CN212633530U - Centrifugal device - Google Patents

Abstract

The present application relates to a centrifuge device comprising a support base and at least one centrifuge assembly. The support base is provided with an accommodating pool. The support base may be disposed at a bottom of the receiving well. The centrifugal assembly is arranged at the edge of the supporting base. When the supporting base rotates, the centrifugal assembly is used for cleaning the grinding knife entering the containing pool under the action of centrifugal force. When the grinding tool extends into the accommodating pool, the supporting base can be started to rotate. Under the action of centrifugal force, the centrifugal cleaning element can be close to the grinding knife, the brush of the centrifugal assembly can clean the grinding knife, so that the grinding knife does not need to be detached from a homogenizer for cleaning, residual samples on the grinding knife can be quickly removed by cleaning the grinding knife through the centrifugal cleaning element rotating at high speed, and the cleaning efficiency is greatly improved.

Description

Centrifugal device

Technical Field

The application relates to the field of cleaning, in particular to a centrifugal device.

Background

China is a large country for using pesticides and veterinary drugs, and the pesticide residue of the final agricultural products and the veterinary drug residue degree of the animal products are related to the food health and safety of common people. The prerequisite of effectively detecting pesticide and animal remedy remains is that will wait to detect the sample and carry out effective homogenization treatment, and the full-automatic homogenizer that uses the tool bit is just effectively improving the product of homogeneity effect. Generally, after one homogenization treatment process is performed, impurities which are difficult to naturally fall off are attached to a grinding cutter head of the homogenizer, and if the cutter head is directly used for the next homogenization treatment process, the subsequent samples are possibly polluted. Therefore the homogenizer tool bit need all wash after going on each time the homogenization treatment, and the current mode of getting rid of the animal and plant tissue that blocks on the homogenizer tool bit mainly relies on artifical clearance, needs the whole homogenizer tool bit of dismantling behind the equipment shut down, and it is long to cause the artifical worker that the clearance took, and is inefficient.

Disclosure of Invention

In view of the above, the present application provides a centrifuge device.

A centrifuge device comprising:

a support base; and

the centrifugal component is arranged at a position outside the circle center of the supporting base, and when the supporting base rotates, the centrifugal component is used for cleaning or polishing objects to be cleaned close to the centrifugal component under the action of centrifugal force.

In one embodiment, the support base comprises a rotary table, the centrifuge assembly comprising:

a first rotating shaft provided to the rotating table;

the first mounting assembly is used for mounting a cleaning component or a polishing component, the first mounting assembly is arranged on one side of the rotating table, and the first mounting assembly is rotatably connected with the first rotating shaft; and

the position adjusting piece is arranged on the other side of the rotating platform, the position adjusting piece is connected with the first rotating shaft in a rotating mode, the position adjusting piece is fixed relative to the first mounting assembly, and when the rotating platform rotates, the centrifugal force applied to the first mounting assembly is smaller than the centrifugal force applied to the position adjusting piece.

In one embodiment, a line connecting the center of gravity of the positioning member and the center of gravity of the first rotating shaft is not collinear with a line connecting the center of gravity of the first mounting assembly and the center of gravity of the first rotating shaft.

In one embodiment, the first mounting assembly comprises a mounting frame and a mounting member, the mounting member comprises the cleaning component and/or the polishing component, the cleaning component and/or the polishing component are respectively detachably arranged on one side of the mounting frame close to the center of the rotating table, the mounting frame is rotatably connected with the first rotating shaft, and the positioning member and the mounting frame are relatively fixed.

In one embodiment, the centrifugal assembly further comprises a second mounting assembly, the second mounting assembly is used for mounting a cleaning component or a polishing component, the second mounting assembly is rotatably arranged on the rotary table and is arranged on the same side of the rotary table at an interval with the first mounting assembly, and when the rotary table rotates, the second mounting assembly inclines towards a direction far away from the center of the rotary table.

In one embodiment, the device further comprises a second rotating shaft arranged on the rotating platform and spaced from the first rotating shaft, and the second mounting assembly is rotatably connected with the second rotating shaft.

In one embodiment, the apparatus further comprises a driving device, the driving device is connected with the rotating platform, and the driving device is used for driving the rotating platform to rotate.

In one embodiment, the support base comprises a rotary table, the centrifuge assembly comprising:

the second installation component is used for installing a cleaning part or a polishing part, the second installation component is rotatably arranged on the rotating platform, and when the rotating platform rotates, the second installation component faces away from the center of the rotating platform and inclines in the direction.

In one embodiment, the centrifuge assembly comprises:

the third mounting assembly is arranged at a position outside the circle center of the rotating table and used for mounting a cleaning component or a polishing component;

the sliding groove extends from the center of the rotating platform to the edge of the rotating platform, and the third mounting assembly is arranged in the sliding groove in a sliding mode;

the fixing column is arranged on the rotating table and is positioned on one side, away from the third mounting assembly, of the sliding groove;

and two ends of the first elastic piece are respectively connected with the third mounting assembly and the fixing column.

In one embodiment, the water storage tank further comprises a containing tank, the supporting base is arranged on the containing tank, a water spraying opening is formed in the inner wall of the containing tank, the bottom surface of the containing tank is an inclined surface, and a drain hole is formed in the lowest point of the inclined surface.

The embodiment of the application provides centrifugal device works as wait to wash the thing or wait to cut open the smooth thing and be close to hold the pond after, can start support the base rotation. Under the action of centrifugal force, the centrifugal assembly can be close to the object to be cleaned or the object to be polished, and the centrifugal assembly can clean or polish the object to be cleaned. When the object to be cleaned is a grinding knife, the grinding knife does not need to be detached from the homogenizer for cleaning, and the residual sample on the grinding knife can be quickly removed by cleaning the grinding knife through the centrifugal cleaning element rotating at a high speed, so that the cleaning efficiency is greatly improved.

Drawings

FIG. 1 is a schematic view of a centrifuge apparatus provided in an embodiment of the present application;

FIG. 2 is a static state diagram of a centrifuge assembly provided in accordance with an embodiment of the present application;

FIG. 3 is a diagram illustrating a rotational state of a centrifuge assembly according to an embodiment of the present disclosure;

FIG. 4 is a schematic illustration of a static state of a centrifuge apparatus according to an embodiment of the present disclosure;

FIG. 5 is a schematic view of a centrifugal apparatus according to an embodiment of the present disclosure;

FIG. 6 is a schematic view of a centrifuge apparatus according to another embodiment of the present application

FIG. 7 is a cross-sectional view of the centrifuge provided in the embodiment of FIG. 1;

FIG. 8 is a top view of a centrifuge apparatus according to an embodiment of the present application;

FIG. 9 is a cross-sectional view of a centrifuge device according to an embodiment of the present application

Reference numerals:

centrifugal device 10

Receiving tank 100

Support base 200

The rotating table 210

Centrifuge assembly 300

First rotating shaft 310

Second rotating shaft 312

First mounting assembly 320

Second mounting assembly 326

Mounting bracket 322

Mounting 324

Position adjusting part 330

Grinding knife 400

Driving device 410

Connecting shaft 420

Cardan shaft 430

Water jet 110

Inclined surface 120

Drain hole 140

Cleaning unit 20

The pumping hole 130

Pipe 440

Third mounting assembly 510

Sliding groove 520

Fixing post 530

The first elastic member 540.

Detailed Description

In order to make the objects, technical solutions and advantages of the present application more apparent, the present application is further described in detail below by way of embodiments and with reference to the accompanying drawings. It should be understood that the specific embodiments described herein are merely illustrative of the present application and are not intended to limit the present application.

The present invention is described in terms of particular embodiments, other advantages and features of the invention will become apparent to those skilled in the art from the following disclosure, and it is to be understood that the described embodiments are merely exemplary of the invention and that it is not intended to limit the invention to the particular embodiments disclosed. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

Referring to fig. 1, the present embodiment provides a centrifuge apparatus 10. The centrifuge device 10 comprises a support base 200 and at least one centrifuge assembly 300. The support base 200 may be used to be provided to a cleaning apparatus or a polishing apparatus. In one embodiment, the support base 200 may be disposed at the bottom of the receiving well 100. The holding tank can hold sewage after cleaning or debris generated by polishing.

The centrifugal assembly 300 is disposed outside the center of the circle of the supporting base 200. When the supporting base 200 rotates, the centrifugal assembly 300 is used for cleaning or polishing the object to be cleaned or polished close to the centrifugal assembly 300 under the action of centrifugal force. The centrifugal assembly 300 may utilize the principle of centrifugation while rotating around the center of the support base 200, so that the centrifugal assembly 300 approaches and washes or polishes the object to be washed or polished located at the center of the support base 200. It will be appreciated that the path of rotation of the centrifuge assembly 300 about the support base 200 forms a cavity-shaped profile as the centrifuge assembly 300 rotates. After the object to be cleaned or polished enters the cavity-shaped profile, the centrifugal assembly 300 can clean the object to be cleaned or polished. The rotation of the support base 200 can rotate the centrifugal assembly 300.

The centrifugal device 10 provided in the embodiment of the present application can start the supporting base 200 to rotate after the object to be cleaned or the object to be polished approaches the centrifugal assembly 300. Under the action of centrifugal force, the centrifugal assembly 300 may be close to the object to be cleaned or the object to be polished, and the centrifugal assembly 300 may be provided with a cleaning part or a polishing part to clean or polish the object to be cleaned. When the object to be cleaned is the grinding knife 400, the grinding knife 400 does not need to be detached from the homogenizer for cleaning, and the residual sample on the grinding knife 400 can be quickly removed by cleaning the grinding knife 400 through the centrifugal assembly rotating at a high speed, so that the cleaning efficiency is greatly improved. By replacing the cleaning member of the centrifugal assembly with a polishing member, the grinding blade 400 can be further polished, and the grinding blade 400 can be further cleaned.

In one embodiment, the centrifugal assembly 300 may be a plurality of centrifugal assemblies 300, and the centrifugal assemblies 300 may be disposed at equal intervals on the periphery of the support base 200. A plurality of the centrifugal assemblies 300 may form the cavity-shaped profile when rotated by the support base 200.

In one embodiment, the support base 200 includes a rotating table 210. The centrifuge assembly 300 includes a first rotating shaft 310, a first mounting assembly 320, and an adjustment member 330. The first rotating shaft 310 is disposed on the rotating table 210. The first rotation shaft 310 is rotatable on the turntable 210. The rotating platform 210 can rotate relative to the receiving tank 100, and thus the centrifugal assembly 300 can rotate. The first mounting assembly 320 is disposed on one surface of the rotating table 210.

In one embodiment, the first mounting assembly 320 may be disposed on the surface of the rotating table 210 near the opening of the receiving tank 100. The first mounting assembly 320 is used to mount a cleaning member or a polishing member. It will be appreciated that the cleaning member may be a brush. The polishing member may be a polishing cloth or the like.

The grinding tool 400 may enter the receiving tank 100 through an opening of the receiving tank 100. The first mounting assembly 320 may then clean the grinding bit 400. The first mounting assembly 320 may also polish an object to be polished, such as a pipe 440, etc., located at the center of the rotary table 210.

The first mounting assembly 320 is rotatably connected to the first rotating shaft 310. The axis of the first rotating shaft 310 may be parallel to the plane on which the rotating table 210 is located. The first mounting assembly 320 is thus free to rotate in a vertical plane about the first rotation axis 310. The positioning member 330 is disposed on a side of the rotating platform 210 away from the opening of the receiving tank 100. That is, the positioning member 330 and the first mounting assembly 320 are respectively located on two opposite surfaces of the rotating platform 210. The positioning member 330 is rotatably connected to the first rotating shaft 310. The positioning member 330 can rotate in a vertical plane. The positioning member 330 and the first mounting assembly 320 are relatively fixed. That is, the positioning member 330 and the first mounting assembly 320 may be mechanically fixed to the first rotating shaft 310, or may be integrally formed to rotate around the first rotating shaft 310. When the rotating platform 210 rotates, the centrifugal force applied to the first mounting assembly 320 is smaller than the centrifugal force applied to the positioning member 330. Therefore, when the rotating table 210 rotates, the positioning member 330 is tilted away from the center of the rotating table 210, and the first mounting member 320 is tilted toward the center of the rotating table 210. It is understood that, at this time, the distance from the center of gravity of the first mounting assembly 320 to the first rotating shaft 310 x the gravity of the first mounting assembly 320 is smaller than the distance from the center of gravity of the positioning member 330 to the first rotating shaft 310 x the gravity of the positioning member 330.

Therefore, referring to fig. 2-3, when the rotating platform 210 rotates, the centrifugal force of the positioning member 330 in the horizontal direction is greater than the centrifugal force of the first mounting assembly 320 in the horizontal direction, so as to force the first mounting assembly 320 to move centripetally and to fit the grinding blade 400 or the object to be polished. It is understood that the object to be polished may also be the grinding blade 400. The aligning member 330 is moved away from the center of the rotary table 210 by a centrifugal force, and the first mounting assembly 320 is tilted in a reverse direction toward the center of the rotary table 210, thereby approaching and cleaning the grinding tool 400 or polishing the object to be polished.

In one embodiment, the positioning member 330 may comprise a metal ball or a metal block weight with a large mass. After cleaning or polishing, the grinding bit 400 may be lifted off the containment tank 100. At this time, the gravity moment of the weight on the positioning member 330 is large so that the first mounting member 320 is tilted away from the center of the rotary table 210, and the water or polishing debris on the first mounting member 320 flows down or falls down.

In one embodiment, a line connecting the center of gravity of the positioning member 330 and the center of gravity of the first rotating shaft 310 is not aligned with a line connecting the center of gravity of the first mounting assembly 320 and the center of gravity of the first rotating shaft 310. Therefore, when the rotating table 210 rotates, the centrifugal force applied to the positioning member 330 is larger. Further, when the rotation of the rotation platform 210 stops, the positioning member 330 can be ensured to return to the original position.

In one embodiment, the first mounting assembly 320 includes a mounting bracket 322 and a mounting member 324. The mounting member 324 may be mounted to the mounting frame 322. The mounting bracket 322 can rotate relative to the first rotating shaft 310, and thus the mounting member 324 can rotate. The mounting member 324 is disposed on a side of the mounting member 322 near the center of the rotating platform 210, and the mounting member 322 is rotatably connected to the first rotating shaft 310. Therefore, when the mounting frame 322 is close to the center of the rotating table 210, the mounting frame 324 can be close to or press the grinding tool 400 for cleaning or polishing. The mounting member 324 includes a cleaning member and/or a polishing member. The cleaning component and/or the polishing component are/is detachably disposed on one side of the mounting frame 322 close to the center of the rotating table 210. The mounting bracket 322 is rotatably connected to the first rotating shaft 310, and the positioning member 330 and the mounting bracket 322 are relatively fixedly disposed, that is, the positioning member 330 and the mounting bracket 322 may be rigidly connected.

In one embodiment, the cleaning component may be a brush, the bristles of the brush may have different lengths, and the soft and hard bristles may be alternately arranged, so as to facilitate cleaning of the hard or soft sample residues in the grinding tool 400. The cleaning member may be a cleaning cloth or the like. The polishing component can also be polishing materials such as abrasive cloth, nylon cloth and the like.

Referring to fig. 4 and 5, in one embodiment, a second mounting assembly 326 is also included. The second mounting assembly 326 is used to mount a cleaning component or a polishing component. The second mounting assembly 326 is rotatably disposed on the turntable 210 and spaced apart from the first mounting assembly 320 on the same side of the turntable 210. The second mounting assembly 326 is used to mount the cleaning member or the polishing member. When the rotary table 210 rotates, the second mounting assembly 326 is tilted away from the center of the rotary table 210. The second mounting assembly 326 may also be mounted with a cleaning material such as a cleaning cloth or a polishing material such as an abrasive cloth or nylon cloth.

In one implementation, a conduit 440 may be disposed above the center of the rotary table 210. The conduit 440 may be an object to be polished. The first mounting assembly 320 may be located outside of the conduit 440 and the second mounting assembly 326 may be located inside of the conduit 440. When the rotating table 210 rotates, as in the above embodiment, the mass of the first mounting assembly 320 is less than that of the positioning member 330, and therefore, the first mounting assembly 320 can be close to clean or polish the outer wall of the pipe 440. Meanwhile, the second mounting assembly 326 may be rotatably disposed on the rotating table 210. Under the centrifugal force, the second mounting assembly 326 is tilted away from the center of the rotary table 210, i.e., the second mounting assembly 326 is tilted toward the edge of the rotary table 210, so that the second mounting assembly 326 can be pressed against the inner wall of the pipe 440, thereby polishing or cleaning the inner wall of the pipe 440.

Referring to fig. 6, in one embodiment, the centrifuge assembly 300 may also include only the second mounting assembly 326. The second mounting assembly 326 is disposed at a position other than the center of the turntable 210. That is, only the second mounting assembly 326 may be provided on the rotary table 210 without including the first mounting assembly 320. A pipe may be disposed at a center position of the rotary table 210 such that the second mounting assembly 326 is positioned within the pipe, and when the rotary table 210 rotates, the second mounting assembly 326 is tilted in a direction away from the center of the rotary table 210 so that an inner wall of the pipe may be cleaned or polished.

In one embodiment, a plurality of second mounting assemblies 326 may also be provided in the same plane of the centrifuge assembly 300.

In one embodiment, one or more second mounting assemblies 326 may be disposed on two opposite planes of the rotating table 210. Accordingly, the second mounting assemblies 326 positioned at both planes of the rotary table 210 can simultaneously wash or polish two objects while the rotary table 210 rotates, and increase a washing or polishing area. When the diameter of the tubing is larger than the diameter of the rotary table 210, the tubing may be sleeved around the rotary table 210 and the second mounting assembly 326. The second mounting assemblies 326 of both surfaces of the rotary table 210 can clean or polish the inner wall of the pipe, thereby accelerating the cleaning or polishing rate. Further, the axial relative movement of the pipe and the rotary table 210 may be made, and thus the uniformity of cleaning or polishing may be improved.

In one embodiment, a second rotational axis 312 is also included. The second rotation shaft 312 is disposed at a position other than the center of the rotation table 210, and is spaced apart from the first rotation shaft 310. The second mounting assembly 326 is rotatably coupled to the second rotating shaft 312. The second mounting assembly 326 is thus free to rotate about the second axis of rotation 312. That is, when the rotating table 210 rotates, the second mounting assembly 326 may rotate around the second rotating shaft 312 toward the edge of the rotating table 210. The second rotating shaft and the first rotating shaft 310 may have the same structure. Therefore, the first and second mounting assemblies 326 can be replaced on the second rotating shaft 312 and the first rotating shaft 310 as required, and cleaning or polishing work can be performed.

In one embodiment, the centrifuge 10 further comprises a drive means 410. The driving device 410 is connected to the rotating table 210. The driving device 410 is used for driving the rotating platform 210 to rotate. It is understood that the driving device 410 may be a motor.

In one embodiment, the centrifuge 10 further comprises a coupling shaft 420. Both ends of the connection shaft 420 are connected to the rotation stage 210 and the driving device 410, respectively. Therefore, when the driving device 410 drives the connection shaft 420 to rotate, the rotation table 210 may rotate along with the connection shaft 420. In one embodiment, the bottom of the receiving well 100 may have a communication chamber, and the connection shaft 420 may be disposed in the communication chamber.

In one embodiment, the centrifuge 10 further comprises a cardan shaft 430. The universal shaft 430 is connected between the driving device 410 and the connection shaft 420. Therefore, the driving device 410 and the connection shaft 420 may not be aligned, facilitating the location of the driving device 410. Space can be saved.

In one embodiment, the connection shaft 420 is detachably connected to the rotation stage 210. In one embodiment, the connection may be by bolting.

In one embodiment, the side wall of the receiving tank 100 near the bottom is provided with water jets 110. The water spraying opening 110 may be a plurality of openings horizontally arranged on the sidewall of the receiving tank 100. A high pressure cleaning liquid or clean water may be sprayed through the water spray 110, and the grinding bit 400 may be high pressure-washed while the cleaning part on the mounting member 324 cleans the grinding bit 400. During the cleaning process, the grinding blade 400 can reciprocate in the vertical direction, so that the cleaning effect can be improved. In addition, the water spray 110 can spray water to achieve a cooling effect. The grinding tool 400 and the mounting part 324 are prevented from being damaged due to mutual friction and heat generation. It will be appreciated that the cleaning position of the grinding tool 400 is relatively close to the bottom of the receiving tank 100, and therefore the robot arm mounting the grinding tool 400 needs to be located at a deep position of the receiving tank 100, so that water splashed by the spray is blocked by the robot arm housing. While the lower positioned water jets 110 minimize the proportion of water that flies out of the containment tank 100.

In one embodiment, the bottom surface of the receiving tank 100 is an inclined surface 120, and a drain hole 140 is formed at the lowest point of the inclined surface 120. Therefore, the residue cleaned from the grinding tool 400 after cleaning can be discharged through the drainage hole 140, and the residue is prevented from being accumulated at the bottom of the receiving tank 100.

Referring to fig. 7, in one embodiment, the centrifuge 10 further comprises a plurality of washing units 20. The plurality of washing units 20 are disposed at intervals in the receiving tank 100. Each of the cleaning units 20 may have a cleaning mode including a rinsing mode using a large amount of running water, an organic solvent cleaning mode, an ultrasonic cleaning mode, and the like. Therefore, the grinding blade 400 of the homogenizer can be sequentially cleaned in different cleaning units 20 as required, and the cleaning effect is improved. Each of the washing units 20 may occupy one region of the receiving tank 100.

Referring to fig. 8 and 9, in one embodiment, the centrifugal assembly 300 includes a third mounting assembly 510, a sliding groove 520, a fixing post 530, and a first elastic member 540. The third mounting assembly 510 is disposed at a position outside the center of the rotary table 210, and is used for mounting a cleaning component or a polishing component. The rotating table 210 has a sliding groove 520. The sliding groove 520 may be plural. The sliding groove 520 extends from the center of the rotation stage 210 toward the edge of the rotation stage 210. The third mounting assembly 510 can slide freely in the sliding groove 520. Different ones of the third mounting assemblies 510 may be placed in different ones of the slide channels 520 as desired. The fixing post 530 is disposed on the rotating platform 210 and located on a side of the sliding groove 520 away from the third mounting assembly 510. There may be a plurality of the fixing posts 530. Both ends of the first elastic member 540 are respectively connected with the third mounting assembly 510 and the fixing post 530. When the rotary table 210 rotates, the third mounting assembly 510 slides along the sliding groove 520 toward the edge of the rotary table 210 under the centrifugal force, and thus can approach the object to be cleaned or polished. When the rotation stage 210 stops rotating, the first elastic member 540 recovers its length, and the third mounting assembly 510 can be pulled back to the original position.

The technical features of the embodiments described above may be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the embodiments described above are not described, but should be considered as being within the scope of the present specification as long as there is no contradiction between the combinations of the technical features.

The above-mentioned embodiments only express several embodiments of the present application, and the description thereof is more specific and detailed, but not construed as limiting the scope of the present patent. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the concept of the present application, which falls within the scope of protection of the present application. Therefore, the protection scope of the present patent shall be subject to the appended claims.

Claims (10)

1. A centrifuge device, comprising:

a support base (200); and

the centrifugal component (300) is arranged at a position outside the circle center of the supporting base (200), and when the supporting base (200) rotates, the centrifugal component (300) is used for cleaning or polishing objects to be cleaned close to the centrifugal component (300) under the action of centrifugal force.

2. The centrifuge device according to claim 1, wherein the support base (200) comprises a rotating table (210), the centrifuge assembly (300) comprising:

a first rotating shaft (310) provided to the rotating table (210);

a first mounting assembly (320) for mounting a cleaning member or a polishing member, the first mounting assembly (320) being disposed at one side of the rotary table (210), the first mounting assembly (320) being rotatably coupled to the first rotating shaft (310); and

the adjusting piece (330) is arranged on the other side of the rotating platform (210), the adjusting piece (330) is connected with the first rotating shaft (310) in a rotating mode, the adjusting piece (330) and the first mounting assembly (320) are relatively fixed, and when the rotating platform (210) rotates, the centrifugal force applied to the first mounting assembly (320) is smaller than the centrifugal force applied to the adjusting piece (330).

3. The centrifugal device as claimed in claim 2, wherein a line connecting the center of gravity of the positioning member (330) and the center of gravity of the first rotating shaft (310) is not collinear with a line connecting the center of gravity of the first mounting assembly (320) and the center of gravity of the first rotating shaft (310).

4. The centrifuge of claim 2, wherein the first mounting assembly (320) comprises a mounting frame (322) and a mounting member (324), the mounting member (324) comprises the cleaning member and/or the polishing member, the cleaning member and/or the polishing member are detachably disposed on one side of the mounting frame (322) near the center of the rotating table (210), the mounting frame (322) is rotatably connected with the first rotating shaft (310), and the positioning member (330) and the mounting frame (322) are relatively fixed.

5. The centrifuge device according to any of claims 2 to 4, wherein the centrifuge assembly (300) further comprises a second mounting assembly (326), the second mounting assembly (326) being adapted to mount a cleaning or polishing member, the second mounting assembly (326) being rotatably mounted to the turntable (210) and being spaced apart from the first mounting assembly (320) on the same side of the turntable (210), the second mounting assembly (326) being inclined away from the center of the turntable (210) when the turntable (210) is rotated.

6. The centrifuge device of claim 5, further comprising a second rotational shaft (312) disposed on said rotating table (210) and spaced from said first rotational shaft (310), said second mounting assembly (326) being rotatably coupled to said second rotational shaft (312).

7. The centrifuge device according to claim 2, further comprising a drive device (410), the drive device (410) being connected to the rotating table (210), the drive device (410) being adapted to drive the rotating table (210) in rotation.

8. The centrifuge device according to claim 1, wherein the support base (200) comprises a rotating table (210), the centrifuge assembly (300) comprising:

a second mounting assembly (326), the second mounting assembly (326) is used for mounting a cleaning component or a polishing component, the second mounting assembly (326) is rotatably arranged on the rotating platform (210), and when the rotating platform (210) rotates, the second mounting assembly (326) inclines towards a direction far away from the center of the rotating platform (210).

9. The centrifuge device of claim 2, wherein said centrifuge assembly (300) comprises:

a third mounting assembly (510), wherein the third mounting assembly (510) is arranged at a position outside the circle center of the rotating table (210) and is used for mounting a cleaning component or a polishing component;

a sliding groove (520) extending from the center of the rotating table (210) toward the edge of the rotating table (210), the third mounting assembly (510) being slidably disposed in the sliding groove (520);

the fixing column (530) is arranged on the rotating platform (210) and is positioned on one side, away from the third mounting assembly (510), of the sliding groove (520);

a first elastic member (540), wherein two ends of the first elastic member (540) are respectively connected with the third mounting component (510) and the fixing column (530).

10. The centrifugal device according to claim 1, further comprising a receiving tank (100), wherein the supporting base (200) is disposed on the receiving tank (100), a water spraying opening (110) is disposed on an inner wall of the receiving tank (100), a bottom surface of the receiving tank (100) is an inclined surface (120), and a drain hole (140) is disposed at a lowest point of the inclined surface (120).

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