CN213069020U - Novel measuring device for multi-track range space plasma - Google Patents
Novel measuring device for multi-track range space plasma Download PDFInfo
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- CN213069020U CN213069020U CN202021913232.3U CN202021913232U CN213069020U CN 213069020 U CN213069020 U CN 213069020U CN 202021913232 U CN202021913232 U CN 202021913232U CN 213069020 U CN213069020 U CN 213069020U
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Abstract
The application provides a novel measuring device for space plasma in a multi-track range, and belongs to the field of space ion measurement. The ion analyzer comprises a shell, an ion deflection mechanism, an electrostatic analyzer, two microchannel plates arranged in parallel at intervals, an anode structure and an electronic processing mechanism; the electronic processing mechanism is arranged on the shell; two ends of the anode structure are respectively connected to two oppositely arranged inner walls of the shell through connecting pieces and are electrically connected to the electronic processing mechanism; the two microchannel plates are positioned above two ends of the anode structure and are connected to two oppositely arranged inner walls of the shell through connecting pieces; the ion deflection mechanism is arranged in the inner cavity of the shell and is positioned right above the anode structure; an electrostatic analyzer is mounted on the inner wall of the housing and within the internal passageway of the ion deflection mechanism, the electrostatic analyzer being directly above the anode structure. The device can realize the measurement of the dynamic flux range of the plasma and improve the energy resolution of the measured ions.
Description
Technical Field
The application relates to the field of space plasmas, in particular to a novel measuring device for space plasmas in a multi-track range.
Background
More than 99% of the substances in the space exist in the form of plasma, the variation range of the substance characteristics is very wide, and the flux of the plasma can be different by several orders of magnitude even in a small orbit height range. At present, the detection instruments for plasma at home and abroad mainly comprise a Faraday cup, a Langmuir probe, an electrostatic analyzer and the like. Wherein: (1) the Faraday cup has low sensitivity and poor angular resolution and measurement precision, and can only detect large-flux particles; (2) the Langmuir probe cannot give information on the particle direction and energy distribution, the surface of the probe is easy to pollute, the detection result is delayed, and the current collected by the probe is limited; (3) the electrostatic analyzer is the most commonly used device in space plasma detection in recent years due to the advantages of good sensitivity, high reliability, light weight, ultraviolet radiation protection and the like.
The electrostatic analyzers can be generally divided into two categories, namely cylindrical electrostatic analyzers and top-hat hemispherical electrostatic analyzers, wherein the cylindrical electrostatic analyzers have poor resolution and narrow detection fields of azimuth angles, and a plurality of cylindrical electrostatic analyzers are generally required to be arranged at different azimuth angles to detect particles at an azimuth angle of 4 pi in a space in a three-dimensional detection task, so that the load of a detector is increased; compared with the traditional cylindrical electrostatic analyzer, the top-hat hemispherical electrostatic analyzer has great advantages, can detect the distribution of charged particles in a 4 pi field range, and can analyze the azimuth angle and polar angle of incident particles, and one top-hat hemispherical electrostatic analyzer can complete the tasks of a plurality of cylindrical electrostatic analyzers, so that the top-hat hemispherical electrostatic analyzer has the widest application in the detection of plasma, but the traditional top-hat hemispherical electrostatic analyzer is difficult to meet the requirements of multi-track plasma detection due to the limitations of the field, resolution and dynamic range of detectable flux.
Therefore, two different types of electrostatic analyzers have been developed on the basis of the top-hat-type hemispherical electrostatic analyzer: an inner hemisphere split electrostatic analyzer and a top cap split electrostatic analyzer. The detection principles of the two types of electrostatic analyzers are similar, and compared with the traditional top-hat hemispherical electrostatic analyzer, the two types of electrostatic analyzers have the advantages and the disadvantages: the inner hemisphere split type electrostatic analyzer has higher energy resolution, but the voltage difference between two parts of the inner hemisphere split cannot be too large, otherwise, breakdown between the plates can occur; and the azimuthal resolution and particle beam focusing characteristics of the top-hat split electrostatic analyzer are both degraded.
SUMMERY OF THE UTILITY MODEL
One of the objectives of the present application is to provide a novel measurement device for multi-track range space plasma, which aims to solve the problems of inter-plate breakdown and poor particle focusing performance of the conventional multi-track plasma detection device.
The technical scheme of the application is as follows:
a novel measuring device for multi-track range space plasma comprises a shell, an ion deflection mechanism, an electrostatic analyzer, two microchannel plates arranged in parallel at intervals, an anode structure and an electronic processing mechanism; the electronic processing mechanism is arranged on the shell and used for converting the ion signals received from the anode structure into electric signals and sending the electric signals to ground detection equipment; two ends of the anode structure are respectively connected to two oppositely arranged inner walls of the shell through connecting pieces and are electrically connected to the electronic processing mechanism, and the anode structure is used for obtaining the information of ions received from the microchannel plate; the two microchannel plates are positioned above two ends of the anode structure, are connected to two oppositely arranged inner walls of the shell through connecting pieces, and are used for generating secondary ions from the ions received from the electrostatic analyzer and amplifying signals; the ion deflection mechanism is arranged in the inner cavity of the shell and is positioned right above the anode structure, and is used for expanding the detection field of view of the electrostatic analyzer and guiding ions in the space into the electrostatic analyzer; the electrostatic analyzer is mounted on the inner wall of the housing and in the internal passage of the ion deflection mechanism, and the electrostatic analyzer is directly above the anode structure for screening ions entering the internal passage of the electrostatic analyzer.
As a further improvement of the above technical solution, the ion deflection mechanism includes two grounded grids arranged in parallel at intervals, two spaced and symmetrical field-of-view upper deflection plates and two spaced and symmetrical field-of-view lower deflection plates are arranged between the two grounded grids, each field-of-view upper deflection plate is positioned right above each field-of-view lower deflection plate, and each field-of-view upper deflection plate is arranged symmetrically with each field-of-view lower deflection plate; the electrostatic analyzer is arranged between the two upper deflection plates of the view field and between the two lower deflection plates of the view field, and the grounding grid, the upper deflection plates of the view field and the lower deflection plates of the view field are respectively connected with the electrostatic analyzer through connecting pieces.
As a further improvement of the above technical solution, the cross sections of the field-of-view upper deflection plate and the field-of-view lower deflection plate are both quarter circles, the tangent of the field-of-view upper deflection plate forms an included angle of 45 degrees with the height direction of the grounded grid mesh, the field-of-view upper deflection plate protrudes outward in the direction toward the grounded grid mesh, and the field-of-view lower deflection plate protrudes outward in the direction toward the grounded grid mesh.
As a further improvement of the above technical solution, the electrostatic analyzer includes a U-shaped top cover, a top cap, two outer hemispherical structures that are symmetrical at intervals, an upper inner hemispherical structure, and two lower inner hemispherical structures that are symmetrical at intervals; the U-shaped top cover is arranged on the top of the inner wall of the shell and is positioned between the two deflection plates on the view field, the opening of the U-shaped top cover faces the anode structure, and the bottoms of two ends of the U-shaped top cover are provided with first wedge-shaped parts; the top cap is arranged in the opening of the U-shaped top cover and is connected to the outer hemisphere structure through a connecting piece; the two outer hemispherical structures are respectively arranged below two ends of the U-shaped top cover and protrude outwards along the direction towards the grounding grid mesh, and the top end of each outer hemispherical structure is provided with a second wedge-shaped part and is installed on the inner wall of the shell through a connecting piece; the two lower inner hemispherical structures are respectively arranged below each outer hemispherical structure and are connected to the outer hemispherical structures through connecting pieces, and the lower inner hemispherical structures are parallel to the outer hemispherical structures; the upper inner hemisphere structure is arranged between the two lower inner hemisphere structures and is connected to the outer hemisphere structure through a connecting piece.
As a further improvement of the above technical solution, the upper inner hemispherical structure and the two lower inner hemispherical structures are concentric and located right below the top cap and right above the anode structure.
As a further improvement of the above technical solution, the voltages on the lower inner hemisphere structure and the upper inner hemisphere structure are different.
As a further improvement of the above technical solution, a shielding grid is correspondingly arranged between each lower inner hemisphere structure and the microchannel plate, and the shielding grid is connected to the inner wall of the housing through a connecting member and is used for preventing the microchannel plate from interfering with the electrostatic analyzer.
As a further improvement of the technical scheme, the connecting piece is made of a polyether-ether-ketone material.
As a further improvement of the above technical solution, a voltage is applied to the top cap.
As a further improvement of the above technical solution, the electronic processing mechanism includes a charge sensitive amplifier, a high voltage control device, a control circuit, a power supply device, and a data transmission port; the charge sensitive amplifier is electrically connected with the anode structure and amplifies an electric signal output by the anode structure; the high-voltage control equipment is respectively and electrically connected with the ion deflection mechanism, the electrostatic analyzer and the microchannel plate; the control circuit is respectively and electrically connected with the charge sensitive amplifier, the high-voltage control equipment, the power supply equipment and the data transmission port and is communicated with a satellite through the data transmission port; the power supply device is respectively and electrically connected with the charge sensitive amplifier, the high-voltage control device, the control circuit, the data transmission port, the ion deflection mechanism, the electrostatic analyzer and the microchannel plate.
The beneficial effect of this application:
according to the novel measuring device for the space plasma in the multi-track range, the inner hemisphere is divided into two regions, namely the upper inner hemisphere structure and the two lower inner hemisphere structures which are symmetrical at intervals, and the existing top cap is separated into the U-shaped top cap and the top cap, so that the total particle receiving band pass of the electrostatic analyzer is the coupling of the two regions of the particles receiving band pass, and the energy resolution of the whole device can be further improved; in addition, the cut-off processing is carried out at the outlet part of the electrostatic analyzer, so that the re-diffusion of the focused beam can be effectively prevented, and the focusing characteristic of the particle beam and the azimuth resolution of the device can be effectively improved; and the voltage on the top cap, the upper inner hemispherical structure and the two lower inner hemispherical structures which are symmetrical at intervals can be changed simultaneously, so that the device can be suitable for measuring plasmas in different height ranges.
Drawings
In order to more clearly explain the technical solutions of the embodiments of the present application, the drawings that are required to be used in the embodiments will be briefly described below, it should be understood that the following drawings only illustrate some embodiments of the present application and therefore should not be considered as limiting the scope, and that for those skilled in the art, other related drawings can be obtained from these drawings without inventive effort.
FIG. 1 is a cross-sectional view of a novel measurement device for multi-track range space plasma provided by an embodiment of the present application;
fig. 2 is a schematic view illustrating an installation of the novel measurement device for multi-orbital-range space plasma on a satellite platform according to an embodiment of the present application.
Icon: 1-a novel measuring device for multi-track range space plasma; 2-a satellite platform; 3-a shell; 4-an ion deflection mechanism; 5-an electrostatic analyzer; 6-microchannel plate; 7-an anode structure; 8-an electronics processing mechanism; 9-a grounded grid; 10-field of view upper deflector plate; 11-deflection plate under field of view; a 12-U-shaped top cover; 13-top cap; 14-external hemisphere structure; 15-upper inner hemisphere structure; 16-lower inner hemisphere structure; 17-a first wedge; 18-second wedge.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present application clearer, the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are some embodiments of the present application, but not all embodiments. The components of the embodiments of the present application, generally described and illustrated in the figures herein, can be arranged and designed in a wide variety of different configurations.
Thus, the following detailed description of the embodiments of the present application, presented in the accompanying drawings, is not intended to limit the scope of the claimed application, but is merely representative of selected embodiments of the application. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
It should be noted that: like reference numbers and letters refer to like items in the following figures, and thus, once an item is defined in one figure, it need not be further defined and explained in subsequent figures.
In the description of the present application, it should be noted that the terms "upper" and "lower" are used for indicating the orientation or positional relationship based on the orientation or positional relationship shown in the drawings or the orientation or positional relationship which is usually placed when the utility model is used, and are only for convenience of describing the present application and simplifying the description, but do not indicate or imply that the device or element to be referred must have a specific orientation, be constructed in a specific orientation and operation, and thus, should not be construed as limiting the present application.
Further, in the present application, unless expressly stated or limited otherwise, the first feature may be directly contacting the second feature or may be directly contacting the second feature, or the first and second features may be contacted with each other through another feature therebetween, not directly contacting the second feature. Also, the first feature being above, on or above the second feature includes the first feature being directly above and obliquely above the second feature, or merely means that the first feature is at a higher level than the second feature. A first feature that underlies, and underlies a second feature includes a first feature that is directly under and obliquely under a second feature, or simply means that the first feature is at a lesser level than the second feature.
Furthermore, the terms "horizontal", "vertical" and the like do not imply that the components are required to be absolutely horizontal or pendant, but rather may be slightly inclined. For example, "horizontal" merely means that the direction is more horizontal than "vertical" and does not mean that the structure must be perfectly horizontal, but may be slightly inclined.
In the description of the present application, it is also to be noted that, unless otherwise explicitly specified or limited, the terms "disposed," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present application can be understood in a specific case by those of ordinary skill in the art.
Example (b):
referring to fig. 1 and fig. 2, the present application provides a novel measurement apparatus 1 for multi-track range space plasma, which includes a housing 3, an ion deflection mechanism 4, an electrostatic analyzer 5, two microchannel plates 6 arranged in parallel and spaced apart from each other, an anode structure 7, and an electronics processing mechanism 8; wherein, the shell 3 is used for providing a spin mounting platform for the whole device; the electronic processing mechanism 8 is arranged on the bottom of the shell 3 and used for converting the ion signals received from the anode structure 7 into electric signals, collecting and packaging the electric signals, sending the electric signals to ground detection equipment and supplying power to the whole device; two ends of the anode structure 7 are respectively connected to two oppositely arranged inner walls of the shell 3 through connecting pieces and are electrically connected to the electronic processing mechanism 8, so as to obtain information such as the direction, the density and the like of ions received from the microchannel plate 6; the two microchannel plates 6 are positioned above two ends of the anode structure 7, are in a ring-shaped structure, are connected to two oppositely arranged inner walls of the shell 3 through connecting pieces, and are used for generating secondary ions from the ions received from the electrostatic analyzer 5 and amplifying signals; the ion deflection mechanism 4 is arranged in the inner cavity of the shell 3 and is positioned right above the anode structure 7, and is used for expanding the detection field of view of the electrostatic analyzer 5 and guiding ions in the space into the electrostatic analyzer 5; an electrostatic analyser 5 is mounted on the inner wall of the housing 3 in the internal passage of the ion deflection mechanism 4, the electrostatic analyser 5 being directly above the anode structure 7 for screening ions entering the internal passage of the electrostatic analyser 5 and for screening ions meeting a particular energy and velocity direction.
The ion deflection mechanism 4 comprises two grounded grids 9 arranged in parallel at intervals, two upper deflection plates 10 of a viewing field which are arranged at intervals and symmetrically and two lower deflection plates 11 of the viewing field which are arranged at intervals and symmetrically are arranged between the two grounded grids 9. The two deflection plates 10 on the interval view field are symmetrical relative to the axis of the shell 3 in the height direction and are positioned above the channel between the two grounding grids 9; the two deflection plates 11 under the interval view field are symmetrical relative to the axis of the shell 3 in the height direction and are positioned at the position below the channel between the two grounding grids 9; meanwhile, each field of view upper deflector 10 is positioned right above each field of view lower deflector 11, and each field of view upper deflector 10 and each field of view lower deflector 11 are also symmetrically arranged. The sections of the upper field-of-view deflector plate 10 and the lower field-of-view deflector plate 11 are both quarter circles, the tangent of the upper field-of-view deflector plate 10 forms an included angle of 45 degrees with the height direction of the grounding grid 9, and the upper field-of-view deflector plate 10 protrudes outwards in the direction towards the grounding grid 9; the tangent line of the deflection plate 11 under the view field forms an included angle of 45 degrees with the height direction of the grounding grid 9, and the deflection plate 11 under the view field protrudes outwards along the direction towards the grounding grid 9; the voltages applied by the electronic processing means 8 allow the upper field deflection plate 10 and the lower field deflection plate 11 to scan the incident particles in any direction within 180 deg.. The electrostatic analyzer 5 is disposed between two upper field-of-view deflector plates 10 and between two lower field-of-view deflector plates 11, and the grounded grid 9, the upper field-of-view deflector plates 10 and the lower field-of-view deflector plates 11 are connected to the electrostatic analyzer 5 through connectors, respectively.
Ions in the detectable range of the electrostatic analyzer 5 pass through the grounded grid 9 and enter between the upper field-of-view deflection plate 10 and the lower field-of-view deflection plate 11, and enter the electrostatic analyzer 5 along the horizontal collimation hole under the action of the deflection electric field.
Further, the electrostatic analyzer 5 includes a U-shaped top cover 12, a top cap 13, two spaced symmetrical outer hemispherical structures 14, an upper inner hemispherical structure 15, and two spaced symmetrical lower inner hemispherical structures 16; the U-shaped top cover 12 is arranged on the top of the inner wall of the shell 3 and is positioned between the two deflection plates 10 on the view field, the opening of the U-shaped top cover 12 faces the anode structure 7, the bottoms of the two ends of the U-shaped top cover are provided with first wedge-shaped parts 17, the first wedge-shaped parts 17 are in a sawtooth shape and can be used for absorbing ultraviolet protection ultraviolet radiation and reducing the interference of secondary sputtering particles on counting; the top cap 13 is arranged in the opening of the U-shaped top cover 12, the bottom of the top cap is in an arch bridge shape, and the top cap 13 is connected to the outer hemisphere structure 14 through a connecting piece. Meanwhile, the two outer hemispherical structures 14 are respectively arranged below two ends of the U-shaped top cover 12 and protrude outwards in the direction facing the grounding grid 9, a second visible wedge-shaped part 18 is arranged at the top end of each outer hemispherical structure 14, and the second visible wedge-shaped parts 18 are in a sawtooth shape and can be used for absorbing ultraviolet protection ultraviolet radiation and reducing interference of secondary sputtering particles on counting; and, the outer hemisphere structure 14 is mounted on the inner wall of the case 3 through a connector. The two lower inner hemispherical structures 16 are respectively arranged below each outer hemispherical structure 14 and connected to the outer hemispherical structures 14 through connecting pieces, and the lower inner hemispherical structures 16 are parallel to the outer hemispherical structures 14; the upper inner hemispherical structure 15 is arranged between the ends of the two lower inner hemispherical structures 16 and is connected to the outer hemispherical structure 14 through a connecting piece; meanwhile, the upper inner hemispherical structure 15 and the two lower inner hemispherical structures 16 are concentric and are located right below the top cap 13 and right above the anode structure 7, and the cross section of the upper inner hemispherical structure 15 and the cross section of each lower inner hemispherical structure 16 jointly form an arc surface. And spaces exist among the lower inner hemispherical structure 16 and the upper inner hemispherical structure 15, the outer hemispherical structure 14 and the top cap 13, so that a channel for deflecting particles is formed, and the particles meeting the characteristic energy and speed directions can be screened.
It should be noted that the voltages applied to the two lower inner hemispherical structures 16 are the same, and the voltages applied to the lower inner hemispherical structure 16 and the upper inner hemispherical structure 15 are different, so that two different deflection regions are formed in the electrostatic analyzer 5, namely, the region 1 formed between the top cap 13 and the upper inner hemispherical structure 15, and the region 2 formed between the outer hemispherical structure 14 and the lower inner hemispherical structure 16, and the particles must pass through the electrostatic analyzer 5 through the two deflection regions at the same time, thereby effectively improving the resolution of the electrostatic analyzer 5. In addition, a voltage is applied to the top cap 13, so that the potential distribution between the region 1 formed between the top cap 13 and the upper inner hemispherical structure 15 is improved, the voltage difference between the two parts of the lower inner hemispherical structure 16 and the upper inner hemispherical structure 15 is smaller when particles with the same energy range are measured, and breakdown can be effectively avoided when the voltage difference between the two parts of the lower inner hemispherical structure 16 and the upper inner hemispherical structure 15 is too large. Further, the energy analysis of the incident ions can be performed by grounding the outer hemisphere 14 and the U-shaped top cap 12 of the electrostatic analyzer 5, and screening out particles satisfying a specific energy by changing the voltages of the upper inner hemisphere 15, the lower inner hemisphere 16, and the separated top cap 13, respectively.
It should be noted that, the outlet portion of the electrostatic analyzer 5 is cut off, so as to effectively ensure that the focus point of the particle beam falls on the microchannel plate 6, thereby achieving the best azimuthal resolution.
Further, in the present embodiment, a shielding mesh is disposed between each lower inner hemisphere structure 16 and the microchannel plate 6, and the shielding mesh is connected to the inner wall of the housing 3 by a connector and is used to prevent the microchannel plate 6 from interfering with the electrostatic analyzer 5.
Further, in this embodiment, the connecting member may be made of a polyetheretherketone material, or may be made of other materials with high temperature resistance and corrosion resistance and good electrical insulation performance, such as a polyimide material. Therefore, the grounding grid 9, the field upper deflection plate 10, the field lower deflection plate 11, the upper inner hemisphere structure 15, the lower inner hemisphere structure 16, the shielding grid, the microchannel plate 6 and the anode structure 7 are all insulated by the polyetheretherketone material, so that the influence of an external electric field can be effectively prevented.
It should be noted that the electronic processing mechanism 8 includes a charge sensitive amplifier, a high voltage control device, a control circuit, a power supply device, and a data transmission port; the charge sensitive amplifier is electrically connected to the anode structure 7 and amplifies an electrical signal output by the anode structure 7; the high-voltage control equipment is respectively and electrically connected with the ion deflection mechanism 4, the electrostatic analyzer 5 and the microchannel plate 6, and provides required multi-path high voltage for each part of the device; the control circuit is respectively and electrically connected with the charge sensitive amplifier, the high-voltage control equipment, the power supply equipment and the data transmission port, is used for controlling the operation of the whole electronic processing unit and is communicated with the satellite through the data transmission port; the power supply equipment is respectively and electrically connected with the charge sensitive amplifier, the high-voltage control equipment, the control circuit, the data transmission port, the ion deflection mechanism 4, the electrostatic analyzer 5 and the microchannel plate 6 and is used for providing power for the whole device.
The above-described electronic processing means 8 can obtain velocity direction information and density information of ions, wherein the velocity direction information of ions includes an azimuth angle and a polar angle of incidence. The anode structure 7 is distributed in a sector island shape by adopting an epoxy resin plate surface gold plating method, the azimuth angle information of ions is obtained by the circumferential position of an electric signal on the anode structure 7, and the incident polar angle information of the ions is obtained by calculating the voltage values of the upper deflection plate 10 and the lower deflection plate 11 of the view field; the ion density information can be obtained from the count of the electrical signal collected on the anode structure 7 per unit time.
It should be noted that, in this embodiment, the charge sensitive amplifier, the high-voltage control device, the control circuit, the power supply device, and the data transmission port all adopt the prior art, and the specific structure and the operation principle thereof are not described herein again.
Referring to fig. 2, the installation position of the device on the satellite platform 2 is shown, and the part above the electrostatic analyzer 5 is located outside the satellite, so that the influence of the satellite surface charge-discharge effect on the measurement can be reduced; meanwhile, the electronic processing mechanism 8 is placed inside the satellite and can be used for controlling the working environment, and the satellite platform 2 can spin, so that the particles in the space with the 4 pi field of view can be detected.
The above description is only a preferred embodiment of the present application and is not intended to limit the present application, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, improvement and the like made within the spirit and principle of the present application shall be included in the protection scope of the present application.
Claims (10)
1. A novel measuring device for multi-track range space plasma is characterized by comprising a shell, an ion deflection mechanism, an electrostatic analyzer, two microchannel plates arranged in parallel at intervals, an anode structure and an electronic processing mechanism; the electronic processing mechanism is arranged on the shell and used for converting the ion signals received from the anode structure into electric signals and sending the electric signals to ground detection equipment; two ends of the anode structure are respectively connected to two oppositely arranged inner walls of the shell through connecting pieces and are electrically connected to the electronic processing mechanism, and the anode structure is used for obtaining the information of ions received from the microchannel plate; the two microchannel plates are positioned above two ends of the anode structure, are connected to two oppositely arranged inner walls of the shell through connecting pieces, and are used for generating secondary ions from the ions received from the electrostatic analyzer and amplifying signals; the ion deflection mechanism is arranged in the inner cavity of the shell and is positioned right above the anode structure, and is used for expanding the detection field of view of the electrostatic analyzer and guiding ions in the space into the electrostatic analyzer; the electrostatic analyzer is arranged on the inner wall of the shell and is positioned in the internal channel of the ion deflection mechanism, and the electrostatic analyzer is positioned right above the anode structure and is used for screening ions entering the internal channel of the electrostatic analyzer; the electrostatic analyzer comprises a U-shaped top cover, a top cap, two outer hemisphere structures which are symmetrical at intervals, an upper inner hemisphere structure and two lower inner hemisphere structures which are symmetrical at intervals.
2. The novel measurement device for multi-track range space plasma according to claim 1, wherein the ion deflection mechanism comprises two grounded grids arranged in parallel at intervals, two spaced and symmetrical upper field-of-view deflection plates and two spaced and symmetrical lower field-of-view deflection plates are arranged between the two grounded grids, each upper field-of-view deflection plate is positioned right above each lower field-of-view deflection plate, and each upper field-of-view deflection plate is arranged symmetrically with each lower field-of-view deflection plate; the electrostatic analyzer is arranged between the two upper deflection plates of the view field and between the two lower deflection plates of the view field, and the grounding grid, the upper deflection plates of the view field and the lower deflection plates of the view field are respectively connected with the electrostatic analyzer through connecting pieces.
3. The novel measurement device for multi-track range space plasma according to claim 2, wherein the cross section of the upper field of view deflector and the cross section of the lower field of view deflector are both quarter circles, the tangent of the upper field of view deflector and the height direction of the grounded grid form an included angle of 45 degrees, the upper field of view deflector protrudes outward in the direction towards the grounded grid, and the lower field of view deflector protrudes outward in the direction towards the grounded grid.
4. The novel measuring device for the multi-track range space plasma according to claim 2, wherein the U-shaped top cover is installed on the top of the inner wall of the shell and located between the two deflection plates on the view field, the opening of the U-shaped top cover faces the anode structure, and the bottoms of two ends of the U-shaped top cover are provided with first wedge-shaped parts; the top cap is arranged in the opening of the U-shaped top cover and is connected to the outer hemisphere structure through a connecting piece; the two outer hemispherical structures are respectively arranged below two ends of the U-shaped top cover and protrude outwards along the direction towards the grounding grid mesh, and the top end of each outer hemispherical structure is provided with a second wedge-shaped part and is installed on the inner wall of the shell through a connecting piece; the two lower inner hemispherical structures are respectively arranged below each outer hemispherical structure and are connected to the outer hemispherical structures through connecting pieces, and the lower inner hemispherical structures are parallel to the outer hemispherical structures; the upper inner hemisphere structure is arranged between the two lower inner hemisphere structures and is connected to the outer hemisphere structure through a connecting piece.
5. The novel measurement device for multi-track range spatial plasma according to claim 4, wherein the upper inner hemispherical structure is concentric with the two lower inner hemispherical structures and is located directly below the top cap and directly above the anode structure.
6. The novel measurement device for multi-orbital range space plasma according to claim 4, characterized in that the voltages on the lower and upper inner hemispherical structures are different.
7. The novel measuring device for multi-track range space plasma according to claim 4, wherein a shielding grid is arranged between each lower inner hemisphere structure and the microchannel plate correspondingly, the shielding grid is connected to the inner wall of the shell through a connecting piece, and is used for preventing the microchannel plate from interfering with the electrostatic analyzer.
8. The novel measuring device for the multi-track range space plasma according to claim 4, wherein the connecting piece is made of a polyether-ether-ketone material.
9. The novel measurement device for multi-track range space plasma as claimed in claim 4, wherein a voltage is applied to the top cap.
10. The novel measurement device for multi-track range space plasma according to claim 1, wherein the electronic processing mechanism comprises a charge sensitive amplifier, a high voltage control device, a control circuit, a power supply device and a data transmission port; the charge sensitive amplifier is electrically connected with the anode structure and amplifies an electric signal output by the anode structure; the high-voltage control equipment is respectively and electrically connected with the ion deflection mechanism, the electrostatic analyzer and the microchannel plate; the control circuit is respectively and electrically connected with the charge sensitive amplifier, the high-voltage control equipment, the power supply equipment and the data transmission port and is communicated with a satellite through the data transmission port; the power supply device is respectively and electrically connected with the charge sensitive amplifier, the high-voltage control device, the control circuit, the data transmission port, the ion deflection mechanism, the electrostatic analyzer and the microchannel plate.
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| Application Number | Priority Date | Filing Date | Title |
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| CN202021913232.3U CN213069020U (en) | 2020-09-04 | 2020-09-04 | Novel measuring device for multi-track range space plasma |
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| CN202021913232.3U CN213069020U (en) | 2020-09-04 | 2020-09-04 | Novel measuring device for multi-track range space plasma |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112147667A (en) * | 2020-09-11 | 2020-12-29 | 兰州空间技术物理研究所 | Sensor for space low-energy ion detection |
| CN113438786A (en) * | 2021-05-17 | 2021-09-24 | 中国科学院国家空间科学中心 | Device for collecting space thermal plasma |
-
2020
- 2020-09-04 CN CN202021913232.3U patent/CN213069020U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112147667A (en) * | 2020-09-11 | 2020-12-29 | 兰州空间技术物理研究所 | Sensor for space low-energy ion detection |
| CN113438786A (en) * | 2021-05-17 | 2021-09-24 | 中国科学院国家空间科学中心 | Device for collecting space thermal plasma |
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