CN212349705U - Cleaning machine - Google Patents
Cleaning machine Download PDFInfo
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- CN212349705U CN212349705U CN202020773465.1U CN202020773465U CN212349705U CN 212349705 U CN212349705 U CN 212349705U CN 202020773465 U CN202020773465 U CN 202020773465U CN 212349705 U CN212349705 U CN 212349705U
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Abstract
The utility model provides a cleaning machine, which is used for cleaning quartz wafers and comprises a cleaning part, a valve and a temperature control component; the cleaning component is provided with a cleaning cavity; the valve comprises a first water port and a second water port, the first water port is a water inlet, and the second water port is communicated with the cleaning cavity; the temperature control assembly comprises a detection part and a control part, the detection part is electrically connected with the control part and used for detecting the water inlet temperature of the valve, and the control part is electrically connected with the valve and used for controlling the valve according to the water inlet temperature. The utility model provides a cleaning machine is at the in-process that washs quartz wafer, and the temperature of washing liquid is guaranteed throughout in suitable temperature range, avoids the high temperature of washing liquid or crosses low excessively, and then promotes the cleaning performance to quartz wafer for quartz wafer possesses more good electrical property.
Description
Technical Field
The utility model relates to a quartz wafer washs technical field, particularly, relates to a cleaning machine.
Background
At present, in the manufacturing process of the quartz crystal resonator, the quartz crystal wafer needs to be cleaned by an ultrasonic cleaning machine, so that the electrical characteristics of the quartz crystal wafer are ensured.
In the related art, when cleaning a quartz wafer, a certain cleaning solution needs to be introduced into a cleaning cavity of an ultrasonic cleaning machine, and a high-frequency oscillation signal is sent out by an ultrasonic generator, so that bubbles are generated in the cleaning solution, and the quartz wafer is cleaned; however, during the cleaning process, the cleaning effect of the quartz wafer is affected by the over-high or over-low temperature of the cleaning liquid.
SUMMERY OF THE UTILITY MODEL
The present invention aims at least solving one of the technical problems existing in the prior art or the related art.
To this end, the utility model discloses a first aspect provides a cleaning machine.
In view of the above, the first aspect of the present invention provides a cleaning machine for cleaning a quartz wafer, the cleaning machine including a cleaning part, a valve and a temperature control assembly; the cleaning component is provided with a cleaning cavity; the valve comprises a first water port and a second water port, the first water port is a water inlet, and the second water port is communicated with the cleaning cavity; the temperature control assembly comprises a detection part and a control part, the detection part is electrically connected with the control part and used for detecting the water inlet temperature of the valve, and the control part is electrically connected with the valve and used for controlling the valve according to the water inlet temperature.
According to the cleaning machine provided by the utility model, the cleaning liquid enters the cleaning cavity after passing through the valve, and the quartz wafer is cleaned in the cleaning cavity; the temperature control assembly comprises a detection part and a control part, the detection part can detect the temperature of the cleaning liquid, when the temperature of the cleaning liquid is equal to a preset temperature, the control part controls the conduction of the first water gap and the second water gap, so that the cleaning liquid can enter the cleaning cavity, and in the process of cleaning the quartz wafer, the temperature of the cleaning liquid is always ensured within an appropriate temperature range, so that the temperature of the cleaning liquid is prevented from being too high or too low, the cleaning effect on the quartz wafer is further improved, and the quartz wafer has better electrical performance; when the temperature of the cleaning liquid is not equal to the preset temperature, the control component controls the first water port and the second water port to be disconnected, the cleaning liquid cannot enter the cleaning cavity, and the cleaning machine is controlled to stop cleaning the quartz wafer.
Additionally, the utility model provides an among the above-mentioned technical scheme cleaning machine can also have following additional technical characterstic:
in one technical scheme of the utility model, the valve further comprises a third water port, and the third water port is a water return port; when the water inlet temperature is equal to the preset working temperature, the control part controls the first water port to be communicated with the second water port, the first water port is disconnected with the third water port, and when the water inlet temperature is not equal to the preset working temperature, the control part controls the first water port to be disconnected with the second water port, and the first water port is communicated with the third water port.
In the technical scheme, when the temperature of the cleaning liquid is equal to the preset temperature, the control part controls the first water port and the second water port to be conducted, the first water port and the third water port are disconnected, so that the cleaning liquid can enter the cleaning cavity, and in the process of cleaning the quartz wafer, the temperature of the cleaning liquid is always ensured within an appropriate temperature range, so that the temperature of the cleaning liquid is prevented from being too high or too low, the cleaning effect on the quartz wafer is further improved, and the quartz wafer has better electrical performance; when the temperature of washing liquid is not equal to preset temperature, the disconnection of first mouth of a river and second mouth of a river is controlled to control unit, first mouth of a river and third mouth of a river switch on, and the washing liquid can't enter into the washing intracavity, but is discharged by the third mouth of a river, avoids the high temperature or the low washing liquid of crossing excessively to pile up in the pipe for when the second mouth of a river is opened once more, the temperature of the washing liquid that enters into the washing intracavity equals preset temperature, further promotes the cleaning performance to quartz wafer.
The utility model discloses an among the technical scheme, the detection part sets up in first water gap department.
In the technical scheme, the detection part is arranged at the first water gap, and when the first water gap is communicated with the second water gap, the detection part can accurately detect the temperature of the cleaning liquid entering the cleaning cavity; when the first water gap is communicated with the third water gap, the cleaning liquid is still in a flowing state, so that the temperature of the cleaning liquid can be still accurately detected by the detection part; and because the detection part sets up in first mouth of a river department, first mouth of a river department is close the cleaning part more, so the temperature that detects out is close more with the washing liquid temperature that enters into the washing intracavity portion, reduces because of the temperature error that the washing liquid dispels the heat and cause in the pipeline, and then promotes the accuracy that detects.
In one technical scheme of the utility model, the cleaning machine also comprises a water tank and a heating component; the water tank is connected with the first water port; the heating part is arranged in the water tank and is electrically connected with the control part, so that the control part controls the heating power of the heating part according to the water inlet temperature.
In this technical scheme, the heater block sets up in the water tank, but the washing liquid in the heatable water tank, and control unit can be according to the heating power of the temperature control heater block that detects to ensure that the washing liquid that enters into the washing intracavity is in all the time and predetermines the temperature, further promotes quartz wafer's cleaning performance.
In one technical scheme of the utility model, the cleaning machine also comprises a water inlet pipe, one end of the water inlet pipe is connected with the water tank, and the other end is connected with the first water gap; the detection component is arranged in the water inlet pipe.
In the technical scheme, the water inlet pipe is used for connecting the water tank and the valve, so that cleaning liquid in the water tank can enter the cleaning cavity. The detection component is arranged in the water pipe, the structure is simple, and the installation mode is simple and convenient.
The utility model discloses an among the technical scheme, the cleaning machine still includes the water pump, and the water pump sets up in the water tank, is connected with the inlet tube.
In the technical scheme, the water pump is arranged in the water tank to drive the cleaning liquid in the water tank to enter the cleaning cavity.
The utility model discloses an among the technical scheme, the cleaning machine still includes the wet return, and the one end of wet return is connected with the water tank, and the other end is connected with the cleaning component to make the washing liquid in the cleaning component can flow back to the water tank in, make washing liquid circulated use.
The utility model discloses an among the technical scheme, the cleaning machine still includes alarm device, and alarm device is connected with the control unit electricity.
In the technical scheme, when the temperature detected by the detection component is not at the preset temperature, an alarm can be given to an operator, so that the operator is reminded of the abnormal temperature of the cleaning liquid, and the operator can adjust the temperature of the cleaning liquid according to the actual condition.
The preset temperature comprises a first preset temperature and a second preset temperature, wherein the first preset temperature is 60-80 ℃, and the second preset temperature is 65-75 ℃.
When the temperature of the cleaning liquid detected by the detection component is not within the range of the second preset temperature but within the range of the first preset temperature, a first alarm prompt is sent to prompt an operator that the temperature of the cleaning liquid is too high or too low, so that the operator can adjust the heating power of the heating component in time, and the cleaning machine is prevented from being stopped.
When the cleaning temperature detected by the detection component is not within the range of the first preset temperature, the control component controls the valve to act, controls the cleaning machine to stop working, and sends out a second alarm prompt to prompt an operator that the temperature of the cleaning liquid cannot ensure the cleaning effect of the quartz wafer.
The utility model discloses an among the technical scheme, the cleaning machine still includes supersonic generator, and supersonic generator sets up at the washing intracavity.
In the technical scheme, a quartz wafer is placed in a cleaning cavity, after cleaning liquid is introduced into the cleaning cavity, an ultrasonic generator sends out a high-frequency oscillation signal, and the high-frequency oscillation signal is converted into high-frequency mechanical oscillation through a transducer and is transmitted into the cleaning liquid; ultrasonic waves are radiated alternately in the cleaning liquid to enable the liquid to flow to generate tens of thousands of tiny bubbles, the bubbles form and grow in a negative pressure region in which the ultrasonic waves longitudinally propagate, and are quickly closed in a positive pressure region.
In a technical solution of the present invention, the detecting component is a thermal resistor.
In the technical scheme, the metal conductor of the thermal resistor is arranged in the water inlet pipe, and the power line and the signal line of the thermal resistor are connected to the control assembly.
Thermal resistance thermometry is based on the property that the resistance of a metal conductor increases with increasing temperature.
In a technical solution of the present invention, the valve is an electromagnetic valve.
In the technical scheme, the electromagnetic valve is convenient to control, has high sensitivity and can open or close the second water port in time.
Additional aspects and advantages of the invention will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the invention.
Drawings
The above and/or additional aspects and advantages of the present invention will become apparent and readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings of which:
fig. 1 shows a schematic structural view of a washing machine according to an embodiment of the invention;
wherein, the corresponding relationship between the reference numbers and the component names in fig. 1 is:
100 cleaning parts, 200 valves, 202 a first water port, 204 a second water port, 206 a third water port, 300 temperature control components, 302 control parts, 304 detection parts, 400 water tanks and 500 water inlet pipes.
Detailed Description
In order to make the aforementioned objects, features and advantages of the present invention more clearly understood, the present invention will be described in further detail with reference to the accompanying drawings and detailed description. It should be noted that the embodiments and features of the embodiments of the present application may be combined with each other without conflict.
In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention, however, the present invention may be practiced in other ways than those specifically described herein, and therefore the scope of the present invention is not limited by the specific embodiments disclosed below.
A washing machine according to some embodiments of the present invention is described below with reference to fig. 1.
In an embodiment of the first aspect of the present invention, as shown in fig. 1, the present invention provides a cleaning machine for cleaning a quartz wafer, the cleaning machine comprising a cleaning part 100, a valve 200 and a temperature control assembly 300; the cleaning part 100 is provided with a cleaning chamber; the valve 200 comprises a first water port 202 and a second water port 204, the first water port 202 is a water inlet, and the second water port 204 is communicated with the cleaning cavity; the temperature control assembly 300 comprises a detection part 304 and a control part 302, wherein the detection part 304 is electrically connected with the control part 302 and is used for detecting the inlet water temperature of the valve 200, and the control part 302 is electrically connected with the valve 200 and is used for controlling the valve 200 according to the inlet water temperature.
In this embodiment, the cleaning liquid enters the cleaning chamber through the valve 200, and the quartz wafer is cleaned in the cleaning chamber; the temperature control assembly 300 comprises a detection component 304 and a control component 302, wherein the detection component 304 can detect the temperature of the cleaning liquid, when the temperature of the cleaning liquid is equal to a preset temperature, the control component 302 controls the conduction of the first water gap 202 and the second water gap 204, so that the cleaning liquid can enter the cleaning cavity, and in the process of cleaning the quartz wafer, the temperature of the cleaning liquid is always ensured within an appropriate temperature range, so that the temperature of the cleaning liquid is prevented from being too high or too low, the cleaning effect on the quartz wafer is further improved, and the quartz wafer has better electrical performance; when the temperature of the cleaning liquid is not equal to the preset temperature, the control component 302 controls the first water port 202 and the second water port 204 to be disconnected, the cleaning liquid cannot enter the cleaning cavity, and the cleaning machine is controlled to stop cleaning the quartz wafer.
In an embodiment of the present invention, as shown in fig. 1, the valve 200 further includes a third water port 206, and the third water port 206 is a water return port; when the water inlet temperature is equal to the preset working temperature, the control component 302 controls the first water gap 202 to be communicated with the second water gap 204, the first water gap 202 is disconnected with the third water gap 206, when the water inlet temperature is not equal to the preset working temperature, the control component 302 controls the first water gap 202 to be disconnected with the second water gap 204, and the first water gap 202 is communicated with the third water gap 206.
In this embodiment, when the temperature of the cleaning liquid is equal to the preset temperature, the control component 302 controls the first water gap 202 and the second water gap 204 to be conducted, and the first water gap 202 and the third water gap 206 are disconnected, so that the cleaning liquid can enter the cleaning chamber, and during the process of cleaning the quartz wafer, the temperature of the cleaning liquid is always ensured within an appropriate temperature range, so as to avoid the temperature of the cleaning liquid from being too high or too low, thereby improving the cleaning effect on the quartz wafer, and enabling the quartz wafer to have more excellent electrical performance; when the temperature of the cleaning liquid is not equal to the preset temperature, the control component 302 controls the first water gap 202 and the second water gap 204 to be disconnected, the first water gap 202 and the third water gap 206 are connected, the cleaning liquid cannot enter the cleaning cavity, but is discharged from the third water gap 206, and the phenomenon that the cleaning liquid with too high or too low temperature is accumulated in the pipe is avoided, so that when the second water gap 204 is opened again, the temperature of the cleaning liquid entering the cleaning cavity is equal to the preset temperature, and the cleaning effect on the quartz wafer is further improved.
In one embodiment of the present invention, as shown in fig. 1, the detecting member 304 is disposed at the first water gap 202.
In this embodiment, the detecting component 304 is disposed at the first water gap 202, and when the first water gap 202 and the second water gap 204 are conducted, the detecting component 304 can accurately detect the temperature of the cleaning liquid entering the cleaning cavity; when the first water gap 202 and the third water gap 206 are conducted, the detection component 304 can still accurately detect the temperature of the cleaning liquid because the cleaning liquid is still in a flowing state; and because the detection part 304 is arranged at the first water gap 202, the first water gap 202 is closer to the cleaning part 100, so that the detected temperature is closer to the temperature of the cleaning liquid entering the cleaning cavity, the temperature error caused by heat dissipation of the cleaning liquid in the pipeline is reduced, and the detection accuracy is further improved.
In one embodiment of the present invention, as shown in fig. 1, the washing machine further includes a water tank 400 and a heating part; the water tank 400 is connected with the first water port 202; the heating part is disposed in the water tank 400 and electrically connected to the control part 302, so that the control part 302 controls the heating power of the heating part according to the temperature of the inflow water.
In this embodiment, the heating component is disposed in the water tank 400, and can heat the cleaning liquid in the water tank 400, and the control component 302 can control the heating power of the heating component according to the detected temperature, so as to ensure that the cleaning liquid entering the cleaning chamber is always at the preset temperature, and further improve the cleaning effect of the quartz wafer.
In an embodiment of the present invention, as shown in fig. 1, the cleaning machine further includes a water inlet pipe 500, one end of the water inlet pipe 500 is connected to the water tank 400, and the other end is connected to the first water gap 202; the sensing member 304 is disposed within the water inlet pipe 500.
In this embodiment, the water inlet pipe 500 is used to connect the water tank 400 and the valve 200 so that the cleaning solution in the water tank 400 can enter into the cleaning chamber. The detection component 304 is arranged in the water pipe, so that the structure is simple, and the installation mode is simple and convenient.
In an embodiment of the present invention, the cleaning machine further includes a water pump, which is disposed in the water tank 400 and connected to the water inlet pipe 500.
In this embodiment, a water pump is provided in the water tank 400 to drive the cleaning liquid in the water tank 400 into the cleaning chamber.
The utility model discloses an in the embodiment, the cleaning machine still includes the wet return, and the one end of wet return is connected with water tank 400, and the other end is connected with cleaning component 100 to make the washing liquid in cleaning component 100 can flow back to in water tank 400, make washing liquid circulated use.
In an embodiment of the present invention, the cleaning machine further comprises an alarm device, and the alarm device is electrically connected to the control unit 302.
In this embodiment, when the temperature detected by the detecting component 304 is not at the preset temperature, an alarm may be given to the operator, so as to remind the operator that the temperature of the cleaning liquid is abnormal, so that the operator may adjust the temperature of the cleaning liquid according to the actual situation.
The preset temperature comprises a first preset temperature and a second preset temperature, wherein the first preset temperature is 60-80 ℃, and the second preset temperature is 65-75 ℃.
When the temperature of the cleaning liquid detected by the detection component 304 is not within the range of the second preset temperature but within the range of the first preset temperature, a first alarm prompt is sent to prompt an operator that the temperature of the cleaning liquid is too high or too low, so that the operator can adjust the heating power of the heating component in time, and the cleaning machine is prevented from being stopped.
When the cleaning temperature detected by the detection component 304 is not within the first preset temperature range, the control component 302 controls the valve 200 to operate, controls the cleaning machine to stop working, and sends out a second alarm prompt to prompt an operator that the temperature of the cleaning liquid cannot ensure the cleaning effect of the quartz wafer.
In an embodiment of the present invention, the cleaning machine further includes an ultrasonic generator, and the ultrasonic generator is disposed in the cleaning cavity.
In the embodiment, a quartz wafer is placed in a cleaning cavity, after cleaning liquid is introduced into the cleaning cavity, an ultrasonic generator sends out a high-frequency oscillation signal, and the high-frequency oscillation signal is converted into high-frequency mechanical oscillation through a transducer and is transmitted into the cleaning liquid; ultrasonic waves are radiated alternately in the cleaning liquid to enable the liquid to flow to generate tens of thousands of tiny bubbles, the bubbles form and grow in a negative pressure region in which the ultrasonic waves longitudinally propagate, and are quickly closed in a positive pressure region.
In one embodiment of the present invention, the detecting member 304 is a thermal resistor.
In this embodiment, the metal conductors of the thermal resistors are mounted within the inlet tube 500, and the power and signal lines of the thermal resistors are connected to the control assembly.
Thermal resistance thermometry is based on the property that the resistance of a metal conductor increases with increasing temperature.
In one embodiment of the present invention, the valve 200 is a solenoid valve.
In this embodiment, the solenoid valve is easy to control, has high sensitivity, and can open or close the second water port 204 in time.
In the description of the present invention, the terms "plurality" or "a plurality" refer to two or more, and unless otherwise specifically limited, the terms "upper", "lower", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are merely for convenience of description and simplification of description, but do not indicate or imply that the device or element referred to must have a specific orientation, be constructed in a specific orientation, and be operated, and thus, should not be construed as limiting the present invention; the terms "connected," "mounted," "secured," and the like are to be construed broadly and include, for example, fixed connections, removable connections, or integral connections; may be directly connected or indirectly connected through an intermediate. The specific meaning of the above terms in the present invention can be understood according to specific situations by those skilled in the art.
In the description of the present invention, the description of the terms "one embodiment," "some embodiments," "specific embodiments," etc., means that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In the present disclosure, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (10)
1. A cleaning machine for cleaning quartz wafers, said cleaning machine comprising:
a cleaning component provided with a cleaning chamber;
the valve comprises a first water port and a second water port, the first water port is a water inlet, and the second water port is communicated with the cleaning cavity;
temperature control assembly, temperature control assembly includes detection part and control unit, detection part with the control unit electricity is connected, is used for detecting the temperature of intaking of valve, control unit with the valve electricity is connected, with the basis temperature control of intaking the valve.
2. The cleaning machine of claim 1 wherein the valve further comprises:
the third water gap is a water return port;
when the water inlet temperature is equal to the preset working temperature, the control part controls the first water port to be communicated with the second water port, the first water port is disconnected with the third water port, and when the water inlet temperature is not equal to the preset working temperature, the control part controls the first water port to be disconnected with the second water port, and the first water port is communicated with the third water port.
3. The cleaning machine of claim 2,
the detection part is arranged at the first water port.
4. The cleaning machine of claim 1, further comprising:
a water tank connected with the first water port;
the heating part is arranged in the water tank and is electrically connected with the control part, so that the control part controls the heating power of the heating part according to the water inlet temperature.
5. The cleaning machine of claim 4 further comprising:
one end of the water inlet pipe is connected with the water tank, and the other end of the water inlet pipe is connected with the first water port;
the detection component is arranged in the water inlet pipe.
6. The cleaning machine of claim 5, further comprising:
the water pump, the water pump set up in the water tank, with the inlet tube is connected.
7. The cleaning machine of claim 5, further comprising:
and one end of the water return pipe is connected with the water tank, and the other end of the water return pipe is connected with the cleaning component.
8. The cleaning machine of any one of claims 1 to 6, further comprising:
and the alarm device is electrically connected with the control component.
9. The cleaning machine of any one of claims 1 to 6, further comprising:
the ultrasonic generator is arranged in the cleaning cavity.
10. The cleaning machine of any one of claims 1 to 6,
the detection component is a thermal resistor;
the valve is an electromagnetic valve.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020773465.1U CN212349705U (en) | 2020-05-12 | 2020-05-12 | Cleaning machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020773465.1U CN212349705U (en) | 2020-05-12 | 2020-05-12 | Cleaning machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN212349705U true CN212349705U (en) | 2021-01-15 |
Family
ID=74136354
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202020773465.1U Active CN212349705U (en) | 2020-05-12 | 2020-05-12 | Cleaning machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN212349705U (en) |
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2020
- 2020-05-12 CN CN202020773465.1U patent/CN212349705U/en active Active
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