CN212680550U

CN212680550U - Gas treatment device

Info

Publication number: CN212680550U
Application number: CN202021277084.0U
Authority: CN
Inventors: 王昊
Original assignee: Aier Weichen Technology Beijing Co ltd
Current assignee: Fute Carbon Beijing Technology Co ltd
Priority date: 2020-07-03
Filing date: 2020-07-03
Publication date: 2021-03-12
Anticipated expiration: 2030-07-03

Abstract

The utility model provides a gas treatment device, include: a housing enclosing a cavity; a gas inlet disposed on the housing; an outlet disposed on the housing; a partition plate disposed in the chamber to divide the chamber into a first region communicating with the gas inlet and a second region communicating with the outlet; an electrostatic generator disposed in an airflow path of the gas entering the first zone through the gas inlet, configured to charge the gas flowing through the electrostatic generator; and a nozzle disposed in the first region and configured to eject a first liquid; the partition includes a through-hole configured to allow the charged gas and the injected first liquid to pass through the through-hole from the first region into the second region to treat the gas; wherein, the position of the static generator is arranged to prevent the sprayed first liquid from splashing to the static generator, thereby preventing the static generator from being punctured due to the sprayed liquid, and improving the safety and the reliability.

Description

Gas treatment device

Technical Field

The utility model relates to a gas treatment technical field, especially a gas treatment device.

Background

The increase in energy demand caused by economic growth has led to the generation of atmospheric pollutants, raising the problem of treating many fields (such as thermal power, steel, chemical industry, etc.), and thus, the demand for gas treatment technology has also increased. In order to improve the treatment effect of gas (e.g., polluted gas), a solution has been developed in which the gas is ionized and then mixed with a sprayed treatment liquid to treat the gas. However, in the prior art, the arrangement of the gas ionization device and the liquid injection device can cause the injected liquid to be easily sputtered onto the gas ionization device, and further easily cause the gas ionization device to be broken down, so that the safety and the reliability are low.

SUMMERY OF THE UTILITY MODEL

In view of the above, the present invention has been made to provide a gas treatment device that overcomes or at least partially solves the above problems.

An object of the utility model is to provide a can reduce and avoid the gas treatment device that electrostatic generator punctures the probability even.

A further object of the utility model is to improve gas ionization efficiency.

According to the utility model discloses an aspect provides a gas processing apparatus, include:

a housing enclosing a cavity;

a gas inlet provided on the housing configured to allow gas to enter the cavity through the gas inlet;

an outlet disposed on the housing configured to allow gas entering the cavity to exit the outlet;

a baffle disposed in the chamber to divide the chamber into a first region in communication with the gas inlet and a second region in communication with the outlet;

an electrostatic generator disposed in a gas flow path of gas entering the first zone through the gas inlet, configured to charge gas flowing through the electrostatic generator; and

a nozzle disposed within the first region and configured to eject a first liquid;

the partition includes a through-hole configured to allow the charged gas and the injected first liquid to pass through the through-hole from the first region into the second region to treat the gas;

wherein the electrostatic generator is positioned such that splashing of the ejected first liquid onto the electrostatic generator is avoided.

Optionally, the second region is configured to receive a liquid pool formed by a second liquid;

the through hole is also configured to allow charged gas to generate bubbles through the through hole to enter the liquid pool, and to allow the sprayed first liquid to enter the bubbles and the liquid pool through the through hole.

Optionally, the position of the electrostatic generator is arranged at the same position on the airflow path as the nozzle.

Optionally, the location of the electrostatic generator is arranged upstream of the nozzle on the airflow path.

Optionally, the electrostatic generator is disposed inside the cavity and in close proximity to the gas inlet.

Optionally, the electrostatic generator is disposed outside the cavity and in close proximity to the gas inlet.

Optionally, the electrostatic generator comprises at least two plates arranged parallel to and spaced apart from each other, and a wire electrode arranged between each two adjacent plates and configured to flow gas through a gap between each two adjacent plates to charge the gas.

Optionally, the wire electrode extends in a direction perpendicular to the direction of the gas flow.

Optionally, the voltage between each polar plate and the adjacent electrode wire is within the range of 5000-.

Optionally, the distance between each said plate and the adjacent said wire electrode is in the range of 1-10 cm.

The utility model discloses among the gas treatment device, the electrostatic generator sets up on the gaseous air current route of the first region of entering cavity through gas inlet, and the position arrangement of electrostatic generator makes on can avoiding the first liquid that the nozzle jetted to splash to electrostatic generator to can effectively reduce and avoid the probability that electrostatic generator punctures because of being infected with the liquid that sprays even, improve gas treatment device's security and reliability.

Furthermore, the electrostatic generator comprises at least two polar plates which are parallel to each other and are arranged at intervals, and a wire electrode arranged between each two adjacent polar plates, and the wire electrode extends along the direction vertical to the airflow direction, so that the contact area between gas flowing through the gap between each two adjacent polar plates and the wire electrode is increased, and the gas ionization efficiency is improved.

The above description is only an overview of the technical solutions of the present invention, and in order to make the technical means of the present invention more clearly understood, the present invention may be implemented according to the content of the description, and in order to make the above and other objects, features, and advantages of the present invention more obvious and understandable, the following detailed description of the present invention is given.

The above and other objects, advantages and features of the present invention will become more apparent to those skilled in the art from the following detailed description of specific embodiments thereof, taken in conjunction with the accompanying drawings.

Drawings

Various other advantages and benefits will become apparent to those of ordinary skill in the art upon reading the following detailed description of the preferred embodiments. The drawings are only for purposes of illustrating the preferred embodiments and are not to be construed as limiting the invention. Also, like reference numerals are used to refer to like parts throughout the drawings. In the drawings:

fig. 1 shows a schematic structural view of a gas processing apparatus according to an embodiment of the present invention;

FIG. 2 shows a schematic structural view of a gas treatment device according to another embodiment of the present invention;

FIG. 3 shows a schematic structural view of a gas treatment device according to yet another embodiment of the present invention;

fig. 4 shows a schematic structural diagram of an electrostatic generator as viewed from a gas inlet according to an embodiment of the invention.

Detailed Description

Exemplary embodiments of the present disclosure will be described in more detail below with reference to the accompanying drawings. While exemplary embodiments of the present disclosure are shown in the drawings, it should be understood that the present disclosure may be embodied in various forms and should not be limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the disclosure to those skilled in the art.

In order to solve the technical problem, the utility model provides a gas treatment device. Fig. 1 shows a schematic structural diagram of a gas processing device 100 according to an embodiment of the present invention. Fig. 2 shows a schematic structural diagram of a gas processing device 100 according to another embodiment of the present invention. Fig. 3 shows a schematic structural diagram of a gas processing device 100 according to another embodiment of the present invention.

Referring to fig. 1-3, a gas treatment device 100 may generally include a housing 1, a gas inlet 2, an outlet 10, a baffle 4, an electrostatic generator 12, and a nozzle 7.

The housing 1 encloses a cavity 15 in its interior. The shape of the housing 1 can be selected according to the actual application requirements, such as square, cylindrical, etc., and the present invention is not limited thereto.

A gas inlet 2 is provided on the housing 1 configured to allow gas to enter the cavity 15 through the gas inlet 2. An outlet 10 is provided on the housing 1 configured to allow gas entering the cavity 15 to exit from the outlet 10. In some embodiments, the gas inlet 2 and the gas outlet 10 may be disposed at two opposite sides (or two opposite ends) of the housing 1, for example, as shown in fig. 1, the gas inlet 2 and the gas outlet 10 may be disposed at two opposite upper and lower sides of the housing 1. In other embodiments, the gas inlet 2 and the gas outlet 10 may be disposed at any two sides (or two ends) of the housing 1, for example, as shown in fig. 2 and 3, the gas inlet 2 may be disposed at the left side of the housing 1, and the gas outlet 10 is disposed at the upper side of the housing 1, and the gas is driven to flow from the gas inlet 2 to the gas outlet 10 by the gas driving device. Of course, the gas inlet 2 and the gas outlet 10 may be disposed at other positions of the housing 1, and the present invention is not limited thereto.

A baffle 4 is provided in the chamber 15 to divide the chamber 15 into a first region 3 communicating with the gas inlet 2 and a second region 17 communicating with the outlet 10. In one embodiment, the partition 4 may be horizontally disposed in the cavity 15 to divide the cavity 15 into the lower first region 3 and the upper second region 17.

An electrostatic generator 12 is disposed in the gas flow path of the gas entering the first zone 3 through the gas inlet 2 and is configured to charge the gas flowing through the electrostatic generator 12. Specifically, for the polluted gas, the gas is ionized when flowing through the electrostatic generator 12, so that the particles in the gas are charged, part of the organic pollutants and germs are ionized, and a small amount of ozone is generated, and the generated ozone can be used for killing the organic pollutants and germs, thereby promoting the subsequent treatment effect on the gas.

A nozzle 7 is arranged in the first region 3 for spraying a first liquid 8. Depending on the specific configuration of the nozzle 7, the first liquid 8 ejected may be in the form of droplets, a liquid column, a jet, or the like. The first liquid 8 may be a liquid for treating a gas, such as an absorption liquid or the like.

The partition 4 may include through-holes 5 to allow the charged gas and the first liquid 8 sprayed by the nozzles 7 to pass from the first zone 3 into the second zone 17 through the through-holes 5 for treatment of the gas (e.g., mixing, debris removal, etc.). The through holes 5 can be uniformly distributed on the partition board 4, or distributed in different areas of the partition board 4 with different densities, and can be arranged according to the actual application requirements.

The nozzle 7 can spray the first liquid 8 in any direction, and the sprayed first liquid 8 is carried by the gas under power to enter the second area 17 from the first area 3 through the through hole 5. Preferably, the angle between the spraying direction of the nozzles 7 and the plane direction of the partition 4 is in the range of 0 to 90 degrees. More preferably, the spraying direction of the nozzle 7 is perpendicular to the planar direction of the partition plate 4 to reduce the resistance to the flow of the gas-carrying sprayed first liquid 8, and at the same time, the scouring action of the sprayed first liquid 8 on the partition plate 4 can be increased to maintain the cleanliness of the surface of the partition plate 4. The distance between the nozzle 7 and the baffle 4 can be set according to the requirements of practical application, and can be set within 1.5m generally.

The static generator 12 is liable to be unstable due to the presence of a large amount of the first liquid 8 ejected by the nozzle 7 in the first region 3. The embodiment of the utility model provides an in arrange the position of static generator 12 on making can avoid the first liquid 8 that nozzle 7 jetted to splash to static generator 12 to can effectively reduce and avoid static generator 12 to improve gas treatment device 100's security and reliability because of being infected with the probability that the liquid that sprays punctures even.

In one embodiment, the second region 17 may be configured to receive a liquid pool 6 formed from a second liquid. In this case, the charged gas can be bubbled (not shown) into the liquid pool 6 through the through holes 5, so that the gas and the second liquid are fully mixed and contacted, and the through holes 5 play the role of foam cells. Also, the first liquid 8 ejected by the nozzle 7 may also be carried by the gas through the through-holes 5 into the gas bubble and liquid pool 6 to further promote thorough mixing contact of the gas with the first liquid 8. The second liquid may be the same as or different from the first liquid 8. For example, the second liquid and the first liquid 8 may both be an absorbent liquid, or the first liquid 8 may be an absorbent liquid and the second liquid may be water.

In some embodiments, the location of the electrostatic generator 12 may be arranged at the same location on the airflow path as the nozzle 7 or upstream of the nozzle 7. Due to the carrying effect of the airflow formed by the power-driven gas on the first liquid 8 sprayed by the nozzle 7, the first liquid 8 sprayed by the nozzle 7 can move towards the direction of the partition plate 4 along with the airflow, so that the first liquid 8 can be ensured not to splash onto the electrostatic generator 12. For example, in the case where the gas inlet 2 and the outlet 10 are respectively disposed at opposite upper and lower sides of the housing 1, and the partition plate 4 is horizontally disposed in the chamber 15 to divide the chamber 15 into the lower first region 3 and the upper second region 17, the gas flow path is to flow upward from the lower gas inlet 2 to the outlet 10, and at this time, the electrostatic generator 12 may be disposed at the same horizontal position as the nozzle 7 or at a position below the nozzle 7 in the first region 3. In addition, it will be understood by those skilled in the art that the electrostatic generator 12 may also be positioned slightly downstream relative to the nozzle 7, and that the sprayed first liquid 8 is likewise prevented from splashing onto the electrostatic generator 12 due to the entrainment of the sprayed first liquid 8 by the air flow. Note that, since the electrostatic generator 12 is generally a device having a certain volume and composed of a plurality of structural components, in the present invention, the position of the electrostatic generator 12 is represented by the position of the structural component of the electrostatic generator 12 located at the most downstream position on the airflow path.

In one embodiment, referring to fig. 1 and 2, the electrostatic generator 12 may be disposed outside the cavity 15 and in close proximity to the gas inlet 2. For example, the electrostatic generator 12 may be provided in a pipe to which the gas inlet 2 is connected. In this case, the gas enters the first region 3 from the gas inlet 2 after passing through the electrostatic generator 12. In this way, it can be ensured that the electrostatic generator 12 does not contaminate the first liquid 8 ejected by the nozzle 7, and at the same time, the arrangement of the nozzle 7 in the first region 3 is more free and selective, which is beneficial to improving the mixing effect of the gas and the first liquid 8, and simplifying the assembly operation of the electrostatic generator 12 and the nozzle 7.

In another embodiment, referring to fig. 3, the electrostatic generator 12 may be arranged inside the cavity 15 in close proximity to the gas inlet 2. In this case, the gas enters the first region 3 from the gas inlet 2, passes through the electrostatic generator 12, and then enters the second region 17 together with the first liquid 8 ejected from the nozzle 7 through the through-hole 5 of the partition plate 4. In this way, the overall structure of the gas processing apparatus 100 can be made more compact. Which is advantageous for the miniaturization of the gas processing apparatus 100.

In one embodiment, the gas treatment device 100 may further comprise a heat exchange wall 9. At least a part of the heat exchange wall surface 9 is arranged in the liquid tank 6, and the second liquid in the liquid tank 6 can exchange heat with the heat exchange wall surface 9 to promote the treatment effect on the gas. For example, the heat exchange wall 9 may be a heat exchange pipe, in which a heat exchange medium flows for exchanging heat with the second liquid.

In one embodiment, the gas treatment device 100 may further comprise a fan 11. A fan 11 may be provided at the outlet 10 or in a duct connected to the outlet 10 for driving the gas flow in a suction manner. Meanwhile, due to the rotation effect of the fan blade, when the air passes through the fan 11, liquid drops (including liquid drops of the first liquid 8 carried by the air and/or liquid drops of the second liquid carried by the air after passing through the liquid pool 6) carried by the air can be captured and collected by the blade, so that the fan 11 provides power for the air and plays a role in demisting, and the power equipment and the demisting equipment are integrated. The fan 11 may be an axial flow fan.

The electrostatic generator 12 used in the present invention will be described below.

Fig. 4 shows a schematic structural diagram of the electrostatic generator 12 when viewed from the gas inlet 2 according to an embodiment of the present invention. Referring to fig. 4, the electrostatic generator 12 may include at least two plates 14 disposed parallel to and spaced apart from each other, and a wire electrode 13 disposed between each adjacent two plates 14. Gas flows through the gap between each adjacent two of the plates 14 to charge the gas. In this case, the position of the electrostatic generator 12 refers to the end face position at the most downstream of the pole plate 14. In order to achieve smooth gas flow and gas ionization effect, the distance between each polar plate 14 and the adjacent wire electrode 13 can be set within the range of 1-10 cm. It should be noted that fig. 4 shows a minimum unit constituting the electrostatic generator 12 by a dashed box, that is, the electrostatic generator 12 may include at least two plates 14 parallel to each other and spaced apart from each other, and the wire electrode 13 disposed between the two plates 14.

The polar plates 14 can be connected with the positive pole of a power supply or grounded, the wire electrodes 13 can be connected with the negative pole of the power supply, and therefore a high-voltage electric field is formed between each polar plate 14 and the adjacent wire electrode 13. The voltage between each electrode plate 14 and the adjacent electrode wire 13 can be set within the range of 5000-. Generally, the higher the voltage between each electrode plate 14 and the adjacent wire electrode 13, the better the ionization and charging effects, the more ozone is generated, and the better the gas treatment effect, but the higher the ozone concentration, the more harmful to the human body. In practical applications, the voltage between each plate 14 and the adjacent wire 13 can be set appropriately according to the gas treatment requirements and human safety considerations.

In a preferred embodiment, as shown in fig. 4, the wire electrode 13 may extend in a direction perpendicular to the direction of the gas flow (i.e., the viewing direction of fig. 4). In this way, the contact area of the gas with the wire electrode 13 when the gas flows through the gap between each adjacent two of the polar plates 14 is increased, thereby improving the gas ionization efficiency.

According to any one of the above-mentioned optional embodiments or the combination of a plurality of optional embodiments, the embodiment of the present invention can achieve the following advantageous effects:

In the description provided herein, numerous specific details are set forth. It is understood, however, that embodiments of the invention may be practiced without these specific details. In some instances, well-known methods, structures and techniques have not been shown in detail in order not to obscure an understanding of this description.

Thus, it should be appreciated by those skilled in the art that while a number of exemplary embodiments of the invention have been shown and described in detail herein, many other variations and modifications can be made, consistent with the principles of the invention, which are directly determined or derived from the disclosure herein, without departing from the spirit and scope of the invention. Accordingly, the scope of the present invention should be understood and interpreted to cover all such other variations or modifications.

Claims

1. A gas processing apparatus, comprising:

a housing enclosing a cavity;

2. The gas processing apparatus according to claim 1,

the second region is configured to receive a liquid pool formed by a second liquid;

3. The gas treatment apparatus according to claim 1, wherein the position of the electrostatic generator is arranged at the same position on the gas flow path as the nozzle.

4. The gas treatment apparatus of claim 1, wherein the electrostatic generator is positioned upstream of the nozzle in the gas flow path.

5. The gas treatment apparatus of claim 4, wherein the electrostatic generator is disposed inside the cavity proximate to the gas inlet.

6. The gas treatment apparatus of claim 4, wherein the electrostatic generator is disposed outside the chamber and in close proximity to the gas inlet.

7. The gas treatment device of claim 1, wherein the electrostatic generator comprises at least two plates disposed parallel to and spaced apart from each other, and a wire electrode disposed between each adjacent two of the plates and configured to flow gas through a gap between each adjacent two of the plates to charge the gas.

8. The gas processing device according to claim 7, wherein the wire electrode extends in a direction perpendicular to a direction of gas flow.

9. The gas treatment device as claimed in claim 7, wherein the voltage between each of the plates and the adjacent wire electrode is in the range of 5000-.

10. The gas treatment device according to claim 7, wherein the distance between each of the plates and the adjacent wire electrode is in the range of 1-10 cm.