CN212586574U - Wafer-level optical lens - Google Patents

Wafer-level optical lens Download PDF

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Publication number
CN212586574U
CN212586574U CN202021780606.9U CN202021780606U CN212586574U CN 212586574 U CN212586574 U CN 212586574U CN 202021780606 U CN202021780606 U CN 202021780606U CN 212586574 U CN212586574 U CN 212586574U
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China
Prior art keywords
optical lens
material layer
lens
wafer
light absorption
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CN202021780606.9U
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Chinese (zh)
Inventor
万佳
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Suzhou Jingfang Photoelectric Technology Co ltd
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Suzhou Jingfang Photoelectric Technology Co ltd
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Abstract

The utility model relates to a wafer level optical lens, including transparent substrate, cover transparent substrate surface's carbon nanotube extinction material layer, cover the optical lens on carbon nanotube extinction material layer surface, optical lens correspond and have the optics active area and surround the optics active area's non-optics active area, the diaphragm hole has been seted up on the carbon nanotube extinction material layer, the diaphragm hole be located the optics active area in.

Description

Wafer-level optical lens
Technical Field
The utility model belongs to the optical lens field, in particular to wafer level optical lens.
Background
Wafer Level Optics (WLO) refers to wafer level lens manufacturing technology. Different from the traditional optical element processing technology, the WLO process is used for copying and processing the lenses in batches by using a semiconductor process on a whole glass wafer, a plurality of lens wafers are pressed together and then cut into single lenses, and the WLO process has the characteristics of small size, low height, good consistency and the like, and has wide application prospect in electronic equipment and components. The position precision among the optical lenses of the wafer-level optical component reaches the nm level, and the method is the best choice for future standardized optical lens combination.
In the prior art, a chromium coating (Gr) on a glass substrate is commonly used as a diaphragm of an optical system to limit a light beam adjusting field of view. However, since the reflectance of the Gr layer is about 60% and the absorptance is about 40%, the diaphragm reflects too much light, which tends to generate stray light (Ghost & Flare), and thus adversely affects the final image formation of the optical system.
Disclosure of Invention
In order to solve the above technical problem, an object of the present invention is to provide a wafer level optical lens for effectively eliminating stray light.
In order to realize the purpose of the utility model, the utility model adopts the following technical scheme:
a wafer-level optical lens comprises a transparent substrate, a carbon nano tube light absorption material layer covering the surface of the transparent substrate, and an optical lens covering the surface of the carbon nano tube light absorption material layer, wherein the optical lens corresponds to an optical effective area and a non-optical effective area surrounding the optical effective area, a diaphragm hole is formed in the carbon nano tube light absorption material layer, and the diaphragm hole is located in the optical effective area.
In the above technical solution, preferably, the light absorption coefficient of the carbon nanotube light absorption material layer is greater than 99%.
In the above technical solution, preferably, the light absorbing material layer of the carbon nanotube is a Venta Black material.
In the above technical solution, preferably, the thickness range of the carbon nanotube light absorption material layer is between 100 nm and 250 nm.
In the above technical solution, preferably, the thickness of the carbon nanotube light absorption material layer is 130nm to 180 nm.
In the above technical solution, preferably, the optical lens is a polymer lens, and the transparent substrate is glass.
Compared with the prior art, the utility model obtain following beneficial effect: the utility model discloses a carbon nanotube extinction material coating replaces traditional chromium-plated layer, and carbon nanotube extinction material coating can absorb the stray light more than 99%, can effectively reduce the stray light that gets into optical system, improves the imaging quality.
Drawings
FIG. 1 is a schematic structural view of the present invention;
FIG. 2 is a top view of the present invention;
wherein: 1. an optical lens; 2. a carbon nanotube light absorbing material layer; 3. a transparent substrate; 4. an optically active area; 5. a non-optically active area; 6. and a diaphragm hole.
Detailed Description
To explain the technical content, structural features, achieved objects and functions of the present invention in detail, the following detailed description is made with reference to the accompanying drawings.
Fig. 1 is a schematic structural diagram of a wafer-level optical lens provided in this embodiment, in which the lens module is an integrated wafer-level optical lens (WLO). The lens module comprises an optical lens 1, a carbon nano tube light absorption material layer 2 and a transparent substrate 3 which are sequentially arranged along the direction of an optical axis.
The optical lens 1 is a polymer lens, and can be any one of a convex lens, a concave lens and a flat lens. As shown in fig. 2, the optical lens 1 corresponds to an optical effective area 4 and a non-optical effective area 5 surrounding the optical effective area, the carbon nanotube light-absorbing material layer 2 is provided with a diaphragm hole 6, and the diaphragm hole 6 is located in the optical effective area 4.
The transparent substrate 3 is glass. The utility model discloses a manufacturing process of wafer level optical lens as follows: the transparent substrate 3 is used as a substrate, and a carbon nanotube light absorption material with the thickness of 100-250nm is covered on the surface of the transparent substrate 3 to form a diaphragm. And then, integrally forming the polymer adhesive on the surface of the carbon nano tube light absorption material by adopting a semiconductor process to form optical structures such as convex lenses or concave lenses. After solidification, the wafer-level optical lens with the diameter below 1mm is formed by cutting, 5-6 thousand lens modules can be cut on each 8-inch wafer, and the optical lens has the advantages of small size and low manufacturing cost.
In a preferred embodiment, the thickness of the carbon nanotube light absorbing material layer is 150nm, and the carbon nanotube light absorbing material layer is a Venta Black material. Venta Black, invented by Surrey NanoSystems, uk technology, is a dark Black material that absorbs 99.96% of the light. Starting from "catalyst particles" (particle size 1-2 nm or less), a Venta Black coating is built up, which, after saturation with gas, is grown into carbon nanotubes, with about billions of nanotubes per square centimeter of coating, uniformly spaced nanotube structures, not too far apart or too dense, which allow photons to enter the spaces between the nanotubes and be absorbed by the nanotubes, so that light cannot escape in, and 99.96% of the light can be absorbed.
The utility model discloses a this kind of up-to-date super extinction coating of Venta Black, the absorptivity is more than 99.9%, can the effective absorption unnecessary reflection light, avoids the parasitic light to appear on the sensor. On the WLO glass substrate, a Venta Black coating is adopted to manufacture a diaphragm to replace the current Gr coating, so that stray light can be effectively reduced, and the best imaging quality is obtained.
The foregoing shows and describes the general principles, essential features, and advantages of the invention. It will be understood by those skilled in the art that the present invention is not limited to the embodiments described above, which are given by way of illustration only, and that various changes and modifications may be made without departing from the spirit and scope of the invention as defined by the appended claims, specification and equivalents thereof.

Claims (7)

1. A wafer-level optical lens, comprising: the optical lens is provided with an optical effective area and a non-optical effective area surrounding the optical effective area, the carbon nano tube light absorption material layer is provided with a diaphragm hole, and the diaphragm hole is positioned in the optical effective area.
2. A wafer level optical lens as claimed in claim 1, wherein: the light absorption coefficient of the carbon nano tube light absorption material layer is more than 99%.
3. A wafer level optical lens as claimed in claim 1, wherein: the carbon nano tube light absorption material layer is made of Venta Black material.
4. A wafer level optical lens as claimed in claim 1, wherein: the thickness range of the carbon nano tube light absorption material layer is between 100 nm and 250 nm.
5. The wafer-level optical lens of claim 4, wherein: the thickness of the carbon nano tube light absorption material layer is 130nm-180 nm.
6. A wafer level optical lens as claimed in claim 1, wherein: the optical lens is a high polymer material lens, and the transparent substrate is glass.
7. A wafer level optical lens as claimed in claim 1, wherein: the optical lens is a convex lens or a concave lens or a flat mirror.
CN202021780606.9U 2020-08-24 2020-08-24 Wafer-level optical lens Active CN212586574U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202021780606.9U CN212586574U (en) 2020-08-24 2020-08-24 Wafer-level optical lens

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202021780606.9U CN212586574U (en) 2020-08-24 2020-08-24 Wafer-level optical lens

Publications (1)

Publication Number Publication Date
CN212586574U true CN212586574U (en) 2021-02-23

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN202021780606.9U Active CN212586574U (en) 2020-08-24 2020-08-24 Wafer-level optical lens

Country Status (1)

Country Link
CN (1) CN212586574U (en)

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