CN212581996U

CN212581996U - Nano multilayer composite anti-scratching film on surface of gold product

Info

Publication number: CN212581996U
Application number: CN202021761568.2U
Authority: CN
Inventors: 周鸿奎
Original assignee: Shenzhen Silicon Valley Sputtering Target Co ltd
Current assignee: Shenzhen Silicon Valley Sputtering Target Co ltd
Priority date: 2020-08-20
Filing date: 2020-08-20
Publication date: 2021-02-23
Anticipated expiration: 2030-08-20

Abstract

The utility model discloses a gold article surface nanometer multilayer composite is prevented drawing flower membrane, characterized by: the surface of the gold-plated layer of the gold product or the gold-plated product is sequentially covered with a gold transition layer, a nano multilayer structure consisting of at least one group of nano multilayer composite protective film units, a Si transition layer and an AF anti-fingerprint film on the outermost surface layer from inside to outside, wherein each group of nano multilayer composite protective film units consists of a nano transparent medium layer and a nano gold layer covered on the nano transparent medium layer. The utility model discloses a compound anti-flower membrane of drawing of gold article surface nanometer multilayer has solved gold, gold ornaments or the incorruptible flower problem of drawing of gold-plated layer on stainless steel, brass etc. well.

Description

Nano multilayer composite anti-scratching film on surface of gold product

Technical Field

The utility model relates to a surface ion plating protective film of a gold product (or a gold plating layer of a gold-plated product), in particular to a nano multilayer composite scratch-resistant film on the surface of the gold product.

Background

Various gold and rose gold hand ornaments are always popular with people, but gold or gold-plated ornaments are softer, and collision and friction are caused in the wearing process, so that the surface of the ornaments is easy to have collision marks and scratches, and the dazzling and beautiful appearance of the ornaments is influenced. People strive to improve the scratch resistance of gold for a long time, and the two ways are as follows: one is alloying, adding various alloy elements including noble metal, light rare earth and the like into Au, but the effect is not ideal, and if the hardness is not greatly improved, the original color tone is not changed; the other is that the surface is plated with a transparent protective film which is mostly a dielectric film, including SiO2, Al2O3 and the like, and a single-layer transparent dielectric layer is tried, but if the film is too thin, the film is not wear-resistant, and the film is too thick, so that interference color is generated. Some people adopt radio frequency sputtering to plate SiO2, and find that the deposition speed is too slow to keep up with the normal production rhythm of ion plating. These difficulties have long been unresolved. The pure gold hand ornament has a matrix which is too soft, lacks strong support for the top transparent medium layer and is easier to scratch. After a gold (TiN) -like rose gold (TiCN) layer is ion-plated on the surface of a stainless steel substrate, products such as watch pieces, spectacle frames, mobile phone shells and the like of real gold or real rose gold are plated on the surface of the stainless steel substrate, although the stainless steel substrate is slightly hard, the problem of poor scratch resistance of a single-layer soft and thin gold layer on the supporting surface is also solved. Therefore, the problem of the scratch resistance of gold plating layers such as gold products, stainless steel and brass is extremely to be solved.

SUMMERY OF THE UTILITY MODEL

The utility model aims to solve the technical problem that a gold article surface or on the gold-plated layer (water method is electroplated or ion plating) on stainless steel, brass surface, provide a gold article surface nanometer multilayer composite anti-scratch flower membrane, the utility model discloses a gold article surface nanometer multilayer composite anti-scratch flower membrane has solved gold ornaments or stainless steel, brass etc. well and has gone up the problem of the non-resistant flower of scratching of gold-plated layer.

Solve above-mentioned technical problem, the utility model discloses the technical scheme who adopts as follows:

a gold product surface nanometer multilayer composite anti-scratching film is characterized in that: the surface of the gold-plated layer of the gold product or the gold-plated product is sequentially covered with a gold transition layer, a nano multilayer structure consisting of at least one group of nano multilayer composite protective film units, a Si transition layer and an AF anti-fingerprint film on the outermost surface layer from inside to outside, wherein each group of nano multilayer composite protective film units consists of a nano transparent medium layer and a nano gold layer covered on the nano transparent medium layer.

On the basis, the utility model discloses can also have various preferred types:

the thickness of the nano transparent medium layer of the nano multilayer composite protective film is 20-300 nm, and the thickness of the nano gold layer is 50-500 nm.

The nano transparent dielectric layer is an oxide film or a nitride film, the oxide comprises aluminum oxide, titanium oxide, niobium oxide, silicon oxide, zinc oxide, yttrium oxide and the like, and the nitride preferably comprises silicon nitride, titanium nitride, zirconium nitride and the like.

The nano gold layer has the same material as the gold component of the substrate, and comprises pure gold, various K gold, various rose gold and various gold alloys, and also comprises platinum and platinum alloy.

The thickness of the Si transition layer is 5-20 nm, and the thickness of the AF fingerprint resistant layer is 20-30 nm.

The utility model can also be applied to the gold plating layer of the stainless steel and the brass surface which is electroplated by a water method or ion plating. At the moment, the nano gold layer material has the same component as the existing gold plating layer on the gold-plated product.

The utility model can also be applied to the imitation gold (TiN) or imitation rose gold (TiCN or TiAlN) plating layer which is plated on the surface of stainless steel and brass by ions. At the moment, the nano multilayer composite anti-scratch pattern film directly replaces the traditional gold-plated layer and the rose layer. The nanogold film or rose gold film component in this case is designated separately.

The utility model discloses can also be applied to on silver ornaments: the silver-plated transition layer is firstly connected with the substrate, the nano transparent medium layer is selected as described above, and the color layer can be made of silver or silver alloy with the same components as the substrate, for example, gold or gold alloy is selected, so that the gold ornament of the silver substrate is formed.

The following is nano Al₂O₃The preparation method of the multilayer composite anti-scratching film with the nano-gold as the unit is illustrated by an example. The nano Al₂O₃The nano transparent dielectric layer mentioned above is represented by an oxide film or a nitride film, the oxide includes aluminum oxide, titanium oxide, niobium oxide, silicon oxide, zinc oxide, yttrium oxide, and the like, and the nitride includes titanium nitride, zirconium nitride, and the like, in addition to the preferable silicon nitride. The nano gold represents the mentioned gold, including pure gold, various K gold, various rose gold and various gold alloys, and also includes platinum and platinum alloy, and also includes silver and silver alloy, etc.

A preparation method of a nano multilayer composite anti-scratching film on the surface of a gold product is characterized by comprising the following steps:

1) furnace vacuumizing: loading cleaned gold or gold-plated product on a rotary and rotary hanger in furnace, and vacuumizing to 3-6 x10^-3Pa；

If the last procedure is to finish the stainless steel, brass ion plating or gold (TiN) imitation plating in the furnace, the titanium target is stopped, the nitrogen supply is stopped, Ar gas is filled to 1-5 Pa for 3-10 minutes, the Ar supply is stopped, and the background vacuum is pumped to 3-6 x10^-3Pa；

2) Glow ion cleaning: filling Ar gas to 1-3 Pa, turning on a pulse bias power supply, turning on a 400-700V power supply, keeping the duty ratio at 50-70%, and performing glow cleaning for 3-10 minutes;

3) make the transition layer

For gold articles, Ar gas is filled 1-5 x10^-1Pa, bias voltage is-50 to-100 v, a cathode arc source of gold is opened at the same time and 40 to 70A and a direct current magnetron sputtering gold target is opened at the same time, mixed plating is carried out for 0.5 to 1.5 minutes, the cathode arc source of gold is closed, the gold target continues to sputter for 50 to 500nm, and plating is stopped;

for stainless steel and brass ion plating imitation gold (TiN) plating ornaments, Ar gas is filled in the ornament at 1-5 x10^-1Pa, bias voltage of-50 to-100 v, simultaneously opening titanium cathode arc (40-70A) and DC magnetron sputtering gold target (2-5A), mixed plating of titanium and gold for 0.5-1.5 min, closing titanium arc source, and gold targetContinuously sputtering to 50-500 nm, and stopping plating;

4) first unit plated with nano-multilayer

Plating a first layer: starting a special ceramic target power supply (note that the special ceramic target power supply is a outsourced product) to operate Al₂O₃Magnetron sputtering twin ceramic target (Al)₂O₃Target, 5-12A), controlling the film thickness to 20-300 nm, and stopping plating;

plating a second layer: starting a gold target for sputtering (2-5A), controlling the film thickness to 50-500 nm, and stopping plating.

5) Plating nano-multilayer second unit

Plating a first layer: starting a special ceramic target power supply and operating a magnetron sputtering twin ceramic target (Al)₂O₃Target, 5-12A), controlling the film thickness to 20-300 nm, and stopping plating;

plating a second layer: opening a gold sputtering target (2-5A), controlling the film thickness to 50-500 nm, and stopping plating;

6) plating nano-multilayer third unit to N unit

The process operation of the second unit is respectively repeated in each unit;

7) final unit of nano-plated multilayer

Plating a first layer: starting a special ceramic target power supply and operating a magnetron sputtering twin ceramic target (Al)₂O₃Target, 5-12A) controlling the film thickness to 20-300 nm and stopping plating;

plating a second layer: opening a gold sputtering target (2-5A), controlling the film thickness to reach 50-500 nm, adding 10-20% of the thickness of the last gold layer, and stopping plating;

8) sputtering a Si transition layer: open Si target, target pressure: 450-550V, target flow: 5-15A, and controlling the film thickness to be about 5-20 nm;

9) and (3) evaporation coating AF: placing the AF pill in a resistance heating crucible, electrifying, heating and evaporating, and depositing the AF pill on a Si transition layer to form an AF film with the thickness of about 20-30 nm;

10) cooling to below 100 ℃, and discharging.

The improved process comprises the following steps: in order to reduce the stress mutation caused by the change of the material between the upper interface and the lower interface in the nano multilayer structure of the nano transparent medium layer/nano gold layer/nano transparent medium layer/nano gold layer … …, the upper film layer material and the lower film layer material are mixed plated in the interface area to form a mixed plating interface so as to reduce the stress mutation of the interface and improve the bonding force of the interface.

The improved process is characterized in that:

in the step 3) of forming the transition layer:

for the gold ornaments, a gold cathode arc source and a direct-current magnetron sputtering gold target are mixed and plated for 0.5-1.5 minutes, the gold arc source is closed, the gold target continues to sputter for the first 1 minute of 50-500 nm, and the target co-plating of the first layer film of the next unit is started in advance;

for stainless steel and brass ion plating imitation gold (TiN) plating ornaments, the cathode electric arc of titanium and a direct current magnetron sputtering gold target are mixed plated for 0.5-1.5 minutes, a titanium electric arc source is closed, the gold target is continuously sputtered for the first 1 minute of 50-500 nm, and the target co-plating of the first layer film of the next unit is started in advance;

the step 4) is that in the first unit for plating the nanometer multilayer:

plating a first layer: in the last step, a transition layer is formed, the power supply of the special ceramic target is started in advance after the gold target runs for the last 1 minute, and the magnetron sputtering twin ceramic target (Al) is run₂O₃Target, 5-12A), the ceramic target and the gold target are mixed and sputtered, after the gold target stops plating, the ceramic target continues to run, the film thickness is controlled to be 0.5 minute before 20-300 nm, and the gold target plated with the second layer is mixed and sputtered with the gold target.

Plating a second layer: and (2) starting the gold target sputtering (2-5A), performing mixed sputtering for 0.5 minute on the gold target and the ceramic target which are previously plated with the second layer, continuing to operate the gold target after the ceramic target stops plating, controlling the film thickness to reach 50-500 nm, and finally performing mixed plating for 0.5 minute, and starting the first plating layer sputtering target of the next unit in advance.

The step 5) of plating the nano-multilayer second unit

Plating a first layer: in the previous step of plating a second gold layer on the nano multilayer first unit layer, the magnetron sputtering twin ceramic target (Al) is started in advance when the gold target runs for the last 0.5 minute₂O₃Target, 5-12A), the ceramic target and the gold target are mixed and sputtered. And after the gold target stops plating, the ceramic target plating film continues to run, the film thickness is controlled to reach the last 0.5 minute of 20-300 nm, and the gold target plated with the second layer is mixed with the gold target.

Plating a second layer: and (3) starting the rose gold target (2-5A) and the ceramic target in advance to mix and sputter for 0.5 minute, continuing to operate the rose gold target after the ceramic target stops plating, controlling the film thickness to reach 50-500 nm for the last 0.5 minute, and starting the first plating layer sputtering target of the next unit in advance to mix and plate.

Step 6) plating a nanometer multilayer third unit to the N units, and repeating the second unit process operation for each unit;

said step 7) plating a nano-multilayer final unit

Plating a first layer: in the previous step of plating the second gold layer on the Nth unit of the nano multilayer, the ceramic target (Al) is started in advance when the gold target runs for the last 0.5 minute₂O₃Target, 5-12A) is sputtered with the gold target. And after the gold target stops plating, the ceramic target plating film continues to run, the last 0.5 minute of the total thickness of the ceramic film layer being 20-300 nm is controlled, and the gold target of the second layer is plated in advance and mixed with the gold target.

Plating the second layer of the last unit: the gold target (2-5A) and the ceramic target are mixed and sputtered for 0.5 minute in advance, the gold target continues to operate after the ceramic target stops plating, the thickness of the film layer is controlled to be 50-500 nm, and the thickness of the last gold layer is increased by 10-20% generally to stop plating.

The preparation method can be completed in the same special coating equipment.

The configuration and the function of the special coating equipment comprise:

(1) plating a titanium-gold transition layer on the substrate, and configuring a cathode arc source (titanium target);

(2) used for sputtering the nano gold or rose gold layer and is provided with a columnar direct current magnetron sputtering source (a gold target and a rose gold target);

(3) for sputtering nano transparent dielectric layer, two techniques can be adopted:

1) the new technology is adopted: a columnar ceramic twin magnetron sputtering source is arranged and a special ceramic target power supply is arranged, thus realizing the insulating ceramic target (such as Al)₂O₃And the like), the ceramic membrane is magnetically controlled and sputtered with higher efficiency, the deposition rate is higher, the deposition rate is matched with the rate of the sputtered gold, and the production rhythm is adapted;

2) the traditional technology is adopted: a columnar intermediate-frequency twin magnetron sputtering source is configured to synthesize an oxide or nitride nanometer transparent medium layer by reactive sputtering, a target material such as aluminum, titanium, niobium, silicon, zirconium and the like is selected and matched according to a compound synthesized by requirements, and a gas supply pipe and a gas distribution pipe for reacting gases such as oxygen and nitrogen are also configured.

(3) A columnar direct-current magnetron sputtering source (silicon target) is configured and used for plating a Si transition layer on the nano multilayer composite protective film to serve as a transition layer of AF;

(4) a thermal resistance evaporation device provided with AF pills and used for thermally evaporating and plating AF plating materials;

(5) configuring a pulse bias power supply for applying negative bias during cathodic arc and magnetron sputtering deposition so as to improve the energy of deposited particles;

(6) if the ion plating of imitation gold TiN or imitation rose gold coating on stainless steel or brass ornaments is required, a columnar twin medium-frequency magnetron sputtering source (Ti target) is arranged and is matched with N₂And a source of acetylene gas.

The utility model is to plate a group of nanometer multilayer composite protective film on the surface of gold and gold ornaments or on the surface of stainless steel and brass plated with a gold-like layer (TiN) or a gold-like layer (TiCN), the constituent units of the protective film are a nanometer transparent dielectric layer and a nanometer gold layer, and the unit is repeated to form a multilayer structure. The effect of the utility model can not only keep the original color of the gold layer, but also improve the anti-scratching performance.

The utility model discloses a more effective preparation nanometer transparent dielectric layer method of special ceramic target power makes two kinds of nanometer coating film production rhythms match, and this kind of preparation technology combination adapts to batch production, has improved production efficiency.

The utility model can also be applied to silver or silver jewelry.

Has the advantages that:

(1) the utility model discloses a nanometer multilayer structure protection film of the same base member material gold alloy membrane of nanometer transparent medium layer/nanometer protects soft gold and gilt ornaments, has both improved anti-scratching performance, does not change former tone again, solves the difficult problem that has not solved in the trade for a plurality of years.

(2) The utility model discloses nanometer multilayer composite protection film is applicable to gold, K gold, rose gold ornaments and does anti drawing flower protection film, also is applicable to on stainless steel, the brass base member ion plating imitation gold TiN layer, the imitation rose gold TiCN layer, directly as anti drawing flower gold plating membrane or rose gold membrane, replaces traditional ion plating gilt and rose gold layer.

(3) The utility model adopts the multilayer structure of the nanometer transparent medium layer/the nanometer gold layer, and plays a role of protecting the softer gold layer from scratching by utilizing the hardness and the wear resistance of the medium film; the original gold color tone is displayed by utilizing the transparency of the dielectric film; the hardness and the wear resistance of the film stack can be improved by utilizing the nano multilayer effect, and the service life is prolonged.

(4) The utility model realizes the selection and pairing of various nanometer transparent dielectric layers and various gold alloy films, the nanometer transparent dielectric layers can be made of oxides such as aluminum oxide, titanium oxide, niobium oxide, silicon oxide, zinc oxide, yttrium oxide and the like, and can also be made of nitrides such as silicon nitride, titanium nitride, zirconium nitride and the like; the gold layer comprises pure gold, various types of K gold, various types of rose gold, various types of gold alloys, platinum alloy and the like, and the gold layer has a plurality of selected materials and wide application.

(5) The nano multilayer structure of the utility model can also be used as a scratch-resistant protective film on silver ornaments. The nano transparent medium layer can be selected from the above oxides or nitrides, the color layer can be selected from silver or silver alloy with the same components as the matrix, and if the color layer is selected from gold or gold alloy, the color layer becomes a gold ornament of the silver matrix.

(6) The utility model discloses a special ceramic target power drive magnetron sputtering twin ceramic target sputtering technique, insulating ceramic target deposition rate is very fast, and it makes transparent dielectric layer and gold layer growth rate match with the technological combination of direct current magnetron sputtering gold, is favorable to industrial production.

(7) The utility model discloses the upper and lower floor of all multilayer structure is situated between the boundary region, all adopts upper and lower floor's material to mix and plates, reduces the stress sudden change, is favorable to improving cohesion.

Drawings

Fig. 1 is a schematic view of the structure of the nano-multilayer composite scratch-resistant flower film on the surface of the gold product of the present invention.

In the figure: the anti-fingerprint film comprises a 1-gold product, a 2-gold transition layer, a 3-nanometer multilayer composite protective film unit, a 3.2-nanometer transparent dielectric layer, a 3.1-nanometer gold layer, a 4-Si transition layer and a 5-AF anti-fingerprint film.

Detailed Description

The utility model discloses a gold article surface nanometer multilayer composite is anti to draw flower membrane embodiment is that the anti fingerprint membrane 5 of AF that covers in proper order from inside to outside on the surface of gold article 1 or the gold-plating layer of gilding article has gold transition layer 2, the nanometer multilayer structure 3, Si transition layer 4 and the outermost top layer that constitute by 2 groups of nanometer multilayer composite protection film units. Each group of nano multilayer composite protective film units consists of a nano transparent dielectric layer 3.2 and a nano gold layer 3.1 covering the nano transparent dielectric layer.

Preferably, the thickness of the nano transparent medium layer of the nano multilayer composite protective film is 20-300 nm, the thickness of the nano gold layer is 50-500 nm, the thickness of the Si transition layer is 5-20 nm, and the thickness of the AF fingerprint resistant layer is 20-30 nm.

The nano transparent dielectric layer is an oxide film or a nitride film, the oxide comprises aluminum oxide, titanium oxide, niobium oxide, silicon oxide, zinc oxide, yttrium oxide and the like, and the nitride preferably comprises silicon nitride, titanium nitride, zirconium nitride and the like. The nano gold layer has the same material as the gold component of the substrate, and comprises pure gold, various K gold, various rose gold and various gold alloys, and also comprises platinum and platinum alloy.

The embodiment of the preparation method of the nano multilayer composite anti-scratching film on the surface of the gold product of the utility model is as follows.

Example one with nano rose gold/nano Al₂O₃For example, a multi-layer film is prepared by using a rose gold target and Al having the same components as the matrix₂O₃A ceramic target.

1) Furnace vacuumizing: loading cleaned rose gold ornament on a revolution and rotation hanger in a furnace, and vacuumizing to 3-6 x10^-3Pa; if the previous process is to finish the ion plating of the imitation rose gold (TiCN) coating on the stainless steel and brass ornaments in the furnace, the titanium target is stopped, the nitrogen and the acetylene are stopped, Ar gas is filled to 5Pa for 7 minutes, the Ar supply is stopped, and the background vacuum pumping reaches 4x10^-3Pa。

2) Glow ion cleaning: filling Ar gas 2Pa, opening pulse bias voltage, -600V, duty ratio 50%, glow cleaning for 5 minutes.

3) Make the transition layer

For rose gold ornaments, Ar gas is filled in the bottle for 3x10^-1Pa, bias voltage is minus 80v, a rose gold cathode arc source (50A) and a direct current magnetron sputtering rose gold target (3A) are opened simultaneously, mixed plating is carried out for 1 minute, the rose gold arc source is closed, the rose gold target continues sputtering, the film thickness is controlled to reach 1 minute before 200nm, and target co-plating of the first film of the next unit is started in advance.

For stainless steel and brass ion-plated rose gold-imitated TiCN plating ornaments, Ar gas filled 3x10^-1Pa, bias voltage is minus 80v, a titanium cathode electric arc (50A) and a direct current magnetron sputtering rose gold target (3A) are opened simultaneously, titanium and rose gold are mixed and plated for 1 minute, a titanium electric arc source is closed, the rose gold target continues sputtering, the film thickness is controlled to reach 1 minute before 200nm, and the target co-plating of the first film of the next unit is opened in advance.

4) Plating a nano-multilayer first unit plating a first layer: the transition link is performed in the last step, the special ceramic target power supply is started in advance after the last 1 minute of the rose gold target operation, and the magnetron sputtering twin ceramic target (Al) is operated₂O₃Target, 7A), ceramic target mixed with rose gold target. Stopping the rose gold target after the time, continuously sputtering the ceramic target, and controlling the film thickness to be 60nm and then starting the rose gold target for co-plating 0.5 min;

plating a second layer: rose gold sputtering (3A) was started in advance at the last 0.5 minutes of the first ceramic layer plating, and the two targets were mixed for 0.5 minutes until the time ceramic target was shut down. The rose gold target continues sputtering, and the target of the first layer film of the unit is started in advance to co-plate with the rose gold target 0.5 min before the film thickness reaches 100 nm.

5) Plating nano-multilayer second unit

Plating a first layer: in the last step, the magnetron sputtering twin ceramic target (Al) is started in advance after the last 0.5 minute of the rose gold target operation₂O₃Target, 7A), ceramic target mixed with rose gold target. Stopping the rose gold target after the time, continuously sputtering the ceramic target, controlling the total film thickness to reach 0.5 minute before 60nm, and opening the second layer of rose gold target in advance to be co-plated with the rose gold target;

a second layer: rose gold sputtering (3A) was started in advance at the last 0.5 minute of the first ceramic layer plating, and the ceramic targets were mixed and plated for 0.5 minute until the time was stopped. The rose gold target continues sputtering, and the target of the first layer film of the unit is started to co-plate with the rose gold target 0.5 min before the film thickness reaches 100 nm.

6) Plating nano-multilayer third to fifth units

The process operation of the second unit is respectively repeated in each unit;

7) plating nano multilayer, and finally plating a first layer in a sixth unit: in the last step, the ceramic target (Al) is started in advance after the last 0.5 minute of the rose gold target operation₂O₃Target, 7A), ceramic target mixed with rose gold target. Stopping the rose gold target after the time, continuously sputtering the ceramic target, controlling the film thickness to be 0.5 min before 60nm, and opening the rose gold target of the second coating in advance to be co-plated with the rose gold target; plating a second layer: when the first ceramic layer is plated for the last 0.5 minutes, the rose gold sputtering (3A) is started in advance, the two targets are mixed and plated for 0.5 minutes, and the ceramic targets are stopped at the end of time. The rose gold target continues sputtering, the total film thickness is controlled to reach 120nm, (generally, the last layer of gold layer is increased by 10-20% compared with the normal thickness), and the plating is stopped.

8) Sputtering a Si transition layer: open Si target, target pressure: 500V, target flow: 10A, and controlling the film thickness to be about 5-20 nm.

9) The AF evaporation is to electrify, heat and evaporate the AF pill placed in a resistance heating crucible to a Si transition layer to form an AF film with the thickness of about 20-30 nm.

10) Cooling to below 100 ℃, and discharging.

Claims

1. A gold product surface nanometer multilayer composite anti-scratching film is characterized in that: the surface of the gold-plated layer of the gold product or the gold-plated product is sequentially covered with a gold transition layer, a nano multilayer structure consisting of at least one group of nano multilayer composite protective film units, a Si transition layer and an AF anti-fingerprint film on the outermost surface layer from inside to outside, wherein each group of nano multilayer composite protective film units consists of a nano transparent medium layer and a nano gold layer covered on the nano transparent medium layer.

2. The gold product surface nano multilayer composite anti-scratching film as claimed in claim 1, which is characterized in that:

3. The gold product surface nano multilayer composite anti-scratching film as claimed in claim 1, which is characterized in that: the thickness of the Si transition layer is 5-20 nm, and the thickness of the AF fingerprint resistant layer is 20-30 nm.