CN212947118U - Adjustable nanocrystalline strip is with burnishing and polishing device - Google Patents
Adjustable nanocrystalline strip is with burnishing and polishing device Download PDFInfo
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- CN212947118U CN212947118U CN202021974346.9U CN202021974346U CN212947118U CN 212947118 U CN212947118 U CN 212947118U CN 202021974346 U CN202021974346 U CN 202021974346U CN 212947118 U CN212947118 U CN 212947118U
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Abstract
The utility model provides an adjustable nanocrystalline strip is with burnishing and polishing device, including supporting sleeve seat, compression spring, a supporting plate, lower leading wheel, flexible seat, left adjustable rod and left position sleeve seat, the leading wheel is equipped with down to the cover of backup pad front side, the supporting sleeve seat is installed to the operation panel up end intermediate position, the inside upside card cover of supporting sleeve seat has flexible seat, terminal surface left and right sides symmetry has clamped compression spring under the flexible seat, support extension board up end left side and install left position sleeve seat, the inside intermediate position interlude of left position sleeve seat has left adjustable rod, original burnishing and polishing device has been solved in this design is inconvenient adjusts from top to bottom, and the not good enough problem of guidance quality, the utility model discloses rational in infrastructure, possess upper and lower adjustable ability to the direction burnishing and polishing effect is good, and the practicality is strong.
Description
Technical Field
The utility model relates to an adjustable nanocrystalline strip is with burnishing and polishing device belongs to nanocrystalline strip burnishing and polishing apparatus technical field.
Background
Nanocrystalline strip is owing to have unique physics and chemical property, receive very big attention in recent years, wide application in fields such as optics, catalysis, biological medicine, the in-process of nanocrystalline strip production needs to be polished, make its surface smooth, but traditional nanocrystalline strip is mostly by the manual burnishing and polishing of manual burnishing and polishing with the burnishing and polishing mode, this kind of mode is not only the inefficiency of polishing, and waste time and energy, and the most fixed position structures of polishing device are used to current nanocrystalline strip, self burnishing and polishing thickness is inconvenient and then adjust, the practicality scope is restricted, remain to improve in the aspect of the practicality, the problem that the aforesaid appears is solved with the burnishing and polishing device to adjustable nanocrystalline strip of present urgent need.
SUMMERY OF THE UTILITY MODEL
The utility model aims at providing an it is not enough that prior art exists, the utility model aims at providing an adjustable nanocrystalline strip is with burnishing and polishing device to solve the problem that proposes in the above-mentioned background art, the utility model discloses rational in infrastructure, but the ability of adjusting about possessing to the direction burnishing and polishing is effectual, and the practicality is strong.
In order to achieve the above purpose, the present invention is realized by the following technical solution: an adjustable polishing device for nanocrystalline strips, which comprises supporting legs, an operating platform, a lower polishing block, an adjustable mechanism, an upper polishing block and a supporting extension plate, wherein the supporting legs are symmetrically welded on the left side and the right side of the lower end surface of the operating platform, the lower polishing block is installed on the upper side of the operating platform, the upper polishing block is installed on the upper side of the lower polishing block, the upper polishing block is installed on the right side of the upper polishing block, the lower polishing block is installed on the lower side of the upper polishing block, the supporting extension plate is installed on the rear side of the upper end surface of the operating platform, the adjustable mechanism is arranged on the upper side of the supporting extension plate, the adjustable mechanism is arranged on the upper side of the operating platform and comprises a supporting sleeve seat, a compression spring, a supporting cylinder, a supporting plate, a lower guide wheel, an upper guide wheel, a telescopic seat, a connecting seat, a right adjustable rod, the utility model discloses a flexible extension board, including operation panel, support sleeve, backup pad, guide wheel, supporting sleeve seat, expansion seat, left locating sleeve seat, left adjustable rod, right locating sleeve seat, right adjustable rod, left adjustable rod, right adjustable rod, support sleeve seat, left locating sleeve seat, right adjustable rod, left adjustable rod, right adjustable rod, support sleeve seat, flexible seat, left adjustable rod, right adjustable rod.
Furthermore, two sets of supporting cylinders are installed, the specifications of the two sets of supporting cylinders are the same, positioning bolts are meshed on the right side of the annular side face of each supporting cylinder, the two sets of positioning bolts are meshed, and the specifications of the two sets of positioning bolts are the same.
Furthermore, two groups of lower guide wheels are sleeved with the lower guide wheels, the specifications of the two groups of lower guide wheels are the same, two groups of upper guide wheels are sleeved with the upper guide wheels, the specifications of the two groups of upper guide wheels are the same, annular limiting grooves are formed in the annular side surfaces of the upper guide wheels and the lower guide wheels, and the front and back width of each annular limiting groove is slightly larger than the front and back width of the external nanocrystalline strip.
Furthermore, the right side of the inside of the right positioning sleeve seat is meshed with a right fixing bolt, the left side of the inside of the left positioning sleeve seat is meshed with a left fixing bolt, the connecting seats are welded with two groups of connecting seats, and the specifications of the two groups of connecting seats are the same.
Furthermore, the lower polishing block, the upper polishing block, the lower polishing block and the upper polishing block are all of a detachable structure, the front and back widths of the lower polishing block, the upper polishing block, the lower polishing block and the upper polishing block are all larger than the front and back widths of an external nanocrystalline strip, and the positions of the lower polishing block, the upper polishing block, the lower guide wheel and the upper guide wheel between the left and right are located on the same central line.
The utility model has the advantages that: the utility model discloses a pair of adjustable nanocrystalline strip is with burnishing and polishing device, because of the utility model discloses added support sleeve seat, compression spring, support section of thick bamboo, backup pad, lower leading wheel, go up leading wheel, flexible seat, connecting seat, right adjustable pole, right side location sleeve seat, left adjustable pole and left location sleeve seat, this design is convenient to be adjusted from top to bottom according to nanocrystalline strip thickness, has solved the inconvenient regulation from top to bottom that goes on of original burnishing and polishing device to guidance quality is not good enough problem has improved the utility model discloses an adjustable effect.
Install two sets ofly because of the supporting cylinder, and two sets of supporting cylinder specifications are the same, the meshing of supporting cylinder ring side right side has positioning bolt, positioning bolt meshing has two sets ofly, and two sets of positioning bolt specifications are the same, positioning bolt conveniently fixes a position the backup pad, be equipped with two sets ofly because of lower leading wheel cover, and two sets ofly the leading wheel specification is the same down, it is two sets ofly equipped with to go up the leading wheel cover, and two sets ofly the leading wheel specification is the same on two sets of, go up the leading wheel and all seted up annular spacing recess with leading wheel ring side down, and width slightly is greater than width around external nanocrystalline strip around the annular spacing recess, this design convenience guides spacingly to external nanocrystalline strip, avoid external nanocrystalline strip to appear the skew condition when burnishing and polishing, the utility model discloses rational in infrastructure, possess upper and lower adjustable ability.
Drawings
Other features, objects and advantages of the invention will become more apparent upon reading of the detailed description of non-limiting embodiments with reference to the following drawings:
fig. 1 is a schematic structural view of the adjustable polishing device for nanocrystalline strips according to the present invention;
FIG. 2 is a front sectional view of an adjustable mechanism of the polishing device for adjustable nanocrystalline strip according to the present invention;
FIG. 3 is an enlarged view of A in FIG. 2;
in the figure: 1-supporting leg, 2-operating platform, 3-lower polishing block, 4-lower polishing block, 5-adjustable mechanism, 6-upper polishing block, 7-upper polishing block, 8-supporting extension plate, 51-supporting sleeve seat, 52-compression spring, 53-supporting cylinder, 54-supporting plate, 55-lower guide wheel, 56-upper guide wheel, 57-telescopic seat, 58-connecting seat, 59-right adjustable rod, 511-right positioning sleeve seat, 512-left adjustable rod, 513-left positioning sleeve seat and 531-positioning bolt.
Detailed Description
In order to make the technical means, creation features, achievement purposes and functions of the present invention easy to understand, the present invention is further described below with reference to the following embodiments.
Referring to fig. 1-3, the present invention provides a technical solution: the utility model provides an adjustable nanocrystalline strip is with burnishing and polishing device, including supporting leg 1, operation panel 2, lower polishing block 3, lower polishing block 4, adjustable mechanism 5, go up polishing block 6, go up polishing block 7 and support extension board 8, both sides symmetrical welding has supporting leg 1 about 2 terminal surfaces under the operation panel, polishing block 3 is installed down to 2 upsides of operation panel, polishing block 7 is installed to polishing block 3 upside down, it installs polishing block 6 to go up polishing block 7 right side, polishing block 4 is installed down to 6 belows of going up polishing block, 2 up end rear sides of operation panel are installed and are supported extension board 8, it is provided with adjustable mechanism 5 to support extension board 8 upsides, 2 upsides of operation panel are provided with adjustable mechanism 5.
The adjustable mechanism 5 comprises a supporting sleeve seat 51, a compression spring 52, a supporting cylinder 53, a supporting plate 54, a lower guide wheel 55, an upper guide wheel 56, a telescopic seat 57, a connecting seat 58, a right adjustable rod 59, a right positioning sleeve seat 511, a left adjustable rod 512 and a left positioning sleeve seat 513, the supporting cylinder 53 is symmetrically arranged on the left and right sides of the upper end surface of the operating platform 2, the supporting plate 54 is sleeved in the supporting cylinder 53 in a clamping way, the lower guide wheel 55 is sleeved on the front side of the supporting plate 54, the upper guide wheel 56 is sleeved on the upper side of the lower guide wheel 55, the supporting sleeve seat 51 is arranged in the middle position of the upper end surface of the operating platform 2, the telescopic seat 57 is sleeved on the upper side of the inner part of the supporting sleeve seat 51 in a clamping way, the compression spring 52 is symmetrically arranged on the left and right sides of the lower end surface of the telescopic seat 57, the left positioning sleeve seat 513 is arranged on the left side of the upper end surface of the supporting extension plate 8, the right adjustable rod 59 is inserted in the middle position in the right positioning sleeve seat 511, the connecting seat 58 is welded on the lower end face of the right adjustable rod 59, and the problem that the original polishing device is inconvenient to adjust up and down and poor in guidance quality is solved by the design.
Two sets of supporting cylinder 53 are installed, and two sets of supporting cylinder 53 specifications are the same, supporting cylinder 53 annular side right side meshing has positioning bolt 531, positioning bolt 531 meshing has two sets, and two sets of positioning bolt 531 specifications are the same, positioning bolt 531 conveniently fixes a position backup pad 54, lower leading wheel 55 cover is equipped with two sets, and two sets of leading wheel 55 specifications are the same down, it is equipped with two sets to go up leading wheel 56 cover, and 56 specifications are the same on two sets of leading wheels, go up leading wheel 56 and 55 annular side down and all seted up annular spacing recess, and the width slightly is greater than external nanocrystalline strip width around the annular spacing recess, this design is convenient to carry out the direction spacing to external nanocrystalline strip, avoid external nanocrystalline strip to appear the skew condition when burnishing and polishing.
The right fixing bolt is meshed on the right side inside the right positioning sleeve seat 511, the left fixing bolt is meshed on the left side inside the left positioning sleeve seat 513, two groups of connecting seats 58 are welded, the specifications of the two groups of connecting seats 58 are the same, the left fixing bolt conveniently positions the left adjustable rod 512, the right fixing bolt conveniently positions the right adjustable rod 59, the two groups of connecting seats 58 conveniently install and fix the upper polishing block 6 and the upper polishing block 7, the lower polishing block 3, the upper polishing block 7, the lower polishing block 4 and the upper polishing block 6 are of detachable structures, the front and rear widths of the lower polishing block 3, the upper polishing block 7, the lower polishing block 4 and the upper polishing block 6 are all larger than the front and rear widths of external nanocrystalline strips, the positions between the left side and the right side of the lower polishing block 3, the upper polishing block 7, the lower polishing block 4, the upper polishing block 6, the lower guide wheel 55 and the upper guide wheel 56 are located on the same central line, and the design is convenient for the lower polishing block 3, and the lower polishing block 4 and the upper polishing block 6 polish and polish the external nanocrystalline strips.
As an embodiment of the present invention: firstly, one end of an external nanocrystalline strip passes between an upper guide wheel 56 and a lower guide wheel 55 from right to left, in the process, the external nanocrystalline strip needs to pass between an upper polishing block 6 and a lower polishing block 4 and between an upper polishing block 7 and a lower polishing block 3, and is finally connected with external winding equipment, then a worker unscrews a left fixing bolt and a right fixing bolt respectively by means of an external wrench, performs up-and-down movement adjustment on a left adjustable rod 512 and a right adjustable rod 59, enables the lower end surface of the upper polishing block 6 and the lower end surface of the upper polishing block 7 to be attached to the upper end surface of the external nanocrystalline strip, enables the upper end surface of the lower polishing block 4 and the upper end surface of the lower polishing block 3 to be attached to the lower end surface of the external nanocrystalline strip, then screws the left fixing bolt and the right fixing bolt, further positions the left adjustable rod 512 and the right adjustable rod 59, and then screws out the positioning bolt 531 again by means of the external wrench, adjust backup pad 54 from top to bottom, make go up leading wheel 56 or leading wheel 55 and external nanocrystalline strip laminating mutually, and then lead to external nanocrystalline strip, avoid external nanocrystalline strip skew to appear when burnishing and polishing, screw up positioning bolt 531 after adjusting, avoid backup pad 54 the condition of falling back to appear, alright start external rolling equipment this moment, make external rolling equipment rotate and carry out the rolling to external nanocrystalline strip, meanwhile, external nanocrystalline strip can be polished by last sanding block 6 and lower sanding block 4 earlier, then polished by last sanding block 7 and lower polishing block 3.
The basic principles and the main features of the invention and the advantages of the invention have been shown and described above, it will be evident to those skilled in the art that the invention is not limited to the details of the foregoing illustrative embodiments, but that the invention may be embodied in other specific forms without departing from the spirit or essential characteristics of the invention. The present embodiments are therefore to be considered in all respects as illustrative and not restrictive, the scope of the invention being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein. Any reference sign in a claim should not be construed as limiting the claim concerned.
Furthermore, it should be understood that although the present description refers to embodiments, not every embodiment may contain only a single embodiment, and such description is for clarity only, and those skilled in the art should integrate the description, and the embodiments may be combined as appropriate to form other embodiments understood by those skilled in the art.
Claims (5)
1. The utility model provides an adjustable nanocrystalline strip is with burnishing and polishing device, includes supporting leg, operation panel, polishes piece down, polishes piece, adjustable mechanism down, on polish the piece, go up polishing piece and support extension plate, its characterized in that: the supporting legs are symmetrically welded on the left side and the right side of the lower end face of the operating platform, a lower polishing block is mounted on the upper side of the operating platform, an upper polishing block is mounted on the upper side of the lower polishing block, an upper polishing block is mounted on the right side of the upper polishing block, a lower polishing block is mounted on the lower side of the upper polishing block, a supporting extension plate is mounted on the rear side of the upper end face of the operating platform, an adjustable mechanism is arranged on the upper side of the supporting extension plate, and an adjustable mechanism is arranged on the upper side of;
the adjustable mechanism comprises a supporting sleeve seat, a compression spring, a supporting barrel, a supporting plate, a lower guide wheel, an upper guide wheel, a telescopic seat, a connecting seat, a right adjustable rod, a right positioning sleeve seat, a left adjustable rod and a left positioning sleeve seat, wherein the supporting barrel is symmetrically arranged on the left side and the right side of the upper end surface of the operating platform, the supporting plate is sleeved in the supporting barrel in a clamping manner, the lower guide wheel is sleeved on the front side of the supporting plate, the upper guide wheel is sleeved on the upper side of the lower guide wheel, the supporting sleeve seat is arranged in the middle of the upper end surface of the operating platform, the telescopic seat is sleeved on the upper side of the inner side of the supporting sleeve seat, the compression spring is symmetrically clamped on the left side and the right side of the lower end surface of the telescopic seat, the left positioning sleeve seat is arranged on the left side of the upper end surface of the supporting extension plate, the left adjustable rod is inserted in the middle of the inner part of the left positioning sleeve seat, and the lower end surface of the right adjustable rod is welded with a connecting seat.
2. The adjustable grinding and polishing device for the nanocrystalline strip as claimed in claim 1, wherein: two sets of are installed to the support section of thick bamboo, and two sets of support section of thick bamboo specifications are the same, the meshing of support section of thick bamboo annular side right side has positioning bolt, positioning bolt meshing has two sets ofly, and two sets of positioning bolt specifications are the same.
3. The adjustable grinding and polishing device for the nanocrystalline strip as claimed in claim 1, wherein: the lower guide wheel sleeves are provided with two groups, the specifications of the two groups of lower guide wheels are the same, the specifications of the two groups of upper guide wheels are the same, the annular side surfaces of the upper guide wheels and the lower guide wheels are provided with annular limiting grooves, and the front and back widths of the annular limiting grooves are slightly larger than the front and back widths of external nanocrystalline strips.
4. The adjustable grinding and polishing device for the nanocrystalline strip as claimed in claim 1, wherein: the inside right side meshing of right side position sleeve seat has right fixing bolt, the inside left side meshing of left side position sleeve seat has left fixing bolt, the connecting seat welding has two sets ofly, and two sets of connecting seat specifications are the same.
5. The adjustable grinding and polishing device for the nanocrystalline strip as claimed in claim 1, wherein: the polishing device is characterized in that the lower polishing block, the upper polishing block, the lower polishing block and the upper polishing block are of detachable structures, the front and back widths of the lower polishing block, the upper polishing block, the lower polishing block and the upper polishing block are all larger than the front and back widths of an external nanocrystalline strip, and the positions of the lower polishing block, the upper polishing block, the lower guide wheel and the upper guide wheel are located on the same central line.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202021974346.9U CN212947118U (en) | 2020-09-11 | 2020-09-11 | Adjustable nanocrystalline strip is with burnishing and polishing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202021974346.9U CN212947118U (en) | 2020-09-11 | 2020-09-11 | Adjustable nanocrystalline strip is with burnishing and polishing device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN212947118U true CN212947118U (en) | 2021-04-13 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202021974346.9U Active CN212947118U (en) | 2020-09-11 | 2020-09-11 | Adjustable nanocrystalline strip is with burnishing and polishing device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN212947118U (en) |
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2020
- 2020-09-11 CN CN202021974346.9U patent/CN212947118U/en active Active
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