CN212451610U - Vertical wafer loading frame suitable for magnetron sputtering coating - Google Patents
Vertical wafer loading frame suitable for magnetron sputtering coating Download PDFInfo
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- CN212451610U CN212451610U CN202020340712.9U CN202020340712U CN212451610U CN 212451610 U CN212451610 U CN 212451610U CN 202020340712 U CN202020340712 U CN 202020340712U CN 212451610 U CN212451610 U CN 212451610U
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Abstract
The utility model discloses a vertical wafer loading frame suitable for magnetron sputtering coating, which comprises a main frame and at least two groups of cross rod components; the main frame comprises at least two vertical rods which are parallel to each other and at least two cross rods which are parallel to each other, and two ends of each cross rod are fixedly connected with the two vertical rods respectively; each cross rod assembly comprises a chip mounting cross rod parallel to the cross rod of the main frame, and two ends of the chip mounting cross rod are respectively detachably connected with the two cross rods of the main frame; the loading cross bar is at least provided with a loading clamping groove along the length direction. The clamping grooves of the adjacent wafer mounting cross rods can form wafer mounting clamping positions, and one opposite end of a mask plate or a sample is clamped between the clamping grooves of the two adjacent wafer mounting cross rods respectively, so that wafer mounting is realized. The mounting cross rod can be detachably connected with the cross rod of the main frame, so that the height position of the mounting cross rod can be adjusted, the mounting and coating device can be suitable for clamping and coating films of masks or samples with different height sizes, and the coating efficiency is improved.
Description
Technical Field
The utility model relates to the technical field of sputtering coating equipment accessories, in particular to a vertical film loading frame suitable for magnetron sputtering coating.
Background
The film holding frame of the existing large-scale film coating equipment generally adopts a fixed rod form and cannot adapt to mask plates or samples with different sizes, so that the film coating process is relatively complicated, the film coating work efficiency is difficult to promote, and the effect of the coated product is not satisfactory.
SUMMERY OF THE UTILITY MODEL
The utility model aims at providing a vertical film loading frame suitable for magnetron sputtering coating film, its film loading space is adjustable, can adapt to the coating film of unidimensional mask plate or sample, improves coating film efficiency.
The utility model discloses the technical scheme who takes does: a vertical wafer loading frame suitable for magnetron sputtering coating comprises a main frame and at least two groups of cross rod assemblies;
the main frame comprises at least two vertical rods which are parallel to each other and at least two cross rods which are parallel to each other, and two ends of each cross rod are fixedly connected with the two vertical rods respectively;
each cross rod assembly comprises a chip mounting cross rod parallel to the cross rod of the main frame, and two ends of the chip mounting cross rod are respectively detachably connected with the two cross rods of the main frame; the loading cross bar is at least provided with a loading clamping groove along the length direction.
The utility model discloses in, can form the mounting screens between the draw-in groove of adjacent mounting horizontal pole, an opposite end of mask plate or sample is gone into respectively between the draw-in groove of double-phase adjacent mounting horizontal pole, realizes the mounting promptly. The mounting cross rod is detachably connected with the cross rod of the main frame, so that the height position of the mounting cross rod can be adjusted, and the mounting and coating device can be suitable for clamping and coating of masks or samples with different height sizes.
Further, the utility model discloses a vertical dress piece frame still includes the locating lever, and the locating lever is on a parallel with the main frame montant, and the main frame horizontal pole is connected at both ends, and each dress piece horizontal pole is run through at the middle part. The positioning rod can position the main frame structure and the horizontal position of each loading cross rod, so that the clamping is stable and reliable.
Optionally, the positioning rod is fixedly installed at the vertical center position of the main frame; the middle part of each loading transverse rod in the length direction is provided with a through hole loosely matched with the positioning rod. The loose arrangement can lead the loading cross rod to be directly lifted when the height is adjusted, thus simplifying the operation.
Optionally, the positioning rod is a threaded rod, and two ends of the positioning rod are in threaded connection with the cross rod of the main frame and are positioned through nuts; positioning nuts are respectively arranged on the positioning rods on the two sides of the through hole of each wafer mounting cross rod. The positioning nut can further position the loading cross rod, and the falling-off caused by the untight fixation of the two ends of the loading cross rod is avoided.
Optionally, the utility model discloses an among the vertical wafer loading frame, the both ends of one of them horizontal pole of main frame link firmly two montant tops respectively, and one side top that this horizontal pole deviates from the main frame is equipped with U type groove. The U-shaped groove is arranged at the top of the main frame, so that the displacement guide of the historical chip loading frame can be realized.
Further, the utility model discloses a vertical sheet loading frame is still including linking firmly the guide holder of main frame, is equipped with the U type groove that the opening deviates from the main frame on the guide holder for the horizontal pole of main frame can slide in matched with guide rail through U type groove, thereby can drive the sheet loading frame and remove, realizes the displacement direction of sheet loading frame.
Optionally, the number of the guide seats is two, the two ends of the two cross rods of the main frame are fixedly connected with the top end and the bottom end of the two vertical rods respectively, and the two guide seats are fixed on the two cross rods of the main frame respectively. The guide seat can be matched with a coating device and a guide rail matched with the coating device for installation so as to be suitable for the coating position.
Optionally, the number of the guide seats is 1, and the guide seats are matched with a cross bar at the top of the main frame; the bottom of the main frame is also provided with a balancing weight which can be detachably fixed on the main frame. Under the spacing guide effect of top guide holder, the bottom balancing weight can realize the aversion along with other power drive device such as belt, and the setting of balancing weight can make the whole difficult skew of main frame. The balancing weight can be fixed at the lower end of the main frame through a screw, such as the lower end parts of two vertical rods.
Optionally, the upper surface and the lower surface of the wafer mounting cross rod are respectively provided with a clamping groove. A slot may also be provided on only one side thereof.
Optionally, the cross rod assembly further comprises a lantern ring and a positioning screw, the lantern ring is sleeved on the periphery of the cross rod of the main frame, and a screw hole and a pin are arranged on the periphery of the lantern ring; the positioning screw is matched with the screw hole and is abutted against the vertical rod of the main frame to fix the wafer mounting cross rod; the two ends of the loading cross rod are respectively provided with a pin hole loosely matched with the pin, and the loading cross rod is connected with the pin through the pin hole, so that the installation and the positioning of the loading cross rod on the main frame can be realized.
Advantageous effects
The utility model discloses adjustable structure between horizontal pole and the main frame can be through adjusting the distance between two arbitrary mounting horizontal poles, realize with the phase-match of not unidimensional mask plate or sample, realize the coating film of not unidimensional sample on same mounting frame, can save the time of customization mounting frame greatly.
Drawings
Fig. 1 shows a schematic structural view of the vertical wafer loading rack of the present invention, in which: 1-counterweight block, 1-1 counterweight block fixing screw, 2-main frame, 3-guide seat, 4-positioning rod, 4-1/4-2-nut, 5-piece-mounting cross rod, 6-lantern ring and 6-1-lantern ring positioning screw.
Detailed Description
The following further description is made in conjunction with the accompanying drawings and the specific embodiments.
Referring to fig. 1, the vertical wafer loading rack for magnetron sputtering coating of the present invention comprises a main frame 2 and at least two sets of cross bar assemblies;
the main frame 2 comprises at least two vertical rods which are parallel to each other and at least two cross rods which are parallel to each other, and two ends of each cross rod are fixedly connected with the two vertical rods respectively;
each cross rod assembly comprises a chip mounting cross rod 5 parallel to the cross rod of the main frame, and two ends of the chip mounting cross rod 5 are respectively detachably connected with two cross rods of the main frame 2; at least one loading slot (not shown) is arranged on the loading cross rod 5 along the length direction thereof.
When the device is used, the clamping grooves of the adjacent wafer mounting cross rods can form wafer mounting clamping positions, and one opposite end of a mask plate or a sample is clamped between the clamping grooves of the two adjacent wafer mounting cross rods respectively, so that wafer mounting is realized. The mounting cross rod is detachably connected with the cross rod of the main frame, so that the height position of the mounting cross rod can be adjusted, and the mounting and coating device can be suitable for clamping and coating of masks or samples with different height sizes.
Example 1
In the embodiment shown in fig. 1, the vertical wafer loading rack further includes a positioning rod 4, a counterweight 1 and a guide seat 3.
The cross rods and the vertical rods of the main frame 2 can be welded and fixed through square pipes, and the sheet mounting cross rods 5 are plates with certain widths so as to be convenient to arrange clamping grooves in the surfaces of the plates.
The locating rod 4 is parallel to the vertical rod of the main frame 2, the two ends of the locating rod are connected with the horizontal rods of the main frame 2, and the middle part of the locating rod runs through the wafer mounting horizontal rods 5. The positioning rod can position the main frame structure and the horizontal position of each loading cross rod, so that the clamping is stable and reliable.
The positioning rod 4 is fixedly arranged at the vertical center position of the main frame 2; the middle part of each mounting cross rod 5 in the length direction is provided with a through hole loosely matched with the positioning rod 4. The loose arrangement can lead the loading cross rod 5 to be directly lifted when the height is adjusted, thus simplifying the operation.
The positioning rod 4 is a threaded rod, and two ends of the positioning rod are in threaded connection with the cross rod of the main frame 2 and are positioned through nuts; positioning nuts 4-1/4-2 are respectively arranged on the positioning rods at the two sides of the through hole of each wafer mounting cross rod. The positioning nut can further position the loading cross rod, and the falling-off caused by the untight fixation of the two ends of the loading cross rod is avoided.
3 quantity of guide holder is 1, is equipped with the U type groove that the opening deviates from the main frame on the guide holder 3 for the horizontal pole of main frame can slide in matched with guide rail through U type groove, thereby can drive the slide holder and remove, realizes the displacement direction of slide holder, supports simultaneously through setting up a plurality of slide holders, realizes pipelined's mask plate or sample batch coating film.
The balancing weight 1 is detachably arranged at the bottom of the main frame 2 and is fixed at the lower end parts of two vertical rods of the main frame 2 through screws 1-1. Under the spacing guide effect of top guide holder, the bottom balancing weight can realize the aversion along with other power drive device such as belt, and the setting of balancing weight can make the whole difficult skew of main frame.
The function of the guide seat can also be directly realized by the cross bar of the main frame, namely: two ends of one cross rod of the main frame are fixedly connected with the top ends of the two vertical rods respectively, and the top of one side of the cross rod, which deviates from the main frame, is provided with a U-shaped groove.
The upper surface and the lower surface of the loading cross rod 5 are respectively provided with a clamping groove which can be a square groove.
The cross bar assembly further comprises a lantern ring 6 and a positioning screw 6-1, the lantern ring 6 is sleeved on the periphery of the cross bar of the main frame, and a screw hole and a pin are formed in the periphery of the lantern ring; the positioning screw is matched with the screw hole and is abutted against the vertical rod of the main frame to fix the wafer mounting cross rod; the two ends of the loading cross rod are respectively provided with a pin hole loosely matched with the pin, and the loading cross rod is connected with the pin through the pin hole, so that the installation and the positioning of the loading cross rod on the main frame can be realized.
Example 2
Different from embodiment 1, this embodiment does not set up the balancing weight, and guide holder quantity is two, is fixed in the top of main frame and the bottom horizontal pole outside respectively to set up the U type groove that the opening deviates from the main frame. In this embodiment, the two ends of the cross bar at the bottom of the main frame are fixedly connected with the lower ends of the two vertical bars. The guide seat can be matched with coating equipment for installation so as to be suitable for the coating position.
In this embodiment, only one clamping groove can be arranged on one side of the wafer loading cross bar, but this embodiment is not suitable for batch coating treatment.
The basic principles and the main features of the invention and the advantages of the invention have been shown and described above. It will be understood by those skilled in the art that the present invention is not limited to the above embodiments, and that the foregoing embodiments and descriptions are provided only to illustrate the principles of the present invention without departing from the spirit and scope of the present invention. The scope of the invention is defined by the appended claims and equivalents thereof.
Claims (10)
1. A vertical wafer loading frame suitable for magnetron sputtering coating is characterized by comprising a main frame and at least two groups of cross rod assemblies;
the main frame comprises at least two vertical rods which are parallel to each other and at least two cross rods which are parallel to each other, and two ends of each cross rod are fixedly connected with the two vertical rods respectively;
each cross rod assembly comprises a chip mounting cross rod parallel to the cross rod of the main frame, and two ends of the chip mounting cross rod are respectively detachably connected with the two cross rods of the main frame; the loading cross bar is at least provided with a loading clamping groove along the length direction.
2. The vertical wafer holder suitable for magnetron sputtering coating of claim 1, further comprising a positioning rod, wherein the positioning rod is parallel to the vertical rod of the main frame, two ends of the positioning rod are connected with the cross rods of the main frame, and the middle part of the positioning rod penetrates through each wafer holding cross rod.
3. The vertical wafer holder suitable for magnetron sputtering coating of claim 2, wherein the positioning rod is fixedly installed at the vertical center position of the main frame; the middle part of each loading transverse rod in the length direction is provided with a through hole loosely matched with the positioning rod.
4. The vertical wafer holder suitable for magnetron sputtering coating according to claim 2 or 3, wherein the positioning rod is a threaded rod, two ends of the positioning rod are in threaded connection with the cross rod of the main frame and are positioned by nuts; positioning nuts are respectively arranged on the positioning rods on the two sides of the through hole of each wafer mounting cross rod.
5. The vertical wafer holder suitable for magnetron sputtering coating of claim 1, wherein two ends of one cross bar of the main frame are fixedly connected with top ends of two vertical bars respectively, and a top of one side of the cross bar, which is away from the main frame, is provided with a U-shaped groove.
6. The vertical wafer holder suitable for magnetron sputtering coating of claim 1, further comprising a guide seat fixedly connected to the main frame, wherein the guide seat is provided with a U-shaped groove with an opening deviating from the main frame.
7. The vertical wafer holder according to claim 6, wherein the number of the guide seats is two, two ends of the two cross bars of the main frame are fixedly connected to the top and bottom ends of the two vertical bars, respectively, and the two guide seats are fixed to the two cross bars of the main frame, respectively.
8. The vertical wafer loading rack suitable for magnetron sputtering coating of claim 6, wherein the number of the guide seats is 1, and the guide seats are fixed on a cross bar at the top of the main frame; the bottom of the main frame is also provided with a balancing weight which can be detachably fixed on the main frame.
9. The vertical wafer holder suitable for magnetron sputtering coating of claim 1, wherein the upper surface and the lower surface of the wafer holding cross bar are respectively provided with a clamping groove.
10. The vertical wafer rack suitable for magnetron sputtering coating of claim 1, wherein the cross bar assembly further comprises a lantern ring and a positioning screw, the lantern ring is sleeved on the outer periphery of the cross bar of the main frame, and the periphery of the lantern ring is provided with a screw hole and a pin; the positioning screw is matched with the screw hole and is abutted against the vertical rod of the main frame to fix the wafer mounting cross rod; the two ends of the loading cross rod are respectively provided with a pin hole loosely matched with the pin, and the loading cross rod is connected with the pin through the pin hole.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020340712.9U CN212451610U (en) | 2020-03-18 | 2020-03-18 | Vertical wafer loading frame suitable for magnetron sputtering coating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020340712.9U CN212451610U (en) | 2020-03-18 | 2020-03-18 | Vertical wafer loading frame suitable for magnetron sputtering coating |
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| Publication Number | Publication Date |
|---|---|
| CN212451610U true CN212451610U (en) | 2021-02-02 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202020340712.9U Active CN212451610U (en) | 2020-03-18 | 2020-03-18 | Vertical wafer loading frame suitable for magnetron sputtering coating |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111334768A (en) * | 2020-03-18 | 2020-06-26 | 苏州求是真空电子有限公司 | Vertical wafer loading frame suitable for magnetron sputtering coating |
-
2020
- 2020-03-18 CN CN202020340712.9U patent/CN212451610U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111334768A (en) * | 2020-03-18 | 2020-06-26 | 苏州求是真空电子有限公司 | Vertical wafer loading frame suitable for magnetron sputtering coating |
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| GR01 | Patent grant | ||
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| TR01 | Transfer of patent right |
Effective date of registration: 20220217 Address after: 310024 room 414, building 3, Hejing business center, Gudang street, Xihu District, Hangzhou, Zhejiang Patentee after: Hangzhou bifanke Electronic Technology Co.,Ltd. Address before: 215300 Building 1, 232 Yuanfeng Road, Yushan Town, Kunshan City, Suzhou City, Jiangsu Province Patentee before: SUZHOU ADVANCED VACUUM ELECTRONIC EQUIPMENT CO.,LTD. |
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| TR01 | Transfer of patent right |