model discloses a polishing equipment commonly used improves, makes it can process two faces of monocrystalline silicon simultaneously when using, has improved the efficiency of processing greatly, through the centre gripping subassembly that sets up, makes it can stabilize the centre gripping with the monocrystalline silicon body when using, prevents that the monocrystalline silicon body from taking place the displacement at the in-process of processing.

Description

Improved monocrystalline silicon double-sided polishing machine

Technical Field

The utility model relates to a monocrystalline silicon processing technology field specifically is a two-sided burnishing machine of improved generation monocrystalline silicon.

Background

The conductivity of semiconductors is between that of conductors and insulators, silicon, germanium, gallium arsenide and cadmium sulfide are semiconductor materials, the resistivity of the semiconductor materials is reduced along with the increase of temperature and the increase of radiation intensity, and trace impurities are added into the semiconductors, so that the conductivity of the semiconductors is influenced decisively, and the important characteristics of the semiconductor materials are realized. Silicon is the most commonly used semiconductor material, and when molten elemental silicon solidifies, the silicon atoms are arranged in diamond lattices to form crystal nuclei, and the crystal nuclei grow into crystal grains with the same crystal plane orientation to form single crystal silicon.

The commonly used monocrystalline silicon polishing equipment can only be processed one surface by one surface when in use, and after one surface is processed, the surface needs to be changed by manpower, so that the operation is complex, and the displacement is easy to occur in the polishing process, thereby bringing influence on the polishing quality, and the practicability is not high.

SUMMERY OF THE UTILITY MODEL

An object of the utility model is to provide an improved generation monocrystalline silicon double-sided burnishing machine to solve the problem that proposes among the above-mentioned background art.

In order to achieve the above object, the utility model provides a following technical scheme: the utility model provides an improved generation monocrystalline silicon double-sided polishing machine, includes base, support column, polishing subassembly, regulation pole, movable block, locking knob, mounting panel, centre gripping subassembly and monocrystalline silicon body, the top fixed mounting of base has the support column, the right side of support column is provided with polishing subassembly, the top fixed mounting of base has the regulation pole, the sliding surface of adjusting the pole is connected with the movable block, the obverse surface of movable block is provided with the locking knob, the top fixed mounting of movable block has the mounting panel, the left side fixed surface of mounting panel installs the centre gripping subassembly, the centre gripping subassembly be provided with the monocrystalline silicon body.

Polishing subassembly includes driving motor, forward screw rod, reverse screw rod, shaft coupling, first throwing aureola and second throwing aureola, the top fixed mounting of support column has driving motor, driving motor's power take off fixed mounting has the forward screw rod, the bottom fixed mounting of forward screw rod has reverse screw rod, reverse screw rod's fixed surface installs the shaft coupling, the surface swing joint of forward screw rod has first throwing aureola, reverse screw rod's surface swing joint has the second to throw aureola.

The centre gripping subassembly includes fixed plate, slide rail, slider, cylinder, rack, gear and arm lock, the left side fixed mounting of mounting panel has the fixed plate, the fixed surface of fixed plate installs the slide rail, the sliding surface of slide rail is connected with the slider, the top fixed surface of slider installs the cylinder, the both sides fixed mounting of slider has the rack, the surface transmission of rack is connected with the gear, the top fixed mounting of gear has the arm lock.

Preferably, the forward screw and the reverse screw are fixedly installed through a coupler, adjusting blocks are movably connected to the surfaces of the forward screw and the reverse screw, and the first polishing wheel and the second polishing wheel are fixedly installed on the surfaces of the adjusting blocks.

Preferably, the right side of the supporting column is provided with a rectangular movable groove matched with the first polishing wheel and the second polishing wheel.

Preferably, the top of the base is fixedly provided with a transverse plate, and the adjusting rod is fixedly arranged on one side opposite to the transverse plate.

Preferably, the power output end of the cylinder is fixedly arranged on the top surface of the sliding block, and the tail end of the cylinder is fixedly arranged on the surface of the fixed plate.

Preferably, the gear is movably connected to the surface of the fixing plate through a rotating shaft, a round rod is fixedly mounted on the surface of the top of the gear, and the clamping arm is fixedly mounted with the gear through the round rod.

Compared with the prior art, the beneficial effects of the utility model are that:

1. this improved generation monocrystalline silicon double-sided polishing machine improves through the polishing equipment to using always, makes it can process two faces of monocrystalline silicon simultaneously when using, and labour saving and time saving has improved the efficiency of processing greatly, and its simple structure, easily realizes.

2. This improved generation monocrystalline silicon double-sided polishing machine through the centre gripping subassembly that sets up, makes it can stabilize the centre gripping of monocrystalline silicon body when using, prevents that the monocrystalline silicon body from taking place the displacement at the in-process of processing to guarantee the quality of processing, have wide development space and higher spreading value.

Drawings

Fig. 1 is a schematic structural view of the present invention;

fig. 2 is a schematic view of the mounting structure of the moving block of the present invention;

fig. 3 is a schematic view of the structure of the clamping assembly of the present invention.

In the figure: 1. a base; 2. a support pillar; 3. a polishing assembly; 301. a drive motor; 302. a forward screw; 303. a reverse screw; 304. a coupling; 305. a first polishing wheel; 306. a second polishing wheel; 4. adjusting a rod; 5. a moving block; 6. locking the knob; 7. mounting a plate; 8. a clamping assembly; 801. a fixing plate; 802. a slide rail; 803. a slider; 804. a cylinder; 805. a rack; 806. a gear; 807. clamping arms; 9. a monocrystalline silicon body.

Detailed Description

The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.

Referring to fig. 1-3, the present invention provides an embodiment: an improved monocrystalline silicon double-sided polishing machine comprises a base 1, a support column 2, a polishing component 3, an adjusting rod 4, a moving block 5, a locking knob 6, a mounting plate 7, a clamping component 8 and a monocrystalline silicon body 9, wherein the support column 2 is fixedly mounted at the top of the base 1, the polishing component 3 is arranged on the right side of the support column 2, the adjusting rod 4 is fixedly mounted at the top of the base 1, a transverse plate is fixedly mounted at the top of the base 1, the adjusting rod 4 is fixedly mounted on one side opposite to the transverse plate, the moving block 5 is connected to the surface of the adjusting rod 4 in a sliding manner, the locking knob 6 is arranged on the front surface of the moving block 5, the mounting plate 7 is fixedly mounted at the top of the moving block 5, the clamping component 8 is fixedly mounted on the left side surface of the mounting plate 7, the, the processing tool can process two surfaces of monocrystalline silicon simultaneously when in use, saves time and labor, greatly improves the processing efficiency, and has simple structure and easy realization.

The polishing component 3 comprises a driving motor 301, a forward screw 302, a reverse screw 303, a coupler 304, a first polishing wheel 305 and a second polishing wheel 306, the driving motor 301 is fixedly installed at the top of the supporting column 2, the forward screw 302 is fixedly installed at the power output end of the driving motor 301, the reverse screw 303 is fixedly installed at the bottom end of the forward screw 302, the coupler 304 is fixedly installed on the surface of the reverse screw 303, the first polishing wheel 305 is movably connected on the surface of the forward screw 302, the second polishing wheel 306 is movably connected on the surface of the reverse screw 303, the forward screw 302 and the reverse screw 303 are fixedly installed through the coupler 304, and the surfaces of the forward screw 302 and the reverse screw 303 are both movably connected with an adjusting block, the first polishing wheel 305 and the second polishing wheel 306 are locally and fixedly installed on the surface of the adjusting block, and the right side of the support column 2 is provided with a rectangular movable groove matched with the first polishing wheel 305 and the second polishing wheel 306.

The clamping assembly 8 comprises a fixed plate 801, a sliding rail 802, a sliding block 803, a cylinder 804, a rack 805, a gear 806 and a clamping arm 807, the left side of the mounting plate 7 is fixedly provided with the fixed plate 801, the surface of the fixed plate 801 is fixedly provided with the sliding rail 802, the surface of the sliding rail 802 is connected with the sliding block 803 in a sliding manner, the top surface of the sliding block 803 is fixedly provided with the cylinder 804, the power output end of the cylinder 804 is fixedly arranged on the top surface of the sliding block 803, the tail end of the cylinder 804 is fixedly arranged on the surface of the fixed plate 801, two sides of the sliding block 803 are fixedly provided with the rack 805, the surface of the rack 805 is connected with the gear 806 in a transmission manner, the gear 806 is movably connected on the surface of the fixed plate 801 through a rotating shaft, the top surface of the gear 806 is fixedly provided with a round rod, the clamping fixture can firmly clamp the monocrystalline silicon body 9 when in use, and prevents the monocrystalline silicon body 9 from displacing in the processing process, thereby ensuring the processing quality and having wide development space and higher popularization value.

The working principle is as follows: firstly, the air cylinder 804 drives the sliding block 803 to slide on the surface sensitive of the sliding rail 802, the gear 806 is driven to rotate through the rack 805 in the sliding process of the sliding block 803, the gear 806 and the clamping arm 807 are fixedly installed, so the clamping arm 807 is driven to stably clamp the monocrystalline silicon body 9 in the rotating process of the gear 806, the forward screw 302 and the reverse screw 303 are driven to rotate through the driving motor 301, at the moment, the first polishing wheel 305 and the second polishing wheel 306 move oppositely, the monocrystalline silicon body 9 is moved to the surface for polishing, the locking knob 6 can be opened in the polishing process, the mounting plate 7 is pulled to drive the monocrystalline silicon body 9 to move, and the polishing quality is ensured.

It will be evident to those skilled in the art that the invention is not limited to the details of the foregoing illustrative embodiments, and that the present invention may be embodied in other specific forms without departing from the spirit or scope of the present invention. Accordingly, the embodiments of the present invention are exemplary, and not limiting. The scope of the invention is indicated by the appended claims rather than by the foregoing description, and all changes that come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein. Any reference sign in a claim should not be construed as limiting the claim concerned.

Claims

1. The utility model provides a two-sided burnishing machine of improved generation monocrystalline silicon, includes base (1), support column (2), polishing subassembly (3), adjusts pole (4), movable block (5), locking knob (6), mounting panel (7), centre gripping subassembly (8) and monocrystalline silicon body (9), its characterized in that: a supporting column (2) is fixedly mounted at the top of the base (1), a polishing assembly (3) is arranged on the right side of the supporting column (2), an adjusting rod (4) is fixedly mounted at the top of the base (1), a moving block (5) is connected to the surface of the adjusting rod (4) in a sliding manner, a locking knob (6) is arranged on the front surface of the moving block (5), a mounting plate (7) is fixedly mounted at the top of the moving block (5), a clamping assembly (8) is fixedly mounted on the left side surface of the mounting plate (7), and a monocrystalline silicon body (9) is arranged on the clamping assembly (8);

the polishing component (3) comprises a driving motor (301), a forward screw (302), a reverse screw (303), a coupler (304), a first polishing wheel (305) and a second polishing wheel (306), the top of the supporting column (2) is fixedly provided with the driving motor (301), the power output end of the driving motor (301) is fixedly provided with the forward screw (302), the bottom end of the forward screw (302) is fixedly provided with the reverse screw (303), the surface of the reverse screw (303) is fixedly provided with the coupler (304), the surface of the forward screw (302) is movably connected with the first polishing wheel (305), and the surface of the reverse screw (303) is movably connected with the second polishing wheel (306);

the clamping assembly (8) comprises a fixing plate (801), a sliding rail (802), a sliding block (803), an air cylinder (804), a rack (805), a gear (806) and clamping arms (807), wherein the fixing plate (801) is fixedly mounted on the left side of the mounting plate (7), the sliding rail (802) is fixedly mounted on the surface of the fixing plate (801), the sliding block (803) is slidably connected to the surface of the sliding rail (802), the air cylinder (804) is fixedly mounted on the top surface of the sliding block (803), the rack (805) is fixedly mounted on two sides of the sliding block (803), the gear (806) is connected to the surface of the rack (805) in a transmission mode, and the clamping arms (807) are fixedly mounted on the top of.

2. The improved monocrystalline silicon double-sided polishing machine as set forth in claim 1, wherein: the forward screw (302) and the reverse screw (303) are fixedly mounted through a coupler (304), the surfaces of the forward screw (302) and the reverse screw (303) are movably connected with an adjusting block, and the first polishing wheel (305) and the second polishing wheel (306) are fixedly mounted on the surface of the adjusting block.

3. The improved monocrystalline silicon double-sided polishing machine as set forth in claim 1, wherein: the right side of the supporting column (2) is provided with a rectangular movable groove matched with the first polishing wheel (305) and the second polishing wheel (306).

4. The improved monocrystalline silicon double-sided polishing machine as set forth in claim 1, wherein: the top of the base (1) is fixedly provided with a transverse plate, and the adjusting rod (4) is fixedly arranged on one side opposite to the transverse plate.

5. The improved monocrystalline silicon double-sided polishing machine as set forth in claim 1, wherein: the power output end of the air cylinder (804) is fixedly arranged on the top surface of the sliding block (803), and the tail end of the air cylinder is fixedly arranged on the surface of the fixing plate (801).

6. The improved monocrystalline silicon double-sided polishing machine as set forth in claim 1, wherein: the gear (806) is movably connected to the surface of the fixing plate (801) through a rotating shaft, a round rod is fixedly mounted on the top surface of the gear (806), and the clamping arm (807) is fixedly mounted with the gear (806) through the round rod.