CN212570938U - Wafer soaking device for wet processing - Google Patents

Wafer soaking device for wet processing Download PDF

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Publication number
CN212570938U
CN212570938U CN202021728967.9U CN202021728967U CN212570938U CN 212570938 U CN212570938 U CN 212570938U CN 202021728967 U CN202021728967 U CN 202021728967U CN 212570938 U CN212570938 U CN 212570938U
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face
box
rear end
plate
baffle
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吴永胜
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Abstract

The utility model discloses a wafer soak device for wet processing, including baffle, electric putter and box, the utility model discloses a set up check fender sealing mechanism in the box rear end, exert pressure to the baffle through stripper plate and micro spring, make the baffle exert pressure to the gasket and make the more stable laminating of gasket on the rear end face of box, the baffle upwards moves after finishing using, when still having the immersion fluid to flow down, through limiting plate and extension plate with the thru hole inboard that immersion fluid water conservancy diversion was seted up to bottom plate top face, and collect in getting into the collection box through the thru hole, reached and improved holistic leakproofness and prevented that the immersion fluid from revealing, and collect the immersion fluid that flows and prevent the extravagant beneficial effect with the polluted environment of immersion fluid.

Description

Wafer soaking device for wet processing
Technical Field
The utility model relates to a soak device correlation field specifically is a wafer soak device for wet processing.
Background
At present, a wafer is often required to be soaked by chemical liquid for a wafer wet processing process in the semiconductor industry; the existing wafer soaking method generally adopts the mode that the whole box of wafers is placed into a chemical liquid tank for soaking at the same time, and the whole box is taken out after the preset time is reached to carry out the next process treatment.
When the wafer is soaked in the soaking device, because certain vibration is easily generated in the soaking process, or when the wafer is rotated and soaked, the soaking liquid is easily splashed on the switch baffle plate, and when the baffle plate is opened again, the soaking liquid is easily outwards flowed to form waste and pollute the environment.
SUMMERY OF THE UTILITY MODEL
Therefore, in order to solve the above-mentioned deficiencies, the present invention provides a wafer soaking device for wet processing.
The utility model is realized in such a way, a wafer soaking device for wet processing is constructed, the device comprises a baffle plate, an electric push rod, a box body and a check sealing mechanism, the baffle plate is arranged on an output shaft at the bottom of a second cylinder, the electric push rod is locked at the front end of the top end face of a base, the check sealing mechanism is arranged at the rear end of the box body, the check sealing mechanism comprises a bottom plate, an extension plate, a limiting plate, a collecting mechanism, a sealing sheet, a fixing plate, a sponge sheet, an L-shaped plate, an extrusion plate, a rubber sheet and a micro spring, the bottom plate is fastened at the middle lower part of the rear end face of the box body, the left end and the right end of the bottom plate are provided with the extension plates, the top parts of the extension plate and the rear end of the bottom plate are provided with the limiting plate, the collecting mechanism is arranged at the bottom of the bottom, and the fixed plate rear end face is pasted with the sponge piece, L template symmetry is installed two in box rear end face middle parts, and about two L templates the opposite face be used for laminating terminal surface about the baffle respectively, the stripper plate passes through miniature spring coupling in L template inboard rear end face, and the terminal surface fastening has the sheet rubber before the stripper plate, the sheet rubber is used for hugging closely in the baffle rear end face.
Preferably, the top output shaft of the electric push rod is fastened on the top end surface of the sliding frame, the sliding frame is slidably arranged on a support frame locked at the front end of the top end surface of the base, and the middle part of the top end surface of the sliding frame and the rear end of the bottom end surface are respectively provided with a first cylinder and a connecting rod, the output shaft at the bottom of the first cylinder passes through the top end surface of the sliding frame and then is fixedly connected with the top end surface of the rotating rod, the connecting rod is hinged to the middle part of the top end face of the wafer box after penetrating through the top end face of the box body, the rotating rod is hinged to the front end of the top end face of the wafer box after penetrating through the top end face of the box body, the left side of the top end face of the box body and the middle part of the back end face of the box body are respectively provided with a liquid inlet and a, and the bottom end of the inner side of the box body is provided with a soaking groove, the second cylinder is fixedly arranged at the top of the rear end of the box body through an L-shaped rigid piece, the front end of the inner side of the soaking groove is embedded with a heating plate, and the rear end of the top of the soaking tank is provided with an air inlet pipe, and the air inlet pipe is arranged at the middle lower part of the rear end surface at the inner side of the tank body.
Preferably, the collecting mechanism comprises a collecting box, a convex block, a groove, a clamping block, a clamping groove, a transparent plate and a through hole, the collecting box is attached to the bottom end face of the bottom plate, the convex block is fastened in the middle of the front end face of the collecting box, the convex block slides left and right along the inner side of the groove formed in the middle-lower portion of the rear end face of the box body, the clamping block is arranged in the middle of the upper end face and the lower end face of the convex block, the convex block movably extends into the inner side of the clamping groove, the clamping groove is formed in the upper end portion and the lower end portion of the inner side of the groove, the transparent plate is embedded into.
Preferably, the extension plates extend upwards in an inclined manner, and the left and right opposite surfaces of the two extension plates form an included angle of 120 degrees with the top end surface of the bottom plate.
Preferably, the top of the front end face of the rubber sheet is in an inclined plane shape gradually reduced from bottom to top, and the front end face of the rubber sheet is smooth and burr-free.
Preferably, the three miniature springs are arranged on the rear end face of the extrusion plate at equal intervals, and the three miniature springs are respectively positioned at the upper end, the lower end and the middle part of the rear end face of the extrusion plate.
Preferably, the sealing piece is square in shape, and the side surface of the sealing piece is flush with the side surface of the baffle.
Preferably, the top end surface of the bottom plate is in an arc shape gradually reduced from outside to inside, and the top end surface of the bottom plate is provided with a smooth thin film layer.
Preferably, the sealing piece is made of silica gel.
Preferably, the micro spring is made of stainless steel.
The utility model has the advantages of as follows: the utility model discloses an improve and provide a wafer soak device for wet processing here, compare with equipment of the same type, have following improvement:
the method has the advantages that: a wafer soak device for wet processing, the utility model discloses a check fender sealing mechanism has been set up in the box rear end, exert pressure to the baffle through stripper plate and miniature spring, make the baffle exert pressure to the gasket and make the more stable laminating of gasket on the rear end face of box, the baffle upwards moves after finishing using simultaneously, when still having the soak flow down, simultaneously when limiting plate and extension board with the thru hole inboard that the soak water conservancy diversion was seted up to bottom plate top end face, and collect in getting into the collection box through the thru hole, reached and improved holistic leakproofness and prevented that the soak from revealing, and collect the soak that flows and prevent the extravagant beneficial effect with the polluted environment of soak.
The method has the advantages that: a wafer soak device for wet processing, the utility model discloses an extension board is the slope and upwards extends the form, and two extension board left and right opposites personally submit 120 contained angles with the bottom plate top, and two extension boards of being convenient for will carry out collecting the soak solution of bigger angle.
Drawings
FIG. 1 is a schematic structural view of the present invention;
FIG. 2 is a schematic view of the right side cross-section of the box body of the present invention;
FIG. 3 is a schematic structural view of the sealing mechanism of the block of the present invention;
FIG. 4 is a schematic view of the micro spring connection structure of the present invention;
fig. 5 is an enlarged schematic view of the structure at a in fig. 3 according to the present invention;
fig. 6 is a matching view of the electric putter and the sliding frame according to the present invention.
Wherein: a baffle-1, an electric push rod-2, a sliding frame-3, a supporting frame-4, a first cylinder-5, a connecting rod-6, a rotating rod-7, a liquid inlet-8, a window-10, a second cylinder-11, a base-12, a sheet box-13, a soaking tank-14, a heating plate-15, an air inlet pipe-16, a box body-17, an L-shaped rigid part-18, a block sealing mechanism-9, a bottom plate-91, an extension plate-92, a limit plate-93, a collection mechanism-94, a sealing sheet-95, a fixing plate-96, a sponge sheet-97, an L-shaped plate-98, a squeezing plate-99, a rubber sheet-910, a micro spring-911, a collection box-941, a bump-942, a groove-943, a clamping block-944, A slot-945, a transparent plate-946 and a through hole-947.
Detailed Description
The present invention will be described in detail with reference to the accompanying fig. 1-6, and the technical solutions in the embodiments of the present invention will be clearly and completely described, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
The present invention provides a wafer soaking device for wet processing through improvement, please refer to fig. 1 to 5 in combination, which includes a baffle 1, an electric push rod 2, a box 17 and a block sealing mechanism 9. Baffle 1 installs on the output shaft of second cylinder 11 bottom, and electric putter 2 lock is in base 12 top end front end, and check keep off sealing mechanism 9 sets up in box 17 rear end.
As shown in fig. 1, the second cylinder 11 is locked and installed on the top side of the box 17 through an L-shaped rigid member 18, and is a side close to the rear end of the box 17, so that the second cylinder 11 is suspended above the rear surface of the box 17, and the baffle 1 located on the rear surface of the box 17 can be pulled up and down by the second cylinder 11.
As shown in fig. 3, the barrier sealing mechanism 9 includes a bottom plate 91, an extension plate 92, a limit plate 93, a collection mechanism 94, a sealing plate 95, a fixing plate 96, a sponge sheet 97, an L-shaped plate 98, a pressing plate 99, a rubber sheet 910, and a micro spring 911.
As shown in fig. 3, the bottom plate 91 is fastened to the middle-lower portion of the rear end surface of the case 17, and the extension plates 92 are provided at the left and right ends of the bottom plate 91. The extending plate 92 and the bottom plate 91 are provided with a limiting plate 93 at the top of their rear ends, in this embodiment, the extending plate 92 and the bottom plate 91 are integrated with the limiting plate 93, and at this time, the limiting plate 93 is located at the top of the extending plate 92 and the bottom plate 91 at the same time, which can be referred to in fig. 1 and fig. 3.
As shown in fig. 3, the collecting mechanism 94 is provided at the bottom of the bottom plate 91, and the seal sheet 95 is attached to the front end surface of the barrier 1 and the seal sheet 95 is attached to the rear end surface of the case 17, thereby improving the sealing performance of the barrier 1. The fixing plate 96 is embedded in the middle upper part of the rear end face of the box body 17, and the sponge sheet 97 is adhered to the rear end face of the fixing plate 96, that is, the fixing plate 96 is adhered to the rear end face of the box body 17 through the sponge sheet 97. Two L-shaped plates 98 are symmetrically arranged and are arranged in the middle of the rear end face of the box body 17, and the left and right opposite faces of the two L-shaped plates 98 are used for being respectively attached to the left and right end faces of the baffle plate 1. It should be noted that the baffle 1 is attached when it is lowered to a corresponding position, and in fig. 3, the baffle 1 is in a raised state, and the baffle 1 is not lowered between the two L-shaped plates 98, so that the left and right opposite surfaces of the two L-shaped plates 98 are not shown to be attached to the left and right end surfaces of the baffle 1.
Referring to fig. 1, 3 and 4, the extrusion plate 99 is connected to the rear end surface of the inner side of the L-shaped plate 98 through a micro spring 911 so as to apply an elastic force to the baffle plate 1, and a rubber sheet 910 is fastened to the front end surface of the extrusion plate 99, and the rubber sheet 910 is used to cling to the rear end surface of the baffle plate 1.
Further, referring to fig. 1, fig. 2 and fig. 3, the top piston rod of the electric push rod 2 is fastened to the top end surface of the sliding frame 3 (referring to fig. 6, the top end surface includes a top lower surface), the sliding frame 3 is slidably mounted on the supporting frame 4 locked to the front end of the top end surface of the base 12, and the first cylinder 5 and the connecting rod 6 are respectively mounted at the middle of the top end surface and the rear end of the bottom end surface of the sliding frame 3. And an output shaft at the bottom of the first air cylinder 5 penetrates through the top end face of the sliding frame 3 and then is fixedly connected to the top end face of the rotating rod 7. The connecting rod 6 is hinged to the middle of the top end face of the film box 13 after penetrating through the top end face of the box body 17. The rotating rod 7 is hinged to the front end of the top end face of the film box 13 after penetrating through the top end face of the box body 17.
As shown in FIG. 2, a liquid inlet 8 and a window 10 are respectively arranged in the middle of the left side and the rear end face of the top end face of the box body 17, and an immersion tank 14 is arranged at the bottom end of the inner side of the box body 17. The second cylinder 11 is installed at the top of the rear end of the box body 17, a heating plate 15 is embedded into the front end of the inner side of the soaking tank 14, an air inlet pipe 16 is arranged at the rear end of the top of the soaking tank 14, and the air inlet pipe 16 is installed at the middle lower part of the rear end face of the inner side of the box body 17.
Further, the collecting mechanism 94 includes a collecting box 941, a protrusion 942, a groove 943, a locking block 944, a locking groove 945, a transparent plate 946 and a through hole 947. The collecting box 941 is attached to the bottom end surface of the bottom plate 91, the projection 942 is fastened to the middle of the front end surface of the collecting box 941, and the projection 942 slides left and right along the inner side of the groove 943 opened at the middle and lower part of the rear end surface of the box 17.
The latching portions 944 are disposed in the middle of the upper and lower end surfaces of the protrusion 942, and fig. 5 only shows that the latching portions 944 are located in the middle of the lower end surface of the protrusion 942 due to the angle problem, and it should be noted that a part of the latching portions 944 are located in the middle of the upper end surface of the protrusion 942. In the present embodiment, the latch 944 and the protrusion 942 are integrated.
The clamping block 944 movably extends into the inner side of the clamping groove 945, and the clamping groove 945 is formed in the upper end and the lower end of the inner side of the groove 943. Also, because of the angle, only the latch 944 is shown to movably extend into the interior of the lower latch 945.
Transparent plate 946 imbeds in the middle and lower part of collection box 941 rear end face, thru hole 947 link up both ends middle part about bottom plate 91, and thru hole 947 falls into the inboard within range of collection box 941, is convenient for collect the soak that thru hole 947 flows out.
Furthermore, the extending plates 92 extend upwards in an inclined manner, and the left and right opposite surfaces of the two extending plates 92 form an included angle of 120 degrees with the top end surface of the bottom plate 91, so that the extending plates 92 can collect a larger area of soak solution conveniently.
Further, the top of the front end face of the rubber sheet 910 is in an inclined plane shape gradually reduced from bottom to top, and the front end face of the rubber sheet 910 is smooth and burr-free, so that the baffle 1 applies thrust to the rubber sheet 910 in the process of vertically moving downwards to enable the rubber sheet 910 to move backwards.
Further, the miniature springs 911 are arranged on the rear end face of the extrusion plate 99 at equal intervals, and the three miniature springs 911 are respectively located at the upper end, the lower end and the middle part of the rear end face of the extrusion plate 99, so that the extrusion plate 99 can be rapidly and stably reset.
Furthermore, the sealing sheet 95 is square in shape, and the side surface of the sealing sheet 95 is flush with the side surface of the baffle 1, so that the whole sealing performance of the baffle 1 is improved.
Further, the top surface of the bottom plate 91 is in an arc shape gradually tapering from outside to inside, and the top surface of the bottom plate 91 is provided with a smooth thin film layer, so that the soak solution can flow into the inner side of the through hole 947 conveniently.
Further, the gasket 95 material is the silica gel material, and the material is softer, and the leakproofness is better.
Furthermore, the miniature spring 911 is made of stainless steel, so that the miniature spring is not easy to rust and corrode and has long service life.
The utility model provides a wafer soaking device for wet processing through improvement, which has the following working principle;
firstly, the device is integrally placed at a designated position, the equipment is connected with an external controller, and then a certain amount of soaking liquid is injected into a soaking groove 14 in a box body 17 through a liquid inlet 8;
secondly, the wafer is placed on the inner side of the wafer box 13 after passing through the inner side of the window 10 by arranging a corresponding working mechanical arm, and the wafer is stopped to be continuously placed when a certain amount of wafers are in the wafer box 13;
thirdly, the baffle 1 can be driven to vertically move downwards by controlling the second cylinder 11, the sealing sheet 95 is driven to move downwards by the baffle 1 in the process of vertically moving downwards, meanwhile, the baffle 1 applies pressure to the rubber sheet 910, the rubber sheet 910 drives the extrusion plate 99 to move backwards by the pressure, the micro spring 911 is stressed and compressed, and the second cylinder 11 stops working after the baffle 1 completely covers the window;
fourthly, under the combined action of the connecting rod 6 and the rotating rod 7, the electric push rod 2 is controlled to drive the sliding frame 3 and the wafer box 13 to move downwards, then the first air cylinder 5 is controlled to drive the rotating rod 7 to move, when the rotating rod 7 moves upwards, the wafer box inclines, the opening of the wafer box is downward, wafers in the wafer box fall into the soaking groove, when the whole pai sliding frame moves downwards, the whole wafer box enters the soaking groove 14 to be soaked, crystals are effectively prevented from being adhered in the wafer box, the angle of the wafer box can be adjusted through adjustment of the rotating rod 7, and meanwhile, soaking liquid is heated through the heating plate 15;
fifthly, and this soak device is in the in-process of using, exert pressure to baffle 1 through stripper plate 99 and miniature spring 911, make baffle 1 exert pressure to gasket 95 and make the more stable laminating of gasket 95 on the rear end face of box 17, thereby improved the leakproofness of baffle 1 and window 10 and prevented that the soak from outwards revealing, baffle 1 is rebound after finishing using simultaneously, contact the baffle front end face through sponge piece 97 and absorb the soak, when still having the soak to flow down, simultaneously through limiting plate 93 and extension plate 92 with the soak water conservancy diversion to the thru hole 947 inboard that bottom plate 91 top end face was seted up, and enter into through thru hole 947 and collect in collecting box 941.
The utility model provides a wafer soaking device for wet processing through improving and providing, exert pressure to baffle 1 through stripper plate 99 and miniature spring 911, make baffle 1 exert pressure to gasket 95 and make gasket 95 more stable laminating on the rear end face of box 17, thereby improve the leakproofness of baffle 1 and window 10 and prevent the soak solution from outwards revealing, baffle 1 moves upwards after finishing using simultaneously, contact baffle front end face through sponge piece 97 and absorb the soak solution, when still having the soak solution to flow down, through limiting plate 93 and extension plate 92 with soak solution water conservancy diversion to the thru hole 947 inboard that bottom plate 91 top end face was seted up, and enter into collection box 941 through thru hole 947 and collect, reached and improved holistic leakproofness and prevent the soak solution from revealing, and collect the soak solution that flows out and prevent soak solution extravagant and the beneficial effect of polluted environment, the extending plates 92 are inclined and extend upwards, the left and right opposite surfaces of the two extending plates 92 form an included angle of 120 degrees with the top end of the bottom plate 91, and the two extending plates 92 can collect the soaking solution at a larger angle.
The previous description of the disclosed embodiments is provided to enable any person skilled in the art to make or use the present invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the spirit or scope of the invention. Thus, the present invention is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims (10)

1. A wafer soaking device for wet processing comprises a baffle (1), an electric push rod (2) and a box body (17), wherein the baffle (1) is installed on an output shaft at the bottom of a second cylinder (11), and the electric push rod (2) is fixedly locked at the front end of the top end face of a base (12);
the method is characterized in that: still keep off sealing mechanism (9) including the check, check keep off sealing mechanism (9) set up in box (17) rear end, check keep off sealing mechanism (9) including bottom plate (91), extension board (92), limiting plate (93), collection mechanism (94) and gasket (95), bottom plate (91) fasten in lower part in box (17) rear end face, just both ends are provided with about bottom plate (91) extension board (92), extension board (92) with bottom plate (91) rear end top is provided with limiting plate (93), collection mechanism (94) set up in bottom plate (91) bottom, gasket (95) paste in baffle (1) preceding terminal surface, just gasket (95) laminate in box (17) rear end face.
2. The wafer soaking apparatus for wet processing according to claim 1, wherein: the check block sealing mechanism (9) further comprises a fixing plate (96), a sponge sheet (97), an L-shaped plate (98), an extrusion plate (99), a rubber sheet (910) and a miniature spring (911); fixed plate (96) are embedded in upper portion in box (17) rear end face, just fixed plate (96) rear end face is pasted have sponge piece (97), two are installed to L template (98) symmetry, L template (98) install in box (17) rear end face middle part, and two the opposite face is used for laminating respectively about L template (98) in terminal surface about baffle (1), extrusion plate (99) pass through miniature spring (911) connect in the inboard rear end face of L template (98), just the terminal surface fastening has before extrusion plate (99) rubber piece (910), rubber piece (910) be used for hugging closely in baffle (1) rear end face.
3. The wafer soaking apparatus for wet processing according to claim 2, wherein: the output shaft of the top of the electric push rod (2) is fastened to the top end face of the sliding frame (3), the sliding frame (3) is slidably mounted on a supporting frame (4) which is locked at the front end of the top end face of the base (12), a first cylinder (5) and a connecting rod (6) are mounted at the rear ends of the middle part of the top end face and the bottom end face of the sliding frame (3) respectively, the output shaft of the bottom of the first cylinder (5) penetrates through the top end face of the sliding frame (3) and then is fixedly connected to the top end face of the rotating rod (7), the connecting rod (6) penetrates through the top end face of the box body (17) and then is hinged to the middle part of the top end face of the box body (13), and the rotating rod (7) penetrates through.
4. The wafer soaking apparatus for wet processing according to claim 3, wherein: liquid inlet (8) and window (10) have been seted up respectively to box (17) top end face left side and rear end face middle part, just tank (17) inboard bottom has been seted up and has been soaked groove (14), second cylinder (11) through L type rigid piece (18) lock solid install in box (17) rear end top, soak the inboard front end embedding in groove (14) and have hot plate (15), just soak groove (14) top rear end and be provided with air-supply line (16), air-supply line (16) install in lower part in the inboard rear end face of box (17).
5. The wafer soaking apparatus for wet processing according to claim 2, wherein: collect mechanism (94) including collecting box (941), lug (942), recess (943), fixture block (944), draw-in groove (945), transparent plate (946) and thru hole (947), collect box (941) and laminate in bottom plate (91) bottom end face, lug (942) fasten in collect box (941) front end face middle part, and lug (942) along the recess (943) inboard side horizontal slip that sets up in the lower part in box (17) rear end face, fixture block (944) set up in the middle part of the upper and lower terminal surface of lug (942), and fixture block (944) activity stretches into draw-in groove (945) inboard, draw-in groove (945) are seted up in both ends about recess (943) inboard, transparent plate (946) imbeds in collect box (941) rear end face middle and lower part, thru hole (947) link up in both ends middle part about bottom plate (91), and the through hole (947) falls within the inside range of the collection box (941).
6. The wafer soaking apparatus for wet processing according to claim 2, wherein: the extension plates (92) extend upwards in an inclined mode, and the left and right opposite surfaces of the extension plates (92) form an included angle of 120 degrees with the top end surface of the bottom plate (91).
7. The wafer soaking apparatus for wet processing according to claim 2, wherein: the top of the front end face of the rubber sheet (910) is in a tapered inclined plane shape from bottom to top, and the front end face of the rubber sheet (910) is smooth and burr-free.
8. The wafer soaking apparatus for wet processing according to claim 2, wherein: the miniature springs (911) are arranged on the rear end face of the extrusion plate (99) at equal intervals, and the miniature springs (911) are respectively arranged at the upper end, the lower end and the middle part of the rear end face of the extrusion plate (99).
9. The wafer soaking apparatus for wet processing according to claim 2, wherein: the sealing piece (95) is in a square shape, and the side surface of the sealing piece (95) is flush with the side surface of the baffle (1).
10. The wafer soaking apparatus for wet processing according to claim 2, wherein: the top end face of the bottom plate (91) is in an arc shape gradually reduced from outside to inside, and a smooth thin film layer is arranged on the top end face of the bottom plate (91).
CN202021728967.9U 2020-08-18 2020-08-18 Wafer soaking device for wet processing Active CN212570938U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202021728967.9U CN212570938U (en) 2020-08-18 2020-08-18 Wafer soaking device for wet processing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202021728967.9U CN212570938U (en) 2020-08-18 2020-08-18 Wafer soaking device for wet processing

Publications (1)

Publication Number Publication Date
CN212570938U true CN212570938U (en) 2021-02-19

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Application Number Title Priority Date Filing Date
CN202021728967.9U Active CN212570938U (en) 2020-08-18 2020-08-18 Wafer soaking device for wet processing

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